EP1292176A2 - Dispositif de production d'un jet de gas actif - Google Patents

Dispositif de production d'un jet de gas actif Download PDF

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Publication number
EP1292176A2
EP1292176A2 EP02019754A EP02019754A EP1292176A2 EP 1292176 A2 EP1292176 A2 EP 1292176A2 EP 02019754 A EP02019754 A EP 02019754A EP 02019754 A EP02019754 A EP 02019754A EP 1292176 A2 EP1292176 A2 EP 1292176A2
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EP
European Patent Office
Prior art keywords
discharge chamber
channel
discharge
gas
process gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP02019754A
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German (de)
English (en)
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EP1292176B8 (fr
EP1292176A3 (fr
EP1292176B1 (fr
Inventor
Rudolph Konavko
Arkady Konavko
Hermann Schmid
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PVA TePla AG
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TePla AG
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Publication of EP1292176A3 publication Critical patent/EP1292176A3/fr
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Publication of EP1292176B1 publication Critical patent/EP1292176B1/fr
Publication of EP1292176B8 publication Critical patent/EP1292176B8/fr
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3484—Convergent-divergent nozzles

Definitions

  • the invention relates to a device for generating a chemically active Jet (hereinafter referred to as active gas jet) by means of an electrically generated Plasma in a process gas used.
  • active gas jet a chemically active Jet
  • the invention is particularly suitable for the treatment of surfaces, e.g. for pretreatment and cleaning of Surfaces before gluing, coating or painting, for coating, Hydrophilizing, removing electrical charges or sterilizing and for Acceleration of chemical reactions.
  • the gas to be activated is passed directly through an electrical discharge zone.
  • the discharge zone is formed in a tube by means of an electric field, with either electrodes being arranged laterally inside the tube in the direction of flow of the gas, or a discharge chamber made of insulating material without electrodes installed in a waveguide.
  • This solution has the disadvantage already mentioned above that, at a high speed of the activated gas flow, there is a high probability of electromagnetic fields and the electrical discharge zone itself emerging from the discharge chamber in the direction of the active gas jet, since there is no shielding ring electrode at the end of the discharge chamber.
  • the arrangement described in EP 0 305 241 A1 prevents the operator from being endangered by a separate, closed processing chamber in which the surface treatment of the material takes place.
  • the invention has for its object a new way to Generation of a chemically active jet (active gas jet) by means of a electrical discharge generated plasma in a process gas used find at which at an increased process gas speed the active gas jet on the processing surface develops a high chemical activity and already on Output of the device is electrically neutral, so that it is not a hazard to Operating personnel, environment and processed surface.
  • active gas jet active gas jet
  • the object in a device for generating a chemically active jet (active gas jet) by means of an electrical discharge generated plasma in a process gas used with an essentially cylindrical discharge chamber, through which a process gas flows and in to activate the process gas, plasma generation due to electrical Gas discharge is provided, a gas inlet for the continuous supply of the Process gas into the discharge chamber and an outlet opening for alignment of the active gas jet onto a surface to be processed, characterized in that that the discharge chamber has a tapered end to increase the Has velocity of the active gas jet, the tapered end of the Discharge chamber a limiting channel to prevent the spread of the Discharge zone in the free space for the surface to be processed is arranged downstream, the limiting channel being essentially cylindrical is trained and grounded and its length is greater than the factor 5-10 Cross section is.
  • An arc discharge is advantageously provided for activating the process gas, the discharge chamber having a central electrode and a hollow electrode which covers the inner wall of the discharge chamber at least in the region of the conically tapered end in a flat and symmetrical manner.
  • the limiting channel preferably adjoins the hollow electrode directly.
  • the central electrode is expediently rod-shaped and is arranged in the gas inlet region along the axis of symmetry of the discharge chamber.
