EP1081748A2 - Ätzstops und Ausrichtungsmarkierungen für gebondete Scheiben - Google Patents

Ätzstops und Ausrichtungsmarkierungen für gebondete Scheiben Download PDF

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Publication number
EP1081748A2
EP1081748A2 EP00307164A EP00307164A EP1081748A2 EP 1081748 A2 EP1081748 A2 EP 1081748A2 EP 00307164 A EP00307164 A EP 00307164A EP 00307164 A EP00307164 A EP 00307164A EP 1081748 A2 EP1081748 A2 EP 1081748A2
Authority
EP
European Patent Office
Prior art keywords
wafer
major surface
trenches
recited
bonded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP00307164A
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English (en)
French (fr)
Inventor
John Charles Desko
Muhammed Ayman Shibib
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nokia of America Corp
Original Assignee
Lucent Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lucent Technologies Inc filed Critical Lucent Technologies Inc
Publication of EP1081748A2 publication Critical patent/EP1081748A2/de
Withdrawn legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • H01L21/2003—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy characterised by the substrate
    • H01L21/2007—Bonding of semiconductor wafers to insulating substrates or to semiconducting substrates using an intermediate insulating layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
    • H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54426—Marks applied to semiconductor devices or parts for alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Definitions

  • This invention relates generally to bonded wafers, and more particularly to a method of manufacturing a bonded wafer, the bonded wafer made by the method, and integrated circuits manufactured from chips on such wafers.
  • Bonded wafers are fabricated with a single crystal substrate wafer bonded to a single crystal silicon device wafer.
  • the substrate wafer provides structural strength to the bonded wafer and is relatively thicker, while the device wafer in which devices are subsequently formed is relatively thinner.
  • a surface of each of the substrate wafer and the device wafer are polished to be planar. The polished surfaces are placed in contact with each other and the wafers are subjected to a high temperature heat treatment which bonds the wafers together.
  • Bonded wafers in which buried layers are required for device fabrication are made by bonding a device wafer to a substrate wafer as described above. Subsequent to being bonded, the device wafer is thinned by removing material from a major exposed surface until the device wafer is thinned to a predetermined thickness, such as 1 to 2 . Buried or diffused layers, of N-type or P-type, or both, are implanted into the device wafer portion of the bonded wafer. An epitaxial layer of N or P type material is grown to the desired thickness over the device wafer portion of the bonded wafer.
  • any known technique including but not limited to plasma etching, ion etching, grinding or polishing, may be used to ablate a surface of the device wafer.
  • plasma etching, ion etching, grinding or polishing may be used to ablate a surface of the device wafer.
  • What is needed is a technique to precisely control the thickness of the device wafer portion of the bonded wafer when the device wafer is thinned. It is also desirable to have an accurate alignment feature to align subsequent device diffusions with buried layers in the device wafer.
  • a method of making a bonded wafer by diffusing regions of a first wafer, first major surface. Trenches are etched a predetermined distance into the first wafer from the first major surface toward a second major surface. The first major surface and trenches are coated with oxide. The first major surface of the first wafer is bonded to a second wafer to form a bonded wafer. The second major surface of the bonded wafer which is also the second major surface of the first wafer is ablated until oxide in the trenches is detected. The bonded wafer is cut into chips which are packaged as integrated circuits.
  • a cross-section of a device wafer 20 is shown prior to wafer bonding in Figure 1.
  • Device wafer is a cylinder having two major circular surfaces.
  • Device wafer 20 is typically polished on one major surface to form a planar first major surface 22.
  • diffused regions 24 are created in selected regions of device wafer 20 such as by implanting an impurity and diffusing the impurity. Diffused regions 24 may be positive diffused regions 26 or negative diffused regions 28.
  • Trenches 30 are etched in device wafer 20 from first major surface 22 and extend toward second major surface 32. Second major surface 32 is substantially parallel to first major surface 22.
  • Trenches 30 are etched in device wafer 20 from first major surface 22 to a predetermined depth, such as d, which is less than the thickness, t, of device wafer 20. Trenches 30 are etched using a well-known, well-controlled process, such as but not limited to active ion etching or plasma etching.
  • an oxide layer 34 is deposited on or grown on first major surface 22, forming an alternative first major surface 36.
  • Trenches 30 will be partially or completely filled with oxide by this process step.
  • Figure 3 illustrates partial filling of a typical trench 30 in which the inner surface of sidewalls 42 and 44 as well as end 46 are coated with oxide but the trench is not completely filled.
  • an additional layer such as a polysilicon layer may be deposited over the layer of oxide.
  • Polysilicon layer 48 fills the remaining cavity in trench 30. Polysilicon layer 48 may be polished and oxidized to form a planar, bondable surface.
