EP0470529B2 - Substrat für lithographische Druckplatten - Google Patents
Substrat für lithographische Druckplatten Download PDFInfo
- Publication number
- EP0470529B2 EP0470529B2 EP19910113068 EP91113068A EP0470529B2 EP 0470529 B2 EP0470529 B2 EP 0470529B2 EP 19910113068 EP19910113068 EP 19910113068 EP 91113068 A EP91113068 A EP 91113068A EP 0470529 B2 EP0470529 B2 EP 0470529B2
- Authority
- EP
- European Patent Office
- Prior art keywords
- plate
- substrate
- light
- aluminum
- lithographic printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007639 printing Methods 0.000 title claims description 63
- 239000000758 substrate Substances 0.000 title claims description 44
- 229910052782 aluminium Inorganic materials 0.000 claims description 60
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 60
- 238000005096 rolling process Methods 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- 230000003746 surface roughness Effects 0.000 claims description 15
- 238000011282 treatment Methods 0.000 claims description 12
- 229910000838 Al alloy Inorganic materials 0.000 claims description 5
- 239000003513 alkali Substances 0.000 claims description 5
- 239000003792 electrolyte Substances 0.000 claims description 5
- 238000005238 degreasing Methods 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 67
- 239000000203 mixture Substances 0.000 description 24
- 229920005989 resin Polymers 0.000 description 21
- 239000011347 resin Substances 0.000 description 21
- 229920002379 silicone rubber Polymers 0.000 description 18
- 239000004945 silicone rubber Substances 0.000 description 18
- 239000002253 acid Substances 0.000 description 14
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 12
- -1 hexafluorophosphates Chemical class 0.000 description 12
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 239000000243 solution Substances 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 239000007795 chemical reaction product Substances 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 238000002048 anodisation reaction Methods 0.000 description 5
- 125000004429 atom Chemical group 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 239000003999 initiator Substances 0.000 description 5
- 239000004115 Sodium Silicate Substances 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 150000001244 carboxylic acid anhydrides Chemical group 0.000 description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 4
- 239000011247 coating layer Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 150000008049 diazo compounds Chemical class 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 4
- 229910052911 sodium silicate Inorganic materials 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- 239000005018 casein Substances 0.000 description 3
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 3
- 235000021240 caseins Nutrition 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 238000005886 esterification reaction Methods 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 238000007645 offset printing Methods 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 239000010731 rolling oil Substances 0.000 description 3
- 238000007788 roughening Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 2
- HSJKGGMUJITCBW-UHFFFAOYSA-N 3-hydroxybutanal Chemical compound CC(O)CC=O HSJKGGMUJITCBW-UHFFFAOYSA-N 0.000 description 2
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 241000283690 Bos taurus Species 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical group CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 150000007824 aliphatic compounds Chemical class 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- 150000001491 aromatic compounds Chemical class 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000001913 cellulose Chemical class 0.000 description 2
- 229920002678 cellulose Chemical class 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- FGDMJJQHQDFUCP-UHFFFAOYSA-M sodium;2-propan-2-ylnaphthalene-1-sulfonate Chemical compound [Na+].C1=CC=CC2=C(S([O-])(=O)=O)C(C(C)C)=CC=C21 FGDMJJQHQDFUCP-UHFFFAOYSA-M 0.000 description 2
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 2
- 150000003460 sulfonic acids Chemical class 0.000 description 2
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- CQGBQHVFCCEEPW-UHFFFAOYSA-N (4-nonylphenyl) hydrogen sulfate Chemical class CCCCCCCCCC1=CC=C(OS(O)(=O)=O)C=C1 CQGBQHVFCCEEPW-UHFFFAOYSA-N 0.000 description 1
- ZMQWRASVUXJXGM-SREVYHEPSA-N (z)-4-cyclohexyloxy-4-oxobut-2-enoic acid Chemical compound OC(=O)\C=C/C(=O)OC1CCCCC1 ZMQWRASVUXJXGM-SREVYHEPSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- ZXDDPOHVAMWLBH-UHFFFAOYSA-N 2,4-Dihydroxybenzophenone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 ZXDDPOHVAMWLBH-UHFFFAOYSA-N 0.000 description 1
- IRLYGRLEBKCYPY-UHFFFAOYSA-N 2,5-dimethylbenzenesulfonic acid Chemical compound CC1=CC=C(C)C(S(O)(=O)=O)=C1 IRLYGRLEBKCYPY-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- XUDBVJCTLZTSDC-UHFFFAOYSA-N 2-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C=C XUDBVJCTLZTSDC-UHFFFAOYSA-N 0.000 description 1
- ZRUOTKQBVMWMDK-UHFFFAOYSA-N 2-hydroxy-6-methylbenzaldehyde Chemical compound CC1=CC=CC(O)=C1C=O ZRUOTKQBVMWMDK-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical group OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- DIYZUWALSKUDMZ-UHFFFAOYSA-N 2-phenylethyl hydrogen sulfate Chemical class OS(=O)(=O)OCCC1=CC=CC=C1 DIYZUWALSKUDMZ-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- ZRYCRPNCXLQHPN-UHFFFAOYSA-N 3-hydroxy-2-methylbenzaldehyde Chemical compound CC1=C(O)C=CC=C1C=O ZRYCRPNCXLQHPN-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- LBSXSAXOLABXMF-UHFFFAOYSA-N 4-Vinylaniline Chemical compound NC1=CC=C(C=C)C=C1 LBSXSAXOLABXMF-UHFFFAOYSA-N 0.000 description 1
