EP2016809B1 - Kaltplasma-handgerät zur plasma-behandlung von oberflächen - Google Patents

Kaltplasma-handgerät zur plasma-behandlung von oberflächen Download PDF

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Publication number
EP2016809B1
EP2016809B1 EP07724599.1A EP07724599A EP2016809B1 EP 2016809 B1 EP2016809 B1 EP 2016809B1 EP 07724599 A EP07724599 A EP 07724599A EP 2016809 B1 EP2016809 B1 EP 2016809B1
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EP
European Patent Office
Prior art keywords
plasma
coil
capacitor
nozzle
generator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP07724599.1A
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German (de)
English (en)
French (fr)
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EP2016809A2 (de
Inventor
Rüdiger FOEST
Klaus-Dieter Weltmann
Manfred Stieber
Eckhard Kindel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leibniz Institut fuer Plasmaforschung und Technologie eV
Original Assignee
Neoplas GmbH
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Publication date
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Priority to PL07724599T priority Critical patent/PL2016809T3/pl
Publication of EP2016809A2 publication Critical patent/EP2016809A2/de
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/36—Circuit arrangements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00—Testing
    • H05H2240/10—Testing at atmospheric pressure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00—Testing
    • H05H2240/20—Non-thermal plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/30—Medical applications
    • H05H2245/36—Sterilisation of objects, liquids, volumes or surfaces
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/40—Surface treatments

