EP1243795B1 - Zweistufige Vakuumpumpe - Google Patents

Zweistufige Vakuumpumpe Download PDF

Info

Publication number
EP1243795B1
EP1243795B1 EP02356050A EP02356050A EP1243795B1 EP 1243795 B1 EP1243795 B1 EP 1243795B1 EP 02356050 A EP02356050 A EP 02356050A EP 02356050 A EP02356050 A EP 02356050A EP 1243795 B1 EP1243795 B1 EP 1243795B1
Authority
EP
European Patent Office
Prior art keywords
pump
gases
vacuum
pumped
pumping system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP02356050A
Other languages
English (en)
French (fr)
Other versions
EP1243795A1 (de
Inventor
Michel Puech
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel CIT SA
Alcatel Lucent SAS
Original Assignee
Alcatel CIT SA
Alcatel SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel CIT SA, Alcatel SA filed Critical Alcatel CIT SA
Publication of EP1243795A1 publication Critical patent/EP1243795A1/de
Application granted granted Critical
Publication of EP1243795B1 publication Critical patent/EP1243795B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B41/00—Pumping installations or systems specially adapted for elastic fluids
    • F04B41/06—Combinations of two or more pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B45/00—Pumps or pumping installations having flexible working members and specially adapted for elastic fluids
    • F04B45/04—Pumps or pumping installations having flexible working members and specially adapted for elastic fluids having plate-like flexible members, e.g. diaphragms
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
    • F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
    • F04C18/123—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with radially or approximately radially from the rotor body extending tooth-like elements, co-operating with recesses in the other rotor, e.g. one tooth
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
    • F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
    • F04C18/126—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with radially from the rotor body extending elements, not necessarily co-operating with corresponding recesses in the other rotor, e.g. lobes, Roots type

