EP1230034A1 - Verfahren zur stromlosen verzinnung von kupfer oder kupferlegierungen - Google Patents
Verfahren zur stromlosen verzinnung von kupfer oder kupferlegierungenInfo
- Publication number
- EP1230034A1 EP1230034A1 EP00978519A EP00978519A EP1230034A1 EP 1230034 A1 EP1230034 A1 EP 1230034A1 EP 00978519 A EP00978519 A EP 00978519A EP 00978519 A EP00978519 A EP 00978519A EP 1230034 A1 EP1230034 A1 EP 1230034A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- tin
- copper
- thiourea
- accordance
- precipitation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/48—Coating with alloys
Definitions
- a tin bath is suggested for the formation of a tin layer by chemical precipitation, which contains at least one foreign metal.
- the addition of foreign metals to the tin bath achieves an advantageous suppression of the diffusion processes, and thus a diffusion barrier is built which prevents the liberation of metals from the base material to a large extent.
- the advantages thus gained are good soldering characteristics at the surface and good durability of the tin layer.
- a diffusion-stable tin layer is produced which prevents the liberation of materials from the base layer to a large extent. This is an advantage especially in view of the copper liberation from potable water carrying copper tubing. However, an out-diffusion of lead and zinc from basic brass materials is prevented by a diffusion-stable tin layer.
- a metal of the group silver, bismuth, nickel, titanium, zirconium and indium is suggested as the foreign metal, whereby the use of indium has shown to be especially effective.
- the foreign metal for the formation of a diffusion barrier within the tin layer, at least one of the above metals is added to the tin bath as a foreign metal.
- thiourea and/or its derivative is used as the complexing agent.
- Thiourea as the complexing agent enables the liberation of positively charged copper ions.
- a copper thiourea complex forms which is soluble in electrolytes at a temperature of >28°C.
- As a result of the complexing of the copper its potential compared to that of tin is reduced.
- the then more noble tin precipitates, forming a layer of tin on the copper.
- the liberated copper ions concentrate in the electrolyte, whereby at a 3 copper concentration above 7 g/1 economical working is no longer possible since at these concentrations tin is no longer precipitated at satisfactory rates.
- a tin bath which preferably contains the following components:
- a source of tin preferably a bivalent tin salt, for example tin methanesulfonate, with 1 to 30 g/1 of tin in the tin bath;
- An acid preferably methanesulphomc acid with 5 to 200 g/1 in the tin bath, whereby the tin bath assumes a pH value of 0 to 3 ;
- a complexing agent preferably thiourea or a derivative in quantities of 10 to 200 g/1;
- a wetting agent in quantities of 1 to 10 g/1; 5. At least one foreign metal, preferably a metal in the group Ag, Bi, Ni, Ti, Zr and In in a proportion of
- a working temperature of the tin bath of 35 to 80°C is suggested.
- already known measures common to the state of the art can be taken when using the process described. This includes, for example, rinsing, pickling and drying of the work pieces.
- the process described by the invention makes it possible to produce diffusion-stable tin layers by means of chemical precipitation, whereby the diffusion barrier generated by the addition of foreign metals prevents the liberation of metals from the base materials in an advantageous manner.
- thiourea as complexing agent it becomes possible to remove the 5 copper ions liberated from the copper from the electrolyte by filtration, and thus to achieve a substantially extended useful life. Furthermore, in this manner a substantial acceleration of the process is achieved.
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemically Coating (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Conductive Materials (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Electrolytic Production Of Metals (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19954613 | 1999-11-12 | ||
DE19954613A DE19954613A1 (de) | 1999-11-12 | 1999-11-12 | Verfahren zur stromlosen Verzinnung von Kupfer oder Kupferlegierungen |
PCT/US2000/030983 WO2001034310A1 (en) | 1999-11-12 | 2000-11-09 | Process for the non-galvanic tin plating of copper or copper alloys |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1230034A1 true EP1230034A1 (de) | 2002-08-14 |