  • the central electrode can advantageously be used to increase the power of the active gas jet by means of enlarged electrode areas, which have the shape of a cylinder cap, which includes a cylinder jacket surface of low height and a cover area, and whose opening is aligned coaxially with the axis of the discharge chamber and is arranged above the gas inlet of the discharge chamber.
  • the discharge chamber in an induction field generated at high frequency (radio frequency) in order to activate the process gas.
  • the discharge chamber (1) is provided with two electrodes which are arranged along the wall of the discharge chamber in the flow direction of the process gas and are operated at radio frequency.
  • the high-frequency excitation for activating the process gas can also advantageously be achieved by generating an induction field by arranging the discharge chamber in a coil operated at radio frequency.
  • Another possibility for activating the process gas without contamination of the active gas by electrode material is that the discharge chamber is arranged in a waveguide connected to a microwave source.
  • a beam shaping device is expediently arranged downstream of the limiting channel. It can be advantageous here that branched nozzles for processing individual partial areas or depressions of the surface to be processed are connected to the outlet of the boundary channel.
  • the beam-shaping device is expediently adapted to the shape of the surface to be processed by guide plates, the distance between the surface and the beam-shaping device being kept in a defined small area, so that the effectively treated surface comprises a larger area.
  • jet-shaping devices which incorporate two or more devices according to the invention for generating the active gas jet into a processing channel, wherein several surfaces of a workpiece to be treated simultaneously or surfaces of extruded profiles with any cross section can be processed on all sides in the processing channel with continuous material flow.
  • a feed tube for introducing additives is preferably arranged axially in the discharge chamber, which ends shortly before the discharge chamber exits, an influence of the additives on the discharge characteristic and contamination of the Discharge chamber (1) is avoided by the additives or their reaction products.
  • the limiting channel comprises a plurality of individual channels in order to reduce the gas dynamic resistance and the residence time of the active gas in the limiting channel, the individual channels being arranged evenly distributed around a central channel.
  • the supply of additives is particularly favorable if the limiting channel with a plurality of individual channels has a central inlet channel for the additives, the inlet channel being arranged axially in the center of a ring of individual channels through which active gas flows, since there is a premature reaction or disintegration of the additives and contamination of the discharge chamber by the additives can be avoided.
  • the additives in the area of the boundary channel can advantageously be introduced as gases, liquids in the form of aerosols or solids in the form of fine particles.
  • the hollow electrode, the limiting channel and the beam-shaping device are manufactured as a uniform rotating body with very good electrical conductivity
  • the central electrode is surrounded coaxially by an insulator tube and inserted into the discharge chamber formed by the hollow electrode
  • the gas inlet into the discharge chamber is initially one cylindrical distribution chamber, wherein tangential flow channels are provided for the process gas from the distribution chamber to the discharge chamber, so that as a result of a spiral gas flow from the distribution chamber into the discharge chamber, arc discharges between the central electrode and the hollow electrode are fixed to an end of the central electrode protruding from the insulator tube. This largely prevents erosion of the insulator tube.
  • Tangential flow channels can advantageously also be guided into a cylindrical annular chamber between the rod-shaped central electrode and the inner surface of the insulator tube, so that the central electrode is cooled directly by a portion of the process gas and exit points of arc discharges are essentially restricted to non-cylindrical surfaces of the central electrode.
  • the insulator tube is expediently towered over by the central electrode by a length of up to twice the diameter of the central electrode. If the additional process gas supply within the insulator tube is used, the end of the central electrode can be shortened and in extreme cases ends with the end of the insulator tube.
  • the limiting channel is preferably narrowed conically in the direction of gas flow and has an average ratio of channel diameter to channel length of 1: 8.
  • the limiting channel is advantageously followed by a beam-shaping device with a bell-shaped widened output, so that the working width of the active gas jet is increased.
  • the basic idea of the invention is based on the fact that, in the known devices of the prior art with plasma-induced active gas jet, either the activity of the gas jet is too low or the active gas jet still has a dangerously high electrical potential when it emerges into the processing space, which leads to a risk to the operating personnel , According to the invention, these mutually influencing problems are eliminated by passing the process gas through three zones in succession.