Definitions

  • the invention relates to a plasma tool for the plasma-assisted treatment, modification and coating of inner and outer surfaces of materials in air by means of a cold plasma jet according to the preamble of claim 1.
  • WO 03/026365 A1 a device is described which allows to generate by means of microwaves a plasma, wherein the in WO 03/026365 described device allows, despite any pressure fluctuations in the process gas to produce a stable plasma flame.
  • Another plasma generator which produces a plasma with high temperatures, is described in the German patent application 1 639 257 described. It is a high-frequency plasma jet generator with a cylindrical tube, on one end side of which to gas to be ionized and at the other end side of the generated plasma flows out, an induction coil whose one end is connected to ground and the other end is connected to a high-frequency generator. Between the two ends of the coil, a tap is arranged. The high-frequency voltage generated in the induction coil is higher than the excitation voltage.
  • the tube in the area of the plasma outlet is made of metal and placed on the high-voltage end of the induction coil. The tube is concentrically and electrically isolated surrounded by a metallic housing. Due to the special arrangement, the gas discharge between the two adjacent ends of tube and housing takes place due to a capacitive coupling between these two components.
  • this generator is not suitable for the generation of a cold normal pressure plasma at least due to its electrode shape.
  • Low-temperature plasmas are also already known and have been used successfully in numerous surface treatment applications for the purpose of surface activation (changes in the adhesion properties, hydrophobization, hydrophilization) of etching, of polymerization, of layer deposition, of cleaning and of germ reduction.
  • low-pressure plasmas have been used to date for these processes, in which the radicals, excited atoms, ions, electrons and UV radiation required for these applications can be generated to a defined extent by the selection of suitable process parameters.
  • Low-pressure plasma processes are not suitable for numerous industrial processes in which a corresponding surface modification is required, both for cost reasons and for procedural reasons.
  • US 6,958,063 and US 6,262,523 are arrangements based on the RF excitation of normal pressure plasmas.
  • US 2002/122896 will be different Arrangements for producing normal pressure plasmas based on RF excited discharges in tubes of insulating material are described.
  • plasmas of this type are used for argon plasma coagulation ( US 4,781,175 . US 4,060,088 . DE 19513338 ), for coatings on artificial implants to increase their biocompatibility, for the control of cell adhesion to surfaces, for the sterilization of medical instruments ( M. Laroussi: IEEE Trans. Plasma Sci. 30 4 (2002), 1409 ) and for the treatment of biological cells and tissues ( E. Stoffels et al .: Plasma Sources Sci. Technol., 11 (2002), 383 ) used.
  • Matchbox High-frequency operated plasma reactors require a matching network (matchbox) for maximum power transmission from their RF generator.
  • An often used circuit in the Matchbox is the n - circuit. It consists of two capacitors C1 and C2 and a coil (s. Fig. 1 ).
  • capacitors with air as a dielectric are used, which occupy a large volume. Since the current transport at these frequencies takes place mainly on the surface of an electrical conductor (skin effect), the coil and all other electrical leads consist of a relatively thick metal wire with high electrical conductivity on the surface (silver wire, silver-plated copper wire). As a result, such a matchbox is generally very voluminous.
  • the matchbox To ignite and maintain a gas discharge in the plasma reactor, high voltages are needed. These are achieved in the matchbox by the fact that the coil and the capacitor C2 form a series resonant circuit, which must be matched to the particular frequency of the RF generator used. To prevent losses, the supply line Z2 should consist of an unshielded cable and should be kept as short as possible. As a result, the matchbox and the plasma reactor actually form a relatively rigid, unwieldy unit. If you want to realize a handy plasma nozzle as a plasma reactor, which can be performed for example by a robot, such a bulky plasma reactor is useless.
  • the invention is therefore based on the object to realize a handy plasma nozzle, which can also be performed by hand and / or by robots.
  • the plasma tool according to the invention for the generation of a cold plasma jet comprises a plasma nozzle with a hollow body for the supply of a process gas or a process gas mixture, a Frequency generator and consisting of at least one coil and a capacitor C2 and optionally a capacitor C1 matching network for generating the required voltage and is characterized in that the matching network at least the coil and the capacitor C2 are integrated into the plasma nozzle.
  • the matching network integrates the coil L and the capacitor C2 into the plasma nozzle.
  • the capacitor C1 of the matching network can be arranged directly on or in the frequency generator and is advantageously arranged there.
  • the plasma nozzle contains a capillary made of insulating material and the coil is arranged around this capillary.
  • the matching network (matchbox) consists of a coil and two capacitors C1 and C2 with their connections.
  • the coil and the capacitor C2 are integrated in the plasma nozzle and the capacitor C1 is arranged directly on or in the generator.
  • capacitors C1 and C2 can be made up of several partial capacitors and that capacitors constructed from partial capacitors are also referred to as C1 and C2 in the context of this invention.
  • a plasma nozzle into which at least one coil and a capacitor C2 are integrated. These can, as described above and in the embodiments resp. the figures shown to be installed.
  • Described but not the subject of the present invention is a frequency generator, in which either a capacitor suitable as capacitor C1 of a matching network capacitor integrated or mounted directly on the output of the generator.
  • both capacitors C1 and C2 can be dispensed with, so that apart from a part of the lines of the matching network in the plasma nozzle only the coil remains, which together with that through the electrodes E1 and E2 formed capacitor forms a series resonant circuit.
  • the resonance state can be adjusted by varying the generator frequency.
  • a plasma nozzle according to the invention generally comprises a body side, ie on the plasma respectively. the nozzle facing away from the plasma nozzle, with a hollow body connected to a process gas supply.
  • This hollow body is preferably made of insulating material.
  • the coil forming part of the matching network is arranged around a part of this hollow body.
  • the dimensions of the hollow body, or these dimensions together with another body, preferably an insulating body, are to be chosen such that the coil with the desired winding diameter can be arranged thereon.
  • This coil must - if the hollow body or other body on which it is arranged, not made of insulating material, be self-insulated.
  • This coil is connected to the nozzle side with an electrode E1 and optionally a variable capacitor C2.
  • the electrode E1 may optionally be a ring electrode arranged around the insulating hollow body or a rod electrode arranged in the hollow body.
  • the capacitor C2 and the coil are connected in series, so that it can adjust the voltage required at a given frequency.
  • the capacitor C2 On the side facing away from the coil, the capacitor C2 is connected to the grounded housing.
  • a ring electrode E2 which is connected to the grounded housing.
  • This housing has feeds for the electric current and feed openings for the process gas and a discharge opening for the plasma within the second electrode E2.
  • the connecting line between the electrode E1 and the capacitor C2 is usually on the coil side on the housing shielding insulation and in turn provided with an insulating layer.
  • Suitable insulating materials are plastic, quartz glass, ceramics, etc., which may be used singly or in combination.
  • a material with high conductivity is preferred at least on the surface, such as silver-plated copper wire or pure silver wire.
  • FIG. 1 Illustrated embodiments of the prior art relate in particular to commercially available RF generators with a fixed frequency.
  • the in FIG. 2 2 the matching network, the matchbox, has been separated, with the capacitor C1 in the RF generator and capacitor C2 and the coil integrated into the plasma nozzle.
  • a simplification and thus a more cost-effective variant of the combination RF generator - plasma nozzle results in the transition to lower frequencies (eg 3 MHz) and when using a generator with variable frequency.
  • the resonance state is adjusted by varying the generator frequency.
  • Fig. 4 an embodiment for a plasma nozzle with a capacitively coupled capillary discharge 1 is shown.
  • Two metallic ring electrodes 2, 3 are mounted at a suitable distance on a hollow body made of insulating material (dielectric) 4.
  • the hollow body 4 enclosing insulator 5, a coil 6 is wound, which is connected at one end to the RF electrode 3 and at the other end to the RF input 7 of the plasma nozzle.
  • the RF electrode 3 is connected to the grounded case 8 via a rotary air capacitor C2.
  • the process gas 9 preferably noble gas
  • Both electrodes 2 and 3 and the dielectric 4 form a capacitance (a few pF), the parallel to C2.
  • the coil 6 forms a series resonant circuit with these capacitances and can be adjusted via C2 to maximum voltage at the electrode 3. If a sufficiently high voltage at the electrode 3 has been reached via the calibration with C2, the electric field built up between the electrodes 3 and 2 leads to a capillary discharge whose plasma is driven outward by the gas flow 9 and forms a jet plasma 10. In order to keep the voltage drop across the capacitor, formed by the electrode 3, the dielectric 4 and the plasma inside the capillary, small, a dielectric with the highest possible dielectric constant should be selected.
  • a further embodiment of a plasma nozzle with a capillary discharge 1 is shown.
  • the RF energy is coupled via a rod electrode 3 into the capillary discharge.
  • the rod electrode should be made of low work function materials to minimize the voltage needed for capillary discharge. She should also be pointed forward, so as to achieve a high field strength. Between the tip and the grounded electrode 2, at sufficiently high voltages, a capillary discharge is formed, the plasma of which is in turn blown outward by the gas flow.
  • Fig. 6 a modified variant of the plasma nozzle is shown.
  • the discharge is again generated between the electrodes 2 and 3 and enters the atmosphere through a slot.
  • a slot of 0.8 mm width and 4 cm length can be generated with this arrangement, a linearly expanded plasma of 4 cm width.
  • insulating material such as, for example, plastic, Quartz glass, ceramics, etc. (referred to in the above description as "plasma nozzle") by means of an RF discharge generated by a nozzle, directed normal pressure jet plasma with the desired properties (for example, non-thermal, floating, homogeneous and reactive) to which the The surface to be treated is exposed at a suitable distance from the nozzle in order to achieve its desired physicochemical change.
  • the conditions in the jet plasma region can be changed by changing the geometrical arrangements and the dimensions inside the plasma nozzle, by using other process gases, their admixtures and flow velocities, by the arrangement and choice of the electrodes, by the kind of ignition and / or by variation of the electrical Parameters of the discharge are controlled.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
  • Treatment Of Fiber Materials (AREA)
EP07724599.1A 2006-04-27 2007-04-26 Kaltplasma-handgerät zur plasma-behandlung von oberflächen Active EP2016809B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL07724599T PL2016809T3 (pl) 2006-04-27 2007-04-26 Przyrząd ręczny z plazmą zimną do plazmowej obróbki powierzchni

