EP2064372A2 - Verfahren zur elektrophoretischen beschichtung von werkstücken und beschichtungsanlage - Google Patents
Verfahren zur elektrophoretischen beschichtung von werkstücken und beschichtungsanlageInfo
- Publication number
- EP2064372A2 EP2064372A2 EP07786409A EP07786409A EP2064372A2 EP 2064372 A2 EP2064372 A2 EP 2064372A2 EP 07786409 A EP07786409 A EP 07786409A EP 07786409 A EP07786409 A EP 07786409A EP 2064372 A2 EP2064372 A2 EP 2064372A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- coating
- voltage
- workpiece
- workpieces
- rectifier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 162
- 239000011248 coating agent Substances 0.000 title claims abstract description 154
- 238000000034 method Methods 0.000 title claims abstract description 19
- 238000009434 installation Methods 0.000 title claims abstract description 17
- 239000004065 semiconductor Substances 0.000 claims description 31
- 239000003973 paint Substances 0.000 claims description 13
- 230000002123 temporal effect Effects 0.000 claims description 4
- 238000001962 electrophoresis Methods 0.000 claims description 2
- 239000004922 lacquer Substances 0.000 abstract description 4
- 238000003618 dip coating Methods 0.000 description 21
- 241000196324 Embryophyta Species 0.000 description 9
- 238000007598 dipping method Methods 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 238000010422 painting Methods 0.000 description 7
- 238000010616 electrical installation Methods 0.000 description 6
- 238000007654 immersion Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 2
- 230000001112 coagulating effect Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000502 dialysis Methods 0.000 description 2
- 230000009189 diving Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000011218 segmentation Effects 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 235000010678 Paulownia tomentosa Nutrition 0.000 description 1
- 240000002834 Paulownia tomentosa Species 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009415 formwork Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/22—Servicing or operating apparatus or multistep processes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/18—Electrophoretic coating characterised by the process using modulated, pulsed, or reversing current
Definitions
- the invention relates to a method for electrophoretic coating of workpieces with a coating medium, in particular lacquer, in which at least one workpiece is immersed in the coating medium, a DC voltage is applied between the workpiece and at least one electrode immersed in the coating medium and the DC voltage is applied with a voltage source during electrophoresis is increased.
- the invention relates to a coating system for the electrophoretic coating of workpieces with a coating medium, in particular paint, with a bath container in which the at least one workpiece can be immersed, with a voltage source for applying a variable DC voltage between the workpiece and at least one electrode in the bath tank.
- a coating medium in particular paint
- a voltage source for applying a variable DC voltage between the workpiece and at least one electrode in the bath tank.
- the voltage is then kept constant in a first exemplary embodiment in each case at the value of the coating voltage or, in a second exemplary embodiment, is increased stepwise.
- the coating of the workpieces acts as an insulating layer on their surface.
- the thickness of the insulating layer increases with the coating time.
- the coating speed is dependent on the conductivity of the workpiece surface and thus the current density initially very large. It decreases exponentially with the coating time due to the increasing thickness of the insulating layer until a saturation occurs or the circuit is interrupted.
- the increasing insulating layer thickness therefore leads to a significant extension of the entire coating duration.
- the method of current density constant maintenance is known from other known continuous flow coating plant.
- the voltage is readjusted as a function of the immersed surface of the workpiece.
- the workpieces are intermittently immersed in an area of the bath and held there. For the duration of the immersion, a substantially constant voltage is applied between the immersed workpiece and at least one electrode in the bath with a voltage source.
- a substantially constant voltage is applied between the immersed workpiece and at least one electrode in the bath with a voltage source.
- longer cycle times for the coating are predetermined here, whereby the entire coating process is significantly prolonged.
- the object of the present invention is to design a method and a coating system of the type mentioned above, with which the workpieces can be provided as simply as possible with a high-quality coating, in particular with a predefinable layer density and a predeterminable layer thickness.
- the layer thickness is proportional to the supplied electric charge depending on the coating medium, it can be easily determined.
- no controlled current increase occurs due to the controlled continuous increase in voltage, so that the voltage source and any contacts, in particular sliding contacts, when using a flow system are loaded less and smaller rectifiers can be used.
- the risk of flashovers is reduced by sparking.
- the achieved almost constant time course of current also leads to a decrease in harmonics when using AC voltage to supply the voltage source.
- a significantly better active power factor can be achieved since the almost constant current Run idle times of the power source can be reduced.
