EP2164944B1 - Solutions de nettoyage concentrées stabilisées et leurs procédés de préparation - Google Patents
Solutions de nettoyage concentrées stabilisées et leurs procédés de préparation Download PDFInfo
- Publication number
- EP2164944B1 EP2164944B1 EP07796891A EP07796891A EP2164944B1 EP 2164944 B1 EP2164944 B1 EP 2164944B1 EP 07796891 A EP07796891 A EP 07796891A EP 07796891 A EP07796891 A EP 07796891A EP 2164944 B1 EP2164944 B1 EP 2164944B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- concentrated cleaning
- chelating agent
- cleaning solution
- stabilized
- cleaning solutions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004140 cleaning Methods 0.000 title claims description 80
- 238000000034 method Methods 0.000 title claims description 21
- 239000002738 chelating agent Substances 0.000 claims description 36
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 21
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 claims description 19
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims description 15
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 8
- 229920000058 polyacrylate Polymers 0.000 claims description 7
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 claims description 7
- 239000005708 Sodium hypochlorite Substances 0.000 claims description 5
- 230000000087 stabilizing effect Effects 0.000 claims description 4
- 239000007800 oxidant agent Substances 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 3
- SATVIFGJTRRDQU-UHFFFAOYSA-N potassium hypochlorite Chemical compound [K+].Cl[O-] SATVIFGJTRRDQU-UHFFFAOYSA-N 0.000 claims description 2
- 101100345345 Arabidopsis thaliana MGD1 gene Proteins 0.000 claims 3
- OHOTVSOGTVKXEL-UHFFFAOYSA-K trisodium;2-[bis(carboxylatomethyl)amino]propanoate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)C(C)N(CC([O-])=O)CC([O-])=O OHOTVSOGTVKXEL-UHFFFAOYSA-K 0.000 claims 3
- 239000000243 solution Substances 0.000 description 94
- 239000002244 precipitate Substances 0.000 description 33
- -1 phosphono compound Chemical class 0.000 description 17
- 229960001484 edetic acid Drugs 0.000 description 11
- 239000012535 impurity Substances 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 238000003860 storage Methods 0.000 description 10
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical class ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 8
- 239000002994 raw material Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000003085 diluting agent Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- CIEZZGWIJBXOTE-UHFFFAOYSA-N 2-[bis(carboxymethyl)amino]propanoic acid Chemical compound OC(=O)C(C)N(CC(O)=O)CC(O)=O CIEZZGWIJBXOTE-UHFFFAOYSA-N 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- 229920002125 Sokalan® Polymers 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000003352 sequestering agent Substances 0.000 description 4
- PQHYOGIRXOKOEJ-UHFFFAOYSA-N 2-(1,2-dicarboxyethylamino)butanedioic acid Chemical compound OC(=O)CC(C(O)=O)NC(C(O)=O)CC(O)=O PQHYOGIRXOKOEJ-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003945 anionic surfactant Substances 0.000 description 3
- 238000013459 approach Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000003599 detergent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910001385 heavy metal Inorganic materials 0.000 description 3
- 229940080260 iminodisuccinate Drugs 0.000 description 3
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 3
- 230000002035 prolonged effect Effects 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical class ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 229910019093 NaOCl Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000004061 bleaching Methods 0.000 description 2
- 239000007844 bleaching agent Substances 0.000 description 2
- 239000003093 cationic surfactant Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- 235000013305 food Nutrition 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 150000003014 phosphoric acid esters Chemical class 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 235000019832 sodium triphosphate Nutrition 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 150000003871 sulfonates Chemical class 0.000 description 2
- 239000002562 thickening agent Substances 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- YRIZYWQGELRKNT-UHFFFAOYSA-N 1,3,5-trichloro-1,3,5-triazinane-2,4,6-trione Chemical compound ClN1C(=O)N(Cl)C(=O)N(Cl)C1=O YRIZYWQGELRKNT-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- ZKQDCIXGCQPQNV-UHFFFAOYSA-N Calcium hypochlorite Chemical compound [Ca+2].Cl[O-].Cl[O-] ZKQDCIXGCQPQNV-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- 235000013162 Cocos nucifera Nutrition 0.000 description 1
- 244000060011 Cocos nucifera Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229920000388 Polyphosphate Polymers 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 230000029936 alkylation Effects 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- VDQQXEISLMTGAB-UHFFFAOYSA-N chloramine T Chemical compound [Na+].CC1=CC=C(S(=O)(=O)[N-]Cl)C=C1 VDQQXEISLMTGAB-UHFFFAOYSA-N 0.000 description 1
