EP0559397B1 - Gerät zur genauen Positionierung - Google Patents

Gerät zur genauen Positionierung Download PDF

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Publication number
EP0559397B1
EP0559397B1 EP93301484A EP93301484A EP0559397B1 EP 0559397 B1 EP0559397 B1 EP 0559397B1 EP 93301484 A EP93301484 A EP 93301484A EP 93301484 A EP93301484 A EP 93301484A EP 0559397 B1 EP0559397 B1 EP 0559397B1
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EP
European Patent Office
Prior art keywords
signal
movable
control
disturbance
control means
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Expired - Lifetime
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EP93301484A
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English (en)
French (fr)
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EP0559397A2 (de
EP0559397A3 (en
Inventor
Mikio C/O Canon Kabushiki Kaisha Sato
Katsumi c/o Canon Kabushiki Kaisha Asada
Shinji c/o Canon Kabushiki Kaisha Wakui
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Canon Inc
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Canon Inc
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709Vibration, e.g. vibration detection, compensation, suppression or isolation
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00Program-control systems
    • G05B19/02Program-control systems electric
    • G05B19/18Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of program data in numerical form
    • G05B19/19Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of program data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B5/00Anti-hunting arrangements
    • G05B5/01Anti-hunting arrangements electric
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/37Measurements
    • G05B2219/37275Laser, interferometer
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/37Measurements
    • G05B2219/37313Derive speed from position
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/41Servomotor, servo controller till figures
    • G05B2219/41117Cancel vibration during positioning of slide
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
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    • G05B2219/41Servomotor, servo controller till figures
    • G05B2219/41179PI precompensation for speed loop
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/41Servomotor, servo controller till figures
    • G05B2219/41181PID precompensation for position loop
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/41Servomotor, servo controller till figures
    • G05B2219/41195Cross coupled feedback, position change one axis effects control of other
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/41Servomotor, servo controller till figures
    • G05B2219/41346Micropositioner in x, y and theta
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/41Servomotor, servo controller till figures
    • G05B2219/41367Estimator, state observer, space state controller
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/41Servomotor, servo controller till figures
    • G05B2219/41457Superposition of movement
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/42Servomotor, servo controller kind till VSS
    • G05B2219/42104Loop switch, speed loop then position loop, mode switch
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/45Nc applications
    • G05B2219/45026Circuit board, pcb
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/49Nc machine tool, till multiple
    • G05B2219/49258Two y axis to control also rotation
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/49Nc machine tool, till multiple
    • G05B2219/49271Air bearing slide, hydraulic, electromagnetic bearing
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/50Machine tool, machine tool null till machine tool work handling
    • G05B2219/50046Control of level, horizontal, inclination of workholder, slide

Definitions

  • This invention relates to a precision positioning apparatus, and particularly to a precision positioning apparatus suitable for a positioning control system for a semiconductor exposing apparatus such as a stepper.
  • the positioning accuracy required is becoming higher with the recent rapid increasing of the degree of integration of semiconductive elements.
  • the present day positioning accuracy of the practical level is of the order of several tens of nanometers for a stage carrying thereon a wafer to be positioned, but positioning accuracy of the order of one nanometer is expected to become necessary in the near future. In order to improve throughput, it is necessary to effect such highly accurate positioning at a higher speed.
  • the rigidity of the above-described apparatus is low and therefore, the disturbance of the other postures such as yawing and pitching than translation motion is great and such movement, like the vibration of the base plate, becomes the cause of the aggravation of positioning accuracy and an increased positioning time.
  • the prior-art fixed table acceleration feedback has suffered from the problem that it can hardly correct such disturbance of the postures.
  • US-A-4956789 discloses an apparatus in which a target trajectory comprising an aggregation of target positions varying with time is determined.
  • the target positions are supplied to a control unit together with a signal representative of the actual position of a movable unit.
  • the control unit then produces a drive signal which is arranged to reduce the difference between the actual position of the movable unit and a target position to zero.
  • the determined drive signal is then supplied to an actuator so that a drive force is transmitted from the actuator to the movable unit, to cause the movable unit to be moved to the target position.
  • the present invention has been made in view of the above-noted problems peculiar to the prior art and the object thereof is to provide a non-contact type precision positioning apparatus which can properly correct the disturbance of posture and vibration based on low rigidity which is a feature of a non-contact guide mechanism and can accomplish stable, highly accurate positioning with a high speed.