- the dipping areas can be designed to be shorter in order to achieve the same layer thicknesses with shorter coating times as in the continuous installations known from the prior art. Accordingly, when using clock systems, the cycle times can be correspondingly shorter.
- the voltage can be increased up to a threshold voltage, which is predetermined in particular depending on the coating medium.
- a multiplicity of workpieces can be conveyed simultaneously in the bath of a continuous coating installation, and the voltage source can be used to provide the same temporal voltage progression for each workpiece with a time shift.
- the advantages of the continuous coating installation and take the advantage ⁇ le of the invention can be combined, so that a plurality of workpieces may be provided continuously and rapidly in each case with a high quality coating.
- the workpieces can also be immersed in cycles in a bath of a tact coater.
- a DC voltage with a single rectifier can be generated from an AC input voltage in a particularly simple and cost-effective manner, and the variable DC voltage (s) applied to the workpiece can be converted from this DC voltage by means of at least one electronic circuit controlled by a control unit of the laminator. is (are) generated.
- the coating system according to the invention is characterized in that the voltage source has at least one electronic circuit with which it can be controlled so that it emits a continuously substantially continuously variable DC voltage over virtually the entire coating duration such that the coating current density at the workpiece surface in the Essentially remains constant over time. In this way, a reduction in the conductivity of the workpiece surface during almost the entire coating time can be optimally compensated.
- the coating installation can be a continuous coating installation, which comprises:
- a conveyor system which passes the workpieces along a path of movement through the bath container, and b) a running along the path of movement busbar arrangement, with which the workpieces are brought into electrical contact during passage through the bath container and which is galvanically divided into a plurality of segments, wherein a plurality, preferably all, segments via its own semiconductor switch with a pole of a single Rectifier are connected such that the voltage applied to a segment in a controllable size can be passed on to the direction of movement following segment;
- This embodiment is used in particular where the workpieces to be coated are not at ground potential. In Europe, where by convention the negative pole is at ground potential, these are anaphore- tic coating processes.
- the coating plant may be a continuous coating plant which comprises: a) a conveyor system, which passes the workpieces along a path of movement through the bath container,
- This embodiment is used in particular where the workpieces to be coated are at ground potential, ie in cataphoretic coating processes in Europe.
- the coating installation can be a clock coating installation which requires less space than a continuous coating installation.
- the voltage source may comprise a single rectifier and at least one controllable electronic circuit connected downstream thereof which can generate a DC voltage of continuously variable size from the voltage delivered by the rectifier.
- the voltage source can be easily realized with just a few components.
- the electronic circuit may include an IGBT
- Circuit which is particularly easy to implement and suitable for high voltages and currents. Another advantage is the low demand for control power, the insulation of the gate connection from the load circuit and the low on-resistance.
- FIG. 1 shows a schematic vertical section of a first embodiment of a fürlauftauchlak- kierstrom for anaphoretic dip painting with associated circuitry
- FIG. 2 schematically shows the time profile of coating voltage and coating flow in the continuous dip coating installation from FIG. 1;
- Figure 3 is a schematic vertical section of a second embodiment of a continuous dip coating plant for cataphoretic dip painting, which is similar to that of Figure 1;
- FIG. 4 shows a schematic vertical section of a clock dip coating apparatus
- FIG. 5 schematically shows the time profile of coating voltage and coating current in the pulse dip coating system from FIG. 4.
- the various workpieces to be painted are not grounded and can therefore be brought to different and time-varying potentials.
- the negative pole of a DC voltage source is grounded.
- the system of Figure 1 thus works anaphoretically in the manner described below.
- the positive terminal is a DC voltage source used as a mass
- the system of Figure 1 is suitable for cataphoretic operation. It is used in particular for pre-painting of not shown workpieces in a continuous dipping process. It comprises a dip tank 12 shown in vertical section, which is filled up to a certain level with a corresponding coating liquid.
- the workpieces to be painted are brought in the direction of the arrow 14 by means of a suitable, not shown För- dersystem to the dip tank 12, then immersed in a first area in the coating liquid, moved through the coating liquid, lifted out of the paint liquid in the end of the dip tank 12 and then discharged for further treatment in accordance with arrow 16.
- a multiplicity of cathodes 18 immersed in the coating liquid which are connected to the earthed negative pole of a regulated rectifier 20, are immersed.
- an input AC voltage in the order of about 450 V at.
- a busbar assembly 22 which preferably extends above the mirror of the paint liquid and is divided into four segments 22a, 22b, 22c and 22d.