- 150000001860 citric acid derivatives Chemical class 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 238000004851 dishwashing Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- SYELZBGXAIXKHU-UHFFFAOYSA-N dodecyldimethylamine N-oxide Chemical compound CCCCCCCCCCCC[N+](C)(C)[O-] SYELZBGXAIXKHU-UHFFFAOYSA-N 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 150000002191 fatty alcohols Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 150000004668 long chain fatty acids Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- ARGDYOIRHYLIMT-UHFFFAOYSA-N n,n-dichloro-4-methylbenzenesulfonamide Chemical compound CC1=CC=C(S(=O)(=O)N(Cl)Cl)C=C1 ARGDYOIRHYLIMT-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 230000009972 noncorrosive effect Effects 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- HWGNBUXHKFFFIH-UHFFFAOYSA-I pentasodium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O HWGNBUXHKFFFIH-UHFFFAOYSA-I 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 1
- 229910000031 sodium sesquicarbonate Inorganic materials 0.000 description 1
- 235000018341 sodium sesquicarbonate Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 229950009390 symclosene Drugs 0.000 description 1
- 239000012085 test solution Substances 0.000 description 1
- 239000001226 triphosphate Substances 0.000 description 1
- WCTAGTRAWPDFQO-UHFFFAOYSA-K trisodium;hydrogen carbonate;carbonate Chemical compound [Na+].[Na+].[Na+].OC([O-])=O.[O-]C([O-])=O WCTAGTRAWPDFQO-UHFFFAOYSA-K 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/06—Hydroxides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/395—Bleaching agents
- C11D3/3956—Liquid compositions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/28—Organic compounds containing halogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3245—Aminoacids
Definitions
- the invention is directed to stabilized concentrated cleaning solutions, and to a method of preparing them.
- the production of such residue is caused or at least facilitated by commercially acceptable levels of impurities present in the raw materials used in the manufacture of the concentrated commercial cleaning solutions.
- these raw materials are available at various costs and associated levels of purity, i.e., a raw material solution with fewer impurities may be obtained for greater cost.
- the cost for a substantially pure raw material may so erode the profit margin of a product that the product would not be commercially viable to produce.
- environmental regulations may limit or prohibit the use of manufacturing processes that would produce substantially pure raw materials. In this instance then, even if a manufacturer would be willing to pay more for a raw material with fewer impurities, such a raw material may simply not be commercially available.
- concentrated cleaning solutions In order to enhance the convenience and customer satisfaction associated with concentrated cleaning solutions, the solutions would desirably be produced so that long-term storage thereof 3a is possible without visible deterioration and/or other change in product quality. Desirably, concentrated cleaning solutions could also be rendered more shelf stable in a manner that is more cost and/or time efficient than previously described. Additionally, such concentrated solutions could desirably be stabilized so that the introduction of impurities via a diluent would not result in the production of commercially unacceptable amounts of visible precipitates.
- EP 0 519 603 A1 describes a phosphate-free, gel-like automatic dishwasher detergent compositions comprising a low molecular weight polyacrylate, a polymeric thickener, a chlorine bleach compound in an amount to provide 0.2 to 4 % availabel chlorine and water.
- the composition may further contain builder salts, alkali metal silicate, alkali metal hydroxide, organic detergent, foam depressant, and a long-chain fatty acid.
- US 4,228,048 describes a foam cleaner for food plants comprising modified polyacrylic acid salt, sodium tripolyphosphate, sodium hydroxide, sodium silicate, sodium hypochlorite, sodium alkane sulfonate, and optionally sodium polyacrylate.
- GB 1 527 706 describes an improved detergent composition and its use in a dishwashing machine.
- EP 0 824 145 A1 describes a bleaching composition.
- the bleaching composition comprises hypochlorite, an alkaline source, and polyacrylate polymers.
- US 5,972,866 describes a thickened, non-corrosive cleaner which comprises hypochlorite bleach used to reduce staining on the surface, an alkalinity source, a thickening agent, and water.
- the present invention provides stabilized concentrated cleaning solutions and methods of stabilizing concentrated cleaning solutions according to claims 1 to 19.
- stabilized concentrated cleaning solutions may be provided that are shelf stable, i.e., that do not form commercially unacceptable levels of precipitates or experience a reduction in efficacy, when stored at or about room temperature for periods of up to at least 10 weeks and even up to 1 year or more.
