Classifications

• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
  • F23J—REMOVAL OR TREATMENT OF COMBUSTION PRODUCTS OR COMBUSTION RESIDUES; FLUES 
  • F23J15/00—Arrangements of devices for treating smoke or fumes
  • F23J15/02—Arrangements of devices for treating smoke or fumes of purifiers, e.g. for removing noxious material
  • F23J15/04—Arrangements of devices for treating smoke or fumes of purifiers, e.g. for removing noxious material using washing fluids
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01D—SEPARATION
  • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
  • B01D53/34—Chemical or biological purification of waste gases
  • B01D53/346—Controlling the process
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • B01D—SEPARATION
  • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
  • B01D53/34—Chemical or biological purification of waste gases
  • B01D53/46—Removing components of defined structure
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
  • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
  • F23G7/00—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals
  • F23G7/06—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases
  • F23G7/061—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating
  • F23G7/065—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating using gaseous or liquid fuel
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
  • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
  • F23G2209/00—Specific waste
  • F23G2209/14—Gaseous waste or fumes
  • F23G2209/142—Halogen gases, e.g. silane
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
  • F23J—REMOVAL OR TREATMENT OF COMBUSTION PRODUCTS OR COMBUSTION RESIDUES; FLUES 
  • F23J2215/00—Preventing emissions
  • F23J2215/30—Halogen; Compounds thereof
• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
  • F23J—REMOVAL OR TREATMENT OF COMBUSTION PRODUCTS OR COMBUSTION RESIDUES; FLUES 
  • F23J2219/00—Treatment devices
  • F23J2219/40—Sorption with wet devices, e.g. scrubbers