Definitions

  • the present invention relates to pumping systems using multi-stage Roots type dry pump vacuum or type multi-lobe "claw", in which the inlet of the primary pump receives the gases to be pumped and the output of the primary pump discharges gases pumped to the atmosphere or to a recycling system pumped gases.
  • the vacuum pumping system To achieve and maintain the vacuum in the vacuum enclosure, the vacuum pumping system must first pump a relatively large gas flow to create the vacuum; in one second, the vacuum pumping system extracted from the enclosure to empties the residual gases or the treatment gases introduced voluntarily in the vacuum enclosure during the various stages of manufacturing processes in a controlled atmosphere. Gas flows to pumping by the vacuum pumping system are then lower.
  • the treatment gases introduced voluntarily in the vacuum vessel are frequently gases expensive, and there is an advantage in recycling these gases at the outlet of the vacuum pumping system, by a gas recycling system pumped, to then reintroduce them in a controlled manner into the vacuum vessel. It is therefore necessary not to contaminate these gas as they pass through the vacuum pumping system, and that's a second reason why we have to use pumps Roots or claw dry primers, rather than pumps traditional oil seal primers.
  • the inlet of the primary pump receives the gases to be pumped, either directly from the vacuum enclosure, either indirectly by a secondary pump which can be a pump turbomolecular.
  • the primary pump delivers the pumped gases directly to the atmosphere or directly to a system of recycling of pumped gases.
  • these very pure gases are used at low pressure in the vacuum vessel, and are evacuated by a multi-stage primary dry pump pumping system Roots type or multi-lobe claw type. So the document US 4,504,201 A describes a Roots type multi-stage pump and two claw floors. The top floor pushes the atmosphere.
  • the gas to be evacuated is sucked by the first stage of the pump then compressed in the stages following until reaching a pressure slightly higher than the atmospheric pressure at the exit of the top floor and so be released to the atmosphere or returned to a recycling system for pumped gases.
  • Rapid blocking and destruction of the pump is due blockage of the last stage of the pump, stage which drives the gas at a pressure close to atmospheric pressure.
  • the structure of the primary dry pumps includes a stator in which rotate two mechanically coupled rotors and laterally offset from each other.
  • the rotors are held by bearings, and are separated from the stator by the gas slide contained in the mechanical clearances between the rotor and the stator or pump body.
  • the dissipation of calories in a stage of the pump is carried out, for a very small part, by conduction across the axis of the rotor towards the pump body, and for a preponderant part by conduction through the gas slide between the rotor and the stator.
  • the problem proposed by the present invention is to design a new vacuum pumping system structure to avoid destruction of the dry primary pump in the case of pumping gas with low thermal conductivity, in using known multi-stage dry primary pumps without modify them, also keeping the same technique possible recycling, thus avoiding the development of a new pump.
  • a system vacuum pump comprises a primary pump Roots or claw multi-stage dryer, pump inlet primary receiving the gases to be pumped and the pump outlet primary pumping the pumped gases towards the atmosphere or towards a pumped gas recycling system.
  • the system vacuum pumping system includes an additional pump whose inlet is connected to the output of the primary pump and whose output back to the atmosphere or to the gas recycling system pumps.
  • a vacuum hose is connected in parallel on the additional pump, and includes a non-return valve allowing gas from the primary pump to pass.
  • the pump additional is a dry pump of technology other than Roots or claw and adapted to safely support the elevation of temperature due to the final compression of the pumped gases.
  • the pump additional is a diaphragm pump.
  • the additional pump is a piston pump.
  • the additional pump must be sized to be able to pump all of the gas flow through the system vacuum pumping during the vacuum pumping steps at low pressure, for example to pump the process gas flow during the low pressure manufacturing process steps in a vacuum enclosure.
  • the additional pump can be sized to be just capable of pumping said flow of gas during the steps of pumping a vacuum at low pressure.
  • the drain line must be dimensioned way to let through the important gas flow during the stages for vacuuming an empty enclosure.
  • the vacuum pumping system according to the invention can be connected to a vacuum enclosure containing or in which are injected gases with low thermal conductivity.
  • Low thermal conductivity gases may include argon or xenon.
  • the pumped gases are discharged at the outlet of the vacuum pumping system in a gas recycling system pumps.
  • the pumped gas recycling system extracts and recycles said gases with low thermal conductivity, to reinject them from controlled way in the vacuum chamber.
  • a vacuum pumping system in the embodiment illustrated schematically on Figure 1, includes a primary pump 1 dry multi-stage Roots type or claw, whose inlet 2 receives the gases to be pumped from a vacuum enclosure 3, and the outlet 4 of which discharges the gases pumped to an output stage 5 comprising an additional pump 6 and a drain line 7.
  • the additional pump 6 has an inlet 8 connected to the outlet 4 of the primary pump 1, and has an outlet 9 which back to the outside atmosphere or to a system of recycling of pumped gases 10.
  • Pre-hose 7 is connected in parallel on additional pump 6, i.e. its input is connected to input 8 of the additional pump 6 and to output 4 of the primary pump 1, and its output is connected to the output 9 of the additional pump 6 and to the atmosphere or to the recycling of pumped gases 10.
  • the evacuation pipe 7 includes a non-return valve 11, which allows the gases of entry to exit while prohibiting their movement from the exit to the entrance. Thus, the non-return valve 11 allows passage gases from outlet 4 of the primary pump 1.
