EP1475463B2 - Methode zum Elektroplattieren mit Umkehrpulsstrom - Google Patents

Methode zum Elektroplattieren mit Umkehrpulsstrom Download PDF

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Publication number
EP1475463B2
EP1475463B2 EP03258024.3A EP03258024A EP1475463B2 EP 1475463 B2 EP1475463 B2 EP 1475463B2 EP 03258024 A EP03258024 A EP 03258024A EP 1475463 B2 EP1475463 B2 EP 1475463B2
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Prior art keywords
seconds
current
plating
metal
cathodic
Prior art date
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Expired - Lifetime
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EP03258024.3A
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English (en)
French (fr)
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EP1475463A2 (de
EP1475463A3 (de
EP1475463B1 (de
Inventor
Leon R. Barstad
Thomas Buckley
Raymond Cruz
Trevor Goodrick
Gary Hamm
Mark J. Kapeckas
Katie Price
Erik Reddington
Wade Sonnenberg
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Rohm and Haas Electronic Materials LLC
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Shipley Co LLC
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)

Claims (6)

  1. Ein Verfahren, das Folgendes beinhaltet:
    (a) Erzeugen einer elektromotorischen Kraft durch eine Kathode, Anode und eine Zusammensetzung in elektrischer Kommunikation zum Bereitstellen eines elektrischen Felds um die Kathode, die Anode und die Zusammensetzung herum, wobei die Zusammensetzung Metallionen, Aufheller und Chloridionen beinhaltet, wobei das Konzentrationsverhältnis von Chloridionen zu Aufhellern von 20 : 1 bis 125 : 1 beträgt;
    wobei die Metallionen Kupferionen sind; und
    (b) Modifizieren des elektrischen Felds um die Kathode, die Anode und die Zusammensetzung herum zum Bereitstellen eines Pulsmusters oder einer Kombination von Pulsmustern, beinhaltend
    (i) kathodischen Strom, gefolgt von anodischem Strom;
    (ii) kathodischen Strom, gefolgt von anodischem Strom, gefolgt von kathodischem Gleichstrom;
    (iii) kathodischen Strom, gefolgt von anodischem Strom, gefolgt von Gleichgewicht; oder
    (iv) kathodischen Strom, gefolgt von anodischem Strom, gefolgt von kathodischem Gleichstrom, dann gefolgt von Gleichgewicht zum Elektroplattieren eines Metalls auf die Kathode;
    wobei für das Pulsmuster (i) Vorwärtspulse im Zeitbereich von 40 Millisekunden (ms) bis 1 Sekunde liegen und Rückwärtspulse im Bereich von 0,25 ms bis 15 ms liegen; für das Pulsmuster (ii) Vorwärtspulse im Bereich von 40 ms bis 1 Sekunde liegen, Rückwärtspulse im Bereich von 0,25 ms bis 15 ms liegen und der Gleichstrom im Bereich von 5 Sekunden bis 90 Sekunden liegt; für das Pulsmuster (iii) Vorwärtspulse im Bereich von 40 ms bis 1 Sekunde liegen, Rückwärtspulse im Bereich von 0,25 ms bis 15 ms liegen und das Gleichgewicht im Bereich von 5 Sekunden bis 90 Sekunden liegt; und für Pulsmuster (iv) Vorwärtspulse im Bereich von 40 ms bis 1 Sekunde liegen, Rückwärtspulse im Bereich von 0,25 ms bis 15 ms liegen, Gleichstrom im Bereich von 5 Sekunden bis 90 Sekunden liegt, und Gleichgewicht im Bereich von 5 Sekunden bis 90 Sekunden liegt.
  2. Verfahren gemäß Anspruch 1, wobei das Konzentrationsverhältnis des Chloridions zu dem Aufheller von 25 : 1 bis 120 : 1 beträgt.
  3. Verfahren gemäß Anspruch 1, das ferner ein Lactam-Alkoxylat-Nivelliermittel mit einer nachfolgenden Formel beinhaltet:
    Figure imgb0003
     wobei A ein Kohlenwasserstoffradikal ist, R1 Wasserstoff oder Methyl ist, n eine ganze Zahl von 2 bis 10 ist und n' eine ganze Zahl von 1 bis 50 ist.
  4. Verfahren gemäß Anspruch 1, das ferner ein Polyalkylenglykolethernivelliermittel mit der Formel [R2-O(CH2CH2O)m (CH(CH3)-CH2O)p-R3]a beinhaltet, wobei m eine ganze Zahl von 8 bis 800 ist, p eine ganze Zahl von 0 bis 50 ist, R2 ein (C1-C4)Alkyl ist, R3 eine aliphatische Kette oder eine aromatische Gruppe ist und a 1 oder 2 ist.
  5. Verfahren gemäß Anspruch 1, das ferner Stickstoff und Schwefel, enthaltend Nivelliermittel mit einer Formel N-R4-S, beinhaltet, wobei R4 eine substituierte oder nichtsubstituierte Alkylgruppe oder eine substituierte oder nichtsubstituiert Arylgruppe ist.
  6. Verfahren gemäß Anspruch 1, wobei der Aufheller in einer Konzentration von 0,001 ppm bis 1,0 ppm vorliegt.
EP03258024.3A 2002-12-20 2003-12-18 Methode zum Elektroplattieren mit Umkehrpulsstrom Expired - Lifetime EP1475463B2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US43597602P 2002-12-20 2002-12-20
US435976P 2002-12-20

Publications (4)

Publication Number Publication Date
EP1475463A2 EP1475463A2 (de) 2004-11-10
EP1475463A3 EP1475463A3 (de) 2006-04-12
EP1475463B1 EP1475463B1 (de) 2011-03-30
EP1475463B2 true EP1475463B2 (de) 2017-03-01

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EP03258024.3A Expired - Lifetime EP1475463B2 (de) 2002-12-20 2003-12-18 Methode zum Elektroplattieren mit Umkehrpulsstrom

Country Status (7)

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US (2) US20050016858A1 (de)
EP (1) EP1475463B2 (de)
JP (1) JP4342294B2 (de)
KR (1) KR101085005B1 (de)
CN (1) CN1540040B (de)
DE (1) DE60336539D1 (de)
TW (1) TWI296014B (de)

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TW200424330A (en) 2004-11-16
EP1475463A2 (de) 2004-11-10
CN1540040A (zh) 2004-10-27
TWI296014B (en) 2008-04-21
JP2004204351A (ja) 2004-07-22
DE60336539D1 (de) 2011-05-12
EP1475463A3 (de) 2006-04-12
JP4342294B2 (ja) 2009-10-14
KR101085005B1 (ko) 2011-11-21
US20050016858A1 (en) 2005-01-27
US20060081475A1 (en) 2006-04-20
CN1540040B (zh) 2012-04-04
EP1475463B1 (de) 2011-03-30
KR20040055684A (ko) 2004-06-26

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