Definitions

• the invention relates to a method for cleaning process exhaust gases by introducing them into an exhaust gas purification system with a reaction chamber and aftertreatment of the reaction products leaving the reaction chamber in a washing or. Sorption chamber with associated detergent circuit.
• a method has become known in which the process exhaust gases are burned / oxidized or thermally decomposed in a reaction chamber. This is done here with the aid of a flame fed by a fuel gas and oxygen and after which the exhaust gases leaving the reaction chamber are washed or washed. Sorption chamber are passed, in which the solid and / or soluble constituents are washed out of the exhaust gas with a sorbent.
• a sorbent for example, hydrogen or natural gas can be considered as fuel gases.
• the exhaust gases which have now been cleaned of harmful or toxic components, are subsequently discharged into the atmosphere via an air-conditioning system.
• process exhaust gases in particular exhaust gases from CVD and / or etching processes and also chamber cleaning processes are cleaned in such a way that pollution of the environment with harmful or possibly toxic substances is avoided.
• process exhaust gases from plants for the chemical processing of semiconductor substrates for the production of microelectronic components by means of CVD low-pressure processes (LP-CVD) can be cleaned with such a method or converted into harmless substances.
• Such an exhaust gas purification method can be seen, for example, from EP 0 347 753 B1, according to which the process exhaust gases are burned in a reaction chamber with an excess of oxygen and are fed to a ventilation system via a washing or sorption chamber.
• the structure of an exhaust gas purification device with which the process exhaust gases can be cleaned by the method mentioned at the outset is described, for example, in DE 195 01 914 C1.
• This device consists of a combustion chamber inside an outer tube, in which a burner with a downward burner flame is arranged, and a sorption chamber above the combustion chamber. The exhaust gases leaving the combustion chamber are directed upwards into the sorption chamber within the outer tube and are discharged into the atmosphere through a filter and via an air-conditioning system.
• the sorbent e.g. Water
• the sorbent can, for example, also be sprayed conically against the flow direction of the exhaust gas.
• the solid reaction products are rinsed down along the inner wall of the outer tube and passed into a treatment plant for the sorbent.
• the process exhaust gases coming from a low-pressure CVD system can contain, for example, SiH 4 , PH 3 , N 2 0 in different oxidation levels and concentrations and also oil vapors and dusts (Si0 2 ). These process gases are in the flame of an oxyhydrogen burner with the said excess of oxygen operated, burned.
• an oxyhydrogen burner which is preferably operated with a hydrogen / oxygen mixture as an internal mixing burner, a burner operated with natural gas or liquid gas can of course also be used.
• the method according to the invention is preferably provided for those methods for exhaust gas purification in which the process exhaust gases are thermally treated in some way.
• the process can of course also be used in connection with other processes for exhaust gas purification.
• the process parameters are usually determined on the basis of empirical values or on the basis of a stoichiometric calculation. Since it is essential to guarantee that all pollutants are removed from the process exhaust gas, it is necessary to determine the process parameters, e.g. to measure the excess of oxygen and the amount of fuel gas supplied, or other process parameters, very abundantly.
• the invention is therefore based on the object of providing a method for purifying process exhaust gases with which the disadvantages of the prior art are effectively eliminated.
• the problem underlying the invention is achieved in a method of the type mentioned in that a continuous measurement of the type and the amount of pollutants in the process exhaust gas is carried out immediately before the process exhaust gases and at the same time the type and amount of pollutants of the exhaust gas purification system leaving reaction products is continuously determined directly at the outlet of the exhaust gas purification system and that the measurement signals are used directly for setting the operating parameters of the exhaust gas purification system.
• the quantities of pollutants are preferably determined using a first and a second detector on the basis of selected pollutants, for example at least one of the perfluorocarbons C 2 F 6 , CF 4 , C 4 F 8 and O 2 on the first and on the second detector and on the second detector HF is also detected.
• a further development of the invention is characterized in that when at least one of the pollutants is detected by the first detector, the operating parameters of the exhaust gas cleaning system are preset using values in relation to the amount of fuel gas, oxygen content (generally oxygen excess), amount of detergent in the detergent circuit and pH of the detergent is carried out.
• the operating parameters are preset by a self-learning system based on comparatively determined exhaust gas species and concentrations of the pollutants. This has the particular advantage that the efficiency of the exhaust gas cleaning system and the basic settings are constantly optimized, which shortens the running-in phase of the exhaust gas cleaning system.
• the operating parameters of the exhaust gas cleaning system are set as a function of the measured values of the second detector so that the concentration of the pollutants at the outlet of the exhaust gas cleaning system is regulated to a minimum.
• the operating parameters are set so that the concentration of the pollutants drops closer to the measurement threshold.
• Another embodiment of the invention is characterized in that the measurement signals are obtained non-invasively and without contact. This has the particular advantage that the sometimes particularly aggressive components of the process exhaust gases to be cleaned cannot influence the measurement result or the measuring device.
• the measurement signals are preferably obtained by optical spectroscopy.
• the type and amount of the pollutants are calculated simultaneously with an on-site computer on the basis of the measurement results of the first and the second detector and the operating parameters of the exhaust gas cleaning system are continuously regulated as a function of the input and output quantities of pollutants, the operating parameters being regulated taking into account the amount of process exhaust gas supplied.
• the method according to the invention has the particular advantage that the fuel gas consumption is minimized and that long-term stability of the residual emissions can be guaranteed, so that the otherwise usual control measurements can be omitted.
• the maintenance intervals can also be extended because deposits cannot be avoided, e.g. in the burner, any changes in the operating parameters can be automatically compensated.
• the method ensures a large dynamic range of the measurable concentrations, so that only a single measuring device is sufficient for the entire range.
• the measuring method is also suitable for system batteries.
• the introduction of pollutants into the exhaust gas cleaning device can be logged continuously, so that a control of the upstream semiconductor process is also made possible.
• Another particular advantage of the method according to the invention is that it can be used independently of the cleaning method used in the exhaust gas cleaning system.
• the method according to the invention is therefore not tied to a specific type of exhaust gas purification, but is also suitable for non-thermal methods.
• the only difference is that different operating parameters of the exhaust gas cleaning system are to be regulated.
• the invention will be explained in more detail using an exemplary embodiment and an associated drawing figure.
• the process exhaust gases are to be disposed of from a chamber cleaning process of a semiconductor CVD system.
• C 2 F 6 and 0 2 are used for this chamber cleaning process.
• the process exhaust gas from this chamber cleaning process contains reaction products, such as, in addition to the starting substances and pure nitrogen of the vacuum pump.
• B. CF 4 and C 4 F 8 are reaction products, such as, in addition to the starting substances and pure nitrogen of the vacuum pump.
• This process exhaust gas is passed to the exhaust gas purification system 1, which has a first detector 2 at the input 5, which analyzes the type and quantity of the process exhaust gas.
• Gas phase FT-IR spectroscopy is used as the measurement method. Particular attention must be paid to the choice of materials for the IR measurement section with integrated nitrogen flushing, since the exhaust gas components e.g. T. are very aggressive.
• a second detector 3 is arranged, the mode of operation of which is comparatively similar to that of the first detector 2.
• the exhaust gas cleaning system 1 is preset via a connected computer 4 based on the gas types and their concentrations in terms of the amount of fuel gas, oxygen content (ia oxygen excess), amount of detergent Detergent cycle and pH of the detergent.
• the perfluorocarbons C 2 F 6 , CF 4 and
• C 4 F 8 also detects HF
• HF is generated when the perfluorocarbons are converted into the flame. If the second detector 3 now measures a higher concentration than 1 ppm HF at the clean gas outlet 6, the pH value of the detergent and / or the amount of detergent circulation is increased, otherwise lower values can be used. The same procedure is followed with the perfluorocarbons, ie if the concentration at the pure gas outlet 6 is too high, the amount of fuel gas and or the amount of oxygen (depending on the species) is increased or otherwise decreased. With this method, the media consumption of the exhaust gas cleaning system 1 is constantly optimized, the operating costs are kept low and the exhaust gas is cleaned optimally.
• the software used is self-learning, the determined optimal operating conditions are used as the basis for the presetting of the exhaust gas purification system 1 for comparative exhaust gas species and concentrations. As a result, the basic settings are also continuously optimized and the running-in phase of the exhaust gas cleaning system 1 is shortened.
• C 2 F 6 can be expected as the reaction gas used with the highest concentration, CF 4 is the most chemically resistant perfluorocarbon, C 4 F 8 can be highly toxic
• HF is formed in large quantities when the perfluorocarbons are reacted in the flame.