  • a precision positioning apparatus comprising:
  • the vibration between the conveying body and a guide surface caused by the rolling of the base plate resulting from the movement reaction force of the conveying body as previously described can be detected as a "disturbance" and be eliminated.
  • the disturbance observer is adopted in the control of a motor, a robot or the like in recent years. This technique foresees the disturbance of torque or thrust from a control voltage to a motor and the actual speed of the motor and compensates for it.
  • Equation (3) can be expressed by a block diagram as shown in the dotted line of Figure 3. This is then converted into a voltage value and superposed on the voltage command value U r , thereby compensating for the influence of the torque disturbance T d .
  • Figure 4 shows an equivalent circuit showing the relations of the command voltage U r to the displacement x 1 of the linear motor of the present invention when it is used.
  • Figure 4 is a diagram in which, relative to the circuit of Figure 2, the angle of rotation ⁇ is substituted for by displacement x 1 , the torque constant K t is substituted for by a thrust constant k t , the inertia J is substituted for by inertia m 1 , the disturbance torque T d is substituted for by a disturbance force F d , the angular velocity ⁇ is substituted for by a velocity v, and the viscosity constant C is substituted for by a constant C 1 and more or less equivalent conversion is applied.
  • Figure 5 is a diagram in which the disturbance observer is combined with the linear motor of Figure 4.
  • the influence of the rolling of the base plate can be eliminated, but the amount of translated state of the stage is varied by the stage posture correcting operation performed after the positioning in the direction of translation of the stage and the estimated disturbance waveform of the disturbance observer is disturbed. This has led to the problem that the positioning characteristic is aggravated more than when the disturbance observer is not used.
  • a precision positioning apparatus carried on a base plate and having translation moving means and posture correcting means and which is suitable for practical use in terms of cost and strength and which properly corrects the disturbance of posture and vibration based on low rigidity which is a feature of a non-contact guide mechanism and can accomplish stable and highly accurate positioning with a high speed.
  • the second form of the present invention is a positioning apparatus carried on a base plate and having translation moving means and posture correcting means and which is provided with first control means for outputting a first command signal to translation driving means on the basis of the output from measuring means for measuring the amount of state of translation movement and a translation reference value, third control means for posture control outputting a command signal to posture driving means on the basis of the output from posture measuring means and a posture reference value, and second control means, namely, a so-called "disturbance observer", for calculating a disturbance to a stage on the basis of the output from the measuring means for measuring the amount of state of translation movement and an input signal to the translation driving means and outputting a second command signal for negating the disturbance, and adds the first command signal and the second command signal together to provide an input signal to the translation driving means, thereby detecting and eliminating the vibration between the stage and a guide surface by the rolling of the fixed table as a "disturbance".
  • first control means for outputting a first command signal to translation driving means on the
  • the influence of the posture correcting means upon the disturbance observer is eliminated by modifying means for the input of the amount of translation state of the disturbance observer which modifying means is first modifying means and uses a control command value for the correction of the posture of the stage and/or the posture information from the posture measuring means, and/or modifying means for the output of the disturbance observer which modifying means is second modifying means and takes the dynamic characteristic of a posture correcting control system into account.
  • the vibration between the stage and the guide surface attributable to the rolling of the base plate resulting from the movement of the stage is detected and eliminated as a "disturbance", thereby realizing a positioning characteristic of high performance.
  • Figure 1 is a schematic diagram of a precision positioning apparatus according to an embodiment of the present invention.
  • the reference numeral 1 designates non-contact guide means such as an air bearing
  • the reference numeral 2 denotes a linear motor which is driving means
  • the reference numeral 3 designates a wafer stage as a conveying body which is driven by the linear motor 2 and on which a wafer is placed
  • the reference numeral 4 denotes a base plate
  • the reference numeral 5 designates position measuring means for measuring a position or displacement amount of the conveying body, such as a laser interferometer
  • the reference numeral 7 denotes first control means
  • the reference numeral 8 designates second control means for estimating a disturbance force, i.e., a disturbance observer.
  • the reference numeral 9 denotes a differentiator
  • the reference numeral 10 designates a damper
  • the reference numeral 11 denotes a coil spring
  • the reference numerals 12 and 13 designate mode changeover switches
  • the reference numeral 14 denotes a speed mode series compensator
  • the reference numeral 15 designates a position mode series compensator.
  • such elements as a projection optical system, a mask stage and an illuminating system are provide above the wafer stage 3 in succession from the stage 3 side. The image of the circuit pattern of a mask on the mask stage is projected onto the wafer on the wafer stage 3 by the projection optical system and is transferred to the wafer, whereby a semiconductive device is made.