  • the process gas (in the discharge space) is activated and accelerated, then the speed-related spreading of the discharge zone out of the discharge space into the active gas jet is intercepted (limited) in a narrow, earthed limiting channel and finally an electrically neutral, chemically active active gas jet by beam-shaping devices according to the desired application (Cleaning, coating, activation, etc.) is formed.
  • the device according to the invention can be combined with all known methods of plasma-induced activation of process gases in which a corona, glow or arc discharge zone (using a direct, alternating or pulse current) or a high-frequency discharge zone generated in an alternating electromagnetic field (with excitation frequencies up to the Microwave range).
  • the effectiveness of the limiting channel depends essentially on the fact that it has a smaller diameter in relation to the discharge chamber. Therefore, the discharge chamber is tapered in the flow direction of the process gas, so that with a large ratio of the cross section of the discharge chamber to the cross section of the limiting channel, the speed of the active gas jet increases significantly, which means that the time required for the chemically active particles of the active gas jet to travel the distance from the discharge chamber covered to the application site is greatly reduced. As a result of the reduction in time, there are fewer recombinations of active particles (reduced activity loss of the active gas jet) and this leads to an increase in the effectiveness of the active gas jet on the surface to be processed.
  • the active gas jet is guided through a narrow, earthed channel at the exit of the discharge zone.
  • the boundary channel is dimensioned such that a discharge arc entering it has a potential whose size at the entrance to the boundary channel is still too small for a breakthrough to the channel wall.
  • the boundary channel must therefore have a minimum length in accordance with the other conditions of plasma generation, which ensures that the aforementioned bulges of the discharge zone into the free space cannot occur. This happens with a ratio of the cross section to the channel length of 1: 5 to 1:10.
  • the device according to the invention allows the generation of an electrical neutral, chemically active jet, with increased process gas velocity the active gas jet on the surface to be processed has a high chemical Activity unfolds and is electrically neutral at the exit of the device, so that he posed no danger to operating personnel, the environment and Represents surface.
  • the basic structure of the device for generating an active gas jet according to FIG. 1 consists of a discharge chamber 2 through which a process gas 1 flows, in which the process gas 1 is activated in the form of an electrical discharge generated by a strong field 3, an essentially cylindrical limiting channel 4 and a beam shaping device 5 for the active gas jet 6 intended for material processing in free space.
  • the discharge chamber 2 has, in the flow direction of the process gas 1, a conically tapered end 21 (ie a nozzle-like constricted shape) which serves to increase the flow rate of the process gas 1 during its activation in the discharge chamber 2. With this increase in gas velocity, the time required to reach a surface 7 to be machined (only shown in FIGS.
  • the limiting channel 4 is dimensioned such that the part of the discharge zone 22 entering it reaches such a potential, the size of which at the entry into the limiting channel 4 is still too small for a breakthrough to the channel wall, but increases so much with increasing path length in the limiting channel 4, until there is a breakthrough to the earthed wall of the limiting channel 4. Furthermore, the limiting channel 4 must have a minimum length in accordance with the other conditions of the plasma generation required to activate the process gas 1, which ensures that the aforementioned bulges 24 of the discharge zone 22 cannot occur in the free space. This is usually achieved with a ratio of the channel cross-section to the channel length of 1: 5 to 1:10.
  • the effectiveness of the active gas jet 6 also depends to a large extent on the fact that the limiting channel 4 has a significantly smaller diameter in relation to the main part of the discharge chamber 2 (in front of its conically tapered end 21), so that with a large ratio (1: 5 to 1: 8 ) of the cross section of the discharge chamber 2 compared to the cross section of the limiting channel 4, the speed of the active gas jet 6 increases significantly, whereby the time required for the chemically active particles of the active gas jet 6 to travel the distance from the discharge chamber 2 to the application site is greatly reduced.
