EP0561893B1 - Reaction d'hyrosilation - Google Patents
Reaction d'hyrosilation Download PDFInfo
- Publication number
- EP0561893B1 EP0561893B1 EP92900658A EP92900658A EP0561893B1 EP 0561893 B1 EP0561893 B1 EP 0561893B1 EP 92900658 A EP92900658 A EP 92900658A EP 92900658 A EP92900658 A EP 92900658A EP 0561893 B1 EP0561893 B1 EP 0561893B1
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- EP
- European Patent Office
- Prior art keywords
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- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000006459 hydrosilylation reaction Methods 0.000 title claims abstract description 50
- 238000006243 chemical reaction Methods 0.000 title claims abstract description 38
- 239000000203 mixture Substances 0.000 claims abstract description 99
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 93
- 150000001875 compounds Chemical class 0.000 claims abstract description 74
- 238000000034 method Methods 0.000 claims abstract description 51
- 230000005855 radiation Effects 0.000 claims abstract description 50
- 239000001257 hydrogen Substances 0.000 claims abstract description 42
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 42
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 41
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 39
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000003054 catalyst Substances 0.000 claims abstract description 24
- 239000012949 free radical photoinitiator Chemical group 0.000 claims abstract description 22
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 claims abstract description 11
- -1 5-cyclopentadienyl Chemical group 0.000 claims description 67
- 125000004432 carbon atom Chemical group C* 0.000 claims description 33
- 125000003118 aryl group Chemical group 0.000 claims description 26
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 23
- 125000000217 alkyl group Chemical group 0.000 claims description 14
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 14
- 238000000576 coating method Methods 0.000 claims description 13
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 12
- 239000011248 coating agent Substances 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 10
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 10
- 229920002554 vinyl polymer Polymers 0.000 claims description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 9
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 claims description 8
- 125000003342 alkenyl group Chemical group 0.000 claims description 8
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 7
- 239000000853 adhesive Substances 0.000 claims description 6
- 230000001070 adhesive effect Effects 0.000 claims description 6
- 150000001491 aromatic compounds Chemical group 0.000 claims description 5
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 claims description 5
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 4
- 150000002170 ethers Chemical class 0.000 claims description 4
- 150000002576 ketones Chemical class 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 claims description 3
- FKDIWXZNKAZCBY-UHFFFAOYSA-N 9,10-dichloroanthracene Chemical compound C1=CC=C2C(Cl)=C(C=CC=C3)C3=C(Cl)C2=C1 FKDIWXZNKAZCBY-UHFFFAOYSA-N 0.000 claims description 3
- JTGMTYWYUZDRBK-UHFFFAOYSA-N 9,10-dimethylanthracene Chemical compound C1=CC=C2C(C)=C(C=CC=C3)C3=C(C)C2=C1 JTGMTYWYUZDRBK-UHFFFAOYSA-N 0.000 claims description 3
- 239000002390 adhesive tape Substances 0.000 claims description 3
- 150000003377 silicon compounds Chemical class 0.000 claims description 3
- 150000002431 hydrogen Chemical class 0.000 claims 5
- 239000013464 silicone adhesive Substances 0.000 claims 2
- 238000007259 addition reaction Methods 0.000 abstract description 11
- 150000003057 platinum Chemical class 0.000 abstract description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 abstract description 4
- 229910017052 cobalt Inorganic materials 0.000 abstract description 2
- 239000010941 cobalt Substances 0.000 abstract description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052759 nickel Inorganic materials 0.000 abstract description 2
- 229910052763 palladium Inorganic materials 0.000 abstract description 2
- 230000001737 promoting effect Effects 0.000 abstract description 2
- 229910052703 rhodium Inorganic materials 0.000 abstract description 2
- 239000010948 rhodium Substances 0.000 abstract description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 15
- 239000011521 glass Substances 0.000 description 11
- 229920000642 polymer Polymers 0.000 description 10
- 229920001296 polysiloxane Polymers 0.000 description 10
- 239000000376 reactant Substances 0.000 description 9
- 125000001183 hydrocarbyl group Chemical group 0.000 description 8
- 229910052736 halogen Inorganic materials 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000000523 sample Substances 0.000 description 6
- 239000004615 ingredient Substances 0.000 description 5
- 150000003961 organosilicon compounds Chemical class 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 239000004205 dimethyl polysiloxane Substances 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 238000001879 gelation Methods 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 0 CCC(C)(CC)N(*)[Mn] Chemical compound CCC(C)(CC)N(*)[Mn] 0.000 description 3
- BCSYXDNNYLPNJO-UHFFFAOYSA-M C[Pt](C)(C)I Chemical compound C[Pt](C)(C)I BCSYXDNNYLPNJO-UHFFFAOYSA-M 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 229940052303 ethers for general anesthesia Drugs 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 229910021485 fumed silica Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000003504 photosensitizing agent Substances 0.000 description 3
- 150000003058 platinum compounds Chemical class 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- OHUVHDUNQKJDKW-UHFFFAOYSA-N sodium;cyclopenta-1,3-diene Chemical compound [Na+].C=1C=C[CH-]C=1 OHUVHDUNQKJDKW-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- DXBHBZVCASKNBY-UHFFFAOYSA-N 1,2-Benz(a)anthracene Chemical compound C1=CC=C2C3=CC4=CC=CC=C4C=C3C=CC2=C1 DXBHBZVCASKNBY-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- MGRRGKWPEVFJSH-UHFFFAOYSA-N 10-(10-oxoanthracen-9-ylidene)anthracen-9-one Chemical compound C12=CC=CC=C2C(=O)C2=CC=CC=C2C1=C1C2=CC=CC=C2C(=O)C2=CC=CC=C21 MGRRGKWPEVFJSH-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- CUFNKYGDVFVPHO-UHFFFAOYSA-N azulene Chemical compound C1=CC=CC2=CC=CC2=C1 CUFNKYGDVFVPHO-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- FUSUHKVFWTUUBE-UHFFFAOYSA-N buten-2-one Chemical compound CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 2
- 239000003060 catalysis inhibitor Substances 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- 125000000068 chlorophenyl group Chemical group 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000005065 mining Methods 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- QMMOXUPEWRXHJS-UHFFFAOYSA-N pentene-2 Natural products CCC=CC QMMOXUPEWRXHJS-UHFFFAOYSA-N 0.000 description 2
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 230000037452 priming Effects 0.000 description 2
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 239000004447 silicone coating Substances 0.000 description 2
- 150000003384 small molecules Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- PRBHEGAFLDMLAL-UHFFFAOYSA-N 1,5-Hexadiene Natural products CC=CCC=C PRBHEGAFLDMLAL-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- KUIZKZHDMPERHR-UHFFFAOYSA-N 1-phenylprop-2-en-1-one Chemical compound C=CC(=O)C1=CC=CC=C1 KUIZKZHDMPERHR-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- JKTCBAGSMQIFNL-UHFFFAOYSA-N 2,3-dihydrofuran Chemical compound C1CC=CO1 JKTCBAGSMQIFNL-UHFFFAOYSA-N 0.000 description 1
