EP1100092A2 - Vorrichtung zur Führung von Röntgenstrahlen - Google Patents
Vorrichtung zur Führung von Röntgenstrahlen Download PDFInfo
- Publication number
- EP1100092A2 EP1100092A2 EP00123501A EP00123501A EP1100092A2 EP 1100092 A2 EP1100092 A2 EP 1100092A2 EP 00123501 A EP00123501 A EP 00123501A EP 00123501 A EP00123501 A EP 00123501A EP 1100092 A2 EP1100092 A2 EP 1100092A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- reflection
- measurement object
- reflection surfaces
- coating
- reflection surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005259 measurement Methods 0.000 claims abstract description 33
- 230000005855 radiation Effects 0.000 claims abstract description 23
- 238000000576 coating method Methods 0.000 claims description 20
- 239000011248 coating agent Substances 0.000 claims description 19
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 9
- 229910052710 silicon Inorganic materials 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 239000010970 precious metal Substances 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 7
- 230000005540 biological transmission Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000013461 design Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 3
- 238000004876 x-ray fluorescence Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000001154 acute effect Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000004936 stimulating effect Effects 0.000 description 1
- 238000012800 visualization Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
Definitions
- the invention relates to a device for guiding X-rays from a Radiation source to a measurement object.
- the X-ray fluorescence method is used to measure thin layers or multiple layers used.
- the X-ray fluorescence radiation of the individual elements of a sample and verified in Layer thickness (es) and composition (s) is converted.
- the stimulating X-rays are blocked by a collimator system as fine Beams of rays to the measuring surface. From here the X-ray fluorescence radiation emitted. In a proportional counter tube or other detector the radiation is detected in an energy-dispersive manner.
- x-ray radiation guides which enable that the X-rays focus on these small functional areas becomes.
- monocapillaries These are so-called monocapillaries. These monocapillaries are cylindrical designed in the form of a glass tube. By total reflection on the Walls of the glass tube allow the X-rays to be sufficient Intensity to the object to be measured.
- the collimators designed as monocapillaries are moreover in this regard have been developed so that the inner walls of the glass tube are parabolic are formed so that a focusing of the reflected rays to the measurement object should be done.
- So-called polycapillaries are also known.
- it is a monolith that is a bundle of several monocapillaries has, which in turn are arranged such that the specifically guided X-rays emanate at a point outside the exit plane of the Focus on monoliths.
- the invention is therefore based on the object of a device for guiding the x-rays from a radiation source to a measurement object, in particular for small structure sizes with a functional area under 100 ⁇ m x 100 ⁇ m create, which are inexpensive to manufacture, on the measuring surface to be measured adjustable and a sufficient transmission of the radiation intensity to the measurement object enables.
- the inventive design of at least two forming a gap Reflective surfaces have the advantage that a simple arrangement is created which allows the x-rays to be of sufficient intensity be guided to the measurement object in order to enable the detector to achieve a sufficient level Can detect the intensity of the emitted fluorescence radiation.
- At least two reflection surfaces forming a gap are simple to manufacture. Elaborate manufacturing processes for manufacturing the device for X-ray guidance is compared to that of the prior art known mono- and / or polycapillaries are not given.
- the X-rays by total reflection within a gap to the measurement object formed by at least two reflection surfaces be performed.
- the X-ray radiation emerging laterally from the column or columns is ineffective for excitation of fluorescent radiation, however by total reflection of the X-rays between the at least two ones Gap-forming reflection surfaces will have an at least sufficient intensity the test object initiated or transferred.
- the adjustable in width by the gap formed by the at least two reflection surfaces is. This enables the size of the measuring surface to be on the measurement object is adjustable. Thus, the device can respond to different requirements Layer thickness measurement can be adjusted and adjusted.
- two mutually opposite and parallel reflection surfaces are provided.
- the gap width is at least close to that Size of the measuring surface of the test objects and advantageously on the outlet opening adapted to the X-ray tube so that the greatest possible radiation intensity can be transferred to the test object.
- two a gap lying opposite one another and tapering towards the measurement object having reflection surfaces are provided.