- concentrated cleaning solutions produced according to the method of the present invention are stabilized so that the introduction of levels of impurities that may be commonly seen in water supplies do not result in the production of commercially unacceptable amounts of visible precipitates.
- the method is not overly time consuming and is inexpensive, relative to methods employing multiple and/or more expensive chemicals, and as such, the stabilized solutions can be produced readily.
- stabilized concentrated cleaning solutions comprise from 5 wt% to about 35 wt% of a source of hydroxide ions, from about 20 wt% to about 70 wt% of a source of hypochlorite ions, and from about 0.002 wt% to about 0.5 wt% chelating agent.
- the stabilized cleaning solutions may comprise from about 15 wt% to about 30 wt% of a hydroxide ion source, from about 20 wt% to about 70 wt% of a hypochlorite ion source and from about 0.0002 wt% to about 0.50 wt% chelating agent.
- the chelating agent may be EDTA, MGDA, NTA, IDS, polyacrylate or combinations of these. In certain embodiments, EDTA, MGDA or NTA are preferred.
- a method of stabilizing a concentrated cleaning solution comprising a source of hypochlorite ions comprises providing such a solution, providing a chelating agent, and adding the chelating agent to the cleaning solution.
- the chelating agent(s) are desirably added to the cleaning solution in amounts so that the concentration of chelating agent provided in the cleaning solution ranges from about 0.0001 wt% to about 2.00 wt%, more typically from about 0.0002 wt% to about 0.5 wt%, and preferably may be present in amounts as low as from about 0.0005 wt% to about 0.05 wt%.
- the present invention provides stabilized concentrated cleaning solutions, and methods of preparing these solutions. It was recently discovered that concentrated cleaning solutions comprising at least one hypochlorite ion source can tend to form visible precipitates upon prolonged storage, or upon the addition of a diluent comprising impurities. It is believed that the precipitates, generally found to be iron oxide, nickel oxide, copper oxide and/or cobalt oxide, were resulting from the reaction of heavy metal impurities in the starting raw materials or diluent, as the case may be, with the oxidant in the concentrated cleaning solutions. If enough impurities are present, and react with enough of the oxidant, the efficacy of the concentrated cleaning solutions may be reduced. Even if the efficacy remains acceptable, the presence of visible precipitates may be commercially unacceptable in products intended to be used in cleaning applications.
- Stabilized concentrated cleaning solutions according to the present invention do not form visible amounts of precipitates after storage at or about room temperature for periods of at least 10 weeks, 3 months, 6 months or even up to one year. This effect is provided via the inclusion of a small amount(s) of one or more chelating agents to the concentrated cleaning solutions. This result is surprising because as described in copending PCT application WO 2007/121785 A1 , these same chelating agents were not effective at reducing or preventing the formation of precipitates in these solutions in greater amounts.
- the chelating agents are extremely effective at reducing or even eliminating the amount of visible precipitates that may form in the cleaning solutions upon prolonged storage. Further, these results are achieved by and large with the use of only one readily commercially available, relatively safe chelating agent in very small amounts, representing a cost and time savings over other known methods of stabilizing these types of cleaning solutions, as well as providing significant advantages in storage and handling safety.
- chelating agents are polydentate ligands that reversibly bind to a metal ion typically via two or more hydrogen or ionic bonds.
- preferred chelating agents for use in the stabilized concentrated cleaning solutions and methods of preparing them include ethylene diamine tetraacetic acid (EDTA), methylglycinediacetic acid (MGDA), nitrilotriacetic acid (NTA), iminodisuccinate (IDS), polyacrylate, or combinations of these.
- very low concentrations of the chelating agents are very effective at providing the concentrated cleaning solutions with the desired stability, i.e., the reduction or even elimination of visible precipitates upon prolonged storage, or upon the addition of a diluent comprising copper, iron, nickel or cobalt impurities. More particularly, amounts of from about 0.0001 wt% to about 2.00 wt%, more typically from about 0.0002 wt% to about 0.5 wt%, and even in amounts as low as from about 0.0005 wt% to about 0.05 wt% have been found capable of providing the concentrated cleaning solutions with the desired stability.
- the chelating agent is, e.g., EDTA provided as a 38 wt% solution, amounts ranging from about 0.4 ppm to about 7600 ppm, or from about 0.76 ppm to about 1900 ppm or even from about 1.9 ppm to about 190 ppm, or may be used.