- VMAWODUEPLAHOE-UHFFFAOYSA-N 2,4,6,8-tetrakis(ethenyl)-2,4,6,8-tetramethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1 VMAWODUEPLAHOE-UHFFFAOYSA-N 0.000 description 1
- AYRABHFHMLXKBT-UHFFFAOYSA-N 2,6-Dimethyl-anthracen Natural products C1=C(C)C=CC2=CC3=CC(C)=CC=C3C=C21 AYRABHFHMLXKBT-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- NFWRFLYAYHHUBT-UHFFFAOYSA-N 2-ethyl-9,10-dimethylanthracene Chemical compound C1=CC=CC2=C(C)C3=CC(CC)=CC=C3C(C)=C21 NFWRFLYAYHHUBT-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical compound C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 description 1
- 125000004861 4-isopropyl phenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000006043 5-hexenyl group Chemical group 0.000 description 1
- DXPPIEDUBFUSEZ-UHFFFAOYSA-N 6-methylheptyl prop-2-enoate Chemical compound CC(C)CCCCCOC(=O)C=C DXPPIEDUBFUSEZ-UHFFFAOYSA-N 0.000 description 1
- ARSRBNBHOADGJU-UHFFFAOYSA-N 7,12-dimethyltetraphene Chemical compound C1=CC2=CC=CC=C2C2=C1C(C)=C(C=CC=C1)C1=C2C ARSRBNBHOADGJU-UHFFFAOYSA-N 0.000 description 1
- BRUOAURMAFDGLP-UHFFFAOYSA-N 9,10-dibromoanthracene Chemical compound C1=CC=C2C(Br)=C(C=CC=C3)C3=C(Br)C2=C1 BRUOAURMAFDGLP-UHFFFAOYSA-N 0.000 description 1
- GJNKQJAJXSUJBO-UHFFFAOYSA-N 9,10-diethoxyanthracene Chemical compound C1=CC=C2C(OCC)=C(C=CC=C3)C3=C(OCC)C2=C1 GJNKQJAJXSUJBO-UHFFFAOYSA-N 0.000 description 1
- NZVLXSFYCZSHRF-UHFFFAOYSA-N 9,10-diethylanthracene Chemical compound C1=CC=C2C(CC)=C(C=CC=C3)C3=C(CC)C2=C1 NZVLXSFYCZSHRF-UHFFFAOYSA-N 0.000 description 1
- OGOYZCQQQFAGRI-UHFFFAOYSA-N 9-ethenylanthracene Chemical compound C1=CC=C2C(C=C)=C(C=CC=C3)C3=CC2=C1 OGOYZCQQQFAGRI-UHFFFAOYSA-N 0.000 description 1
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- BUDQDWGNQVEFAC-UHFFFAOYSA-N Dihydropyran Chemical compound C1COC=CC1 BUDQDWGNQVEFAC-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 229910020388 SiO1/2 Inorganic materials 0.000 description 1
- 229910020485 SiO4/2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001263 acyl chlorides Chemical class 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 1
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 150000008365 aromatic ketones Chemical class 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000001231 benzoyloxy group Chemical group C(C1=CC=CC=C1)(=O)O* 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- PVEOYINWKBTPIZ-UHFFFAOYSA-N but-3-enoic acid Chemical compound OC(=O)CC=C PVEOYINWKBTPIZ-UHFFFAOYSA-N 0.000 description 1
- WFYPICNXBKQZGB-UHFFFAOYSA-N butenyne Chemical compound C=CC#C WFYPICNXBKQZGB-UHFFFAOYSA-N 0.000 description 1
- 238000003490 calendering Methods 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000011111 cardboard Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000007799 cork Substances 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 150000001925 cycloalkenes Chemical class 0.000 description 1
- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- ZXIJMRYMVAMXQP-UHFFFAOYSA-N cycloheptene Chemical compound C1CCC=CCC1 ZXIJMRYMVAMXQP-UHFFFAOYSA-N 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- VJIYRPVGAZXYBD-UHFFFAOYSA-N dibromosilane Chemical compound Br[SiH2]Br VJIYRPVGAZXYBD-UHFFFAOYSA-N 0.000 description 1
- VILAVOFMIJHSJA-UHFFFAOYSA-N dicarbon monoxide Chemical group [C]=C=O VILAVOFMIJHSJA-UHFFFAOYSA-N 0.000 description 1
- VEYJKODKHGEDMC-UHFFFAOYSA-N dichloro(trichlorosilyl)silicon Chemical compound Cl[Si](Cl)[Si](Cl)(Cl)Cl VEYJKODKHGEDMC-UHFFFAOYSA-N 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 125000005388 dimethylhydrogensiloxy group Chemical group 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- NHOGGUYTANYCGQ-UHFFFAOYSA-N ethenoxybenzene Chemical compound C=COC1=CC=CC=C1 NHOGGUYTANYCGQ-UHFFFAOYSA-N 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 125000003106 haloaryl group Chemical group 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- CLUPOLFGIGLMIQ-UHFFFAOYSA-N heptane;propan-2-ol Chemical compound CC(C)O.CCCCCCC CLUPOLFGIGLMIQ-UHFFFAOYSA-N 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical compound C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 125000002346 iodo group Chemical group I* 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- 239000002655 kraft paper Substances 0.000 description 1
- 150000002605 large molecules Chemical class 0.000 description 1
- 229960004488 linolenic acid Drugs 0.000 description 1
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 150000005673 monoalkenes Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- RPMXALUWKZHYOV-UHFFFAOYSA-N nitroethene Chemical group [O-][N+](=O)C=C RPMXALUWKZHYOV-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- HRGDZIGMBDGFTC-UHFFFAOYSA-N platinum(2+) Chemical compound [Pt+2] HRGDZIGMBDGFTC-UHFFFAOYSA-N 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
- MWWATHDPGQKSAR-UHFFFAOYSA-N propyne Chemical compound CC#C MWWATHDPGQKSAR-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000011369 resultant mixture Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 229910052990 silicon hydride Inorganic materials 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 235000015096 spirit Nutrition 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- IMYGMRDBUAOCFV-UHFFFAOYSA-N trichloro(dichlorosilyloxy)silane Chemical compound Cl[SiH](Cl)O[Si](Cl)(Cl)Cl IMYGMRDBUAOCFV-UHFFFAOYSA-N 0.000 description 1
- OAXYRBYIEBMHNL-UHFFFAOYSA-N trichloro-[dichloro(dichlorosilyl)silyl]silane Chemical compound Cl[SiH](Cl)[Si](Cl)(Cl)[Si](Cl)(Cl)Cl OAXYRBYIEBMHNL-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 229960000834 vinyl ether Drugs 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/56—Organo-metallic compounds, i.e. organic compounds containing a metal-to-carbon bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0801—General processes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
- C07F7/0872—Preparation and treatment thereof
- C07F7/0876—Reactions involving the formation of bonds to a Si atom of a Si-O-Si sequence other than a bond of the Si-O-Si linkage
- C07F7/0878—Si-C bond
- C07F7/0879—Hydrosilylation reactions
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1876—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-C linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0091—Complexes with metal-heteroatom-bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
- Y10T428/2809—Web or sheet containing structurally defined element or component and having an adhesive outermost layer including irradiated or wave energy treated component
Definitions
- This invention relates to a hydrosilation process involving the reaction of a compound containing silicon-bonded hydrogen with a compound containing aliphatic unsaturation in the presence of ultraviolet or visible radiation, and to compositions that are useful in that process.
- the invention further relates to polysiloxane compositions, prepared by that process, which compositions are useful for preparing dental impressions, adhesives, release liners, and caulking materials.
- 3,470,225 discloses production of organic silicon compounds by addition of a compound containing silicon-bonded hydrogen to organic compounds containing at least one non-aromatic double or triple carbon-to-carbon bond using a platinum compound of the empirical formula PtX 2 (RCOCR'COR") 2 wherein X is halogen, R is alkyl, R' is hydrogen or alkyl, and R" is alkyl or alkoxy.
- the catalysts disclosed in the foregoing patents are characterized by their high catalytic activity.
- Other platinum complexes for accelerating the aforementioned thermally-activated addition reaction include: a platinacyclobutane complex having the formula (PtCl 2 -C 3 H 6 ) 2 (U.S.