- Each workpiece can be connected in succession with the segments 22a, 22b, 22c and 22d via a galvanic contact during conveyance.
- the distance of the workpieces is sufficiently large, so that never two of the workpieces are connected in time with the same segment 22a, 22b, 22c and 22d.
- a workpiece and its galvanic contact together with the cathodes 18 each form an electrode device.
- Each segment 22a, 22b, 22c and 22d is, tung an IGBT formwork via a respective controllable semiconductor switches 24a, 24b, 24c or 24d in the present case is connected to the positive terminal of the controlled rectifier '20th With the semiconductor switches 24a, 24b, 24c and 24d a coating DC voltage U (T) at the corresponding segments 22a, 22b, 22c and 22d is adjustable.
- the semiconductor switches 24a, 24b, 24c and 24d in turn each comprise a controllable power transistor 26 and a logic circuit 28 driving the same. For the sake of clarity, only the semiconductor switch 24a for the first segment 22a in the conveying direction, in FIG. 1 on the left, is shown in detail.
- the semiconductor switches 24b, 24c and 24d of the further segments 22b, 22c, 22d correspond to the first one.
- control program for the power transistor 26 is stored, which is then set in motion when at an input 30 of the semiconductor switch 24a or an input, not shown, the semiconductor switches 24b, 24c and 24d arrives a start signal.
- Each semiconductor switch 24a, 24b, 24c and 24d and the conveyor are connected to a central control unit, not shown, with which the delivery process and the Control program can be coordinated in the manner explained below.
- the central control unit may be a programmable controller (PLC) or a PC.
- the dip coating system 10 described above operates as follows:
- the approaching in the direction of arrow 14 workpiece is detected at the inlet of the dip tank 12 by an inlet sensor 32. This gives the start signal to the input 30 of the semiconductor switch 24a of the first segment 22a, so that the logic begins with the execution of the stored program.
- the workpiece is now galvanically connected to the first segment 22a of the busbar arrangement 22, which is still at zero potential.
- the logic circuit 28 generates now with a certain repetition frequency of eg 500 Hertz pulse width modulated voltage pulses, which during its duration the Power transistor 26 Open.
- a certain repetition frequency eg 500 Hertz pulse width modulated voltage pulses, which during its duration the Power transistor 26 Open.
- the duration of these pulses is still very low, but increases continuously, though not necessarily linearly, during the passage of the first segment 22a. Accordingly, the mean coating DC voltage U (T) to which the workpiece is exposed during its movement increases along the first segment 22a.
- the time profile of the coating DC voltage U (T) for the entire coating process is shown in Figure 2 and is explained in more detail below.
- a presence sensor 34 is arranged shortly before reaching the end of the first segment 22a, which is connected via the semiconductor switch 24a to the central control unit.
- the workpiece enters the detection area of the presence sensor 34, it generates a signal which starts the program of the logic circuit 28 of the semiconductor switch 24b, the second segment 22b and causes the central control unit to apply the same to the second segment 22b, independently of the semiconductor switch 24a of the first segment 22a To bring potential like the first segment 22a.
- the coating voltage U (T) at the end of the first segment ment 22a is thus' passed on in controllable size to the second segment 22b.
- the transition from the second segment 22b to the third segment 22c and from the third segment 22c to the fourth segment 22d is monitored by analogous not further shown other presence sensors.
- the programs of the second semiconductor switch 24b and of the third semiconductor switch 24c are processed analogously to that of the first semiconductor switch 24a and the coating DC voltage U (T) is continuously increased further when passing through the second segment 22b and the third segment 22c.
- the workpiece is further coated with varnish.
- the entry into the fourth segment 22d is analogous to that in the previous segments 22b and 22c. However, just before the end of the fourth segment 22d, when a limit voltage U G is reached , the coating uniformity voltage U (T) kept constant to prevent the paint from coagulating.
- the coating DC voltage U (T) whose course over time is caused to flow along the four segments 22a to 22d, causes the workpiece to lie overall 2 and which has no steps at the transitions between the segments 22a, 22b, 22c and 22d.
- the time profile of the coating DC voltage U (T) and of a coating current I (T) in the dipping coating system 10 when passing through all four segments 22a, 22b, 22c and 22d is, as already mentioned, schematically illustrated in FIG. Time diagram shown.
- the course of the coating DC voltage U (T) is dashed in the top of FIG. 2 and that of the coating current I (T) below is shown as a solid line.