- This approximately wedge-shaped Arrangement of the reflection surfaces can additionally focus the X-rays be achieved.
- the opening width of the reflection surfaces between the entrance and the exit provided at the tapered end can in Micrometer range or larger.
- fixed at least one of the reflection surfaces and at least one further reflection surface is adjustable in distance and / or angle. This can make you dependent Depending on the application, both distance / and or angle are set with a reflection surface serving as a reference surface.
- the reflection surfaces made of a semiconductor material, in particular a silicon wafer are manufactured.
- the industrial production of silicon wafers is now in the meantime inexpensive.
- the silicon wafers also have very flat design on a surface that is suitable for the total reflection of the X-rays are suitable.
- the critical angle of total reflection is at a few mrad depending on the energy of the X-rays.
- the reflection surfaces at least partially with a precious metal preferably copper, silver, gold, platinum, or palladium the like is steamed.
- a precious metal preferably copper, silver, gold, platinum, or palladium the like is steamed.
- the critical angle can be, for example, with a platinum coating be increased to 4.5 mrad, making the critical angle for total reflection can be increased. This in turn leads to the effect that a higher one The intensity of the X-rays on the measurement object is present, which makes it sufficient high intensity for emitting fluorescent beams can be given.
- the coating at least partially on the beam exit of the X-ray tube facing end is provided. This allows a variety of X-rays are reflected by total reflection in the entrance area, causing a high intensity can be achieved.
- the reflective surfaces near the measurement object have an area which is a Has coating which prevents total reflection or at least partially coated reflection surfaces has an area without coating or in which a coating preventing total reflection is provided. This can allow the total reflection of rays to be eliminated which is after a last reflection before exiting the reflection surfaces would be outside the measuring range. With this arrangement, a even more precise irradiation of the measuring surface can be achieved on a measuring object, which in turn increases the quality of the measurement.
- At least a reflection surface can be set by at least one adjustment unit.
- This Adjustment unit can advantageously as a fine mechanical adjustment electrical, hydraulic, pneumatic or piezoelectric actuator his.
- This setting unit must have settings at least in the micrometer range allow for an exact alignment and adjustment of the least there are two mutually arranged reflection surfaces.
- FIG 1 the essential components of a layer thickness measuring device are shown schematically 11, with the representation of an evaluation unit, one Screen for the visualization of a picture taken by a video camera DUT and input keyboard and printer was dispensed with.
- This Layer thickness measuring device 11 is used, for example, for measuring bond pads, contacts, which are partially provided with selective coating, conductor tracks and functional coatings used on small areas.
- Layer thicknesses determined or checked their measuring surface or the functional surfaces are smaller than 100 ⁇ m x 100 ⁇ m, in particular smaller than 50 ⁇ m x 50 ⁇ m.
- an X-ray radiation is generated, which via an anode 14 is directed to a measurement object 16.
- the X-rays are used in one Layer of the measurement object 16 excited fluorescence radiation.
- the intensity this fluorescence radiation as a function of energy (spectrum) is one Function of the layer thickness. This or the parameter of the layer system is used, in which with the aid of a detector 17 the system of emitted radiation is registered.
- Device 12 is provided, which according to the embodiment of two mutually opposite reflection surfaces 18. These reflective surfaces 18 are used for beam bundling and beam transmission, so that the X-ray radiation reaches the measuring surface of the measuring object 16.
- the reflective surfaces 18 are preferably directly to the anode 14 or to an outlet flange 21 arranged near the anode 14.
- a collimator 23 is also provided, whereby a measuring area 24 according to FIG. 3 is imaged on a measurement object can.
- the collimator 23 is advantageously a slit collimator, the Gap width is adjustable.
- the reflection surfaces 18 are designed as elongated, rectangular surfaces, as can be seen from Figure 1 and Figure 2.
- the length of the reflection surfaces 18 is essentially determined by the structure and by the degree of total reflection. X-rays that are not parallel between an axis of the measuring range 24 and the anode 14 are at least once by a total reflection distracted.