- Patent No. 3,159,662, Ashby a complex of a platinous salt and an olefin
- U.S. Patent No. 3,178,464, Pierpoint a platinum-containing complex prepared by reacting chloroplatinic acid with an alcohol, ether, aldehyde, or mixtures thereof
- a platinum compound selected from trimethylplatinum iodide and hexamethyldiplatinum U.S. Patent No. 3,313,773, Lamoreaux
- a hydrocarbyl or halohydrocarbyl nitrile-platinum (II) halide complex U.S. Patent No.
- platinum complexes that can be used to initiate ultraviolet radiation-activated hydrosilation reactions have been disclosed, e.g., platinum azo complexes (U.S. Patent No. 4,670,531, Eckberg); ( ⁇ 4 -cyclooctadiene)diarylplatinum complexes (U.S. Patent No.
- EP-A-0,358,452 discloses a process for the addition of compounds containing silicon-bonded hydrogen to compounds containing aliphatic unsaturation and compositions suitable for said process.
- the process is activated by visible radiation and is conducted in the presence of a platinum complex having one cyclopentadienyl group that is eta -bonded to the platinum atom and three aliphatic groups that are sigma -bonded to the platinum atom and a sensitizer that is capable of absorbing visible light and is capable of transferring energy to said platinum complex such that the hydrosilation reaction is initiated upon exposure to visible light.
- the invention also provides compositions for use in the aforementioned process.
- DE-A-2,736,499 discloses a hydrosilation process in the presence of a pt-complex and a photosensitizer.
- suitable sensitizers benzoin ethyl ether is expressly mentioned.
- the process of the reference takes place in the presence of ultraviolet light.
- this invention provides an improved process for the actinic radiation-activated addition reaction of a compound containing silicon-bonded hydrogen with a compound containing aliphatic unsaturation, said addition being referred to as hydrosilation, the improvement comprising using, as a platinum hydrosilation catalyst, an ( ⁇ 5 -cyclopentadienyl)tri( ⁇ -aliphatic)platinum complex, and as a reaction accelerator, a free-radical photoinitiator capable of absorbing actinic radiation, i.e. light having a wavelength ranging from 200 nm to 800 nm.
- this invention provides a hydrosilation process which comprises reacting a composition comprising a compound having aliphatic unsaturation and a compound containing at least one silicon-bonded hydrogen atom and not having more than three hydrogen atoms attached to any one silicon atom, in the presence of both a ( ⁇ 5 -cyclopentadienyl)tri- ( ⁇ -aliphatic)platinum complex having the formula: wherein:
- the process can also employ, as a sensitizer, a compound that absorbs actinic radiation, and that is capable of transferring energy to the aforementioned platinum complex or platinum complex/free-radical photoinitiator combination, such that the hydrosilation reaction is initiated upon exposure to actinic radiation.
- the process comprises exposing to actinic radiation, i.e., radiation having a wavelength of 200 nm to 800 nm, a composition capable of undergoing hydrosilation comprising
- Important applications of the process and compositions of the invention include adhesives, coatings, and light curable materials for dental applications, e.g., impressions.
- the main advantage of using the free-radical photoinitiator in the actinic radiation-activated addition reaction of compounds containing silicon-bonded hydrogen with compounds containing aliphatic unsaturation is the unexpectedly high acceleration of the reaction, e.g., up to about a 40% reduction in curing time.
- the term "compound”, unless indicated otherwise, is a chemical substance which has a particular molecular identity or is made of a mixture of such substances, e.g., polymeric substances.
- hydrosilation means the addition of organosilicon compounds containing silicon-bonded hydrogen to a compound containing an aliphatic multiple bond, and in the hydrosilation process described in this application, it refers to those processes in which platinum-containing catalysts are used to effect the addition of an organosilicon compound having a silicon-bonded hydrogen atom to an aliphatically unsaturated compound having either olefinic or acetylenic unsaturation.
- the platinum complex is an ( ⁇ 5 -cyclopentadienyl)tri( ⁇ -aliphatic)platinum complex having the formula: wherein
- the groups represented by R 1 , R 2 , and R 3 can be unsubstituted or substituted hydrocarbyl groups, or unsubstituted or substituted acyl groups, said substituents, if any, not interfering in a hydrosilation reaction.
- the groups can be straight-chain, branched-chain, and, if sufficiently large, cyclic.
- ( ⁇ 5 -Cyclopentadienyl)trimethylplatinum can be prepared by the addition of a solution of cyclopentadienylsodium in tetrahydrofuran to an equimolar amount of iodotrimethylplatinum dissolved in benzene, and isolation of the product complex from the reaction mixture according to the procedure of S. D. Robinson and B. L. Shaw, J. Chem. Soc. , 1965, 1529.
- Suitable ( ⁇ 5 -cyclopentadienyl)trialiphaticplatinum complexes useful in the practice of this invention include the following, in which (Cp) represents the ( ⁇ 5 -cyclopentadienyl) group:
- Photoinitiators suitable for this invention are those compounds capable of generating free radicals upon absorption of actinic radiation between 200 and 800 nm and are selected from the following classes of compounds: (1) monoketals of ⁇ -diketones or ⁇ -ketoaldehydes, and (2) acyloins and their corresponding ethers.
- Monoketals of ⁇ -diketones and ⁇ -ketoaldehydes have the general formula: wherein R 4 represents an aryl group that is unsubstituted or substituted with one or more groups that do not interfere with the hydrosilation reaction, and R 5 , R 6 , and R 7 each independently represents a member selected from the group consisting of an aryl group that is unsubstituted or substituted with one or more groups that do not interfere with the hydrosilation reaction, an aliphatic group having from one to eighteen carbon atoms, and hydrogen.
- Acyloins and their corresponding ethers have the general formula: wherein R 8 represents an unsubstituted aryl group or an aryl group substituted with one or more groups that do not interfere with the hydrosilation reaction, and R 9 , R 10 , and R 11 each independently represents a member selected from the group consisting of an aryl group that is unsubstituted or substituted with one or more groups that do not interfere with the hydrosilation reaction, aliphatic groups having from one to eighteen carbon atoms, and hydrogen.
- Representative examples of these compounds are the commercially available derivatives "Darocure” 1173 (EM Industries, Inc.), for which R 8 represents the phenyl group, R 9 and R 10 each represents the methyl group, and R 11 represents hydrogen, "Darocure” 1116 (EM Industries, Inc.), for which R 8 represents the 4-isopropylphenyl group, R 9 and R 10 each represents the methyl group, and R 11 represents hydrogen, and "Vicure” 30 (Stauffer Chemical Co.), for which R 8 and R 9 each represents the phenyl group, R 10 represents hydrogen, and R 11 represents the methyl group.
- Sensitizers suitable for this invention are those compounds capable of absorbing actinic radiation within the ultraviolet and visible regions of the electromagnetic spectrum, i.e., 200 nm to 800 nm, and capable of transferring energy to the platinum complex. They must not inhibit the hydrosilation reaction.
- Sensitizers are preferably selected from two classes of compounds: 1) polycyclic aromatic compounds, and 2) aromatic compounds containing a ketone chromophore.
- the sensitizer compounds can be substituted with any substitutent that does not interfere with the light absorbing and energy transferring capabilities of the sensitizer compound or the hydrosilation catalyst. Examples of typical substituents include alkyl, alkoxy, aryl, aryloxy, aralkyl, alkaryl, halogen, etc.
- polycyclic aromatic sensitizers suitable for the invention include anthracene, 9-vinylanthracene, 9,10-dimethylanthracene, 9,10-dichloroanthracene, 9,10-dibromoanthracene, 9,10-diethylanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-dimethylanthracene, naphthacene, pentacene, benz[a]anthracene, 7,12-dimethylbenz[a]anthracene, and azulene.