  • the additional pump 6 is a dry pump of technology different from the Roots or claw technologies used for primary pump 1, and is adapted to support without damage the temperature rise due to the final compression of the gases pumped before being discharged to the atmosphere or to the pumped gas recycling system 10.
  • a first example of an additional pump that can suitable is a diaphragm pump, as shown schematically in Figure 3. It is understood that such a pump membranes is a dry pump, that is to say in which the seal sealing of the pump is not achieved by a liquid volume. It is also understood that the membrane pump structure does not does not have a rotor isolated from the stator by the blade of pumped gases.
  • a second example of an additional pump that may be suitable is a piston pump, which is a well-known structure in the state of the art. In such a piston pump, there is no rotor isolated from the stator either by a blade of pumped gases.
  • the additional pump 6 must be dimensioned so as to be able to pump the entire process gas flow through the vacuum pumping system during the pumping steps from vacuum to low pressure. During these stages where the pumped gas is low pressure, the gas flow is relatively low. So it is enough that the additional pump be sized to be fair capable of pumping said gas flow, so that inlet 8 of the additional pump 6 is at a much lower pressure at atmospheric pressure, and the primary pump 1 must thus achieve a reduced compression ratio which consequently reduces the heating of the gases passing through it and the heating which results on its constituent parts.
  • the additional pump 6 is capable of pumping the entire gaseous flow of the operating regime normal, the non-return valve 11 ensuring the maintenance of the pressure difference between inlet 8 and outlet 9 of the pump additional 6.
  • Pre-hose 7 is required to allow pass the gas flow at a higher flow rate than the primary pump 1 must evacuate at the start of emptying a vacuum chamber 3.
  • the gases being pumped generally do not include low gas thermal conductivity, and the compression that the last stage of primary pump 1 is lower than that the vacuum pumping system must perform in operating mode normal, i.e. when the pressure in the vacuum vessel 3 is very low.
  • the primary pump 1 is thus capable of ensuring that only the step of vacuuming the vacuum chamber 3, through the drain line 7, and the additional pump 6 has not significant effect on the functioning of the system.
  • the pipeline 7 should be dimensioned so that the significant gas flow during the steps of the feed the vacuum chamber 3.
  • the pumped gas recycling system 10 generates a gas flow recycled.
  • the flow of recycled gas is sent through a pipeline of recycling 110 to a piloted gas source 12 which is itself connected to the vacuum enclosure 3 by an injection pipe 13 to inject into the vacuum vessel 3 appropriate quantities of gas during programmed operating steps.
  • the primary pump 1 is for example a multi-stage dry pump Roots type, as illustrated more clearly on Figure 2.
  • the stator 14 defines a succession of compression chambers, for example the compression chambers 15, 16 and 17, in which rotate Roots compression lobes carried by two rotors parallel such as the rotor 20 mechanically coupled, with gas passage pipes to let gases pass successively between the adjacent compression chambers.
  • Rotors such as rotor 20 are mounted parts rotating on bearings, and a play is necessarily present between the compression lobes and the walls of the stator 14. A blade therefore exists between the compression lobes of the rotors and the stator mass 14. In the case of low gas pumping heat conduction, the gas blade effectively insulates the lobes compression of the rotors relative to the stator, and therefore opposes the passage of heat energy from the rotors to stator 14. It this results in the heating of rotors such as rotor 20.
  • This heating is more accentuated in the last floor 17 of the primary pump, stage where the most compression occurs important gas.
  • the vacuum pumping system as illustrated in the figure 1 according to the invention makes it possible to lower the pressure at outlet 4 of the primary pump 1, thereby reducing overheating of the top stage of the primary pump 1.
  • This effect is particularly advantageous during pumping gas with low thermal conduction, and prevents destruction primary pump 1.
  • the operation of the system according to the invention is the following: at the start of pumping of the gases present in an enclosure at vacuum 3, the primary pump 1 sucks the gases at its inlet 2 and the compresses to discharge them at its outlet 4 at pressure close to the atmospheric pressure.
  • the gas flow is important, and the pumped gas mixtures generally contain good gases coefficient of thermal conduction.
  • Primary pump type 1 Multi-stage Roots is thus capable of ensuring the pumping of this gas flow, during a vacuuming step.
  • the gas driven back to its outlet 4 mainly pass through the hose 7 to through the non-return valve 11, to escape towards the atmosphere.
  • the additional pump 6 sees only a weak pass portion of the discharged gas flow, its pumping capacity being scaled down.
  • the process steps can be carried out under vacuum, by example for the manufacture of semiconductors.
  • process are injected into the vacuum enclosure 3 by the gas source 12 through the injection pipe 13.
  • These process gases can be insulating gases such as argon or xenon, in the stages where these gases are used for example in sources of light emitting in the deep ultraviolet.
  • the gas flows pumped being weak, the additional pump 6 is capable of ensuring the pumping of all the gas flow leaving the primary pump 1 by outlet 4, and no flow flows through the drain line 7. As a result, the additional pump 6 produces a lowering of the pressure at its inlet 8, i.e. at the outlet 4 of the primary pump 1.
  • the primary pump 1 is thus capable of withstand the presence of gases with low thermal conductivity such than argon or xenon in the flow of pumped gases, without exaggerated heating of its elements.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Compressor (AREA)
  • Reciprocating Pumps (AREA)