  • an alternative first major surface is produced and is substantially planar.
  • the alternative first major surface will be referenced by reference numeral 36, although it is understood that it may be either surface 36 or surface 48.
  • a cross section of trenches 30 have parallel sidewalls 42 and 44 and a flat end 46.
  • the cross-section of an ideal trench forms a rectangular shape.
  • sidewalls 42 and 44 tend to taper toward each other slightly from first major surface 22 extending toward second major surface 32 and end 46 of trench 30.
  • End 46 may be slightly rounded with a rounded intersection between each of sidewalls 42 and 44 and end 46, as shown in Figure 3.
  • Substrate wafer 50 having substantially planar major surface 52 is placed in contact with alternative first major surface 36, or alternative first major surface 48 when present.
  • Device wafer 20 and substrate wafer 50 are subjected to a high-temperature heat treatment, as is known in the art, to bond the wafers together forming bonded wafer 54 illustrated in Figure 4.
  • the diffused regions 24 and trenches 30 are internal to bonded wafer 54. Trenches 30 extend toward one of the outer major surfaces of bonded wafer 54, which is also the second major surface 32 of device wafer 20.
  • second major surface 32 is ablated by a known process. Any known ablating process may be used, including but not limited to, chemical mechanical polishing, polishing, grinding or etching.
  • the major surface 32 at any stage of the ablating process will be referred to as major surface 60.
  • the ablating process thins bonded wafer 54, and more specifically device wafer 20 to a predetermined thickness. Device wafer 20 is thinned by ablating major surface 60 until the
  • Ends 46 act as stops to the ablating process.
  • the ablating process is stopped when the end 46 of trenches 30 begin to be ablated. This may be detected such as by observing a characteristic such as but not limited to opacity of a grinding solution, or optically in accordance with U.S. Patent, 4,313,732, the disclosure of which is hereby incorporated by reference.
  • the remaining thickness of device wafer 20 between ablated major surface 60 and first major surface 22 is also known.
  • the remaining predetermined thickness by device wafer 20 is selected so that subsequent implants from major surface 60 provides proper depth placement of implanted regions relative to diffused regions 24.
  • the device wafer is thinned to a predetermined thickness, such as 1 to 2 micrometers, which is critical for device characteristics and performance.
  • trenches 30 are etched in device wafer 20 to a predetermined depth as shown in Figure 5.
  • trenches 30 may be etched to various predetermined depths into device wafer 20. More than one etching step may be required.
  • One or more trenches or sets of trenches may be etched to various depths such that when the ablating process is reducing the thickness of device wafer 20 by ablating major surface 60, the process may be stopped and evaluated for the remaining distance to be ablated based on the predetermined depth of the various trenches 30.
  • One or more trenches may be used to indicate the desired thickness has been reached, or has been passed.
  • ends 46 of trenches 64 denote the desired thicknesses of device wafer 20, such that the ablating process should be terminated when surface 60 is coincident with broken line 62.
  • Trenches 66 may not be as deep as trenches 64, as illustrated in Figure 6. Should the ablating process continue until ends 46 of trenches 66 are exposed, device wafer 20 has been thinned too much.
  • the trenches may be placed, for example, in areas of the wafer in which devices will not be formed.
  • the area density of the trenches may range from about 2% to about 15% of the area of a major surface of device wafer 20.
  • the area density of the trenches can be controlled by placement of trenches in saw-grid area and other otherwise unused areas of the wafer to match control conditions to stop the ablating process.
  • All trenches may have the same width between sidewalls 42 and 44, although the invention is not limited thereto. Trenches may vary in width. One advantage of trenches of uniform width is that the trenches would be filled with oxide more consistently than trenches of varying width.
  • a major surface 60 has been ablated using the thickness of device wafer 20 as its predetermined depth, sidewalls 42 and 44 may be detected by separate equipment used to align subsequent implantation over the diffused regions 24 more precisely than could be achieved in the past.
  • the subsequent device level making step can use the trenches as alignment marks to obtain improved alignment between the device level implants and the buried diffused regions 24. Alignment may rely for example on a sidewall 42 or 44. The more precise alignment assures that doping in a subsequent processing step is placed in the proximity of buried diffused regions 24 such that the buried diffused regions 24 can interact with doped regions created in the subsequent processing step.
  • bonded wafer 54 is cut into chips. Chips are wire bonded and packaged as integrated circuits as is known in the art.
  • the substrate wafer could be made of other materials known in the art including but not limited to polysilicon or silicon carbide.
  • the device wafer could be made of other semiconductor materials known in the art including but not limited to indium phosphide, gallium arsenide, indium gallium phosphide and silicon carbide.