  • the non-contact type guide means 1 is fixed on the base plate 4, and the conveying body 3 integral with the mover of the linear motor 2 floats by a minute amount relative to the guide means 1 and is moved in a non-contact fashion in x direction by said driving force f with the aid of the linear motor 2 and the guide means 1.
  • the second control means 8 is provided to eliminate such an influence, and the positional information of the conveying body 3 obtained from the position measuring means 5 is differentiated by the differentiator 9 to obtain velocity information v 1 , and by the use of this velocity information and a control command u, the estimated value F de of the disturbance force by at least one of the vibration, the pitching and rolling is found, and in order to compensate for this, a control amount u" is superposed on the output u' of the first control means 7.
  • Figure 1 may be represented by a block diagram as shown in Figure 7.
  • the first control means 7 is shown as a digitally constructed block, and it effects PI compensation in the speed mode, and effects PID compensation in the position control mode.
  • the non-contact type conveying body 3 and the base plate 4 which are the objects of control effect modeling as a compound system of two degrees of freedom, and the conveying body 3 takes the displacement x p by translation movement and in addition, the influence x th of yawing movement which, among rotational movements, particularly poses a problem into account.
  • R v is a command speed
  • R p is a reference position
  • T is a sampling period
  • K p1 is a speed control mode proportional gain
  • K i1 is a position control mode integrated gain
  • K p2 is a position control mode proportional gain
  • K i2 is a position control mode integrated gain
  • K D2 is a position control mode differential gain.
  • Z -1 is a lag operator
  • HOLD is a holder
  • s is a differential operator
  • k t is a linear motor thrust constant
  • m 1 is the mass of the conveying body
  • k tn is the nominal value of the linear motor thrust constant
  • m 1n is the nominal value of the mass of the conveying body
  • g 0 is an observer gain
  • 1 r is the length from the center of gravity of the conveying body to the right force acting point
  • L 1 is the length from the center of gravity of the conveying body to the left force acting point
  • L 2 is the length from the center of gravity of the conveying body to the position measuring point
  • m 2 is the mass of the base plate
  • c 1 , c 2 and c y are viscosity constants
  • k 1 , k 2 and k y are spring constants
  • x th is the displacement in x direction by pitching
  • x p is the displacement in x direction by translation movement
  • the frequency characteristic (the characteristic in the position control mode) from the disturbance force applied to the base plate 4 to the displacement of the conveying body 3 is shown in Figures 8A and 8B.
  • Figure 8A shows the amptitude of response
  • Figure 8B shows the phase of response
  • the dimension of amplitude is compliance (displacement/force).
  • Figures 9A and 9B show the displacement waveform of the conveying body to a unit step disturbance force applied to the fixed table.
  • Figure 9A show the reponse till time t 1 for response to be settled in a certain predetermined range
  • Figure 9B shows the response from after the time t 1 till time 2t 1
  • the vertical axes of these figures represent the displacement x 1 of the conveying body 3 normalized by the same representative length.
  • Vibration of great period remarkably seen in the example of the prior art shown in Figure 9B is the vibration of the conveying body by the rolling of the base plate 4, and vibration of small period is the yawing vibration of the conveying body 3.
  • Figures 10A and 10B show the displacement of the conveying body 3 when the conveying body 3 is actually moved by a predetermined distance ⁇ by the speed control mode and the position control mode and precisely positioned.
  • Figure 10A shows the state of the response till time t 2 when deviation is settled in a certain predetermined range
  • Figure 10B shows the state of the response from after the time t 2 till time 2t 2
  • the vertical axes in these figures represent values normalized by the movement distance ⁇ .
  • the rough state of the response shown in Figure 10A differs very little from that in the prior-art method, but the response in the minute positioning area of Figure 10B differs entirely from that in the prior-art method, and the response according to the present embodiment is better in convergence than that by the method using the prior-art base plate acceleration feedback. This is because, as previously described. According to the present embodiment, the suppressing characteristic to the vibration of the base plate and the rotational vibration of the conveying body is greatly improved. Thus, if precision positioning is effected by the present embodiment, improved positioning accuracy and shortened positioning time can be achieved as compared with the prior-art method.
  • the speed signal v 1 is found from the position signal obtained from the position detecting means, by the differentiator, and is used as the input of the second control means.
  • the embodiment shown in Figure 1 relates to a single-axis positioning apparatus, but the present invention can also be applied to a two-axis (or multi-axis) positioning apparatus like a stepper without any difference from the present embodiment.