- Cost/efficiency considerations may dictate that the no more chelating agent than that required to achieve the desired effect should be used, and indeed, at higher concentrations the chelating agent(s) may not be effective at reducing or eliminating the visible precipitates that may occur upon storage for prolonged periods of time. For these reasons, amounts of the chelating agent greater than 2.5 wt% based upon the total weight of the stabilized concentrated cleaning solution, should be avoided.
- Concentrated cleaning solutions that benefit from application of the present method include those comprising an amount of hypochlorite ions.
- Sources of hypochlorite ions include, but are not limited to, chlorine, hypochlorite salts, chloramine T, dichloramine T, trichloroisocyanuric acid and any of these, or combinations thereof are suitable for use in the present stabilized concentrated cleaning solutions.
- the stabilized concentrated cleaning solutions comprise one or more hypochlorite salts as the source of hypochlorite ions, and calcium hypochlorite, potassium hypochlorite and/or sodium hypochlorite are particularly preferred.
- the source of hypochlorite ions in typical concentrated cleaning solutions ranges from about 5 to about 80 wt%, or from about 20 wt % to about 70 wt%, and more particularly from about 40 wt% to about 60 wt%, and these concentration ranges are suitable for use in the stabilized concentrated cleaning solutions of the present invention.
- hypochlorite ions that are, in turn, formed via the dissociation of hypochlorite salts or hypochlorous acid in water.
- Hypochlorous acid in turn, can be formed when chlorine reacts with water in amounts that depend upon the pH of the solution: Cl 2 + H 2 O HOCl + HCl
- the equilibrium of this reaction, and thus the amount of hypochlorous acid produced, depends on the pH of the solution. In alkaline solution, more hypochlorous acid is produced thereby increasing the bactericidal effect that can be seen.
- the stabilized concentrated cleaning solutions of the present invention are also desirably alkaline, and include a sufficient amount of a hydroxide ion source to render them so.
- hydroxide ions are provided in cleaning solutions via the inclusion of one or more caustic, or base, solutions.
- caustic, or base, solutions Such solutions are well known in the art, and any of these may be used, with preference given to sodium hydroxide and potassium hydroxide for their ready availability and ease of use.
- the source of hydroxide ions is typically included in conventional concentrated cleaning solutions in amounts of from about 1 wt% to about 40 wt%, preferably from about 5 wt% to about 35 wt%, or more typically from about 15 wt% to about 30 wt% of one or more hydroxide ion sources, and these ranges again provide a cleaning solution that would desirably be stabilized against the formation of visible precipitates and thus could benefit from application of the method of the present invention.
- particular stabilized concentrated cleaning solutions according to the present invention may comprise from about 15 wt% to about 30 wt% hydroxide ion source, such as sodium hydroxide or potassium hydroxide, from about 40 wt% to about 60 wt% hypochlorite ion source, such as sodium hypochlorite, and from about 0.0005 wt% to about 0.05 wt%chelating agent, such as EDTA.
- hydroxide ion source such as sodium hydroxide or potassium hydroxide
- hypochlorite ion source such as sodium hypochlorite
- EDTA wt%chelating agent
- stabilized concentrated cleaning solutions may comprise any of the other components typically included in conventional concentrated cleaning solutions.
- many such solutions include one or more sequestrants, surfactants, corrosion inhibitors, builders, solubilizers, solvents, other additives, or combinations of these.
- Sequestrants are typically included in cleaning solutions to reduce or prevent water hardness scaling.
- suitable sequestrants include, polyphosphates, organic phosponates, citrates, lactic acid, combinations of these and the like.
- One or more surfactants may also be included in the stabilized concentrated cleaning solutions to enhance the cleaning performance thereof.
- any type of surfactant i.e., anionic, cationic, non-ionic or amphoteric, may be added to the present concentrated cleaning solutions without detrimentally impacting the stability thereof, anionic and/or non-ionic surfactants are particularly appropriate for inclusion therein since the stabilized concentrated cleaning solutions may typically be alkaline.
- anionic surfactants include, but are not limited to, alkyl arene sulfonates, such as alkyl benzene sulfonates, alkyl naphthalene sulfonates, alkylsulfonates, alpha olefin sulfonates or alkyl sulfates.
- alkyl arene sulfonates such as alkyl benzene sulfonates, alkyl naphthalene sulfonates, alkylsulfonates, alpha olefin sulfonates or alkyl sulfates.