Claims (8)

  1. Vakuumpumpsystem mit einer mehrstufigen trockenlaufenden Primärpumpe (1) des Roots- oder Klauentyps, bei welcher der Einlass (2) der Primärpumpe (1) die zu pumpenden Gase ausnimmt und der Auslass (4) der Primärpumpe (1) die gepumpten Gase in die Atmosphäre oder zu einem Rückführungssystem für die gepumpten Gase (10) fördert, dadurch gekennzeichnet, dass :
    der Einlass (2) der Primärpumpe (1) mit einer Vakuumkammer (3) verbunden ist, die Gase mit geringer Wärmeleitfähigkeit enthält oder in die diese Gase eingeleitet werden,
    eine Zusatzpumpe (6) einen Einlass (8) aufweist, der mit dem Auslass (4) der Primärpumpe (1) verbunden ist, und einen Auslass (9), der in die Atmosphäre oder zu einem Rückführungssystem für die gepumpten Gase (10) fördert,
    eine Vorevakuierungsleitung (7) parallel an die Zusatzpumpe (6) angeschlossen ist, und ein Rückschlagventil (11) aufweist, das die von der Primärpumpe (1) kommenden Gase durchlässt,
    die Zusatzpumpe (6) eine trockenlaufende Pumpe einer anderen Technologie als der Roots- oder Klauentechnologie ist und keinen Rotor besitzt, der vom Stator durch eine dünne Schicht gepupter Gase getrennt wäre, damit sie ohne Schädigung der Temperaturerhöhung standhält, welche durch die Endverdichtung der gepumpten Gase entsteht.
  2. Vakuumpumpsystem nach Anspruch 1, dadurch gekennzeichnet, dass die Zusatzpumpe (6) eine Membranpumpe ist.
  3. Vakuumpumpsystem nach Anspruch 1, dadurch gekennzeichnet, dass die Zusatzpumpe (6) eine Kolbenpumpe ist.
  4. Vakuumpumpsystem nach einem beliebigen der Ansprüche 1 bis 3, dadurch gekennzeichnet, dass die Zusatzpumpe so dimensioniert ist, dass sie in der Lage ist, den gesamten Gasstrom zu pumpen, der während der Pumpphasen eines Niederdruckvakuums das System durchläuft.
  5. Vakuumpumpsystem nach Anspruch 4, dadurch gekennzeichnet, dass die Zusatzpumpe (6) so dimensioniert ist, dass sie gerade in der Lage ist, diesen Gasstrom während der Pumpphasen eines Niederdruckvakuums zu pumpen.
  6. Vakuumpumpsystem nach einem beliebigen der Ansprüche 1 bis 5, dadurch gekennzeichnet, dass die Vorevakuierungsleitung (7) so dimensioniert ist, dass sie den starken Gasstrom während der Vorevakuierungsphasen einer Vakuumkammer (3) durchlässt.
  7. Vakuumpumpsystem nach einem beliebigen der Ansprüche 1 bis 6, bei dem die Gase mit geringer Wärmeleitfähigkeit Argon oder Xenon aufweisen.
  8. Vakuumpumpsystem nach einem beliebigen der Ansprüche 1 bis 7, dadurch gekennzeichnet, dass die gepumpten Gase in ein Rückführungssystem für gepumpte Gase (10) gefördert werden, das diese Gase mit geringer Wärmeleitfähigkeit extrahiert und in den Kreislauf zurückführt.
EP02356050A 2001-03-19 2002-03-13 Zweistufige Vakuumpumpe Expired - Lifetime EP1243795B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0103678 2001-03-19
FR0103678A FR2822200B1 (fr) 2001-03-19 2001-03-19 Systeme de pompage pour gaz a faible conductivite thermique