  • the delimitation channel 4 is therefore essentially cylindrical and has a cross section of 1: 5 to 1: 8 that is adapted to the diameter of the discharge chamber 2.
  • Process gas 1 is introduced into the discharge chamber 2.
  • the supplied process gas 1 is activated by the interaction with the field 3 in the electrical discharge zone 22, accelerated and largely discharged in the conically tapered part 21 of the discharge chamber 2 and introduced into the limiting channel 4, which spreads the discharge zone 22 outwards into the free zone Processing space prevented.
  • the active gas jet 6 flows through a jet-shaping device 5, in which it is shaped in accordance with the application in terms of speed, temperature, geometric shape and flow type (laminar or turbulent flow).
  • the discharge zone 22 can arise as desired (depending on the type of field generation used) by direct, alternating or pulse current, electromagnetic induction, microwaves or other types of excitation which trigger an electrical gas discharge when the process gas 1 is used.
  • the process gas 1 is activated by an arc discharge 34 between two electrodes in the discharge chamber 2.
  • One of the electrodes is a rod-shaped central electrode 31, the other is located on the inner wall of the discharge chamber 2 and forms a so-called hollow electrode 32.
  • the hollow electrode 32 is attached at least to the conically tapered end 21 of the discharge chamber 2. However, it can also form the wall of the discharge chamber 2 itself (as shown, for example, in FIG. 13).
  • the process gas 1 is introduced tangentially into the discharge chamber 2, in which an electrical arc discharge 34 takes place between the central electrode 31 and the hollow electrode 32 along the inner wall of the discharge chamber 2 by means of a generator 33.
  • the interaction with the electric arc discharge 34 activates the process gas 1, accelerates it in the conically tapered part 21 of the discharge chamber 1 and largely discharges it on the way to the limiting channel 4.
  • the subsequent delimitation channel 4 which receives a bulge 23 of the discharge zone 22 that is possible at high gas velocities, a forwarding of the electrical potential of the discharge zone 22 to the outside into the free space of the surface 7 to be processed is prevented.
  • the gas throughput through the discharge chamber 2 is very high, discharge tufts are blown out into the active gas jet of the delimitation channel 4, ie a bulge 23 of the discharge zone 22 is formed.
  • the active gas jet 6 is guided at the outlet of the discharge chamber 2 through the narrow, grounded limiting channel 4, in which a certain aerodynamic congestion, a further discharge of the active gas jet 6 takes place.
  • the limiting channel 4 is dimensioned such that the bulge 23 of the discharge zone 22 entering it has a potential whose size at the entrance to the limiting channel 4 is still too small for a breakthrough to the channel wall. As the path length in the delimitation channel 4 increases, the voltage in the discharge arc rises until a breakthrough to the channel wall occurs.
  • the boundary channel 4 must have a certain minimum length in accordance with the other conditions of the plasma generation, which ensures that the aforementioned bulge 23 of the discharge zone 22 cannot cross the boundary channel 4 and to indicate a ratio between the channel cross section and the channel length of 1/5 to 1/10 is.
  • the active gas jet 6 has a temperature which is comparable to the temperature at the outlet of the discharge chamber 2, but its gas dynamic properties (speed and flow conditions) are essentially determined by the gas throughput and by the dimensions and the structural design of the limiting channel 4. After the limiting channel 4, the active gas jet 6 flows through the jet-shaping device 5, in which it is shaped in accordance with the application in relation to speed, temperature, geometric shape and flow type (laminar or turbulent flow).
  • jet-shaping devices 5 can be used for this, for example nozzles designed in such a way that adiabatic expansion of the active guest jet occurs in order to lower the temperature, or flattened jet-shaping devices 5, as will be described in more detail below, in order to achieve a flat, to form wide active gas jet 6.
  • the electrical discharge zone 22 can arise for the described device as desired (depending on the type of voltage generator 33 used) by direct, alternating or pulse current.
