EP1546053A1 - Systemes de couches contenant une couche d'oxyde de titane-aluminium - Google Patents

Systemes de couches contenant une couche d'oxyde de titane-aluminium

Info

Publication number
EP1546053A1
EP1546053A1 EP03750543A EP03750543A EP1546053A1 EP 1546053 A1 EP1546053 A1 EP 1546053A1 EP 03750543 A EP03750543 A EP 03750543A EP 03750543 A EP03750543 A EP 03750543A EP 1546053 A1 EP1546053 A1 EP 1546053A1
Authority
EP
European Patent Office
Prior art keywords
layer
layer system
titanium
functional
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP03750543A
Other languages
German (de)
English (en)
Inventor
Christoph MÖLLE
Lars Bewig
Frank Koppe
Thomas Küpper
Stefan Geisler
Stefan Bauer
Jürgen DZICK
Christian Henn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schott AG
Original Assignee
Schott AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schott AG filed Critical Schott AG
Publication of EP1546053A1 publication Critical patent/EP1546053A1/fr
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
    • C23C14/0078—Reactive sputtering by exposing the substrates to reactive gases intermittently by moving the substrates between spatially separate sputtering and reaction stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
    • C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
    • G02B1/105—
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C03C2218/322—Oxidation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12576—Boride, carbide or nitride component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12611—Oxide-containing component