Publications (2)

Publication Number Publication Date
EP1243795A1 EP1243795A1 (de) 2002-09-25
EP1243795B1 true EP1243795B1 (de) 2004-05-19

Family

ID=8861270

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02356050A Expired - Lifetime EP1243795B1 (de) 2001-03-19 2002-03-13 Zweistufige Vakuumpumpe

Country Status (6)

Country Link
US (1) US6644931B2 (de)
EP (1) EP1243795B1 (de)
JP (1) JP4166491B2 (de)
AT (1) ATE267345T1 (de)
DE (1) DE60200493T2 (de)
FR (1) FR2822200B1 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104541061A (zh) * 2012-07-19 2015-04-22 阿迪克森真空产品公司 用于泵浦加工室的方法和设备
US10047747B2 (en) 2013-01-21 2018-08-14 Sterling Industry Consult Gmbh Pump assembly and method for evacuating a vapor-filled chamber

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008008302A (ja) * 2001-09-06 2008-01-17 Ulvac Japan Ltd 多段式容積移送型ドライ真空ポンプの省エネ方法
WO2003023229A1 (fr) * 2001-09-06 2003-03-20 Ulvac, Inc. Systeme de pompe a vide et procede de fonctionnement d'un systeme de pompe a vide
JP2003343469A (ja) * 2002-03-20 2003-12-03 Toyota Industries Corp 真空ポンプ
GB0229353D0 (en) * 2002-12-17 2003-01-22 Boc Group Plc Vacuum pumping system and method of operating a vacuum pumping arrangement
JP2004263686A (ja) * 2003-01-06 2004-09-24 Toyota Industries Corp 往復動型ポンプ及び真空ポンプ
JP2006520873A (ja) * 2003-03-19 2006-09-14 株式会社荏原製作所 容積型真空ポンプ
FR2854933B1 (fr) * 2003-05-13 2005-08-05 Cit Alcatel Pompe moleculaire, turbomoleculaire ou hybride a vanne integree
US7094036B2 (en) * 2003-09-24 2006-08-22 The Boc Group Plc Vacuum pumping system
GB2407132A (en) * 2003-10-14 2005-04-20 Boc Group Plc Multiple vacuum pump system with additional pump for exhaust flow
US7021888B2 (en) * 2003-12-16 2006-04-04 Universities Research Association, Inc. Ultra-high speed vacuum pump system with first stage turbofan and second stage turbomolecular pump
JP4633370B2 (ja) * 2004-02-17 2011-02-16 財団法人国際科学振興財団 真空装置
TWI234801B (en) * 2004-05-13 2005-06-21 Powerchip Semiconductor Corp Equipment and method for improving remain gas to pollute wafer
US7189066B2 (en) * 2004-05-14 2007-03-13 Varian, Inc. Light gas vacuum pumping system
GB0418771D0 (en) * 2004-08-20 2004-09-22 Boc Group Plc Evacuation of a load lock enclosure
US20070020115A1 (en) * 2005-07-01 2007-01-25 The Boc Group, Inc. Integrated pump apparatus for semiconductor processing
JP4709016B2 (ja) * 2006-01-12 2011-06-22 アネスト岩田株式会社 複合圧縮機
TWI467092B (zh) * 2008-09-10 2015-01-01 Ulvac Inc 真空排氣裝置
DE202009003980U1 (de) 2009-03-24 2010-08-19 Vacuubrand Gmbh + Co Kg Vakuumpumpe