  • the active gas jet 6 generated in the discharge chamber 2 unfortunately also loses part of its activity when flowing through the boundary channel 4 as a result of recombination of the active particles and because of the interaction of the active gas jet 6 with the channel wall.
  • the limiting channel 4 consists of two or more grounded individual channels 41 which are arranged parallel to one another in electrically conductive material and which result in a larger effective flow cross section. 2 shows an embodiment in which further individual channels 41 are arranged uniformly distributed around a central single channel 41.
  • FIG. 3 shows a generation of an active gas jet 6, in which - in contrast to the example described above - the central electrode 31 has the shape of an electrically conductive cylinder cap instead of the rod shape.
  • This central electrode 31 is arranged coaxially with its opening in the direction of the discharge chamber 2.
  • the process gas 1 is introduced tangentially into a gap between the cylindrical central electrode 31 and the discharge chamber 2.
  • the supporting surface of the arc discharge 34 on the central electrode 31 increases, ie the base points of the arc discharges 34 move on a larger surface when the flow of the process gas 1 is intensely swirled. This prevents overheating in the central electrode 31 and increases the service life and the maximum discharge current.
  • the process gas 1 is activated between two electrodes 35 arranged one after the other in the discharge chamber 2 in the flow direction.
  • the discharge zone 22 is generated by a high-frequency discharge in an alternating field 3, the discharge chamber 2 being made of an electrically insulating material (eg quartz). Since it is well known that the electrical discharge produced when using cold electrodes 35 is unstable under certain pressures, for example at atmospheric pressure, without additional measures, because high electron densities and energy gradients create a space charge layer in front of the electrodes 35 and destabilize the discharge. In high-frequency discharges, this stabilization is carried out by simple measures (as described, for example, by J. Reece Roth in: Industrial Plasma Engineering, Vol.
  • the discharge chamber 2 which in this example consists of electrically insulating but microwave-transparent material, is introduced into the field 3 of a microwave generator 37, a location of relatively uniform and high field strength being used in a typical microwave conductor 38 which is connected to the microwave generator 37. All other processes which produce the active gas jet 6 from the discharge zone 22 run according to the preceding examples.
  • a likewise electrodeless activation of the process gas 1 is shown in FIG. 6.
  • a high-frequency generator 36 is used to induce a high-frequency changing field 3 in the discharge chamber 2 with a coil 39.
  • the discharge chamber 2 is arranged within the turns of the coil 39 and forms the desired discharge zone 22 on the inside.
  • the material of the discharge chamber 2 can be selected relatively freely, but is not necessarily ferromagnetic.
  • the process gas 1 is accelerated in the conically tapered end 21 of the discharge chamber 2 and freed of its dangerous potential in the earthed limiting channel 4, so that an electrically neutral active gas jet 6 is available at the output of the beam-shaping device 5.
  • Fig. 7 shows a stylized discharge chamber 2, in which the type of Generation of the electrical discharge can be chosen arbitrarily.
  • the generated Active gas is discharged from the discharge chamber 2 through the limiting channel 4 into a jet-shaping device 5, which has branched nozzles 51.
  • the branched nozzles 51 are directed to different partial areas 71 which represent different heights in the surface 7 to be machined and each direct a portion of the active gas jet 6 onto the partial surfaces 71.
  • angled, largely flat guide plates 52 are provided as beam-shaping device 5, directly adjoining the delimitation channel 4, and are evenly spaced a short distance above the flat surface 7 must be performed.
  • the high gas velocity already generated in the end of the tapered discharge chamber 2 and passed on via the limiting channel 4 is also continued in the beam-shaping device 5 in the form of a beam, which is guided parallel to the surface 7, through a type of boundary layer line.
  • FIG. 10 shows the same mode of operation for a spherical surface 7, in which case the guide plates 52 must have a concentric curvature in accordance with the surface curvature in order to achieve the same effect of the laminar flow layer.
  • FIG. 10 Another special design of beam-shaping device is shown in FIG. 10.