- a particularly preferred anionic surfactant that may be included in the present stabilized solutions is sodium lauryl sulfate.
- Examplary non-ionic surfactants include ethoxylated and/or propoxylated fatty alcohols or fatty amines, alkyl polyglucosides and aminoxides, or combinations thereof.
- Aminoxides are preferred, and examples of these include coconut alkyl dimethylamine oxide and lauryl dimethylamine oxide.
- Cationic surfactants may also be included in the present cleaning solutions.
- Cationic surfactants believed to be capable of providing some cleaning activity when in alkaline solution are exemplified by the quaternary ammonium salts.
- Preferred quaternary ammonium salts may be saturated or unsaturated and are those derived from trialkanol amines esterified with fatty acids and then quaternized with appropriate alkylation agents.
- Amounts of surfactant from about 1 wt% to 30 wt%, preferably from about 2 wt% to about 20 wt% and most preferably from about 4 wt% to about 15 wt% based upon the total weight of the stabilized concentrated solution may be employed.
- Solubilizers typically act to facilitate the dispersion of organic components, including any of the non-critical components such as surfactants, in aqueous solution, and one or more may also optionally be included in the stabilized cleaning solutions.
- solubilizers include sodium, potassium, ammonium and alkanol ammonium salts of sulfonates of xylene, toluene, ethylbenzoate, isopropylbenzene, naphthalene or alkyl naphthalene, phosphate esters of alkoxylated alkyl phenols, phosphate esters of alkoxylated alcohols and sodium, potassium and ammonium salts of alkyl sarcosinates, and mixtures of these.
- the one or more solubilizer(s) may be present in amounts of from about 1 to about 35 wt%, or from about 5 to about 25 wt% and more preferably from about 9 to about 20 wt%.
- the stabilized concentrated cleaning solution may also optionally contain one or more of other components commonly used in cleaning solutions including, but not limited to, builders, solvents, and other additives. Amounts of up to about 20%, or up to about 15 wt%, or even up to about 10% are suitable for each of these.
- Examplary builders that may be included in the stabilized concentrated cleaning solutions are sodium carbonate, sodium sesquicarbonate, sodium sulfate, sodium hydrogencarbonate, phosphates like pentasodium triphosphate, or its salt, citric acid or its salt, or combinations of these.
- Table 1 shows the storage stability of several exemplary stabilized concentrated cleaning solutions prepared in accordance with the present invention, as well as several comparative solutions. Each solution was prepared by simply mixing the components in the order and amounts indicated. Further, all amounts indicated are weight percents, based on the total weight of the solution.
- the solutions were stored at or about room temperature (25°C) and visual evaluations taken at 10 weeks, 3 months, 6 months and 1 year.
- 0.05% EDTA effectively prevents the formation of visible levels of precipitates in all of the tested solutions.
- Table 2 shows the storage stability of several exemplary stabilized concentrated cleaning solutions prepared in accordance with the present invention, as well as a comparative solution. Each solution was prepared by simply mixing the components in the order and amounts indicated. Further, all amounts indicated are weight percents, based on the total weight of the solution.
- the solutions were stored at or about room temperature (25°C) and visual evaluations taken at 10 weeks, 3 months, 6 months and 1 year.
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Claims (14)
- Une solution de nettoyage concentrée stabilisée comprenant:(i) d'environ 5 % en poids à environ 35 % en poids d'une source d'ions d'hydroxyde;(ii) d'environ 20 % en poids à environ 70 % en poids d'une source d'ions d'hypochlorite; et(iii) d'environ 0,0002 % en poids à environ 0,5 % en poids de l'agent de chélation.
- La solution de nettoyage concentrée stabilisée selon la revendication 1, comprenant(i) d'environ 15 % en poids à environ 30 % en poids d'une source d'ions d'hydroxyde;(ii) d'environ 40 % en poids à environ 60 % en poids d'une source d'ions d'hypochlorite; et(iii) d'environ 0,0005 % en poids à environ 0,05 % en poids de l'agent de chélation.
- La solution de nettoyage concentrée stabilisée selon la revendication 2, dans laquelle la source d'ions d'hydroxyde comprend l'hydroxyde de sodium, l'hydroxyde de potassium ou des combinaisons de ceux-ci.
- La solution de nettoyage concentrée stabilisée selon la revendication 2, dans laquelle la source d'ions d'hypochlorite comprend l'hypochlorite de sodium.
- La solution de nettoyage concentrée stabilisée selon la revendication 2, dans laquelle l'agent de chélation comprend l'EDTA.