  • control means namely, a disturbance observer, for estimating a disturbance force causing the vibration of the conveying body 3 attributable to the rolling of the base plate 4 resulting from the movement reaction force of the conveying body 3, or the disturbance of other posture such as the yawing or pitching of the conveying body 3 than translation movement, and producing a control input negating this, whereby the vibration of the conveying body 3 attributable to the rolling of the base plate 4 resulting from the movement reaction of the conveying body 3, or the disturbance of other posture such as the yawing or pitching vibration of the conveying body 3 than translation movement is effectively suppressed and improved positioning accuracy and shortened positioning time become possible as compared with the method using the prior-art base plate acceleration feedback.
  • FIG 11 is a schematic diagram of a precision positioning apparatus according to another embodiment of the present invention in a stepper for the manufacture of various devices.
  • the stepper originally has structure capable of controlling all of the six degrees of freedom of a stage, but in the present embodiment, for simplicity, description will be made of a positioning apparatus of two degrees of freedom for measuring and controlling, in addition to one degree of freedom of translation in x direction, the degree of freedom of rotation of the stage in ⁇ direction, as shown in Figure 11.
  • this simplification does not spoil the features of the present invention in any way.
  • the reference numeral 101 designates guide means such as a static pressure bearing or an antifriction bearing
  • the reference numeral 102 denotes a linear motor which is translation driving means
  • the reference numeral 103 designates a coarse movement stage driven by the linear motor 102
  • the reference numeral 104 denotes posture correction driving means for effecting posture correction in ⁇ direction
  • the reference numeral 105 designates a fine movement stage driven by the posture correction driving means 104
  • the reference numeral 106 denotes a base plate
  • the reference numeral 107 designates a position measuring means for measuring the position in the direction of translation by a laser interferometer or the like
  • the reference numeral 108 denotes posture measuring means for measuring the posture of the fine movement stage 105
  • the reference numeral 109 designates first control means
  • the reference numeral 110 denotes third control means for posture correction
  • the reference numeral 111 designates second control means used in the first embodiment to estimate a disturbance, i.e., a disturbance observer similar to that
  • the coarse movement stage 103, the fine movement stage 105 carried thereon, the posture correction driving means 104 and the posture measuring means 108 together are simply called a stage.
  • a stage Again in Figure 11, by the use of an illuminating system, a mask stage and a projection optical system, all not shown, the image of the circuit pattern of a mask on the mask stage is projected and transferred onto a wafer on the stage 105.
  • the first control means 109 changes over the speed mode compensator 118 and the position control mode compensator 119 by the changeover switches 116 and 117 in conformity with the deviation e p between the displacement X l of the fine movement stage 105 relative to the base plate 106 obtained by the translation position detecting means 107 fixed to the base plate 106 and a target position r p .
  • the compensators in the respective modes are popular PI and PID series compensators.
  • a command value u L to the linear motor 102 which is the translation driving means is calculated by the first control means 109.
  • the difference between the inclination ⁇ f of the fine movement stage 105 detected by the posture measuring means 108 and a target value r f is delivered to the series compensator 122, whereby a command value u f to the posture correction driving means 104 is calculated.
  • a control command u is supplied to the linear motor 102 fixed to the base plate 106, and a thrust is created.
  • the fixed table 106 is supported from a floor by the damper 113 and coil spring 114 for intercepting the vibration of the floor.
  • the guide means 101 is fixed to the base plate 106, and the entire stage including the coarse movement stage 103 integral with the mover of the linear motor 102 is guided by the guide means 101 and moved in x direction.
  • the second control means 111 is estimating means for estimating a disturbance force by the disturbance observer shown in the aforedescribed embodiment, and in the second control means 111, a disturbance including positional deviation vibration attributable to the rolling of the base plate is estimated from stage position information obtained by the measuring means 107 and the command signal u to the linear motor 102, and it is converted into a voltage and added to u L .
  • m 3n in the second control means 111 is the nominal value of the mass of the stage including the fine movement stage, i.e., m ln + m fn .
  • the second control means 111 which is such a disturbance observer is intactly applied to a positioning apparatus having the posture correcting means 110, like a stepper, the influence of the posture correction of the fine movement stage 105 effected after the positioning in the direction of translation is superposed as a step-like disturbance on the stage position information detected by the position measuring means 107 and accordingly, affects the operation of the disturbance observer, and this may lead to the problem of an increased positioning time.