  • This example deals with the effective processing of a continuous material flow, in which either an extruded profile 72 or a material flow of identical workpieces are to be processed simultaneously on several surfaces 7 with an active gas jet 6. 10, an extruded profile 72 is guided through a closed processing channel 53, a device according to the invention being attached to at least two opposite sides of this processing channel 53 at an angle to the direction of movement of the extruded profile 72.
  • the mass flow of this additive 8 may only make up a fraction of the mass flow of the process gas 1 in the discharge chamber 2.
  • the discharge chamber 2 is integrated in a housing 9, since an electrodeless activation of the process gas 1 is to be assumed here.
  • the housing 9 symbolizes a waveguide 38 with a connected microwave source 37 according to FIG. 5, but can also accommodate a coil 39 according to FIG. 7 and an associated cooling.
  • the activated process gas 1 is guided through a limiting channel 4 with a plurality of parallel individual channels 41, which are arranged in a ring 42.
  • the additive 8 is introduced into the center of an active gas jet 6, which approximately represents a gas ring, via this feed channel 82, which is guided from the outside into the center of the ring 42 of the individual channels 41 within the perforated metal plate of the limiting channel 4. Since the active gas jet 6 flows out at a very high speed in the case of the small cross sections of the individual channels 41, the mass flow of the additive 8 can be varied over a wide range via the feed channel 82 and set very precisely. 13 shows the longitudinal and cross-section of the device for generating an electrically neutral active gas jet 6 in a manageable housing 9.
  • the device consists of the discharge chamber 2, the delimitation channel 4 and the beam shaping device 5, which as a unitary body 91 in the form of a non-slip handpiece (pen) made of copper or another very good electrical conductor, a rod-shaped central electrode 31, which is arranged by means of an insulating tube 29 made of quartz, coaxial to the wall of the discharge chamber 2, which also represents the hollow electrode 32.
  • the insulator tube 29 is sealed in a gas-tight manner with respect to the discharge chamber 21 by an elastic sealing ring 92 in the base body 91.
  • the end of the central electrode 31 protrudes from the insulator tube 29 into the discharge chamber 2 by a length of up to twice the diameter of the central electrode 31.
  • the insulator tube 29 itself protrudes into the discharge chamber 2 by at least a length the size of its own outside diameter and thus forms part of the discharge chamber 2 in the form of a hollow cylinder outside its outer surface.
  • the process gas 1 is introduced symmetrically into the discharge chamber 2 into this hollow cylinder near the rear end wall of the discharge chamber 2.
  • the conically tapered end 21 of the discharge chamber 2 merges smoothly into the narrow delimitation channel 4.
  • the diameter of the boundary channel 4 is in a ratio of 1: 8 to its length and is only shown in a stylized manner in FIG. 13 (not to scale).
  • the beam-shaping device 5 connects to the limiting channel 4.
  • the discharge chamber 2, the delimitation channel 4 and the beam-shaping device 5 are made uniformly from copper and have a common grounded contact 93.
  • the grounded contact 93 is also connected to the negative pole of the voltage generator 33 (not shown in FIG. 13).
  • the positive pole of the voltage generator 33 is connected to the central electrode 31.
  • the process gas 1 is initially fed via the gas inlet 24 into a cylindrical distribution chamber 25, from which a spiral gas flow is generated in the hollow-cylindrical part of the discharge chamber 2 by way of uniformly distributed tangential flow channels 26.
  • This measure has the effect that the base points of the arc discharge 34 (not shown in FIG. 13) on the central electrode 31 are restricted to its end face and directly adjacent parts of the electrode surface, so that the insulator tube 29 is subjected to less thermal stress and its erosion is reduced.
  • an insulating connection body 94 is fastened (eg screwed), which carries the fastening and the connection of the central electrode 31.