- aromatic ketone sensitizers suitable for this invention include 2-chlorothioxanthone, 2-isopropylthioxanthone, thioxanthone, anthraquinone, benzophenone, 1-chloroanthraquinone, and bianthrone.
- the aliphatically unsaturated compound can contain one or more carbon-to-carbon multiple bonds.
- Representative examples of the aliphatically unsaturated hydrocarbons which can be employed include mono-olefins, for example, ethylene, propylene, and 2-pentene; diolefins, for example, divinylbenzene, butadiene, and 1,5-hexadiene; cycloolefins, for example, cyclohexene and cycloheptene; and monoalkynes, for example, acetylene, propyne, and 1-buten-3-yne.
- the aliphatically unsaturated compounds can have up to 20 to 30 carbon atoms, or more.
- Oxygen-containing aliphatically unsaturated compounds can also be used, especially where the unsaturation is ethylenic, such as methyl vinyl ether, divinyl ether, phenyl vinyl ether, monoallyl ether of ethylene glycol, allyl aldehyde, methyl vinyl ketone, phenyl vinyl ketone, acrylic acid, methacrylic acid, methyl acrylate, allyl acrylate, methyl methacrylate, allyl methacrylate, vinylacetic acid, vinyl acetate, and linolenic acid.
- Heterocyclic compounds containing aliphatic unsaturation in the ring such as dihydrofuran, and dihydropyran, are also suitable for the present invention.
- Halogenated derivatives of the previously mentioned aliphatically unsaturated compounds can be employed, including acyl chlorides as well as compounds containing a halogen substituent on a carbon atom other than a carbonyl carbon atom.
- halogen-containing compounds include, for example, vinyl chloride, and the vinyl chlorophenyl esters.
- Unsaturated compounds containing nitrogen substituents such as acrylonitrile, N-vinylpyrrolidone alkyl cyanide, and nitroethylene, are also useful in the practice of the present invention.
- unsaturated compounds useful in the practice of the present invention include polymers containing aliphatic unsaturation, such as the polyester resins prepared from polybasic saturated or unsaturated acids with polyhydric unsaturated alcohols, and the polyester resins prepared by reacting unsaturated polybasic acids with saturated polyhydric alcohols.
- a particularly useful type of unsaturated compound which can be employed in the practice of the present invention is that containing silicon, such as those compounds commonly referred to as organosilicon monomers or polymers. These unsaturated organosilicon compounds have at least one aliphatically unsaturated organic radical attached to silicon per molecule.
- the aliphatically unsaturated organosilicon compounds include silanes, polysilanes, siloxanes, silazanes, as well as monomeric or polymeric materials containing silicon atoms joined together by methylene or polymethylene groups or by phenylene groups.
- aliphatically unsaturated organosilicon compounds useful in the present invention are the monomeric silanes having the empirical formula R 12 b R 13 c SiX (4-b-c) the cyclopolysiloxanes having the empirical formula (R 12 R 13 SiO) d III and the polyorganosiloxanes having the empirical formula R 12 e R f 13 SiO (4-e-f)/2 wherein
- Monovalent aliphatic unsaturated hydrocarbyl groups represented by R 12 include alkenyl, for example, vinyl, propenyl, isopropenyl, 3-butenyl, and 5-hexenyl.
- Groups represented by R 13 include, for example, alkyl groups, such as methyl, ethyl, and pentyl; cycloalkyl groups, such as cyclopentyl and cyclohexyl; aryl groups such as phenyl and tolyl; aralkyl groups, such as benzyl and phenylethyl; and halogenated hydrocarbyl groups, such as haloalkyl, e.g., chloromethyl, trichloromethyl, and 3,3,3-trifluoropropyl, and haloaryl, e.g., chlorophenyl.
- Hydrolyzable groups represented by X include, for example, halogen groups such as chloro, bromo, and iodo; alkoxy groups such as methoxy, ethoxy, and phenoxy; and acyloxy groups such as acetoxy, propionoxy, and benzoyloxy.
- a hydrolyzable group is one which undergoes a displacement reaction with water.
- the compound containing aliphatic unsaturation is an aliphatically unsaturated polyorganosiloxane represented by the general formula: wherein
- the reactant containing the silicon-hydrogen linkage can be a polymeric compound or a compound that is not polymeric. These compounds are well-known in the art and are disclosed in the patents which describe the aliphatically unsaturated reactant, i.e., Ashby, U.S. Patent No. 3,159,662; Lamoreaux, U.S. Patent No. 3,220,972; and Joy, U.S. Patent No. 3,410,886.
- the reactant containing the silicon-hydrogen linkage should contain at least one silicon-bonded hydrogen atom per molecule, with no more than three hydrogen atoms attached to any one silicon atom.
- organosilanes having the empirical formula: (H) j Si(R 15 ) k (X) (4-j-k) VI organocyclopolysiloxanes having the empirical formula: (HR 15 SiO) d VII and organohydrosiloxane polymers or copolymers having the empirical formula: (R 15 ) f Si(H) e O (4-e-f)/2 VIII wherein
- R 15 examples include, for example, alkyl groups having 1 to 18 carbon atoms, e.g., methyl, ethyl, propyl, octyl, and octadecyl; cycloalkyl groups having 5 to 7 ring carbon atoms, e.g., cyclohexyl and cycloheptyl; aryl groups having 6 to 18 carbon atoms, e.g., phenyl, naphthyl, tolyl, xylyl; and combinations of alkyl and aryl groups, e.g., aralkyl groups, such as, benzyl and phenylethyl, and halo-substituted groups thereof, e.g., chloromethyl, chlorophenyl, and dibromophenyl.
- alkyl groups having 1 to 18 carbon atoms e.g., methyl, ethyl, propyl, oct
- the R 15 group is methyl or both methyl and phenyl.
- the R 15 group can also be an unsaturated aliphatic group having 1 to 20 carbon atoms, such as alkenyl or cycloalkenyl, e.g., vinyl, allyl and cyclohexenyl.
- alkenyl or cycloalkenyl e.g., vinyl, allyl and cyclohexenyl.
- the silicon compound containing silicon-hydrogen linkages can be reacted with itself to form a polymer.
- a preferred compound having silicon-bonded hydrogen useful in this invention is a polyorganohydrosiloxane having the general formula: wherein
- the hydrosilation composition useful in the synthesis of low molecular weight compounds by the process of the invention can be prepared by mixing about 0.1 to about 10.0 equivalent weights of the compound having silicon-bonded hydrogen with one equivalent weight of the compound having aliphatic unsaturation and then adding an amount of platinum complex catalyst sufficient to catalyze the reaction and an amount of a free-radical photoinitiator sufficient to accelerate the reaction.
- an amount of a sensitizer sufficient to sensitize the platinum complex/free-radical photoinitiator combination upon exposure to actinic radiation having a wavelength from 200 nm to 800 nm can also be added.
- the amount of the catalyst can range from 5 to 1,000 parts by weight, preferably from 50 to 500 parts by weight, per 1,000,000 parts by weight of the total composition.
- the amount of free-radical photoinitiator can range from 50 to 50,000 parts by weight, preferably from 100 to 5,000 parts by weight, per 1,000,000 parts by weight of the total composition.
- the amount of sensitizer can range from 50 to 50,000 parts by weight, preferably from 100 to 5,000 parts by weight, per 1,000,000 parts by weight of the total composition.
- the reactants and catalyst can be introduced into a vessel equipped for stirring, where the mixture is stirred until it is homogenous. If either of the reactants is a solid or is extremely viscous, a solvent can be introduced into the vessel to facilitate uniform mixing of the reactants.