Definitions

  • the invention relates to a layer system with at least one metal oxide layer, the metal oxide comprising a titanium-aluminum oxide.
  • the layer system has a high structural and. Temperature resistance, especially at operating temperatures of over 600 ° C and is particularly suitable for optical coatings, but is not limited to this.
  • Optical layer systems in particular alternating layer systems, which are made up of alternately superimposed thin high and low refractive layers have been known for many years for a large number of applications. They act as a light interference film, the optical properties of which are determined by the choice of the material for the high or low refractive index layer and thus the corresponding refractive index, by the arrangement of the individual layers and by the choice of the individual layer thicknesses. The selection is made essentially using known optical
  • Suitable starting materials for the production of such coatings for, for example, reflectors, mirrors, filters, lamps, IRC burners / lamps, etc. include Ti0 2 and Si0 2 .
  • Thin layers of these materials are usually applied using CVD (Chemical Vapor Deposition), PVD (Physical Vapor Deposition) or Sol-Gel processes and are characterized by the fact that they are hard and chemically stable as well as a have a high refractive index difference.
  • CVD Chemical Vapor Deposition
  • PVD Physical Vapor Deposition
  • Sol-Gel Sol-Gel processes
  • DE 3227069 AI discloses an optical coating suitable for high temperatures, which consists of a Alternating layer system with Si0 2 as a low-refractive layer material and Ta 2 0 5 as a high-refractive layer material. This coating is resistant to high temperatures and is designed to improve the working efficiency of the coated object, in particular of halogen lamps.
  • the object of the invention is to provide a coating which is essentially structurally stable at high operating temperatures and remains low or free from haze.
  • the layer system according to the invention has at least one layer made of a metal oxide which comprises titanium-aluminum oxide.
  • the individual layers of the layer system which are required, for example, to create a specific optical design of the layer system, are referred to below as functional layers.
  • Functional layers made of titanium-aluminum oxide have a significantly higher temperature and structural stability than the known functional layers made of metal oxides. Since a functional layer comprising titanium-aluminum oxide inherently guarantees high temperature resistance, an additional interruption with an intermediate layer made of another metal oxide contributes to the fulfillment of the task in that it can be additionally stabilized, but mainly the mechanical and further improve the optical properties of functional layers comprising titanium aluminum oxide. To avoid optically undesirable influences
  • the intermediate layer either choose the thickness or the refractive index of the intermediate layer so that it is not optically effective.
  • such layers also have, for example, increased brilliance, an improvement in the desired optical parameters, such as reflectivity or transmittance, and increased scratch resistance.
  • Another layer system according to the invention likewise consists at least of one functional layer from one
  • a thickness of 50 nm remains, no crystallization behavior when exposed to high temperatures.
  • a particular effect of the invention is the adjustability of the refractive index of the layer comprising titanium-aluminum oxide by adjusting the quantitative ratio of aluminum to titanium.
  • the refractive index n can be varied in a range from 1.55 ⁇ n ⁇ 2.50. As the aluminum content increases, the refractive index n of the layer decreases. You can achieve this with only a small amount
  • the adjustability of the refractive index of the layer comprising titanium aluminum oxide can be used particularly advantageously for adapting the refractive index of the functional layer to that of the intermediate layer or vice versa.
  • Functional layers made of metal oxides with a refractive index n in the range of 1.55 n n 2,5 2.50 for example made of zirconium oxide or stabilized zirconium oxide, that by adding a stabilizer material such as Yttrium oxide etc. was stabilized, with n approx. 2.1
  • an intermediate layer made of titanium-aluminum oxide without being influenced optically.
  • the intermediate layers no longer have to have the small thicknesses, such as intermediate layers with a different refractive index, which must remain below a thickness at which they can be optically effective.
  • intermediate layers with a different refractive index which must remain below a thickness at which they can be optically effective.
  • the layer systems according to the invention can consist of a single functional layer as well as a layer system with several functional layers, preferably of an alternating layer system of high and low refractive index functional layers.
  • the high refractive index functional layer comprises a titanium-aluminum oxide. It preferably consists of Ti ⁇ l ⁇ J ⁇ y with 0 ⁇ x ⁇ 1, preferably with 0.3 ⁇ x ⁇ 1, particularly advantageously with
  • the low-index functional layer then comprises a silicon oxide, preferably silicon dioxide. Silicon dioxide is also resistant to high temperatures and has a low refractive index compared to titanium-aluminum oxide.
  • the values of the layer thicknesses d p of the functional layers for applications of the layer system according to the invention in the near IR and visible range are then preferably 5 nm d d F 200 200 nm.
  • Such layer systems for optical applications are for use in high-temperature ranges, ie at operating temperatures above 600 ° C, well suited.
  • the high-index functional layers are also characterized by low-index. Interrupted intermediate layers and vice versa, it is particularly important in the case of optical layer systems that the intermediate layers interrupting the functional layers remain below a thickness at which they could become optically effective in the overall layer system.
  • Useful thicknesses d z of the intermediate layers are then in the range of 0.3 nm ⁇ d z 10 10 nm, preferably in the range of 0.5 nm d d z 4,0 4.0 nm and particularly suitable in the range of 1.0 nm d d z 2,5 2.5 nm.
  • the use and the number of intermediate layers should preferably be chosen such that the thickness dp of the partial layers resulting from the functional layer is approximately 20 nm d dp 250 250 nm.