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Element Separation (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
EP00307164A 1999-08-30 2000-08-21 Ätzstops und Ausrichtungsmarkierungen für gebondete Scheiben Withdrawn EP1081748A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US385735 1999-08-30
US09/385,735 US6372600B1 (en) 1999-08-30 1999-08-30 Etch stops and alignment marks for bonded wafers

Publications (1)

Publication Number Publication Date
EP1081748A2 true EP1081748A2 (de) 2001-03-07

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EP00307164A Withdrawn EP1081748A2 (de) 1999-08-30 2000-08-21 Ätzstops und Ausrichtungsmarkierungen für gebondete Scheiben

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Country Link
US (1) US6372600B1 (de)
EP (1) EP1081748A2 (de)
JP (1) JP2001111014A (de)
KR (1) KR20010021466A (de)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003036699A2 (en) * 2001-10-23 2003-05-01 Cambridge Semiconductor Limited Lateral semiconductor-on-insulator structure and corresponding manufacturing methods
EP1469355A1 (de) * 2002-12-20 2004-10-20 ASML Netherlands B.V. Verfahren zur Herstellung einer Vorrichtung
US6844244B2 (en) 2002-12-20 2005-01-18 Asml Netherlands B.V. Dual sided lithographic substrate imaging
FR2925223A1 (fr) * 2007-12-18 2009-06-19 Soitec Silicon On Insulator Procede d'assemblage avec marques enterrees
EP2161742A1 (de) * 2008-09-03 2010-03-10 S.O.I.TEC. Silicon on Insulator Technologies S.A. Verfahren zur Herstellung eines lokal passivierten Germanium-on-Insulator-Substrats
EP2375442A1 (de) * 2010-04-06 2011-10-12 S.O.I.Tec Silicon on Insulator Technologies Verfahren zur Herstellung eines Halbleitersubstrats
US8223582B2 (en) 2010-04-02 2012-07-17 Soitec Pseudo-inverter circuit on SeOI
US8305803B2 (en) 2010-01-14 2012-11-06 Soitec DRAM memory cell having a vertical bipolar injector
US8304833B2 (en) 2010-01-14 2012-11-06 Soitec Memory cell with a channel buried beneath a dielectric layer
US8325506B2 (en) 2010-01-14 2012-12-04 Soitec Devices and methods for comparing data in a content-addressable memory
US8358552B2 (en) 2010-03-11 2013-01-22 Soitec Nano-sense amplifier
US8384425B2 (en) 2009-12-08 2013-02-26 Soitec Arrays of transistors with back control gates buried beneath the insulating film of a semiconductor-on-insulator substrate
US8432216B2 (en) 2010-03-03 2013-04-30 Soitec Data-path cell on an SeOI substrate with a back control gate beneath the insulating layer
US8455938B2 (en) 2010-04-22 2013-06-04 Soitec Device comprising a field-effect transistor in a silicon-on-insulator
US8508289B2 (en) 2009-12-08 2013-08-13 Soitec Data-path cell on an SeOI substrate with a back control gate beneath the insulating layer
US8575697B2 (en) 2010-03-08 2013-11-05 Soitec SRAM-type memory cell
US8664712B2 (en) 2009-12-08 2014-03-04 Soitec Flash memory cell on SeOI having a second control gate buried under the insulating layer
WO2016149113A1 (en) * 2015-03-17 2016-09-22 Sunedison Semiconductor Limited Thermally stable charge trapping layer for use in manufacture of semiconductor-on-insulator structures
US9490264B2 (en) 2010-01-14 2016-11-08 Soitec Device having a contact between semiconductor regions through a buried insulating layer, and process for fabricating said device
US10304722B2 (en) 2015-06-01 2019-05-28 Globalwafers Co., Ltd. Method of manufacturing semiconductor-on-insulator
US10332782B2 (en) 2015-06-01 2019-06-25 Globalwafers Co., Ltd. Method of manufacturing silicon germanium-on-insulator
US10546771B2 (en) 2016-10-26 2020-01-28 Globalwafers Co., Ltd. High resistivity silicon-on-insulator substrate having enhanced charge trapping efficiency