FR2952683B1 (fr) 2009-11-18 2011-11-04 Alcatel Lucent Procede et dispositif de pompage a consommation d'energie reduite
TWI518245B (zh) * 2010-04-19 2016-01-21 荏原製作所股份有限公司 乾真空泵裝置、排氣單元，以及消音器
CN102869886A (zh) * 2010-04-20 2013-01-09 山特维克知识产权股份有限公司 空气压缩机系统及操作方法
CN102654117B (zh) * 2011-03-04 2014-10-22 中国科学院沈阳科学仪器研制中心有限公司 一种真空泵用排气装置
US10428807B2 (en) * 2011-12-09 2019-10-01 Applied Materials, Inc. Pump power consumption enhancement
WO2013087713A2 (de) 2011-12-14 2013-06-20 Sterling Industry Consult Gmbh Vorrichtung und verfahren zum evakuieren eines raums und zum reinigen des aus dem raum abgesaugten gases
DE102012220442A1 (de) * 2012-11-09 2014-05-15 Oerlikon Leybold Vacuum Gmbh Vakuumpumpensystem zur Evakuierung einer Kammer sowie Verfahren zur Steuerung eines Vakuumpumpensystems
DE102013108090A1 (de) * 2013-07-29 2015-01-29 Hella Kgaa Hueck & Co. Pumpenanordnung
DE202013104111U1 (de) 2013-09-10 2013-12-03 Ilmvac Gmbh Trockenlaufender Vakuumpumpstand
US20150139817A1 (en) * 2013-11-19 2015-05-21 Gardner Denver Thomas, Inc. Ramp-up optimizing vacuum system
CN106232992A (zh) * 2014-03-24 2016-12-14 阿特利耶博世股份有限公司 真空泵系统中的泵送方法和真空泵系统
CN104019017B (zh) * 2014-06-18 2016-08-17 宝钢工程技术集团有限公司 一种抽真空工艺设备
DE202014005279U1 (de) * 2014-06-26 2015-10-05 Oerlikon Leybold Vacuum Gmbh Vakuumpumpen-System
WO2015197138A1 (fr) * 2014-06-27 2015-12-30 Ateliers Busch Sa Méthode de pompage dans un système de pompes à vide et système de pompes à vide
JP6418838B2 (ja) * 2014-07-31 2018-11-07 エドワーズ株式会社 ドライポンプ及び排ガス処理方法
CN105464932A (zh) * 2014-08-15 2016-04-06 北京和华腾真空泵压缩机有限公司 一种抽真空排气装置
CA2961977A1 (fr) * 2014-09-26 2016-03-31 Ateliers Busch Sa Systeme de pompage pour generer un vide et procede de pompage au moyen de ce systeme de pompage
WO2016050313A1 (fr) * 2014-10-02 2016-04-07 Ateliers Busch Sa Systeme de pompage pour generer un vide et procede de pompage au moyen de ce systeme de pompage
CN104806487A (zh) * 2015-05-16 2015-07-29 肥西县三星玻璃有限公司 除尘器用一开一备真空泵组
US9982666B2 (en) * 2015-05-29 2018-05-29 Agilient Technologies, Inc. Vacuum pump system including scroll pump and secondary pumping mechanism
US10094381B2 (en) * 2015-06-05 2018-10-09 Agilent Technologies, Inc. Vacuum pump system with light gas pumping and leak detection apparatus comprising the same
CN105889072A (zh) * 2016-06-25 2016-08-24 余林岚 一种应用于厌氧胶加工的抽真空机组
CN107942918B (zh) * 2017-12-22 2023-04-18 大连华锐重工集团股份有限公司 自适应式干式真空机械泵电控系统及控制方法
FR3098869B1 (fr) * 2019-07-17 2021-07-16 Pfeiffer Vacuum Groupe de pompage
CA3157078A1 (en) * 2019-12-04 2021-06-10 Ateliers Busch Sa Redundant pumping system and pumping method by means of this pumping system