  • a reasonable layer thickness of functional layers to be interrupted is d p ⁇ 40 nm. It is particularly optimal for the procedural process if, in an alternating layer system made of high and low refractive index functional layers, the high refractive index functional layers are interrupted by intermediate layers made of the low refractive index layer material. There is also the possibility that the low-index functional layers are interrupted by intermediate layers made of the high-index layer material. It is not absolutely necessary to interrupt each functional layer.
  • the intermediate layer it is not essential for the intermediate layer that it has a different refractive index than the functional layer, but that it is suitable for influencing the structure formation in the functional layer, so that high temperatures cannot cause any deterioration in the optical properties of the coating. It is therefore also possible for high-index functional layers, for example made of titanium oxide, to have high-index
  • Sol-gel processes are also advantageously suitable for industrial production of the coating.
  • PVD Physical Vapor Deposition
  • the substrate materials can be very diverse and essentially depend on the area of application of the coated article. For use in the high temperature range, the associated temperature load must be taken into account. Metals, glass and glass ceramics as well as plastics come into consideration as substrate materials.
  • the layer systems are used for the coating of reflectors, in particular for the coating of glass ceramic reflectors.
  • excellent optical and mechanical properties of the reflectors can be achieved even with long and extreme temperature loads due to the structure and temperature stability of the coating.
  • the layer systems are used according to the invention for the coating of lighting fixtures, in particular IRC lamps / burners.
  • these coatings can be used to achieve excellent optical and mechanical properties of the lighting fixtures due to the structure and temperature stability of the coating under long and extreme temperature loads.
  • the invention will be explained in more detail below on the basis of the exemplary embodiments and figures.
  • Fig.l a layer system according to the invention for a reflector coating
  • Fig. 2 the reflection behavior of the reflector at temperatures of 450 ° C, 650 ° C and 750 ° C
  • Fig. 3 the diffractograms of titanium aluminum oxide layers with different refractive indices after tempering at 650 ° C and 850 ° C
  • FIG. 1 shows an optical layer system according to the invention for a reflector.
  • the reflector has a high
  • the layer system is an alternating layer system and consists of 43 functional layers.
  • the low-index functional layer is made of Si0 2 and the high-index functional layer is made of t U ⁇ O y .
  • the individual functional layers were produced using the PICVD process. With this procedure.
  • the person skilled in the art succeeds in controlling the aluminum content in a customary manner, so that the refractive index of the titanium-aluminum oxide layer could be set in a targeted manner.
  • Reflectors produced in this way were then subjected to temperature loads of 450 ° C, '650 ° C and 750 ° C. The reflectors showed no turbidity after these temperature loads.
  • FIG. 2 shows the reflection behavior of the reflectors under the various temperature loads mentioned above. Also when examining the reflection behavior of the reflector coating according to the invention, it could be shown that the high operating temperatures have a negligible effect on the reflection behavior, especially in the desired wavelength range of 370 nm ⁇ ⁇ 800 nm, the reflection behavior of the reflectors remains stable.
  • the reflector described by way of example with a structure and temperature-stable coating according to the invention can be used in digital projectors, but is also for lighting purposes in high and
  • Low voltage technology for example suitable for use in halogen lighting technology.
  • substrates made of quartz glass were coated using the PICVD method, each with a Ti ⁇ l ⁇ O y individual layer (0 ⁇ x ⁇ 1) with a layer thickness of 500 nm.
  • PICVD method PICVD method
  • different proportions of aluminum and titanium were set in the coating process.
  • the conditions in the layers were measured using EDX. The respective is from the measured proportions in at%
  • Quantity ratio can be determined. The individual values for the proportions in at% titanium and aluminum, the associated quantitative ratio of Ti: Al and the corresponding refractive indices can be found in the overview in FIG. 4.
  • the refractive index n of the layer is reduced.
  • the coated substrates were then exposed to a temperature load of 650 ° C. or 850 ° C. for 1 hour.
  • n 2.34 approaches for the formation of the anatase phase.
  • even small amounts of aluminum are sufficient to prevent crystal formation under high temperature loads.
  • both the crystallization of an amorphous layer in anatase at low temperatures and the recrystallization into the rutile phase at temperatures above 600 ° C. are prevented. All examined layers showed no signs of cloudiness.
  • substrates coated with a single functional layer according to the invention can also be used for a wide variety of applications, preferably in the high-temperature range, since they remain structurally stable even under extreme temperature loads of more than 600 ° C. and have no cloudiness.
  • the layer system consists of an alternating layer system of high and low refractive index functional layers. These interference layer systems typically consist of more than 30 functional layers.
  • the temperature of the lamp bulb or burner can, under certain circumstances, be more than 1000 ° C.
  • thermal load capacity of known alternating layer systems has hitherto been around 600 ° C., which was primarily due to the insufficient temperature stability of the highly refractive layer.
  • the temperature stability of the IRC lamps / burners can be increased significantly above 600 ° C.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Laminated Bodies (AREA)
  • Optical Filters (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Chemically Coating (AREA)
  • Formation And Processing Of Food Products (AREA)
EP03750543A 2002-09-14 2003-09-13 Systemes de couches contenant une couche d'oxyde de titane-aluminium Withdrawn EP1546053A1 (fr)