- Suitable solvents include aromatic hydrocarbons, such as xylene and toluene; aliphatic hydrocarbons, such as hexane and mineral spirits; and halogenated hydrocarbons, such as chlorobenzene and trichloroethane. It is desirable that the solvent be transmissive to actinic radiation. From 0.1 to 10 parts of solvent per part by weight of the combined reactants may be used. The resulting reaction product will generally be sufficiently pure for its intended use. However, it may be desirable to remove the solvent if one has been employed.
- the hydrosilation compositions useful in the preparation of higher molecular weight cured siloxane polymers, by the process of this invention can be prepared by mixing an aliphatically unsaturated polysiloxane and the compound having silicon-bonded hydrogen in such a proportion so as to provide 0.1 to 10.0 silicon-bonded hydrogen atoms per unsaturated group, and then adding from 5 to 1,000 parts by weight, preferably from 50 to 500 parts by weight of platinum complex catalyst and from 50 to 50,000 parts by weight, preferably from 100 to 5,000 parts by weight of a free-radical photoinitiator.
- from 50 to 50,000 parts by weight, preferably from 100 to 5,000 parts by weight of sensitizer, per 1,000,000 parts by weight of the total composition can be added.
- the reaction mixture can be mixed, as by stirring, blending, or tumbling, until it is homogenous.
- the thoroughly mixed composition can then be applied to a substrate by any suitable means, such as by spraying, dipping, knife coating, curtain coating, roll coating, or the like, and the coating cured by using conventional techniques for providing actinic radiation. It is preferred that curing be conducted by exposing the coated substrate to radiation having a wavelength of 200 nm to 800 nm. Depending on the particular silicone formulation, catalyst, free-radical photoinitiator, optional sensitizer, and intensity of the actinic radiation, curing can be accomplished in a period from less than one second to less than 30 minutes. Any radiation source emitting radiation above about 200 nm can be used.
- suitable radiation sources include tungsten halogen lamps, xenon arc lamps, mercury arc lamps, incandescent lamps, and fluorescent lamps.
- Particularly preferred sources of actinic radiation are tungsten halogen, xenon arc, and mercury arc lamps.
- additives conventionally included in hydrosilation compositions can be included in the curable compositions, depending on the intended purpose of the composition.
- Fillers and/or pigments such as chopped fibers, crushed polymers, talc, clay, titanium dioxide, and fumed silica can be added.
- Soluble dyes, oxidation inhibitors, and/or any material that does not interfere with the catalytic activity of the platinum complex and does not absorb actinic radiation at the absorption wavelength of the free-radical photoinitiator, or of the optional sensitizer, can be added to the composition.
- the shelf life of the curable compositions containing the catalyst and sensitizer can be extended by the addition of a conventional catalyst inhibitor.
- the amount of catalyst inhibitor can vary from 1 to 10 times, or more, the amount of platinum complex, depending on the activity of the particular complex or complex-accelerator used and the shelf life desired for the composition. Greater amounts of inhibitor should be used with the more active complexes, with lesser amounts being used for the less active complexes.
- Hydrosilation inhibitors are well known in the art and include such compounds as acetylenic alcohols, certain polyolefinic siloxanes, pyridine, acrylonitrile, organic phosphines and phosphites, unsaturated amides, and alkyl maleates.
- hydrosilation compositions of this invention can be applied to the surface of any solid substrate for a variety of purposes.
- substrates include paper, cardboard, wood, cork, plastic, such as polyester, nylon, and polycarbonate, woven and nonwoven fabric, such as cotton, polyester, and nylon, metal, glass, and ceramic.
- compositions of this invention can be applied and cured in relatively thick sections, such as an impression material for dental applications or a fast-setting caulking material.
- compositions of this inventions were evaluated for cure speed in the following manner.
- Molds made from a 1.5 mm thick "Teflon” sheet with a 6 mm diameter hole through the sheet were clamped to clean glass slides so that the central axis of the hole in the mold was normal to the glass slide.
- the hole was filled with a sample of the composition being evaluated.
- a "Visilux” 2 dental curing light (available from Minnesota Mining and Manufacturing Company) with a light output in the visible region of the spectrum between 400 and 500 nm was clamped to a ring stand and positioned such that the cylindrical tip of the light source was 5.0 mm above the top of the "Teflon” mold. The center of the 6 mm diameter sample was directly beneath the light tip.
- compositions were evaluated for cure speed under ultraviolet radiation by placing small samples of each formulation in shallow 5.08 cms (2 inch) diameter aluminum pans and irradiating the samples at a distance of 25 cm under a bank of six Sylvania 15 Watt "Black Light” bulbs or at a distance of 5 mm from a Caulk/Hanovia "Black Light", each with a maximum intensity output at 365 nm. All samples were tested in duplicate or triplicate.
- a stock composition was prepared by mixing in a glass container 85 parts by weight of vinyl terminated polydimethylsiloxane polymer having the formula: and 15 parts by weight of a compound containing silicon-bonded hydrogen atoms having the formula: To 10.0 g portions of this stock composition were added the photohydrosilation catalyst CpPt(CH 3 ) 3 at a concentration of 960 ppm platinum and a photoinitiator selected from "Irgacure” 651, "Irgacure” 184, "Darocure” 1173, and “Daracure” 1116 at a concentration of 1,000 ppm. Compositions were irradiated as previously described, and the times until gelation of these compositions are set forth in Table I.
- Example 2 To each of four 2 g portions of the stock composition of Example 1 in glass vials were added 960 ppm platinum in the form of CpPt(CH 3 ) 3 and from 0 to 4,000 ppm of the photoinitiator "Darocure" 1173. Compositions were irradiated as previously described, and gelation times of each composition are set forth in Table II.
- Table II Amount of photoinitiator (ppm) Gel time (sec) Ultraviolet (Caulk/Hanovia) Visible ("Visilux”2) -- 240 143 1333 137 130 2666 137 124 4000 143 118
- the data in Table II show that the rate of cure increases with increasing amounts of "Darocure” 1173 photoinitiator under a source of visible light up to a level of at least 4,000 ppm and under a source of ultraviolet light to a level of approximately 1,333 ppm.
- a stock composition was prepared by mixing in a glass container 97.5 parts by weight of a vinyl-terminated polydimethylsiloxane having the formula: and 2.5 parts by weight of a compound containing silicon-bonded hydrogen having the formula: To 10.0 g aliquots of this composition were added CpPt(CH 3 ) 3 to the extent of from 50 to 500 ppm Pt and varying amounts of a photoinitiator selected from "Irgacure” 651, "Irgacure” 184, "Darocure” 1173, and “Darocure” 1116. Samples were irradiated as previously described, and the time until gelation of these compositions is set forth in Table IV.
- This example illustrates the release characteristics of coatings prepared with the compositions of this invention.
- To a 30.0 g aliquot of the stock composition of Example 2 were added 9.4 mg of CpPt(CH 3 ) 3 (200 ppm Pt), 15 mg of 2-chlorothioxanthone (500 ppm), and 15 mg of "Irgacure” 651 photoinitiator (500 ppm).
- composition was coated on super calendered Kraft paper at a coating weight of 1 to 2 g/m 2 and cured by irradiation under an atmosphere of nitrogen in a PPG processor that advanced the sample at a rate of 50 cm/sec under two medium pressure mercury lamps emitting 120 watts of radiation per centimeter of lamp length and subsequent heating in a circulating air oven at 100°C for 2 minutes. Similarly coated samples that were not exposed to radiation did not cure when heated at 100°C.