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102006019664.3A DE102006019664B4 (de) 2006-04-27 2006-04-27 Kaltplasma-Handgerät zur Plasma-Behandlung von Oberflächen
PCT/EP2007/003669 WO2007124910A2 (de) 2006-04-27 2007-04-26 Kaltplasma-handgerät zur plasma-behandlung von oberflächen

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EP2016809A2 EP2016809A2 (de) 2009-01-21
EP2016809B1 true EP2016809B1 (de) 2015-07-01

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EP (1) EP2016809B1 (es)
DE (1) DE102006019664B4 (es)
ES (1) ES2548096T3 (es)
PL (1) PL2016809T3 (es)
PT (1) PT2016809E (es)
WO (1) WO2007124910A2 (es)

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DE202018005328U1 (de) 2018-11-14 2018-12-12 Gesellschaft zur Förderung von Medizin-, Bio- und Umwelttechnologien e.V. LED-Bestrahlungsgerät zur Prävention von Wundinfektionen und zur Verbesserung der Heilung von Wunden und Wundinfektionen
US12064160B2 (en) 2015-05-15 2024-08-20 Clear Intradermal Technologies, Inc. Tattoo removal using a liquid-gas mixture with plasma gas bubbles

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Publication number Priority date Publication date Assignee Title
US12064160B2 (en) 2015-05-15 2024-08-20 Clear Intradermal Technologies, Inc. Tattoo removal using a liquid-gas mixture with plasma gas bubbles
DE202018005328U1 (de) 2018-11-14 2018-12-12 Gesellschaft zur Förderung von Medizin-, Bio- und Umwelttechnologien e.V. LED-Bestrahlungsgerät zur Prävention von Wundinfektionen und zur Verbesserung der Heilung von Wunden und Wundinfektionen

Also Published As

Publication number Publication date
EP2016809A2 (de) 2009-01-21
PT2016809E (pt) 2015-10-14
ES2548096T3 (es) 2015-10-13
PL2016809T3 (pl) 2015-12-31
DE102006019664A1 (de) 2007-10-31
WO2007124910A3 (de) 2009-03-26
DE102006019664B4 (de) 2017-01-05
WO2007124910A2 (de) 2007-11-08

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