Landscapes

• Engineering & Computer Science (AREA)
• Chemical & Material Sciences (AREA)
• Environmental & Geological Engineering (AREA)
• Oil, Petroleum & Natural Gas (AREA)
• Health & Medical Sciences (AREA)
• Biomedical Technology (AREA)
• Analytical Chemistry (AREA)
• General Chemical & Material Sciences (AREA)
• Chemical Kinetics & Catalysis (AREA)
• General Engineering & Computer Science (AREA)
• Mechanical Engineering (AREA)
• Treating Waste Gases (AREA)
• Chimneys And Flues (AREA)
• Incineration Of Waste (AREA)

Applications Claiming Priority (3)

Publications (1)

Family

ID=7869444

Family Applications (1)

Country Status (7)

Families Citing this family (15)

Family Cites Families (18)

• 1999
  • 1999-05-31 WO PCT/DE1999/001581 patent/WO1999062621A1/de not_active Ceased
  • 1999-05-31 EP EP99936351A patent/EP1083978A1/de not_active Withdrawn
  • 1999-05-31 CN CNB998065374A patent/CN1141167C/zh not_active Expired - Fee Related
  • 1999-05-31 JP JP2000551870A patent/JP4776073B2/ja not_active Expired - Fee Related
  • 1999-05-31 KR KR1020007013463A patent/KR100581446B1/ko not_active Expired - Fee Related
  • 1999-05-31 AU AU51505/99A patent/AU5150599A/en not_active Abandoned
• 2000
  • 2000-11-29 US US09/725,428 patent/US7014824B2/en not_active Expired - Fee Related

Non-Patent Citations (1)

Also Published As

Similar Documents

Legal Events