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DE10242848 2002-09-14
DE10242848 2002-09-14
PCT/EP2003/010219 WO2004026782A1 (fr) 2002-09-14 2003-09-13 Systemes de couches contenant une couche d'oxyde de titane-aluminium

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EP1546053A1 true EP1546053A1 (fr) 2005-06-29

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EP03757838A Expired - Lifetime EP1537057B1 (fr) 2002-09-14 2003-09-13 Procede de realisation de couches et de systemes de couches, et substrat recouvert
EP03757836A Ceased EP1537055A1 (fr) 2002-09-14 2003-09-13 Objet pourvu d'un revetement
EP03757837A Withdrawn EP1537056A1 (fr) 2002-09-14 2003-09-13 Couche de protection, et procede et dispositif pour la realisation de couches de protection
EP03750543A Withdrawn EP1546053A1 (fr) 2002-09-14 2003-09-13 Systemes de couches contenant une couche d'oxyde de titane-aluminium
EP10004380A Ceased EP2243751A3 (fr) 2002-09-14 2003-09-13 Objet revêtu

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EP03757838A Expired - Lifetime EP1537057B1 (fr) 2002-09-14 2003-09-13 Procede de realisation de couches et de systemes de couches, et substrat recouvert
EP03757836A Ceased EP1537055A1 (fr) 2002-09-14 2003-09-13 Objet pourvu d'un revetement
EP03757837A Withdrawn EP1537056A1 (fr) 2002-09-14 2003-09-13 Couche de protection, et procede et dispositif pour la realisation de couches de protection

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EP10004380A Ceased EP2243751A3 (fr) 2002-09-14 2003-09-13 Objet revêtu

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EP (5) EP1537057B1 (fr)
JP (4) JP2005538255A (fr)
KR (3) KR100890258B1 (fr)
CN (3) CN100575290C (fr)
AT (1) ATE394353T1 (fr)
AU (4) AU2003273872A1 (fr)
DE (1) DE50309800D1 (fr)
WO (4) WO2004026782A1 (fr)