- the release value of the cured silicone coating was determined by the following procedure: A heptane-isopropyl alcohol solution of pressure-sensitive adhesive comprising isooctyl acrylate (95.5% by weight)-acrylic acid (4.5% by weight) copolymer, as described in Example 5 of U.S. Patent No. Re. 24,906, was applied to the cured silicone coating and dried for 5 minutes at 70°C in a circulating air oven to give a dry coating weight of 32 g/m 2 . A biaxially oriented film of polyethylene terephthalate (PET) (38 micrometers thick) was pressed against the surface of the coating to produce a laminate consisting of a pressure-sensitive adhesive tape and a silicone-coated substrate.
- PET polyethylene terephthalate
- the laminate was cut into 2.5 x 25 cm strips.
- An average value of 15 g per 2.5 cm of width was measured to be the force required to pull the PET film with adhesive attached thereto (i.e., a pressure-sensitive adhesive tape) away from the silicone-coated substrate at an angle of 180° and a pulling speed of 230 cm/min.
- the readhesion value of the pressure-sensitive tapes was determined by the following procedure: The pressure-sensitive tapes, as removed from the silicone coated surface, were applied to the surface of a clean glass plate. An average value of 1,400 g per 2.5 cm of width was measured to be the force required to pull the tape from the glass surface at an angle of 180° and a pulling speed of 230 cm/min. A control readhesion value was obtained for the pressure-sensitive tape by applying the tape, which had not been placed in contact with a silicone-coated surface, to a clean glass plate and measuring the force required to remove the tape from the plate. The control readhesion value was 1,500 g per 2.5 cm of width.
- This example illustrates the preparation of a silicone-based pressure-sensitive adhesive tape from a composition of this invention.
- a mixture of the following three ingredients was prepared:
- the mixture was stripped of volatile material by heating at 65°C under less than 0,667 m bar (0.5 mm of Hg) pressure on a rotary evaporator.
- To the resulting viscous mixture were added 0.80 g of 1,3,5,7-tetravinyltetramethylcyclotetrasiloxane, 2.0 g of toluene, 78 mg of CpPt(CH 3 ) 3 (500 ppm Pt), 100 mg of 2-chlorothioxanthone (1,000 ppm), and 100 mg of "Irgacure" 651 photoinitiator (1,000 ppm).
- the composition was knife coated at a thickness of 0.05 mm on a 0.05 mm thick polyethylene terephthalate film, and the coating was cured by irradiation under an atmosphere of nitrogen in a PPG processor that advanced the sample at a rate of 50 cm/sec under two medium pressure mercury lamps emitting 120 watts of radiation per centimeter of lamp length and subsequent heating in a circulating air oven at 100°C for two minutes.
- Adhesion was determined essentially according to the procedure described in ASTM D-330 (1983). Strips of the tape 2.54 cm wide and approximately 25 cm long were adhered to a glass surface using a 2.04 kg rolled weight. An average value of 1,600 g per 2.5 cm of width was measured to be the force required to pull the adhesive tape away from the glass surface at an angle of 180° and a pulling speed of 230 cm/min.
- Shear strength was determined essentially according to the procedure described in ASTM D-3654 (1982). Specimens 1.27 cm wide and approximately 8 cm long were adhered to a bright annealed steel surface with an overlap area of 1.27 cm by 1.27 cm. The samples were suspended vertically and maintained at a temperature of 70°C for one hour. A 1 kg weight was suspended from the free end of each specimen, and an average of 200 minutes was measured as the elapsed time before the adhesive bond failed while being maintained at a temperature of 70°C. The test was repeated at room temperature, and an average holding time exceeding 10,000 minutes was measured.
- the tack of the adhesive tape was measured qualitatively by touching the cured adhesive with a finger. Tack was judged to be moderate.
- composition of this invention illustrates the preparation of a conformal coating for electronic components using a composition of this invention.
- a composition consisting of the following ingredients in the amounts indicated was prepared:
- the ingredients were introduced into a 250 ml beaker and mixed thoroughly. The mixture was transferred to a 50 cc syringe and degassed under reduced pressure for approximately 30 minutes to yield a bubble-free mixture.
- composition was applied to an integrated circuit board measuring 5.08 cms by 5.08 cms (2 inches by 2 inches) in sufficient quantity to provide a coating approximately 1 mm in thickness.
- the coating was irradiated with a "Visilux" 2 light source for approximately 4 minutes to provide a tough, elastomeric, transparent coating that adhered well to the circuit board.
- This example illustrates preparation of a dental impression by means of a visible-light curable wash material and a chemically curable tray material.
- a polyvinylsiloxane formulation curable by visible light was prepared by mixing the following ingredients in the amounts indicated: Indegredient Amount (g) (wt %) Vinyl-terminated polysiloxane polymer of Example 1 8.5 76.81 Crosslinking agent of Example 1 1.5 13.56 Catalyst (CpPt(CH 3 ) 3 ) 0.015 0.14 Sensitizer (2-chlorothioxanthone) 0.01 0.09 Photoinitiator ("Darocure” 1173) 0.04 0.36 Fumed Silica ("Aerosol" R-972, available from Degussa) 1.0 9.04 11.065 100.00 The first four ingredients were premixed; then fumed silica was added.
- the resultant mixture was painted on the entire surface of a single tooth of a typodont.
- the coated surface was then irradiated by means of a "Visilux" 2 light over the entire surface for approximately two minutes or until the resin was completely tack-free.
- a two-part chemically curable impression material (Express Medium Viscosity Wash, Minnesota Mining and Manufacturing Company, St. Paul, Minnesota) was applied by syringe directly over the several teeth both adjacent to and including those previously irradiated with light.
- the material was allowed to set for about five minutes.
- the bulk material was easily removed from the typodont by firmly holding the typodont in one hand and the impression in the other. Upon removal of the silicone impression, it was observed that the light-cured material was firmly and completely bonded to the chemically-cured material.
- the stone model that was prepared from the impression showed improved detail where the light cured material was placed.
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Abstract
Claims (35)
- Procédé d'hydrosilylation qui comprend la réaction d'une composition comprenant un composé possédant une insaturation aliphatique et un composé contenant au moins un atome d'hydrogène lié à du silicium et ne contenant pas plus de trois atomes d'hydrogène fixés sur l'un quelconque des atomes de silicium, en présence à la fois d'un complexe (η5-cyclopentadiényl)tri(δ-aliphatique)platine répondant à la formule:Cp représente un groupe cyclopentadiényle lié en êta à l'atome de platine, le groupe cyclopentadiényle étant non substitué ou substitué par un ou plusieurs groupes qui n'interfèrent pas dans une réaction d'hydrosilylation, etchacun des radicaux R1, R2 et R3 représente un groupe aliphatique comportant un à dix-huit atomes de carbone, lesdits groupes R1, R2 et R3 étant liés en sigma à l'atome de platine,et d'un photoinitiateur de radicaux libres capable d'absorber un rayonnement actinique, pour que la réaction d'hydrosilylation soit amorcée lors de l'exposition au rayonnement actinique, ledit photoinitiateur de radicaux libres étant choisi parmi (1) les monocétals d'α-dicétones ou d'α-cétoaldéhydes répondant à la formule générale
- Procédé selon la revendication 1, dans lequel ladite réaction est réalisée par exposition desdites compositions à un rayonnement actinique ayant une longueur d'onde de 200 nm à 800 nm.
- Procédé selon l'une quelconque des revendications précédentes, dans lequel ladite composition renferme en outre un sensibilisateur.
- Procédé selon la revendication 3, dans lequel ledit sensibilisateur est un composé aromatique polycyclique.
- Procédé selon la revendication 4, dans lequel ledit composé aromatique polycyclique contient de trois à cinq noyaux, bornes comprises.