  • Figure 11 the construction of Figure 11 can be shown by a block diagram as shown in Figure 12.
  • Figure 12 the fine movement stage 105, the coarse movement stage 103 and the base plate 106 are dealt with as a secondary vibration system.
  • r P is a command position
  • r V is a command speed
  • r f is a command posture
  • s is a differential operator
  • k tL is a linear motor thrust constant
  • k tLn is the nominal value of the linear motor thrust constant
  • m l is the mass of the coarse movement stage
  • m ln is the nominal value of the mass of the coarse movement stage
  • m f is the mass of the fine movement stage
  • m fn is the nominal value of the mass of the fine movement stage
  • m 3n is the nominal value (m ln + m fn ) of the mass of the stage
  • m 2 is the mass of the fixed table
  • m 2n is the nominal value of the mass of the fixed table
  • c 1 , c 2 and c f are viscosity constants
  • k 1 , k 2 and k 3 are spring constants
  • x 1 is stage displacement
  • g 1 and g 2 are observer
  • the displacement waveform of the stage for a unit step disturbance force applied to the base plate 106 is shown in Figures. 14A and 14B.
  • Figure 14A shows the response till time t 3 for the response to be settled in a predetermined range
  • Figure 14B shows the response from the time t 3 till time 2t 3 .
  • the vertical axes represent normalized stage displacement x l /L normalized by the same representative length L.
  • the vibration of great cycle remarkably seen in the example of the prior art shown in Figure 14B is the positional deviation vibration of the stage caused by the rolling of the base plate 106
  • the vibration of small cycle is the vibration by the influence of the fine movement stage control system.
  • the supporting characteristic can be more greatly improved for the vibration of the stage caused by the rolling of the fixed table 106 and the vibration of the fine movement stage control system than by the prior-art base plate acceleration feedback.
  • first control means for outputting a first command signal to translation driving means on the basis of the output from measuring means for the amount of state of translation movement and a translation target value
  • third control means for posture control for outputting a command signal to posture driving means on the basis of the output from posture measuring means and a posture target value
  • second control means i.e., a so-called “disturbance observer"
  • the first command signal and the second command signal are added together to provide an input signal to the translation driving means, whereby the vibration between the stage and a guide surface caused by the rolling of the base plate can be detected and eliminated as a "disturbance”.
  • the influence of the posture correcting means upon the disturbance observer can be eliminated by modifying means for the input of the amount of translation state of the disturbance observer using a control command value for the correction of the posture of the stage and/or the posture information from the posture measuring means, which modifying means is first modifying means, and/or modifying means for the output of the disturbance observer taking the dynamic characteristic of a posture correction control system into account, which modifying means is second modifying means.

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  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Claims (10)

  1. Gerät zur genauen Positionierung, das aufweist:
    ein Grundelement (4; 106),
    ein bewegbares Element (3; 103, 105), das in bezug auf das Grundelement (4; 106) bewegbar ist, und
    eine Antriebsvorrichtung zum Bewegen des bewegbaren Elements (3; 103) gemäß einem Steuerbefehlssignal (U),
       dadurch gekennzeichnet, daß es ferner aufweist:
    eine erste Steuervorrichtung (7; 109) zum Ausgeben eines Steuersignals (U'; UL) als Reaktion auf die Differenz zwischen einem Sollpositionssignal (Rp; rp) und einem Signal (X1), das die Istposition des bewegbaren Elements (3; 103, 105) darstellt),
    eine zweite Steuervorrichtung (8; 111) zum Ermitteln einer Störungskraft, welche das bewegbare Element (3; 103, 105) beeinflußt, und zum Ausgeben eines entsprechenden Korrektursignals (U"; Uo), wobei die Ermittlung auf der Grundlage mindestens entweder eines Signals (X1) ausgeführt wird, das die Position des bewegbaren Elements (3; 103, 105) darstellt, oder eines Signals, das die Bewegungsgeschwindigkeit des bewegbaren Elements (3; 103, 105) darstellt, und
    eine Vorrichtung zum Erzeugen des Steuerbefehlssignals (U) aus dem Steuersignal (U'; UL), das durch die erste Steuervorrichtung (7; 109) erzeugt ist, und dem Korrektursignal (U"; Uo), das durch die zweite Steuervorrichtung (8; 111) erzeugt ist.