EP1230034A4 EP1230034A4 (de) | 2003-01-08 |
EP1230034B1 EP1230034B1 (de) | 2010-09-08 |
Family
ID=7928903
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP00978519A Expired - Lifetime EP1230034B1 (de) | 1999-11-12 | 2000-11-09 | Verfahren zur stromlosen verzinnung von kupfer oder kupferlegierungen |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1230034B1 (de) |
JP (1) | JP4084569B2 (de) |
CN (1) | CN1192125C (de) |
AT (1) | ATE480340T1 (de) |
AU (1) | AU1597501A (de) |
DE (2) | DE19954613A1 (de) |
WO (1) | WO2001034310A1 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4998704B2 (ja) | 2007-01-22 | 2012-08-15 | 上村工業株式会社 | 置換錫合金めっき皮膜の形成方法、置換錫合金めっき浴及びめっき性能の維持方法 |
US9175400B2 (en) * | 2009-10-28 | 2015-11-03 | Enthone Inc. | Immersion tin silver plating in electronics manufacture |
DE102010031181A1 (de) * | 2010-07-09 | 2012-01-12 | Atotech Deutschland Gmbh | Verfahren und Anordnung zum Abscheiden einer Metallschicht |
JP5830242B2 (ja) * | 2010-12-28 | 2015-12-09 | ローム・アンド・ハース電子材料株式会社 | めっき液中から不純物を除去する方法 |
JP5715411B2 (ja) * | 2010-12-28 | 2015-05-07 | ローム・アンド・ハース電子材料株式会社 | めっき液中から不純物を除去する方法 |
JP5937320B2 (ja) * | 2011-09-14 | 2016-06-22 | ローム・アンド・ハース電子材料株式会社 | めっき液中から不純物を除去する方法 |
MA37931A1 (fr) * | 2012-08-13 | 2016-07-29 | Teni Boulikas | Procédés améliorés permettant de traiter un cancer avec une toxicité rénale réduite |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4749626A (en) | 1985-08-05 | 1988-06-07 | Olin Corporation | Whisker resistant tin coatings and baths and methods for making such coatings |
JPH0339488A (ja) | 1989-07-05 | 1991-02-20 | C Uyemura & Co Ltd | 無電解錫めっき方法 |
US5211831A (en) | 1991-11-27 | 1993-05-18 | Mcgean-Rohco, Inc. | Process for extending the life of a displacement plating bath |
JPH09302476A (ja) | 1996-05-10 | 1997-11-25 | Daiwa Kasei Kenkyusho:Kk | 無電解錫−銀合金めっき浴 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5160422A (en) * | 1989-05-29 | 1992-11-03 | Shimizu Co., Ltd. | Bath for immersion plating tin-lead alloys |
US5266103A (en) * | 1991-07-04 | 1993-11-30 | C. Uyemura & Co., Ltd. | Bath and method for the electroless plating of tin and tin-lead alloy |
US5217751A (en) * | 1991-11-27 | 1993-06-08 | Mcgean-Rohco, Inc. | Stabilized spray displacement plating process |
JP3274232B2 (ja) * | 1993-06-01 | 2002-04-15 | ディップソール株式会社 | 錫−ビスマス合金めっき浴及びそれを使用するめっき方法 |
US5391402A (en) * | 1993-12-03 | 1995-02-21 | Motorola | Immersion plating of tin-bismuth solder |
JP3660777B2 (ja) * | 1997-03-06 | 2005-06-15 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | 錫合金膜の形成方法およびその錫合金めっき浴 |
-
1999
- 1999-11-12 DE DE19954613A patent/DE19954613A1/de not_active Withdrawn
-
2000
- 2000-11-09 EP EP00978519A patent/EP1230034B1/de not_active Expired - Lifetime
- 2000-11-09 JP JP2001536299A patent/JP4084569B2/ja not_active Expired - Lifetime
- 2000-11-09 AU AU15975/01A patent/AU1597501A/en not_active Abandoned
- 2000-11-09 DE DE60044943T patent/DE60044943D1/de not_active Expired - Lifetime
- 2000-11-09 AT AT00978519T patent/ATE480340T1/de not_active IP Right Cessation
- 2000-11-09 CN CNB008154627A patent/CN1192125C/zh not_active Expired - Lifetime
- 2000-11-09 WO PCT/US2000/030983 patent/WO2001034310A1/en active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4749626A (en) | 1985-08-05 | 1988-06-07 | Olin Corporation | Whisker resistant tin coatings and baths and methods for making such coatings |
JPH0339488A (ja) | 1989-07-05 | 1991-02-20 | C Uyemura & Co Ltd | 無電解錫めっき方法 |
US5211831A (en) | 1991-11-27 | 1993-05-18 | Mcgean-Rohco, Inc. | Process for extending the life of a displacement plating bath |
JPH09302476A (ja) | 1996-05-10 | 1997-11-25 | Daiwa Kasei Kenkyusho:Kk | 無電解錫−銀合金めっき浴 |
Non-Patent Citations (1)
Title |
---|
DR. MANFRED JORDAN: "The Electrodeposition of Tin and its Alloys", March 1992, EUGEN G. LEUZEN PUBLISHERS, ISBN: 3-87480-118-7, article "Whiskers", XP003025396 |
Also Published As
Publication number | Publication date |
---|---|
WO2001034310A1 (en) | 2001-05-17 |
DE19954613A1 (de) | 2001-05-17 |
JP2003514120A (ja) | 2003-04-15 |
JP4084569B2 (ja) | 2008-04-30 |
CN1387465A (zh) | 2002-12-25 |
EP1230034B1 (de) | 2010-09-08 |
ATE480340T1 (de) | 2010-09-15 |
EP1230034A4 (de) | 2003-01-08 |
AU1597501A (en) | 2001-06-06 |
DE60044943D1 (de) | 2010-10-21 |
CN1192125C (zh) | 2005-03-09 |
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