- Procédé selon la revendication 5, dans lequel ledit composé aromatique polycyclique est choisi dans le groupe constitué par le 9,10-diméthylanthracène et le 9,10-dichloroanthracène.
- Procédé selon la revendication 3, dans lequel ledit sensibilisateur est un composé aromatique contenant un chromophore cétonique.
- Procédé selon la revendication 7, dans lequel ledit composé aromatique est une thioxanthone.
- Procédé selon la revendication 8, dans lequel ladite thioxanthone est choisie dans le groupe constitué par la 2-chlorothioxanthone et la 2-isopropylthioxanthone.
- Procédé selon l'une quelconque des revendications précédentes, dans lequel le complexe de platine est choisi dans le groupe constitué par:le (η5-cyclopentadiényl)triméthylplatine,le (η5-méthylcyclopentadiényl)triméthylplatine,le (η5-triméthylsilylcyclopentadiényl)triméthylplatine, etle (η5-diméthylphénylsilylcyclopentadiényl)triméthylplatine.
- Procédé selon l'une quelconque des revendications précédentes, dans lequel la composition comprend de 0,1 à 10,0 équivalents en poids du composé contenant un atome d'hydrogène lié à un silicium par équivalent en poids du composé ayant une insaturation aliphatique et, pour 1 000 000 parties en poids de la composition totale, de 5 à 1 000 parties en poids du catalyseur au platine et de 50 à 50 000 parties en poids du photoinitiateur de radicaux libres.
- Procédé selon la revendication 3, dans lequel la composition comprend de 0,1 à 10,0 équivalent en poids du composé contenant un atome d'hydrogène lié à un silicium par équivalent en poids du composé ayant une insaturation aliphatique et, pour 1 000 000 parties en poids de la composition totale, d'environ 5 à environ 1 000 parties en poids du catalyseur au platine et de 50 à 50 000 parties en poids du photoinitiateur de radicaux libres, et de 50 à 50 000 parties en poids dudit sensibilisateur.
- Procédé selon l'une quelconque des revendications précédentes, dans lequel le composé contenant une insaturation aliphatique est un polyorganosiloxane répondant à la formule générale:
chaque R14 peut être identique ou différent et représente un groupe non halogéné ou halogéné, à insaturation éthylénique, comportant 2-18 atomes de carbone, un groupe alkyle non halogéné ou halogéné comportant 1-18 atomes de carbone, un groupe cycloalkyle non halogéné ou halogéné comportant 3-12 atomes de carbone, ou un groupe phényle, au moins 70% de tous les groupes R14 étant des groupes méthyle, mais pas plus de 10% de tous les groupes R14 étant un groupe vinyle ou un autre groupe alcényle, et au moins un des groupes R14 étant un groupe vinyle ou un autre groupe alcényle, h représente un nombre valant 1 à 3 000, et g représente 0, 1, 2 ou 3. - Procédé selon l'une quelconque des revendications précédentes, dans lequel le composé contenant un atome d'hydrogène lié à un silicium est un polyorganohydrosiloxane répondant à la formule générale:chaque R16 peut être identique ou différent et représente un groupe alkyle comportant 1-18 atomes de carbone, un groupe cycloalkyle comportant 3-12 atomes de carbone, un groupe phényle, ou un atome d'hydrogène, au moins un mais pas plus de la moitié de tous les groupes R16 dans le siloxane étant un atome d'hydrogène,m représente 0, 1, 2 ou 3, etn représente un nombre ayant une valeur moyenne de 1 à 3 000.
- Procédé selon l'une quelconque des revendications précédentes, dans lequel le composé ayant une insaturation aliphatique est un composé ayant une insaturation oléfinique.
- Composition durcissable par un rayonnement comprenant:(a) un composé de silicium contenant au moins un atome d'hydrogène lié à un atome de silicium par molécule, pas plus de trois atomes d'hydrogène étant liés à un atome de silicium quelconque,(b) un composé contenant une insaturation aliphatique,(c) un complexe (η5-cyclopentadiényl)tri(δ-aliphatique)platine,(d) un photoinitiateur de radicaux libres capable d'absorber un rayonnement actinique.
- Composition selon la revendication 16, comprenant en outre un sensibilisateur.
- Composition selon la revendication 17, dans laquelle ledit sensibilisateur est un composé aromatique polycyclique.
- Composition selon la revendication 18, dans laquelle ledit composé aromatique polycyclique contient de trois à cinq noyaux, bornes comprises.
- Composition selon la revendication 19, dans laquelle ledit composé aromatique polycyclique est choisi dans le groupe constitué par le 9,10-diméthylanthracène et le 9,10-dichloroanthracène.
- Composition selon la revendication 17, dans laquelle ledit sensibilisateur est un composé aromatique contenant un chromophore cétonique.
- Composition selon la revendication 21, dans laquelle ledit composé aromatique est une thioxanthone.
- Composition selon la revendication 22, dans laquelle ladite thioxanthone est choisie dans le groupe constitué par la 2-chlorothioxanthone et la 2-isopropylthioxanthone.
- Composition selon l'une quelconque des revendications 16-23 précédentes, dans laquelle ledit complexe de platine est choisi dans le groupe constitué par:le (η5-cyclopentadiényl)triméthylplatine,le (η5-méthylcyclopentadiényl)triméthylplatine,le (η5-triméthylsilylcyclopentadiényl)triméthylplatine, etle (η5-diméthylphénylsilylcyclopentadiényl)triméthylplatine.
- Composition selon l'une quelconque des revendications 16-24 précédentes, ladite composition comprenant de 0,1 à 10,0 équivalents en poids du composé contenant un atome d'hydrogène lié à un silicium par équivalent en poids du composé ayant une insaturation aliphatique et, pour 1 000 000 parties en poids de la composition totale, de 5 à 1 000 parties en poids du complexe de platine et de 50 à 50 000 parties en poids du photoinitiateur de radicaux libres.
- Composition selon la revendication 17, ladite composition comprenant de 0,1 à 10,0 équivalents en poids du composé contenant un atome d'hydrogène lié à un silicium par équivalent en poids du composé ayant une insaturation aliphatique et, pour 1 000 000 parties en poids de la composition totale, de 5 à 1 000 parties en poids du complexe de platine et de 50 à 50 000 parties en poids du photoinitiateur de radicaux libres, et de 50 à 50 000 parties en poids dudit sensibilisateur.
- Empreinte dentaire préparée par exposition de la composition de l'une quelconque des revendications 16-26 précédentes à un rayonnement actinique.
- Substrat dont au moins une des surfaces majeures porte une couche préparée par application de la composition selon l'une quelconque des revendications 16-26 précédentes sur ladite surface, puis par exposition de ladite composition à un rayonnement actinique.
- Ruban adhésif auto-collant comprenant une couche d'envers dont l'une des surfaces majeures porte une couche d'un adhésif normalement poisseux et auto-collant, et dont l'autre surface majeure porte une surface de protection à décoller, préparée par application sur ladite autre surface majeure, de la composition selon l'une quelconque des revendications 16-26 précédentes, puis par exposition de ladite composition à un rayonnement actinique.
- Ruban adhésif comprenant une couche d'envers dont au moins une des surfaces majeures porte un adhésif de type silicone préparé par application, sur au moins ladite surface majeure, de la composition selon l'une quelconque des revendications 16-26 précédentes, puis par exposition de ladite composition à un rayonnement actinique.
- Ruban selon la revendication 30, dans lequel ledit adhésif de type silicone est un adhésif auto-collant.
- Joint d'étanchéité préparé par exposition de la composition selon l'une quelconque des revendications 16-26 précédentes à un rayonnement actinique.
- Adhésif préparé par exposition de la composition selon l'une quelconque des revendications 16-26 précédentes à un rayonnement actinique.