- La solution de nettoyage concentrée stabilisée selon la revendication 1, dans laquelle l'agent de chélation comprend l'EDTA, le MGDA, le NTA, l'iminodisuccinate, le polyacrylate ou des combinaisons de ceux-ci.
- La solution de nettoyage concentrée stabilisée selon la revendication 2, dans laquelle l'agent de chélation comprend l'EDTA, le MGDA, le NTA ou des combinaisons de ceux-ci.
- La solution de nettoyage stabilisée selon la revendication 1, dans laquelle la source d'ions d'hydroxyde comprend l'hydroxyde de sodium, l'hydroxyde de potassium ou des combinaisons de ceux-ci.
- La solution de nettoyage stabilisée selon la revendication 1, dans laquelle la source d'ions d'hypochlorite comprend l'hypochlorite de sodium, l'hypochlorite de potassium ou des combinaisons de ceux-ci.
- Un procédé pour stabiliser une solution de nettoyage concentrée comprenant un oxydant selon l'une ou plusieurs des revendications 1 à 9, le procédé comprenant:(i) fournir d'une solution de nettoyage concentrée comprenant une source d'ions d'hypochlorite;(ii) fournir d'un agent de chélation; et(iii) ajouter l'agent de chélation à la solution de nettoyage concentrée.
- Le procédé selon la revendication 10, dans lequel l'agent de chélation est ajouté à la solution de nettoyage en une quantité pour fournir une concentration finale de l'agent de chélation dans la solution d'environ 0,0001 % en poids à environ 2,00 % en poids.
- Le procédé selon la revendication 11, dans lequel l'agent de chélation est ajouté à la solution de nettoyage en une quantité pour fournir une concentration finale de l'agent de chélation dans la solution d'environ 0,0002 % en poids à environ 0,5 % en poids.
- Le procédé selon la revendication 12, dans lequel l'agent de chélation est ajouté à la solution de nettoyage en une quantité pour fournir une concentration finale de l'agent de chélation dans la solution d'environ 0,0005 % en poids à environ 0,05 % en poids.
- Le procédé selon la revendication 10, dans lequel l'agent de chélation comprend l'EDTA, le MGDA, le NTA, l'iminodisuccinate, le polyacrylate ou des combinaisons de ceux-ci.
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PCT/US2007/016147 WO2009011676A1 (fr) | 2007-07-17 | 2007-07-17 | Solutions de nettoyage concentrées stabilisées et leurs procédés de préparation |
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EP (1) | EP2164944B1 (fr) |
JP (1) | JP5443351B2 (fr) |
CN (1) | CN101679921B (fr) |
AU (1) | AU2007356500B2 (fr) |
BR (1) | BRPI0721689A2 (fr) |
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US12134114B2 (en) | 2022-06-21 | 2024-11-05 | Ecolab Usa Inc. | Acidic cleaner |
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JP5603057B2 (ja) * | 2009-12-08 | 2014-10-08 | エステー株式会社 | 洗濯槽用洗浄剤組成物 |
CN103820800A (zh) * | 2014-02-20 | 2014-05-28 | 苏州龙腾万里化工科技有限公司 | 一种低温脱脂清洗剂 |
WO2016192787A1 (fr) * | 2015-06-03 | 2016-12-08 | Ecolab Inc. | Composition de nettoyage chlorée, hautement alcaline, présentant une stabilisation du chlore |
JP6900522B2 (ja) * | 2015-12-24 | 2021-07-07 | 水ing株式会社 | 洗浄組成物の製造方法 |
JP2017115010A (ja) * | 2015-12-24 | 2017-06-29 | 水ing株式会社 | 洗浄剤組成物、その製造方法、及びこれを用いた洗浄方法 |
CN105950315B (zh) * | 2016-01-28 | 2018-07-03 | 杨日升 | 农产品清洗剂及用其清洗农产品的方法 |
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US12134114B2 (en) | 2022-06-21 | 2024-11-05 | Ecolab Usa Inc. | Acidic cleaner |
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CA2686590A1 (fr) | 2009-01-22 |
JP5443351B2 (ja) | 2014-03-19 |
BRPI0721689A2 (pt) | 2013-03-26 |
AU2007356500B2 (en) | 2013-01-17 |
EP2164944A1 (fr) | 2010-03-24 |
AU2007356500A1 (en) | 2009-01-22 |
CA2686590C (fr) | 2014-04-01 |
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