Families Citing this family (82)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005538255A (ja) * 2002-09-14 2005-12-15 ショット アクチエンゲゼルシャフト 保護層ならびに保護層を生成するプロセスおよび構成
TWI352071B (en) 2003-01-28 2011-11-11 Koninkl Philips Electronics Nv Transparent titanium oxide-aluminum and/or aluminu
DE10342397B4 (de) * 2003-09-13 2008-04-03 Schott Ag Transparente Schutzschicht für einen Körper und deren Verwendung
DE10342398B4 (de) * 2003-09-13 2008-05-29 Schott Ag Schutzschicht für einen Körper sowie Verfahren zur Herstellung und Verwendung von Schutzschichten
JP4630574B2 (ja) * 2004-05-31 2011-02-09 キヤノン株式会社 光学素子及びミラー並びに反射防止膜
DE102004041007B4 (de) * 2004-08-16 2013-10-17 E.G.O. Elektro-Gerätebau GmbH Kochfeldplatte sowie Kochfeld mit einer solchen Kochfeldplatte
EP1662197B1 (fr) * 2004-10-07 2010-04-21 Auer Lighting GmbH Réflecteur en métal et méthode de production
DE102004049134A1 (de) * 2004-10-07 2006-04-13 Schott Ag Metallreflektor und Verfahren zu dessen Herstellung
US20090258222A1 (en) * 2004-11-08 2009-10-15 Agc Flat Glass Europe S.A. Glazing panel
DE102004058426A1 (de) * 2004-12-03 2006-06-08 Interpane Entwicklungs- Und Beratungsgesellschaft Mbh & Co.Kg Hochtemperaturbeständiger Belag aus TiOx
DE102004060670B4 (de) * 2004-12-15 2010-07-01 Von Ardenne Anlagentechnik Gmbh Verfahren und Anordnung zur Herstellung hochtemperaturbeständiger Kratzschutzschichten mit geringer Oberflächenrauigkeit
DE102004061464B4 (de) * 2004-12-17 2008-12-11 Schott Ag Substrat mit feinlaminarer Barriereschutzschicht und Verfahren zu dessen Herstellung
FI117728B (fi) * 2004-12-21 2007-01-31 Planar Systems Oy Monikerrosmateriaali ja menetelmä sen valmistamiseksi
US8814861B2 (en) 2005-05-12 2014-08-26 Innovatech, Llc Electrosurgical electrode and method of manufacturing same
US7147634B2 (en) 2005-05-12 2006-12-12 Orion Industries, Ltd. Electrosurgical electrode and method of manufacturing same
TWI275135B (en) * 2005-07-08 2007-03-01 Univ Tsinghua Fabrication method of epitaxial substrate having single-crystal Sc2O3 junction film
US7968426B1 (en) * 2005-10-24 2011-06-28 Microwave Bonding Instruments, Inc. Systems and methods for bonding semiconductor substrates to metal substrates using microwave energy
US7595271B2 (en) * 2005-12-01 2009-09-29 Asm America, Inc. Polymer coating for vapor deposition tool
JP5135753B2 (ja) * 2006-02-01 2013-02-06 セイコーエプソン株式会社 光学物品
US7892662B2 (en) * 2006-04-27 2011-02-22 Guardian Industries Corp. Window with anti-bacterial and/or anti-fungal feature and method of making same
TW200830034A (en) * 2006-10-13 2008-07-16 Asahi Glass Co Ltd Method of smoothing surface of substrate for EUV mask blank, and EUV mask blank obtained by the method
FR2907112B1 (fr) * 2006-10-16 2009-10-02 Eurokera S N C Sa Plaque vitroceramique et son procede de fabrication
DE102007023803B4 (de) * 2007-05-21 2009-11-05 Schott Ag Verfahren zur Herstellung von Schichtsystemen mit Zwischenschichten sowie Gegenstand mit Schichtsystem mit Zwischenschichten
US20090297703A1 (en) * 2008-05-29 2009-12-03 Motorola, Inc. Induced phase composite transparent hard coating
WO2013170052A1 (fr) 2012-05-09 2013-11-14 Sio2 Medical Products, Inc. Enrobage protecteur en saccharide pour conditionnement pharmaceutique
EP2674513B1 (fr) 2009-05-13 2018-11-14 SiO2 Medical Products, Inc. Revêtement de récipient et inspection
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US8035285B2 (en) * 2009-07-08 2011-10-11 General Electric Company Hybrid interference coatings, lamps, and methods
EP2336811B1 (fr) * 2009-12-21 2016-09-07 ALANOD GmbH & Co. KG Matériau composite
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
CN102333426A (zh) * 2010-07-12 2012-01-25 鸿富锦精密工业（深圳）有限公司 壳体及其制作方法
CN102465267A (zh) * 2010-11-08 2012-05-23 鸿富锦精密工业（深圳）有限公司 镀膜件的制备方法及由该方法制得的镀膜件
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US8574728B2 (en) 2011-03-15 2013-11-05 Kennametal Inc. Aluminum oxynitride coated article and method of making the same
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
CN102732846A (zh) * 2011-04-07 2012-10-17 鸿富锦精密工业（深圳）有限公司 被覆件及其制造方法
WO2013029656A1 (fr) * 2011-08-30 2013-03-07 Ev Group E. Thallner Gmbh Procédé de liaison permanente de tranches par une couche de liaison au moyen d'une diffusion en phase solide ou d'une transformation de phase
DE102011085799B4 (de) * 2011-11-04 2014-07-24 Von Ardenne Anlagentechnik Gmbh Verfahren zum Schutz einer Substratbehandlungsanlage vor Überhitzung
CN103930595A (zh) 2011-11-11 2014-07-16 Sio2医药产品公司 用于药物包装的钝化、pH保护性或润滑性涂层、涂布方法以及设备