- the width of the reflection surfaces 18 is at least one and a half times as large as the maximum functional area to be tested.
- Advantageously 18 silicon wafers used for the reflection surfaces.
- This inexpensive Base material can be the appropriate size of the device according to the invention 12 can be easily adjusted.
- the reflection surfaces 18 made from a silicon wafer are advantageously applied to holding elements 26, 27 according to FIG. 3.
- these are glued tension-free so that the flatness of the reflective surface 18 can be maintained.
- the reflective surfaces 18 also tension-free on the holding elements 26, 27 by clamping or the like can be fixed.
- Figure 3 engages one of the two holding elements 27 to an adjusting unit 28 through which a holding element 27 closes the fixed element 26 is adjustable.
- the holding element 26 advantageously takes the reflection surface 18 parallel to the central axis 29 of the device 12 on.
- the gap width can be set by the setting unit 28.
- the angularity of the holding element 27 to the element 26 is adjustable is.
- a mirror-image arrangement can also be provided.
- an adjusting unit 28 is provided on each of the holding elements 26, 27 , whereby the holding elements 26, 27 either be arranged parallel to one another and / or at an angle to one another can, so that a uniform or tapering gap to the measurement object 16th is formed.
- the setting unit 28 is designed such that gap widths, for example can be set in a range from 10 to 100 ⁇ m can. Fine mechanical adjustment mechanisms, piezoelectric Actuators, as well as electric, hydraulic, pneumatic actuators be provided.
- the reflection surface 18 can be vapor-coated with a noble metal, for example. This allows the critical angle for total reflection, that for silicon at 1.5 mrad is increased to 4.5 mrad by a platinum coating. This in turn has an advantageous effect on the transmission of the X-rays.
- the base material can consist of a quartz surface or a plastic material which fulfills the requirement for flatness and has a coating.
- the coating can advantageously be provided at least at the entrance of the reflection surfaces 18, so that the number of captured and reflected rays is as large as possible.
- the coating can be continued completely over the course along the reflection surfaces 18 or can also be provided only partially.
- the coating or the material of the coating can also change depending on the application.
- the divergence at the exit of the reflection surfaces 18 can be reduced, as a result of which the radiation can be focused and thereby an increase in intensity on the measurement area 24 of the measurement object 16.
- a coating is not provided in a region near the lower end 22 of the reflection surface 18 or that a coating preventing total reflection is provided, as a result of which the radiation emerging below the reflection surface 18 precisely matches the size of the measuring region 24 from the measurement object 16 is focused. The irradiation of edge areas outside of the measuring area 24 can thereby be considerably reduced.
- the collimator 23 can also be adapted to this measuring range, so that by focusing the Radiation enables an increase in intensity to a predetermined measuring range is.
- the reflection surfaces 18 at least slightly are concave.
- the concave formation can become lower Taper end 22 out, so that a kind of mouthpiece-shaped design of the reflection surfaces 18 is given.
- the dimensions must be taken into account which can also be in the micrometer range.
- the opening width of the reflection surfaces 18 at the entrance to the device 12 corresponds essentially the outlet opening of those emitted via the anode X-rays.
- a slightly larger or smaller opening width can also be used given the diameter of the primary spot of the X-rays his.
- the device 12 can furthermore have openings and receptacles, which serve to arrange an optics to the measurement object 16 by a Visualize video camera.
- the device 12 is according to the embodiment by two to each other arranged reflection surfaces 18 which are parallel or at an acute angle to each other are arranged, provided. It can also be provided that instead of these two reflecting surfaces 18, three or more reflecting surfaces are suitably arranged to each other to control the transmission of X-rays to the measuring area 24 of a measurement object 16, so that enables an increase in intensity by focusing the X-rays is.
- these two reflecting surfaces 18, three or more reflecting surfaces are suitably arranged to each other to control the transmission of X-rays to the measuring area 24 of a measurement object 16, so that enables an increase in intensity by focusing the X-rays is.
- it is not necessary that a closed, tubular arrangement is used to hold the x-rays to focus to the measuring range by total reflection. More geometrical Embodiments of the reflection surfaces 18 are also conceivable, which the Allow total reflection of the X-rays.