  2. Gerät gemäß Anspruch 1, wobei das bewegbare Element (103, 105) aufweist:
    einen ersten bewegbaren Abschnitt (103), der in bezug auf das Grundelement (106) bewegbar ist, und
    einen zweiten bewegbaren Abschnitt (105), der in bezug auf den ersten bewegbaren Abschnitt (103) bewegbar ist,
    die Antriebsvorrichtung, die ferner eingerichtet ist, den zweiten bewegbaren Abschnitt (105) gemäß einem zweiten Steuerbefehlssignal (Uf) zu bewegen, wobei das Gerät ferner aufweist:
    eine dritte Steuervorrichtung (110) zum Ausgeben des zweiten Steuerbefehlssignals (Uf) als Reaktion auf die Differenz zwischen einer Sollposition (rf) und einem Signal (f), das die Istposition des zweiten bewegbaren Abschnitts (105) darstellt.
  3. Gerät gemäß Anspruch 2, wobei der zweite bewegbare Abschnitt (105) in bezug auf den ersten bewegbaren Abschnitt (103) drehbar ist und die Antriebsvorrichtung zum Drehen des zweiten bewegbaren Abschnitts (105) gemäß dem Steuerbefehlssignal (Uf) eingerichtet ist.
  4. Gerät gemäß Anspruch 2 oder 3, wobei die zweite Steuervorrichtung (111) ferner eingerichtet ist, das Korrektursignal (U0) auf der Grundlage eines weiteren Signals (f) auszugeben, welches die Istposition des zweiten bewegbaren Abschnitts (105) darstellt.
  5. Gerät gemäß Anspruch 4, wobei die zweite Steuervorrichtung (111) ferner eine erste Abwandlungsvorrichtung (120) zum Berechnen des Einflusses einer Stellungsänderung aus dem Signal (f) aufweist, das die Istposition des zweiten bewegbaren Abschnitts (105) darstellt, wobei die zweite Steuervorrichtung (111) ferner eingerichtet ist, das Korrektursignal (U0) auf der Grundlage des Signals (f), das die Istposition des zweiten bewegbaren Abschnitts (105) darstellt, abgewandelt auszugeben, um den Einfluß darauf gemäß der Berechnung der ersten Abwandlungsvorrichtung (120) zu vermindern.
  6. Gerät gemäß Anspruch 4 oder 5, wobei die zweite Steuervorrichtung ferner eine zweite Abwandlungsvorrichtung (121) aufweist, wobei die zweite Steuervorrichtung (111) eingerichtet ist, das Korrektursignal (U0) auszugeben, wobei das Korrektursignal durch die zweite Abwandlungsvorrichtung (121) gefiltert wird, um den Resonanzspitzenwert des Geräts zur genauen Positionierung zu unterdrücken.
  7. Gerät gemäß einem der vorhergehenden Ansprüche, das ferner aufweist:
    eine Stoßdämpfungsvorrichtung zum Tragen des Grundelements (4; 106) und
    eine kontaktlose Führung, die auf dem Grundelement (4; 106) zum Tragen des bewegbaren Elements (3; 103, 105) angeordnet ist.
  8. Gerät gemäß Anspruch 7, wobei die Führung mit einer Vorrichtung zum Loslagern des bewegbaren Elements (3; 103, 105) auf einem Luftkissen ausgestattet ist.
  9. Gerät gemäß einem der vorhergehenden Ansprüche, wobei das bewegbare Element (3; 103, 105) einen bewegbaren Tisch aufweist, um darauf ein zu belichtendes Element zu tragen.
  10. Belichtungsgerät, das aufweist:
    ein Gerät gemäß Anspruch 7 oder 8 und
    eine Belichtungsvorrichtung zum Belichten eines zu belichtenden Elements, wobei das Element durch das bewegbare Element (3; 103, 105) des Geräts zum Positionieren getragen wird.
EP93301484A 1992-03-02 1993-02-26 Gerät zur genauen Positionierung Expired - Lifetime EP0559397B1 (de)

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JP78756/92 1992-03-02
JP7875692 1992-03-02
JP7875692 1992-03-02
JP25980/93 1993-01-22
JP02598093A JP3217522B2 (ja) 1992-03-02 1993-01-22 精密位置決め装置
JP2598093 1993-01-22

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EP0559397A3 EP0559397A3 (en) 1995-06-07
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DE69330476T2 (de) 2001-12-13
JP3217522B2 (ja) 2001-10-09
EP0559397A2 (de) 1993-09-08
EP0559397A3 (en) 1995-06-07
US5511930A (en) 1996-04-30
JPH05308044A (ja) 1993-11-19
DE69330476D1 (de) 2001-08-30

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