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
WO2013088451A1 (fr) * 2011-12-15 2013-06-20 Council Of Scientific & Industrial Research Revêtement sélectif solaire amélioré présentant une meilleure stabilité thermique et son procédé de préparation
KR101444188B1 (ko) * 2012-07-04 2014-10-02 영남대학교 산학협력단 태양전지 광흡수층 제조장치
TWI606986B (zh) 2012-10-03 2017-12-01 康寧公司 用於保護玻璃表面的物理氣相沉積層
WO2014071061A1 (fr) 2012-11-01 2014-05-08 Sio2 Medical Products, Inc. Procédés d'inspection de revêtement
EP2920567B1 (fr) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Procédé et appareil pour détecter des caractéristiques d'intégrité de revêtement de barrière rapide
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
WO2014085346A1 (fr) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Corps creux comportant un revêtement intérieur
US9017809B2 (en) 2013-01-25 2015-04-28 Kennametal Inc. Coatings for cutting tools
US9138864B2 (en) 2013-01-25 2015-09-22 Kennametal Inc. Green colored refractory coatings for cutting tools
WO2014134577A1 (fr) 2013-03-01 2014-09-04 Sio2 Medical Products, Inc. Prétraitement par plasma ou par dépôt chimique en phase vapeur pour kit pharmaceutique lubrifié, procédé de revêtement et appareil
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
WO2014164928A1 (fr) 2013-03-11 2014-10-09 Sio2 Medical Products, Inc. Emballage muni d'un revêtement
WO2014144926A1 (fr) 2013-03-15 2014-09-18 Sio2 Medical Products, Inc. Procédé de revêtement
US9359261B2 (en) 2013-05-07 2016-06-07 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US9110230B2 (en) 2013-05-07 2015-08-18 Corning Incorporated Scratch-resistant articles with retained optical properties
US9703011B2 (en) 2013-05-07 2017-07-11 Corning Incorporated Scratch-resistant articles with a gradient layer
US9366784B2 (en) 2013-05-07 2016-06-14 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US9684097B2 (en) 2013-05-07 2017-06-20 Corning Incorporated Scratch-resistant articles with retained optical properties
US9427808B2 (en) 2013-08-30 2016-08-30 Kennametal Inc. Refractory coatings for cutting tools
JP6511474B2 (ja) * 2014-03-07 2019-05-15 ユニヴァーシティ・オブ・サウス・オーストラリア プラスチック基板のための装飾コーティング
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
US9335444B2 (en) 2014-05-12 2016-05-10 Corning Incorporated Durable and scratch-resistant anti-reflective articles
US11267973B2 (en) 2014-05-12 2022-03-08 Corning Incorporated Durable anti-reflective articles
US9650290B2 (en) 2014-05-27 2017-05-16 Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique (C.R.V.C.) Sarl IG window unit for preventing bird collisions
KR101467889B1 (ko) * 2014-06-12 2014-12-03 주식회사 엠코드 무반사 무정전 필터의 제조장치 및 제조방법
US9790593B2 (en) 2014-08-01 2017-10-17 Corning Incorporated Scratch-resistant materials and articles including the same
CA3204930A1 (fr) 2015-08-18 2017-02-23 Sio2 Medical Products, Inc. Conditionnement pharmaceutique et autre presentant un faible taux de transmission d'oxygene
EP3770649A1 (fr) 2015-09-14 2021-01-27 Corning Incorporated Articles anti-réfléchissants de transmission de lumière élevée et résistants aux rayures
US10816703B2 (en) 2015-09-28 2020-10-27 Tru Vue, Inc. Near infrared reflective coatings
ES2882707T3 (es) 2016-04-19 2021-12-02 Apogee Entpr Inc Superficies de vidrio revestidas y procedimiento de revestimiento de un sustrato de vidrio
JP7014353B2 (ja) * 2017-03-31 2022-02-01 株式会社Flosfia 結晶性積層構造体
CN106945490B (zh) * 2017-04-27 2021-01-15 上海蔚来汽车有限公司 平视显示装置、挡风玻璃、以及电动车辆
EP3619176A1 (fr) 2017-05-04 2020-03-11 Apogee Enterprises, Inc. Revêtements à faible émissivité, surfaces de verre comprenant lesdits revêtements, et procédés de fabrication desdits revêtements
CN111132945B (zh) 2017-07-31 2022-10-21 康宁股份有限公司 具有受控的粗糙度和微结构的涂层
US10650935B2 (en) * 2017-08-04 2020-05-12 Vitro Flat Glass Llc Transparent conductive oxide having an embedded film
WO2020037042A1 (fr) 2018-08-17 2020-02-20 Corning Incorporated Articles en un oxyde inorganique comportant des structures antiréfléchissantes durables et minces
CN109336630B (zh) * 2018-08-29 2021-06-11 宁波华源精特金属制品有限公司 一种支架及其制备方法
CN110879435B (zh) * 2019-11-18 2021-08-06 中国科学院上海技术物理研究所 一种以硒化锌晶体为基底的中长波红外宽光谱分色片
CN112526663A (zh) * 2020-11-04 2021-03-19 浙江大学 一种基于原子层沉积的吸收膜及其制作方法
TW202300959A (zh) * 2021-03-11 2023-01-01 美商應用材料股份有限公司 藉由物理氣相沉積所沉積的氧化鈦光學裝置薄膜
CN113473657B (zh) * 2021-09-03 2021-11-30 中熵科技(北京)有限公司 一种定向传热的半导体发热薄膜及其制备方法
WO2023064122A1 (fr) * 2021-10-13 2023-04-20 Applied Materials, Inc. Dépôt de phase rutile avec orientations cristallines préférées