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3536418A (en) * 1969-02-13 1970-10-27 Onezime P Breaux Cryogenic turbo-molecular vacuum pump
US3922110A (en) * 1974-01-28 1975-11-25 Henry Huse Multi-stage vacuum pump
US4504201A (en) * 1982-11-22 1985-03-12 The Boc Group Plc Mechanical pumps
JPS6238883A (ja) * 1985-08-09 1987-02-19 Toyota Motor Corp ピストン摺動式バキユ−ムポンプ
DE3710782A1 (de) * 1987-03-31 1988-10-20 Vacuubrand Gmbh & Co Verfahren und vorrichtung zum abpumpen von daempfen und/oder dampfhaltigen gemischen und/oder gas-dampf-gemischen oder dgl. medien
US5356673A (en) * 1991-03-18 1994-10-18 Jet Process Corporation Evaporation system and method for gas jet deposition of thin film materials
JPH04326943A (ja) * 1991-04-25 1992-11-16 Hitachi Ltd 真空排気システム及び排気方法
KR100190310B1 (ko) * 1992-09-03 1999-06-01 모리시따 요오이찌 진공배기장치
EP0626516B1 (de) * 1993-04-15 1997-06-04 KNF Neuberger GmbH Schmiermittelfreie Vakuum-Pumpeinrichtung
DE4443387C1 (de) * 1994-12-06 1996-01-18 Saskia Hochvakuum Und Labortec Zweistufige mechanische Vakuumpumpanordnung
JP2000509786A (ja) * 1997-02-25 2000-08-02 バリアン・アソシエイツ・インコーポレイテッド 二段式真空排気装置
IT1297347B1 (it) * 1997-12-24 1999-09-01 Varian Spa Pompa da vuoto.
US6589023B2 (en) * 2001-10-09 2003-07-08 Applied Materials, Inc. Device and method for reducing vacuum pump energy consumption

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104541061A (zh) * 2012-07-19 2015-04-22 阿迪克森真空产品公司 用于泵浦加工室的方法和设备
CN104541061B (zh) * 2012-07-19 2017-02-22 阿迪克森真空产品公司 用于泵浦加工室的方法和设备
US10047747B2 (en) 2013-01-21 2018-08-14 Sterling Industry Consult Gmbh Pump assembly and method for evacuating a vapor-filled chamber

Also Published As

Publication number Publication date
DE60200493T2 (de) 2005-08-04
ATE267345T1 (de) 2004-06-15
US6644931B2 (en) 2003-11-11
US20020131870A1 (en) 2002-09-19
JP2002339864A (ja) 2002-11-27
JP4166491B2 (ja) 2008-10-15
FR2822200B1 (fr) 2003-09-26
EP1243795A1 (de) 2002-09-25
FR2822200A1 (fr) 2002-09-20
DE60200493D1 (de) 2004-06-24

Similar Documents

Publication Publication Date Title
EP1243795B1 (de) Zweistufige Vakuumpumpe
EP2875240B1 (de) Verfahren und vorrichtung zum pumpen einer prozesskammer
BE1018846A3 (fr) Compresseur a vis.
EP1669609B1 (de) Partialdruckregelung von Gas zur Optimierung eines Verfahrens
FR2525698A1 (fr) Pompe turbomoleculaire
EP1510697B1 (de) Vakuumpumpe
FR2638788A1 (fr) Pompe a vide du type roots multietage
EP3485168B1 (de) Verfahren zur druckabsenkung in einem be- und entladeschloss und zugehörige pumpeneinheit
EP0985828B1 (de) Verfahren und Anlage zur Verhinderung von Ablagerungen in eineTurbomolekularpumpe mit Magnet-oder Gaslager
FR2619867A1 (fr) Pompe moleculaire polyetages
EP1589227A1 (de) Mehrstufige Vakuumpumpe und Pumpgerät mit einer solchen Pumpe
JP2012513111A (ja) チャージ−ディスチャージロック内の圧力を下げるための方法および関連装置
FR2810340A1 (fr) Cellule de trempe au gaz
FR2646881A1 (fr) Pompe a vide a plusieurs etages
EP1538656B1 (de) System zur Plasmabehandlung von Gasen in einer Vakuumpumpe
EP0999292B1 (de) Beförderung von in einer Vakuumpumpe oder in Leitungen gepumpten Gasen
FR2923946A1 (fr) Equipement pour la fabrication de semi-conducteurs, dispositif de pompage et porte-substrat correspondant
EP3105455B1 (de) Pumpsystem und verfahren zur verringerung des drucks in einer load-lock-kammer
FR3128747A1 (fr) Pompe à vide multi-étagée
FR3079886A1 (fr) Pompe a vide de type seche
FR2517416A1 (fr) Procede de sechage par le vide de canalisations
FR3118649A3 (fr) Pompe à vide rotative à palettes avec ensemble à lest de gaz
JPS62174592A (ja) スクリユ式真空ポンプ
WO2021164843A1 (fr) Dispositif pour la recirculation d'une composition au moins partiellement gazeuse contenant de l'hydrogène et système de pile à combustible
FR3101921A1 (fr) Pompe à vide sèche et procédé de fabrication