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Radiation-Therapy Devices (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- X-Ray Techniques (AREA)
Abstract
Description
- Figur 1
- eine schematische Ansicht eines Schichtdickenmeßgerätes mit einer erfindungsgemäßen Vorrichtung,
- Figur 2
- eine schematische Seitenansicht des in Figur 1 dargestellten Schichtdickenmeßgerätes,
- Figur3
- eine schematische Detaildarstellung der erfindungsgemäßen Vorrichtung und
- Figur 4
- eine schematisch vergrößerte Darstellung eines zum Meßobjekt weisenden Ende der erfindungsgemäßen Vorrichtung.
mrad liegt, durch eine Platinbeschichtung auf 4,5 mrad erhöht werden. Dies schlägt sich wiederum vorteilhafterweise auf die Transmission der Röntgenstrahlung nieder. Alternativ ist denkbar, daß bei dem Einsatz von beschichteten Reflexionsflächen der Grundwerkstoff aus einer Quarzoberfläche oder einem Kunststoffmaterial bestehen kann, welches die Anforderung an die Ebenheit erfüllt und eine Beschichtung aufweist. Vorteilhafterweise kann die Beschichtung zumindest am Eingang der Reflexionsflächen 18 vorgesehen sein, so daß die Anzahl der eingefangenen und reflektierten Strahlen möglichst groß ist. Über den Verlauf entlang der Reflexionsflächen 18 kann die Beschichtung vollständig fortgeführt werden oder auch nur teilweise vorgesehen sein. Ebenso kann sich die Beschichtung bzw. das Material der Beschichtung in Abhängigkeit der Anwendungsfälle auch ändern. Beispielsweise kann durch Verkleinerung des Grenzwinkels für die Totalreflexion die Divergenz am Ausgang der Reflexionsflächen 18 verkleinert werden, wodurch eine Fokussierung der Strahlung und dadurch eine Intensitätserhöhung auf dem Meßbereich 24 des Meßobjektes 16 erzielt werden kann. Dazu ist beispielsweise denkbar, daß in einem Bereich nahe dem unteren Ende 22 der Reflexionsfläche 18 eine Beschichtung nicht vorgesehen ist oder eine die Totalreflexion verhindernde Beschichtung vorgesehen ist, wodurch die unterhalb der Reflexionsfläche 18 austretende Strahlung gerade auf die Größe des Meßbereiches 24 von dem Meßobjekt 16 fokusiert ist. Die Bestrahlung von Randbereichen außerhalb des Meßbereiches 24 kann dadurch erheblich verringert werden.
Claims (15)
- Vorrichtung zur Führung von Röntgenstrahlen von einer Strahlenquelle zu einem Meßobjekt (16), dadurch gekennzeichnet, daß zumindest zwei einen Spalt bildenden Reflexionsflächen (18) vorgesehen sind.
- Vorrichtung nach Anspruch 1, dadurch gekennzeichnet, daß der durch die zumindest zwei Reflexionsflächen (18) gebildete Spalt in der Breite einstellbar ist.
- Vorrichtung nach einem der Ansprüche 1 oder 2, dadurch gekennzeichnet, daß zwei einander gegenüberliegende und parallel zueinander angeordnete Reflexionsflächen (18) vorgesehen sind.
- Vorrichtung nach einem der Ansprüche 1 oder 2, dadurch gekennzeichnet, daß zwei einander gegenüberliegende und einen zum Meßobjekt (16) sich verjüngenden Spalt aufweisende Reflexionsflächen (18) vorgesehen sind.
- Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß zumindest eine Reflexionsfläche (18) fixiert und zumindest eine weitere Reflexionsfläche (18) im Abstand und/oder Winkel einstellbar ist.
- Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß zumindest eine, vorzugsweise die Reflexionsfläche (18) im wesentlichen unmittelbar an dem Strahlaustritt der Strahlaustrittseinrichtung angeordnet sind.
- Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß zumindest eine Reflexionsfläche (18) eben ausgebildet ist.
- Vorrichtung nach einem der Ansprüche 1 bis 6, dadurch gekennzeichnet, daß zumindest eine Reflexionsfläche (18) im Querschnitt gesehen konkav gekrümmt ausgebildet ist.
- Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß die Reflexionsflächen (18) aus einem Halbleitermaterial, insbesondere aus einem Siliziumwafer, hergestellt ist.
- Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß zumindest eine Reflexionsfläche (18) zumindest teilweise mit einem Edelmetall, vorzugsweise Gold, Platin, Kupfer, Silber, Palladium, beschichtet ist.
- Vorrichtung nach Anspruch 10, dadurch gekennzeichnet, daß die zumindest teilweise Beschichtung an einem am Strahlaustritt der Röntgenröhre zugewandten Ende vorgesehen ist.
- Vorrichtung nach einem der Ansprüche 10 oder 11, dadurch gekennzeichnet, daß die zumindest eine teilweise beschichtete Reflexionsfläche (18) nahe dem Meßobjekt (16) einen Bereich aufweist, der ohne Beschichtung vorgesehen ist oder eine die Totalreflexion unterbindende Beschichtung aufweist.
- Vorrichtung nach einem der Ansprüche 1 bis 11, dadurch gekennzeichnet, daß die nicht beschichtete Reflexionsfläche (18) nahe dem Meßobjekt (16) einen Bereich mit einer die Totalreflexion unterbindenden Beschichtung aufweist.
- Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß zumindest eine der Reflexionsflächen (18) an einer die Öffnungsweite des Spaltes einstellbaren Einstelleinheit (28) vorgesehen ist.
- Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß an einem zum Meßobjekt (16) weisenden Ende ein den Reflexionsflächen (18) zugeordneter Kollimator (23) vorgesehen ist, dessen Spaltbreite vorzugsweise einstellbar ist.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19954520 | 1999-11-12 | ||
DE19954520A DE19954520A1 (de) | 1999-11-12 | 1999-11-12 | Vorrichtung zur Führung von Röntgenstrahlen |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1100092A2 true EP1100092A2 (de) | 2001-05-16 |
EP1100092A3 EP1100092A3 (de) | 2003-03-26 |
EP1100092B1 EP1100092B1 (de) | 2006-07-19 |
Family
ID=7928847
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP00123501A Expired - Lifetime EP1100092B1 (de) | 1999-11-12 | 2000-10-27 | Vorrichtung zur Führung von Röntgenstrahlen |
Country Status (7)
Country | Link |
---|---|
US (1) | US6438209B1 (de) |
EP (1) | EP1100092B1 (de) |
JP (1) | JP2001201599A (de) |
CN (1) | CN1202416C (de) |
AT (1) | ATE333702T1 (de) |
DE (2) | DE19954520A1 (de) |
HK (1) | HK1035400A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1193492B1 (de) * | 2000-09-27 | 2007-08-08 | Euratom | Mikrostrahl-Kollimator für Hochauflösungs-Röntgenstrahl-Beugungsanalyse mittels konventionellen Diffraktometern |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007304063A (ja) * | 2006-05-15 | 2007-11-22 | Shimadzu Corp | ソーラスリット |
EP2572368A2 (de) * | 2010-05-19 | 2013-03-27 | Eric H. Silver | Optische hybrid-röntgen-vorrichtungen und verfahren dafür |
EP3115809B1 (de) * | 2015-07-06 | 2021-04-28 | Exruptive A/S | Verfahren zur sicherheitsabtastung von handgepäckstücken und sicherheitsabtastsystem von handgepäckstücken |