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4321311A (en) * 1980-01-07 1982-03-23 United Technologies Corporation Columnar grain ceramic thermal barrier coatings
CA1177704A (fr) 1981-07-20 1984-11-13 James D. Rancourt Enduits optiques pour emploi a temperatures elevees
JPS58147556A (ja) 1982-02-26 1983-09-02 Hitachi Ltd アルミニウム薄膜製作法
EP0183770B1 (fr) 1984-05-14 1988-11-23 GORDON, Roy Gerald Procede de suppression de couleurs
AT380910B (de) 1984-05-23 1986-07-25 Nedoma Olga Unterdecke fuer arbeitsraeume
US4643951A (en) * 1984-07-02 1987-02-17 Ovonic Synthetic Materials Company, Inc. Multilayer protective coating and method
US4920014A (en) * 1987-02-27 1990-04-24 Sumitomo Metal Mining Co., Ltd. Zirconia film and process for preparing it
JPH06102558B2 (ja) * 1987-05-29 1994-12-14 セントラル硝子株式会社 色ガラス板
JP2964513B2 (ja) 1988-12-27 1999-10-18 東芝ライテック株式会社 高耐熱性高屈折率複合酸化物薄膜、その形成用組成物及び白熱電球
ATE130284T1 (de) 1990-07-05 1995-12-15 Saint Gobain Vitrage Verfahren zur bildung einer schicht aus aluminium- titanoxiden auf glas, das so erhaltene glas mit halbleitenden beschichtungen.
DE4031489A1 (de) 1990-10-05 1992-04-09 Ver Glaswerke Gmbh Verfahren zum beschichten von glasscheiben mit hilfe eines thermischen spritzverfahrens
GB2252333B (en) 1991-01-29 1995-07-19 Spectra Physics Scanning Syst Improved scanner window
DE69208721T2 (de) 1991-04-30 1996-10-10 Saint Gobain Vitrage Glassubstrat beschichtet mit dünnen Merhschichten für Sonnenschütz
ATE147890T1 (de) * 1991-05-31 1997-02-15 Deposition Sciences Inc Sputteranlage
DE69219300T2 (de) * 1991-12-26 1997-08-14 Asahi Glass Co Ltd Ein transparentes Filmbeschichtetes Substrat
DE4208376A1 (de) * 1992-03-16 1993-09-23 Asea Brown Boveri Hochleistungsstrahler
FR2698093B1 (fr) 1992-11-17 1995-01-27 Saint Gobain Vitrage Int Vitrage à propriétés de transmission variant avec l'incidence.
JPH06256929A (ja) * 1993-03-04 1994-09-13 Mitsubishi Shindoh Co Ltd 金色蒸着製品
JPH07138048A (ja) 1993-10-26 1995-05-30 Nissan Motor Co Ltd 紫外線熱線遮断ガラス
DE4438359C2 (de) * 1994-10-27 2001-10-04 Schott Glas Behälter aus Kunststoff mit einer Sperrbeschichtung
US5513040B1 (en) * 1994-11-01 1998-02-03 Deposition Technology Inc Optical device having low visual light transmission and low visual light reflection
WO1997008357A1 (fr) 1995-08-30 1997-03-06 Nashua Corporation Revetement anti-reflechissant
JP3761273B2 (ja) * 1996-02-20 2006-03-29 フクビ化学工業株式会社 反射防止膜
US5944964A (en) * 1997-02-13 1999-08-31 Optical Coating Laboratory, Inc. Methods and apparatus for preparing low net stress multilayer thin film coatings
JPH11149063A (ja) 1997-09-09 1999-06-02 Asahi Optical Co Ltd 反射防止膜付き眼鏡レンズ
JPH11305014A (ja) * 1998-04-22 1999-11-05 Asahi Optical Co Ltd 多層膜ミラーおよび多層膜ミラーの製造方法
US5914817A (en) * 1998-05-15 1999-06-22 Optical Coating Laboratory, Inc. Thin film dichroic color separation filters for color splitters in liquid crystal display systems
US6797388B1 (en) * 1999-03-18 2004-09-28 Ppg Industries Ohio, Inc. Methods of making low haze coatings and the coatings and coated articles made thereby
JP2002014203A (ja) * 2000-06-30 2002-01-18 Canon Inc 反射防止膜及びそれを用いた光学部材
JP2002243906A (ja) * 2001-02-21 2002-08-28 Toppan Printing Co Ltd 反射防止積層体及びその製造方法
DE20106167U1 (de) 2001-04-07 2001-06-21 Schott Glas Kochfeld mit einer Glaskeramikplatte als Kochfläche
US6579590B2 (en) * 2001-11-16 2003-06-17 Hitachi Global Storage Technologies Netherlands B.V. Thermally-assisted magnetic recording disk with multilayered thermal barrier
JP2005538255A (ja) * 2002-09-14 2005-12-15 ショット アクチエンゲゼルシャフト 保護層ならびに保護層を生成するプロセスおよび構成
DE10342397B4 (de) * 2003-09-13 2008-04-03 Schott Ag Transparente Schutzschicht für einen Körper und deren Verwendung