  • the connection body 94 has an additional gas inlet 27, which is connected to the discharge chamber 2 via a narrow annular chamber 28 along the central electrode 31. Through this narrow annular chamber 28, part of the process gas 1 with the function of electrode cooling and direct feeding into the discharge zone 22 is fed between the central electrode 31 and the insulator tube 29.
  • the annular chamber 28 is sealed in the rear in the connecting body 94 by an elastic ring 96 against the central electrode 31, which is guided to the rear to the connecting terminal 95.
  • Tangential flow channels 26 can also be provided in the annular chamber 28, as between the distribution chamber 25 and the hollow cylindrical part of the discharge chamber 2, in order to generate a spiral gas circulation.
  • 13 now works in the following manner.
  • Part of the process gas 1 is supplied through the additional gas inlet 27 and flows through the annular chamber 28 between the central electrode 31 and the insulator tube 29 into the discharge chamber 2.
  • the other (larger) part of the process gas 1 through the gas inlet 24 via the distribution chamber 25 , through the tangential openings 26 of the discharge chamber 2 in its hollow cylindrical part, which is formed by the hollow electrode 32 and the protruding insulator tube 29. This creates a spiral eddy flow in the discharge chamber 2.
  • the active gas jet 6 is then brought to the width and shape desired for the application (as described, for example, in relation to FIGS. 7 to 9). A chemically very effective and electrically neutral active gas jet 6 is thus available for any application.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Percussion Or Vibration Massage (AREA)
  • Nozzles (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Lasers (AREA)
EP02019754A 2001-09-07 2002-09-04 Dispositif de production d'un jet de gas actif Expired - Lifetime EP1292176B8 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10145131A DE10145131B4 (de) 2001-09-07 2001-09-07 Vorrichtung zum Erzeugen eines Aktivgasstrahls
DE10145131 2001-09-07

Publications (4)

Publication Number Publication Date
EP1292176A2 true EP1292176A2 (fr) 2003-03-12
EP1292176A3 EP1292176A3 (fr) 2008-07-02
EP1292176B1 EP1292176B1 (fr) 2009-12-09
EP1292176B8 EP1292176B8 (fr) 2010-05-19

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EP02019754A Expired - Lifetime EP1292176B8 (fr) 2001-09-07 2002-09-04 Dispositif de production d'un jet de gas actif

Country Status (6)

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US (1) US6943316B2 (fr)
EP (1) EP1292176B8 (fr)
AT (1) ATE451824T1 (fr)
CA (1) CA2399493C (fr)
DE (2) DE10145131B4 (fr)
ES (1) ES2337657T3 (fr)

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CH700049A2 (fr) * 2008-12-09 2010-06-15 Advanced Machines Sarl Procédé et dispositif de génération d'un flux de plasma.
KR101001477B1 (ko) 2009-02-27 2010-12-14 아주대학교산학협력단 바이오-메디컬 응용을 위한 상압 저온 마이크로 플라즈마 분사 장치
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DE102014118909B4 (de) 2014-02-05 2016-12-29 Wilhelm Niemann GmbH & Co. KG Maschinenfabrik Tauchmühle mit Mahlraumabdichtung
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DE102018221191A1 (de) 2018-12-07 2020-06-10 Carl Zeiss Smt Gmbh Optisches Element zur Reflexion von VUV-Strahlung und optische Anordnung
CN111465160A (zh) * 2020-05-14 2020-07-28 国网重庆市电力公司电力科学研究院 一种等离子体射流发生装置及系统

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CA2399493C (fr) 2011-05-24
CA2399493A1 (fr) 2003-03-07
ES2337657T3 (es) 2010-04-28
EP1292176B8 (fr) 2010-05-19
DE10145131A1 (de) 2003-03-27
EP1292176A3 (fr) 2008-07-02
US20030047540A1 (en) 2003-03-13
US6943316B2 (en) 2005-09-13
EP1292176B1 (fr) 2009-12-09
DE10145131B4 (de) 2004-07-08
DE50214062D1 (de) 2010-01-21

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