- the amplitudes are plotted on the vertical axis of the diagram and the coating time T on the horizontal axis.
- the inlet sensor 32 indicates to the semiconductor switches 24a of the first segment 22a of the immersion of the workpiece in the bath is at a time t 0, in the figure 2 on the left, with the semiconductor switches 24a to the first Seg ⁇ element 22a has a minimum initial coating DC voltage U A applied. Because of the initially large conductivity The uncoated workpiece surface still follows the initial coating DC voltage U A immediately following a sharp increase in the coating current I (T) to a value I B. The current I (T) causes the desired uniform and rapid coating of the workpiece surface.
- the coating DC voltage U (T) is increased approximately in the form of an exponential function such that the coating current I (T) and thus the coating speed remain almost constant even with increasing layer thickness, ie decreasing conductivity of the workpiece surface.
- a continuous busbar arrangement could be brought by a single controllable semiconductor switch during the passage of the workpiece to the changing coating DC voltage U (T), as shown in Figure 2.
- each segment 22a, 22b, 22c and 22d there may be only one workpiece.
- the workpiece previously in the first segment 22a changes to the second segment 22b
- the workpiece previously in the second segment 22b changes to the third segment 22c, which was previously in the third segment 22c
- Workpiece on the fourth segment 22d and the previously located in the fourth segment 22d workpiece leaves this segment 22d.
- the semiconductor switches 24b, 24c and 24d are brought to the potential which the workpieces last had on the preceding segment 22a, 22b or 22c by means of the semiconductor switches 24b, 24c and 24d, respectively.
- each segment 22a, 22b, 22c, 22d thus covers a specific voltage range of the coating DC voltage U (T) shown in FIG.
- the temporal stress curve is the same for all workpieces with respect to the respective beginning of the coating; the respective start of coating for a workpiece is shifted in time relative to the beginning of the coating of the workpiece previously conveyed in the dipping area.
- the voltage source which includes the semiconductor switches 24a, 24b, 24c and 24d and the regulated rectifier 20
- the coating DC voltage U (T) required in each case for depositing a paint film between each workpiece and the cathodes 18 in the bath can be as shown in FIG 2 course are created.
- a continuous dip coating system 110 for cataphoretic dip coating 3 the elements which are similar to those of the continuous dip coating installation 10 described in FIGS. 1 and 2 are given the same reference numerals plus 100 so that reference is made to the above description with regard to their description.
- the cataphoretic continuous dip coating system 110 of FIG. 3 differs from the continuous dip coating system 10 of FIG. 1 in that the workpieces are all at ground, that is to say at the same, constant potential over time. For a plant according to European convention, this means that the plant of Figure 3 works cataphoretically in the manner described below.
- a contiguous, continuous bus bar 122 may be used, with which each workpiece 170 is galvanically connected via a suspension 150 during conveyance.
- the bus bar 122 is connected via a terminal 135 to the negative terminal of the controlled rectifier 120.
- Each of the anodes 118 is connected to the positive pole of the controlled rectifier 120 separately via a blocking diode 125a, 125b, 125c, and 125d, respectively, and the semiconductor switches 124a, 124b, 124c, and 124d, respectively.
- a presence sensor 134 is arranged, which is connected to the semiconductor switches 124a, 124b, 124c and 124d of the anode 118 corresponding to it.
- the lines between the presence sensors 134 and the respective semiconductor switches 124a, 124b, 124c and 124d are not shown in FIG. 3 for the sake of clarity.
- the anodes 118 may each be surrounded in a known manner by a membrane which forms a dialysis cell.
- the cataphoretic continuous dip coating system 110 functions analogously to the anaphoretic continuous dip coating system 10 according to FIG. 1, except that in the case of the cataphoretic continuous dip coating system 110, unlike the anaphoretic continuous dip coating system 10, the movement path is not subdivided by physical rail segments 22a, 22b, 22c and 22d, but by potential districts in the bathroom, which are realized near the anodes 118.
- the potentials at the anodes 118 in the second embodiment are changed analogously to the potentials at the segments 22a, 22b, 22c and 22d of the first embodiment, as soon as the presence of a workpiece 170 from the corresponding is detected sensor 134.
- the voltage curve on the workpieces 170 corresponds to that shown in FIG.
- the use of the presence sensors 134 is then omitted.
- the coating DC voltage U (T) to which the workpieces 170 are exposed when passing through the dip tank 112 thus increases during the coating from about 30 V to about 450 V with a similar time course as in the anaphoretic continuous dipping coating plant 10 is shown in FIG. Since the anodes 118 are arranged close to one another, the voltage profile is essentially continuous here as well, with the exception of the minimal narrow steps compared to the applied DC coating voltages U (T).