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JP2011044667A (ja) * 2009-08-24 2011-03-03 Shin Etsu Handotai Co Ltd 半導体装置の製造方法
EP2320454A1 (de) * 2009-11-05 2011-05-11 S.O.I.Tec Silicon on Insulator Technologies Substrathalter und Klammervorrichtung
FR2953636B1 (fr) * 2009-12-08 2012-02-10 Soitec Silicon On Insulator Procede de commande d'une cellule memoire dram sur seoi disposant d'une seconde grille de controle enterree sous la couche isolante
US8710629B2 (en) * 2009-12-17 2014-04-29 Qualcomm Incorporated Apparatus and method for controlling semiconductor die warpage
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Cited By (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003036699A2 (en) * 2001-10-23 2003-05-01 Cambridge Semiconductor Limited Lateral semiconductor-on-insulator structure and corresponding manufacturing methods
WO2003036699A3 (en) * 2001-10-23 2003-09-25 Cambridge Semiconductor Ltd Lateral semiconductor-on-insulator structure and corresponding manufacturing methods
US6844244B2 (en) 2002-12-20 2005-01-18 Asml Netherlands B.V. Dual sided lithographic substrate imaging
US7133117B2 (en) 2002-12-20 2006-11-07 Asml Netherlands B.V. Dual sided lithographic substrate imaging
EP1469355A1 (de) * 2002-12-20 2004-10-20 ASML Netherlands B.V. Verfahren zur Herstellung einer Vorrichtung
FR2925223A1 (fr) * 2007-12-18 2009-06-19 Soitec Silicon On Insulator Procede d'assemblage avec marques enterrees
WO2009077538A2 (en) * 2007-12-18 2009-06-25 S.O.I.Tec Silicon On Insulator Technologies Process of assembly with buried marks
WO2009077538A3 (en) * 2007-12-18 2009-08-27 S.O.I.Tec Silicon On Insulator Technologies Process of assembly with buried marks
US8372733B2 (en) 2008-09-03 2013-02-12 Soitec Method for fabricating a locally passivated germanium-on-insulator substrate
EP2161742A1 (de) * 2008-09-03 2010-03-10 S.O.I.TEC. Silicon on Insulator Technologies S.A. Verfahren zur Herstellung eines lokal passivierten Germanium-on-Insulator-Substrats
US9076713B2 (en) 2008-09-03 2015-07-07 Soitec Locally passivated germanium-on-insulator substrate
US8508289B2 (en) 2009-12-08 2013-08-13 Soitec Data-path cell on an SeOI substrate with a back control gate beneath the insulating layer
US8664712B2 (en) 2009-12-08 2014-03-04 Soitec Flash memory cell on SeOI having a second control gate buried under the insulating layer
US8384425B2 (en) 2009-12-08 2013-02-26 Soitec Arrays of transistors with back control gates buried beneath the insulating film of a semiconductor-on-insulator substrate
US8305803B2 (en) 2010-01-14 2012-11-06 Soitec DRAM memory cell having a vertical bipolar injector
US8325506B2 (en) 2010-01-14 2012-12-04 Soitec Devices and methods for comparing data in a content-addressable memory
US8304833B2 (en) 2010-01-14 2012-11-06 Soitec Memory cell with a channel buried beneath a dielectric layer
US9490264B2 (en) 2010-01-14 2016-11-08 Soitec Device having a contact between semiconductor regions through a buried insulating layer, and process for fabricating said device
US8432216B2 (en) 2010-03-03 2013-04-30 Soitec Data-path cell on an SeOI substrate with a back control gate beneath the insulating layer
US8575697B2 (en) 2010-03-08 2013-11-05 Soitec SRAM-type memory cell
US8358552B2 (en) 2010-03-11 2013-01-22 Soitec Nano-sense amplifier
US8625374B2 (en) 2010-03-11 2014-01-07 Soitec Nano-sense amplifier
US8223582B2 (en) 2010-04-02 2012-07-17 Soitec Pseudo-inverter circuit on SeOI
US8654602B2 (en) 2010-04-02 2014-02-18 Soitec Pseudo-inverter circuit on SeOI
EP2375442A1 (de) * 2010-04-06 2011-10-12 S.O.I.Tec Silicon on Insulator Technologies Verfahren zur Herstellung eines Halbleitersubstrats
US9035474B2 (en) 2010-04-06 2015-05-19 Soitec Method for manufacturing a semiconductor substrate
EP2378549A1 (de) * 2010-04-06 2011-10-19 S.O.I.Tec Silicon on Insulator Technologies Verfahren zur Herstellung eines Halbleitersubstrats
US8455938B2 (en) 2010-04-22 2013-06-04 Soitec Device comprising a field-effect transistor in a silicon-on-insulator
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