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2004026782A1 *

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ATE394353T1 (de) 2008-05-15
US7381469B2 (en) 2008-06-03
US20040258947A1 (en) 2004-12-23
US20060246321A1 (en) 2006-11-02
US7713638B2 (en) 2010-05-11
EP2243751A3 (fr) 2011-11-02
KR100885083B1 (ko) 2009-02-25
AU2003270193A1 (en) 2004-04-08
CN100575290C (zh) 2009-12-30
CN1681743A (zh) 2005-10-12
AU2003273873A1 (en) 2004-04-08
KR20050057328A (ko) 2005-06-16
WO2004026787A1 (fr) 2004-04-01
JP2005538255A (ja) 2005-12-15
JP2005538256A (ja) 2005-12-15
EP1537056A1 (fr) 2005-06-08
KR100909905B1 (ko) 2009-07-30
WO2004026782A1 (fr) 2004-04-01
WO2004026785A1 (fr) 2004-04-01
EP2243751A2 (fr) 2010-10-27
JP2005538028A (ja) 2005-12-15
EP1537055A1 (fr) 2005-06-08
CN100465116C (zh) 2009-03-04
AU2003273872A1 (en) 2004-04-08
JP4268938B2 (ja) 2009-05-27
AU2003273874A1 (en) 2004-04-08
EP1537057B1 (fr) 2008-05-07
US7641773B2 (en) 2010-01-05
CN1323045C (zh) 2007-06-27
US20060093840A1 (en) 2006-05-04
CN1681745A (zh) 2005-10-12
US20060127699A1 (en) 2006-06-15
DE50309800D1 (de) 2008-06-19
CN1681744A (zh) 2005-10-12
WO2004026786A1 (fr) 2004-04-01
KR100890258B1 (ko) 2009-03-24
KR20050057312A (ko) 2005-06-16
EP1537057A1 (fr) 2005-06-08
KR20070087259A (ko) 2007-08-27
JP2005538871A (ja) 2005-12-22

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