- the coating speed is influenced here by all An ⁇ oden 118.
- the coating speed at each workpiece 170 is additionally controlled by the removal of the corresponding cathode suspension 150 from the anodes 118.
- FIG. 4 shows a vertical dip dip coating system 210 for cataphoretic dip painting.
- a plurality of workpieces 270 are subjected to a coating DC voltage U (T) which increases continuously during the coating and which overall has the same time profile as the coating DC voltage U (T) in the first exemplary embodiment of the continuous dip coating system 10 Figures 1 and 2 has.
- the voltage profile in the clock dip coating system 210 is shown in FIG.
- the elements which are similar to those of the continuous-flow coating plants 10 from FIGS. 1 and 2 are provided with the same reference numerals plus 200.
- the workpieces to be coated 270 are immersed simultaneously in the sense of the double arrow 211 by means of a suitable, not shown conveyor system down in the paint liquid in the grounded dip tank 212, held there during the Lak- kiervorgangs and then upwards in opposite Direction out of the paint liquid lifted.
- the front workpiece 270 obscures the other workpieces, which is why the latter are not visible.
- anodes 218 On both sides of the workpieces 270 a plurality of anodes 218 is immersed in the paint liquid.
- the anodes 218 may optionally be surrounded in a known manner in each case with a membrane which forms a dialysis cell.
- Each anode 218 is connected via a stationary contact 209, an anode connection 203 and a fixed electrical installation.
- onstress 205 connected to the positive pole of the combined with an isolating transformer rectifier 220. From some of the electrical installation connection 205 leading to the hidden workpieces, only the ends connected to the rectifier 220 are shown.
- the rectifier 220 is also grounded.
- the rectifier 220 is connected to a PC (not shown) or a memory-programmed control (PLC), with which a time profile for the coating DC voltage U (T) can be specified, as shown in FIG.
- PC not shown
- PLC memory-programmed control
- the workpieces 270 are each connected via a flexible galvanic contact 211 to a cathode connection 204. From this, a fixed electrical installation line 206 leads to the negative pole of the rectifier 220. Again, the ends of some fixed electrical installation lines 206 leading away from the rectifier 220 are shown leading to concealed workpieces.
- the flexible contacts 211 are each designed such that the associated workpiece 270 is permanently connected to the cathode connection 204 during immersion or when lifting out.
- the rectifier 220 After immersing the workpieces 270 in the plunge pool 212, the rectifier 220 is controlled by the PC or the PLC in such a way that it generates the DC coating voltage U (T), which is increased in a time-dependent manner as shown in FIG.
- the coating DC voltage U (T) is applied to the workpieces via the positive pole of the rectifier 220, the electrical installation connections 205, the anode connections 203, the stationary contacts 209 and the anodes 218 on the one hand and via the electrical installation lines 206, the cathode connections 204 and the flexible contacts 210 on the other hand 270 created.
- the coating DC current U (T) is steplessly controlled by the coating current I (T) such that the current density at the workpiece surface remains constant during the immersion process, regardless of the size of the submerged surfaces and then over time.
- the workpieces 170; 270 can also be coated with a different type of coating medium.
- the input AC voltage may also be greater than 400V.
- a medium voltage for example of the order of 10 kV to 20 kV.
- a regulated rectifier 20; 120; 220 may also be provided an unregulated rectifier.