WO2017009302A1 (en) * | 2015-07-14 | 2017-01-19 | Koninklijke Philips N.V. | Imaging with enhanced x-ray radiation |
DE102022105838B3 (de) | 2022-03-14 | 2023-08-17 | Helmut Fischer GmbH Institut für Elektronik und Messtechnik | Justiereinheit für eine Röntgenoptik in einem Röntgenfluoreszenzgerät sowie Röntgenfluoreszenzgerät |
Family Cites Families (13)
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EP0322408B1 (de) * | 1986-08-15 | 1993-05-05 | Commonwealth Scientific And Industrial Research Organisation | Instrumente zur konditionierung von röntgen- oder neutronenstrahlen |
US4958363A (en) * | 1986-08-15 | 1990-09-18 | Nelson Robert S | Apparatus for narrow bandwidth and multiple energy x-ray imaging |
EP0403561B1 (de) * | 1988-03-11 | 1995-04-19 | Btg International Limited | Optische vorrichtungen und methoden für ihre herstellung |
US5001737A (en) * | 1988-10-24 | 1991-03-19 | Aaron Lewis | Focusing and guiding X-rays with tapered capillaries |
JPH02271300A (ja) * | 1989-04-12 | 1990-11-06 | Toshiba Corp | X線集光器 |
JP2522584B2 (ja) * | 1990-05-07 | 1996-08-07 | 東芝セラミックス株式会社 | シンクロトロン放射光用反射ミラ― |
US5101422A (en) * | 1990-10-31 | 1992-03-31 | Cornell Research Foundation, Inc. | Mounting for X-ray capillary |
JPH0727946B2 (ja) * | 1993-03-25 | 1995-03-29 | 東和科学株式会社 | 表面異物分析用ウエハ及びウエハ表面の金属不純物の評価方法 |
JP2731501B2 (ja) * | 1993-04-07 | 1998-03-25 | 理学電機工業株式会社 | X線用集光素子 |
WO1996002058A1 (fr) * | 1994-07-08 | 1996-01-25 | Muradin Abubekirovich Kumakhov | Procede de guidage de faisceaux de particules neutres et chargees et son dispositif de mise en ×uvre |
WO1997025722A2 (de) * | 1996-01-10 | 1997-07-17 | Bastian Niemann | Kondensor-monochromator-anordnung für röntgenstrahlung |
JPH10221500A (ja) * | 1997-02-03 | 1998-08-21 | Olympus Optical Co Ltd | 軟x線検査装置 |
JP3771697B2 (ja) * | 1997-11-01 | 2006-04-26 | 株式会社堀場製作所 | 螢光x線分析装置 |
-
1999
- 1999-11-12 DE DE19954520A patent/DE19954520A1/de not_active Withdrawn
-
2000
- 2000-10-27 EP EP00123501A patent/EP1100092B1/de not_active Expired - Lifetime
- 2000-10-27 DE DE50013184T patent/DE50013184D1/de not_active Expired - Lifetime
- 2000-10-27 AT AT00123501T patent/ATE333702T1/de not_active IP Right Cessation
- 2000-11-06 US US09/707,394 patent/US6438209B1/en not_active Expired - Lifetime
- 2000-11-10 CN CN00133902.8A patent/CN1202416C/zh not_active Expired - Fee Related
- 2000-11-13 JP JP2000344828A patent/JP2001201599A/ja active Pending
-
2001
- 2001-08-16 HK HK01105756A patent/HK1035400A1/xx not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1193492B1 (de) * | 2000-09-27 | 2007-08-08 | Euratom | Mikrostrahl-Kollimator für Hochauflösungs-Röntgenstrahl-Beugungsanalyse mittels konventionellen Diffraktometern |
US7397900B2 (en) | 2000-09-27 | 2008-07-08 | Euratom | Micro beam collimator for high resolution XRD investigations with conventional diffractometers |
Also Published As
Publication number | Publication date |
---|---|
CN1296178A (zh) | 2001-05-23 |
EP1100092B1 (de) | 2006-07-19 |
JP2001201599A (ja) | 2001-07-27 |
DE50013184D1 (de) | 2006-08-31 |
EP1100092A3 (de) | 2003-03-26 |
HK1035400A1 (en) | 2001-11-23 |
DE19954520A1 (de) | 2001-05-17 |
CN1202416C (zh) | 2005-05-18 |
ATE333702T1 (de) | 2006-08-15 |
US6438209B1 (en) | 2002-08-20 |
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