- Revêtement conforme préparé par exposition de la composition selon l'une quelconque des revendications 16-26 précédentes à un rayonnement actinique.
- Composition durcissable par un rayonnement comprenant(a) un polyorganohydrosiloxane répondant à la formule générale:chaque R16 peut être identique ou différent et représente un groupe alkyle comportant 1-18 atomes de carbone, un groupe cycloalkyle comportant 3-12 atomes de carbone, un groupe phényle, ou un atome d'hydrogène, au moins un mais pas plus de la moitié de tous les groupes R16 dans le siloxane étant un atome d'hydrogène,m représente 0, 1, 2 ou 3,n représente un nombre ayant une valeur moyenne de 1 à 3 000.(b) un polyorganosiloxane répondant à la formule générale:chaque R14 peut être identique ou différent et représente un groupe non halogéné ou halogéné, à insaturation éthylénique, comportant 2-18 atomes de carbone, un groupe alkyle non halogéné ou halogéné comportant 1-18 atomes de carbone, un groupe cycloalkyle non halogéné ou halogéné comportant 3-12 atomes de carbone, ou le groupe phényle, au moins 70% de tous les groupes R14 étant des groupes méthyle, mais pas plus de 10% de tous les groupes R14 étant un groupe vinyle ou un autre groupe alcényle, et au moins un des groupes R14 étant un groupe vinyle ou un autre groupe alcényle,h représente un nombre ayant une valeur de 1 à 3 000, etg représente 0, 1, 2 ou 3,(c) un complexe de platine représenté par la formule:Cp représente un groupe cyclopentadiényle lié en êta à l'atome de platine, le groupe cyclopentadiényle étant non substitué ou substitué par un ou plusieurs groupes qui n'interfèrent pas dans une réaction d'hydrosilylation, etchacun des radicaux R1, R2 et R3 représente un groupe aliphatique comportant un à dix-huit atomes de carbone, lesdits groupes R1, R2 et R3 étant liés en sigma à l'atome de platine,(d) un photoinitiateur de radicaux libres décrit dans la revendication 1 précédente, capable d'absorber un rayonnement actinique.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US627009 | 1990-12-13 | ||
US07/627,009 US6376569B1 (en) | 1990-12-13 | 1990-12-13 | Hydrosilation reaction utilizing a (cyclopentadiene)(sigma-aliphatic) platinum complex and a free radical photoinitiator |
PCT/US1991/008436 WO1992010543A1 (fr) | 1990-12-13 | 1991-11-12 | Reaction d'hyrosilation |
Publications (2)
Publication Number | Publication Date |
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EP0561893A1 EP0561893A1 (fr) | 1993-09-29 |
EP0561893B1 true EP0561893B1 (fr) | 1996-10-09 |
Family
ID=24512793
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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EP92900658A Expired - Lifetime EP0561893B1 (fr) | 1990-12-13 | 1991-11-12 | Reaction d'hyrosilation |
Country Status (7)
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US (1) | US6376569B1 (fr) |
EP (1) | EP0561893B1 (fr) |
JP (1) | JPH06503591A (fr) |
KR (1) | KR930703401A (fr) |
CA (1) | CA2096228A1 (fr) |
DE (1) | DE69122625T2 (fr) |
WO (1) | WO1992010543A1 (fr) |
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JP6880315B2 (ja) | 2017-10-24 | 2021-06-02 | ワッカー ケミー アクチエンゲゼルシャフトWacker Chemie AG | 低温硬化シリコーン剥離コーティング |
CN109796599B (zh) * | 2019-01-28 | 2021-07-09 | 广东工业大学 | 一种利用紫外光催化硅氢加成反应合成的有机硅弹性体及其制备方法 |
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WO2022169556A1 (fr) | 2021-02-02 | 2022-08-11 | Dow Silicones Corporation | Composition de silicone imprimable et ses procédés de préparation et d'utilisation |
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- 1991-11-12 WO PCT/US1991/008436 patent/WO1992010543A1/fr active IP Right Grant
- 1991-11-12 DE DE69122625T patent/DE69122625T2/de not_active Expired - Fee Related
- 1991-11-12 EP EP92900658A patent/EP0561893B1/fr not_active Expired - Lifetime
- 1991-11-12 JP JP4501929A patent/JPH06503591A/ja active Pending
- 1991-11-12 CA CA002096228A patent/CA2096228A1/fr not_active Abandoned
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US6908682B2 (en) | 2002-09-12 | 2005-06-21 | 3M Innovative Properties Company | Photocured silicone sealant having improved adhesion to plastic |
DE102008000156A1 (de) | 2008-01-25 | 2009-07-30 | Wacker Chemie Ag | Durch Bestrahlung aktivierte Hydrosilylierungsreaktionen |
US8088878B2 (en) | 2008-01-25 | 2012-01-03 | Wacker Chemie Ag | Hydrosilylation reactions activated through radiation |
US10471653B2 (en) | 2014-11-06 | 2019-11-12 | Wacker Chemie Ag | Method for producing silicone elastomer parts |
WO2016071241A1 (fr) | 2014-11-06 | 2016-05-12 | Wacker Chemie Ag | Procédé de production de pièces d'élastomères de silicone |
DE102014222685A1 (de) | 2014-11-06 | 2016-05-12 | Wacker Chemie Ag | Verfahren zur Herstellung von Siliconelastomerteilen |
WO2017081028A1 (fr) | 2015-11-09 | 2017-05-18 | Wacker Chemie Ag | Compositions de silicone permettant de fabriquer des pièces moulées élastomères au moyen d'un procédé balistique |
WO2017089496A1 (fr) | 2015-11-26 | 2017-06-01 | Wacker Chemie Ag | Compositions de silicone haute viscosité destinées à la fabrication de pièces moulées en élastomère par un procédé de fabrication additive balistique |
WO2017108208A1 (fr) | 2015-12-21 | 2017-06-29 | Wacker Chemie Ag | Dispositif d'impression 3d et procédé de fabrication d'un objet à l'aide d'un dispositif d'impression 3d |
US10987856B2 (en) | 2015-12-21 | 2021-04-27 | Wacker Chemie Ag | Method and device for producing an object by using a 3D printing device |
WO2017121733A1 (fr) | 2016-01-11 | 2017-07-20 | Wacker Chemie Ag | Compositions de silicone réticulables destinées à la fabrication de pièces façonnées hautement transparentes au moyen d'un procédé de fabrication par jets multiples |
US10669421B2 (en) | 2016-01-11 | 2020-06-02 | Wacker Chemie Ag | Cross-linkable silicone compositions for producing highly transparent molded parts by means of ballistic methods |
WO2018014948A1 (fr) | 2016-07-20 | 2018-01-25 | Wacker Chemie Ag | Dispositif d'impression 3d et procédé pour produire des objets |
WO2019025002A1 (fr) | 2017-08-04 | 2019-02-07 | Wacker Chemie Ag | Stabilisation de catalyseurs à base de métal noble |
DE102017216072A1 (de) | 2017-09-12 | 2017-10-26 | Wacker Chemie Ag | Durch Bestrahlung mit UV-Licht vernetzbare Siliconzusammensetzungen |
Also Published As
Publication number | Publication date |
---|---|
DE69122625T2 (de) | 1997-04-17 |
KR930703401A (ko) | 1993-11-30 |
WO1992010543A1 (fr) | 1992-06-25 |
JPH06503591A (ja) | 1994-04-21 |
EP0561893A1 (fr) | 1993-09-29 |
CA2096228A1 (fr) | 1992-06-14 |
US6376569B1 (en) | 2002-04-23 |
DE69122625D1 (de) | 1996-11-14 |
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