- the control can also be taken over by corresponding semiconductor switches, for example.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102006044050A DE102006044050A1 (de) | 2006-09-20 | 2006-09-20 | Verfahren zur elektrophoretischen Beschichtung von Werkstücken und Beschichtungsanlage |
PCT/EP2007/006699 WO2008034484A2 (de) | 2006-09-20 | 2007-07-28 | Verfahren zur elektrophoretischen beschichtung von werkstücken und beschichtungsanlage |
Publications (2)
Publication Number | Publication Date |
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EP2064372A2 true EP2064372A2 (de) | 2009-06-03 |
EP2064372B1 EP2064372B1 (de) | 2018-12-05 |
Family
ID=38800741
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP07786409.8A Active EP2064372B1 (de) | 2006-09-20 | 2007-07-28 | Verfahren zur elektrophoretischen beschichtung von werkstücken und beschichtungsanlage |
Country Status (5)
Country | Link |
---|---|
US (1) | US8182667B2 (de) |
EP (1) | EP2064372B1 (de) |
DE (1) | DE102006044050A1 (de) |
HU (1) | HUE043737T2 (de) |
WO (1) | WO2008034484A2 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
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DE102011056496A1 (de) * | 2011-12-15 | 2013-06-20 | Dürr Systems GmbH | Beschichtungsanlage und Verfahren zum Beschichten von Werkstücken |
JP5708471B2 (ja) * | 2011-12-20 | 2015-04-30 | トヨタ自動車株式会社 | 電着塗装システム |
DE202013009714U1 (de) | 2012-03-02 | 2014-01-02 | Basf Coatings Gmbh | Werkstück beschichtet mit einem Elektrotauchlack |
CN102758238B (zh) * | 2012-07-26 | 2016-03-30 | 无锡澳美机械有限公司 | 一种大型件电泳装置及其电泳工艺 |
DE102013224748B4 (de) | 2012-12-21 | 2014-12-24 | Basf Coatings Gmbh | Verfahren zur Ermittlung der maximalen Abscheidespannung oder Abscheidestromstärke bei einem Elektrotauchlackierverfahren |
CN103526264B (zh) * | 2013-08-26 | 2016-05-04 | 广东科富科技股份有限公司 | 一种阴极电泳涂膜制备实验装置 |
CN110668083B (zh) * | 2019-11-01 | 2024-05-24 | 苏州柳溪机电工程有限公司 | 多工艺高效智能涂装流水线 |
DE102021111415A1 (de) | 2021-05-03 | 2022-11-03 | Dürr Systems Ag | Verfahren zum betreiben einer behandlungsanlage sowie behandlungsanlage und computer programm produkt |
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DE1577934C3 (de) | 1966-03-17 | 1973-11-08 | Siemens Ag, 1000 Berlin U. 8000 Muenchen | Einrichtung zur Stromversorgung von Werkstucken beim Durchlaufen von elektrophoretischen Lackierbadern |
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JPH01246397A (ja) * | 1988-03-29 | 1989-10-02 | Trinity Ind Corp | 電着塗装方法 |
JP2775333B2 (ja) | 1990-03-26 | 1998-07-16 | 本田技研工業株式会社 | 電着塗装方法 |
DE19502470A1 (de) * | 1995-01-27 | 1996-08-01 | Basf Lacke & Farben | Pulsmoduliertes Gleichspannungsapplikationsverfahren |
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JP2002030486A (ja) | 2000-07-12 | 2002-01-31 | Poritekkusu:Kk | 電着塗装装置 |
DE10054489A1 (de) * | 2000-11-03 | 2002-05-29 | Zf Sachs Ag | Leistungs-Umrichtermodul |
JP2003277991A (ja) | 2002-03-27 | 2003-10-02 | Kansai Paint Co Ltd | アルミニウム合金の塗膜形成方法 |
DE10325656C5 (de) | 2003-06-06 | 2007-12-27 | Eisenmann Anlagenbau Gmbh & Co. Kg | Elektrophoretische Tauchlackieranlage |
JP2005002397A (ja) | 2003-06-11 | 2005-01-06 | Canon Inc | 粗面化ローラの製造方法 |
DE102004003456B4 (de) | 2004-01-22 | 2006-02-02 | Eisenmann Maschinenbau Gmbh & Co. Kg | Verfahren und Anlage zur Bestimmung der Dicke einer Lackschicht |
-
2006
- 2006-09-20 DE DE102006044050A patent/DE102006044050A1/de not_active Withdrawn
-
2007
- 2007-07-28 HU HUE07786409A patent/HUE043737T2/hu unknown
- 2007-07-28 US US12/442,070 patent/US8182667B2/en not_active Expired - Fee Related
- 2007-07-28 EP EP07786409.8A patent/EP2064372B1/de active Active
- 2007-07-28 WO PCT/EP2007/006699 patent/WO2008034484A2/de active Application Filing
Non-Patent Citations (1)
Title |
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See references of WO2008034484A2 * |
Also Published As
Publication number | Publication date |
---|---|
WO2008034484A3 (de) | 2008-08-21 |
US20090314640A1 (en) | 2009-12-24 |
WO2008034484A2 (de) | 2008-03-27 |
DE102006044050A1 (de) | 2008-04-03 |
EP2064372B1 (de) | 2018-12-05 |
HUE043737T2 (hu) | 2019-09-30 |
US8182667B2 (en) | 2012-05-22 |
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