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

AX Request for extension of the european patent

Free format text: AL;LT;LV;MK;RO;SI

17P Request for examination filed

Effective date: 20021218

17Q First examination report despatched

Effective date: 20030403

AKX Designation fees paid

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20040519

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20040519

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20040519

Ref country code: IE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20040519

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20040519

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: FRENCH

REF Corresponds to:

Ref document number: 60200493

Country of ref document: DE

Date of ref document: 20040624

Kind code of ref document: P

GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)

Effective date: 20040720

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20040819

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20040819

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20040819

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20040830

NLV1 Nl: lapsed or annulled due to failure to fulfill the requirements of art. 29p and 29m of the patents act
REG Reference to a national code

Ref country code: IE

Ref legal event code: FD4D

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20050313

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20050313

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20050331

Ref country code: MC

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20050331

26N No opposition filed

Effective date: 20050222

BERE Be: lapsed

Owner name: *ALCATEL

Effective date: 20050331

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20060331

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20060331

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

REG Reference to a national code

Ref country code: FR

Ref legal event code: CD

BERE Be: lapsed

Owner name: *ALCATEL

Effective date: 20050331

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20041019

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20120327

Year of fee payment: 11

Ref country code: IT

Payment date: 20120321

Year of fee payment: 11

REG Reference to a national code

Ref country code: FR

Ref legal event code: TP

Owner name: ADIXEN VACUUM PRODUCTS, FR

Effective date: 20131009

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20130313

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130313

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130313

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 14

REG Reference to a national code

Ref country code: FR

Ref legal event code: CD

Owner name: PFEIFFER VACCUUM, FR

Effective date: 20160118

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 15

REG Reference to a national code

Ref legal event code: R082

Country of ref document: DE

Ref country code: DE

Ref document number: 60200493

Representative=s name: FDST PATENTANWAELTE FREIER DOERR STAMMLER TSCH, DE

Ref country code: DE

Ref legal event code: R081

Ref document number: 60200493

Country of ref document: DE

Owner name: ADIXEN VACUUM PRODUCTS, FR

Free format text: FORMER OWNER: ALCATEL LUCENT, PARIS, FR

Ref country code: DE

Ref legal event code: R081

Ref document number: 60200493

Country of ref document: DE

Owner name: PFEIFFER VACUUM, FR

Free format text: FORMER OWNER: ALCATEL LUCENT, PARIS, FR

REG Reference to a national code

Ref country code: DE

Ref legal event code: R082

Ref document number: 60200493

Country of ref document: DE

Representative=s name: FDST PATENTANWAELTE FREIER DOERR STAMMLER TSCH, DE

Ref country code: DE

Ref legal event code: R082

Ref document number: 60200493

Country of ref document: DE

Ref country code: DE

Ref legal event code: R081

Ref document number: 60200493

Country of ref document: DE

Owner name: PFEIFFER VACUUM, FR

Free format text: FORMER OWNER: ADIXEN VACUUM PRODUCTS, ANNECY, FR

REG Reference to a national code

Ref country code: DE

Ref legal event code: R082

Ref document number: 60200493

Country of ref document: DE

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 16

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 17

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20210323

Year of fee payment: 20

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20210325

Year of fee payment: 20

REG Reference to a national code

Ref country code: DE

Ref legal event code: R071

Ref document number: 60200493

Country of ref document: DE