- WQTCZINVPXJNEL-UHFFFAOYSA-N 4-amino-3-methylbenzenesulfonic acid Chemical compound CC1=CC(S(O)(=O)=O)=CC=C1N WQTCZINVPXJNEL-UHFFFAOYSA-N 0.000 description 1
- VZLUGGCFYPMLMI-UHFFFAOYSA-N 5-(3,5-dihydroxyphenyl)benzene-1,3-diol Chemical compound OC1=CC(O)=CC(C=2C=C(O)C=C(O)C=2)=C1 VZLUGGCFYPMLMI-UHFFFAOYSA-N 0.000 description 1
- 244000215068 Acacia senegal Species 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical class [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229920000623 Cellulose acetate phthalate Polymers 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- VKOUCJUTMGHNOR-UHFFFAOYSA-N Diphenolic acid Chemical compound C=1C=C(O)C=CC=1C(CCC(O)=O)(C)C1=CC=C(O)C=C1 VKOUCJUTMGHNOR-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- JVTAAEKCZFNVCJ-UHFFFAOYSA-M Lactate Chemical compound CC(O)C([O-])=O JVTAAEKCZFNVCJ-UHFFFAOYSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 206010034960 Photophobia Diseases 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- MRILCXWJOJSABZ-UHFFFAOYSA-N S(=O)(=O)(OOC1=C(C=CC=C1)CCCCCC(C)C)OCC(OCC)OCC Chemical class S(=O)(=O)(OOC1=C(C=CC=C1)CCCCCC(C)C)OCC(OCC)OCC MRILCXWJOJSABZ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 238000007112 amidation reaction Methods 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- WXNRYSGJLQFHBR-UHFFFAOYSA-N bis(2,4-dihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O WXNRYSGJLQFHBR-UHFFFAOYSA-N 0.000 description 1
- SODJJEXAWOSSON-UHFFFAOYSA-N bis(2-hydroxy-4-methoxyphenyl)methanone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=C(OC)C=C1O SODJJEXAWOSSON-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229940081734 cellulose acetate phthalate Drugs 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 150000001896 cresols Chemical group 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical class CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 description 1
- 229940043264 dodecyl sulfate Drugs 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- FCQJEPASRCXVCB-UHFFFAOYSA-N flavianic acid Chemical compound C1=C(S(O)(=O)=O)C=C2C(O)=C([N+]([O-])=O)C=C([N+]([O-])=O)C2=C1 FCQJEPASRCXVCB-UHFFFAOYSA-N 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- KVUAEFHJHLAYGM-UHFFFAOYSA-N hydroxysulfanylmethanol Chemical compound OCSO KVUAEFHJHLAYGM-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000005001 laminate film Substances 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 208000013469 light sensitivity Diseases 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- XZSZONUJSGDIFI-UHFFFAOYSA-N n-(4-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=C(O)C=C1 XZSZONUJSGDIFI-UHFFFAOYSA-N 0.000 description 1
- AJDUTMFFZHIJEM-UHFFFAOYSA-N n-(9,10-dioxoanthracen-1-yl)-4-[4-[[4-[4-[(9,10-dioxoanthracen-1-yl)carbamoyl]phenyl]phenyl]diazenyl]phenyl]benzamide Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2NC(=O)C(C=C1)=CC=C1C(C=C1)=CC=C1N=NC(C=C1)=CC=C1C(C=C1)=CC=C1C(=O)NC1=CC=CC2=C1C(=O)C1=CC=CC=C1C2=O AJDUTMFFZHIJEM-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-N naphthalene-2-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000007793 ph indicator Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 150000002989 phenols Chemical group 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 125000005498 phthalate group Chemical class 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 235000012752 quinoline yellow Nutrition 0.000 description 1
- 239000004172 quinoline yellow Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229940077386 sodium benzenesulfonate Drugs 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 235000011008 sodium phosphates Nutrition 0.000 description 1
- 235000019794 sodium silicate Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- MZSDGDXXBZSFTG-UHFFFAOYSA-M sodium;benzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=CC=C1 MZSDGDXXBZSFTG-UHFFFAOYSA-M 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000005420 sulfonamido group Chemical group S(=O)(=O)(N*)* 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000001043 yellow dye Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
- B21B1/22—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
- B41N1/083—Printing plates or foils; Materials therefor metallic for lithographic printing made of aluminium or aluminium alloys or having such surface layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/04—Graining or abrasion by mechanical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
- B21B1/22—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
- B21B1/227—Surface roughening or texturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B3/00—Rolling materials of special alloys so far as the composition of the alloy requires or permits special rolling methods or sequences ; Rolling of aluminium, copper, zinc or other non-ferrous metals
- B21B2003/001—Aluminium or its alloys
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B2261/00—Product parameters
- B21B2261/14—Roughness
Definitions
- the present invention relates to a substrate for a presensitized plate for use in making a lithographic printing plate (hereinafter referred to as "PS plate”) and hence for a lithographic printing plate and in particular, to a substrate for a PS plate or a lithographic printing plate which can show improved suitability for a plate scanner of an ink-presetting system.
- PS plate lithographic printing plate
- a PS plate comprising an aluminum substrate is in general imagewise exposed to light, developed with a developer and then subjected to retouching to give a lithographic printing plate.
- the resulting printing plate is put on a printing press to perform printing operations.
- the basic principle of the offset printing is to express light and shade of patterns in terms of the difference between the numbers of half-tone dots and, therefore, it is ideal that the half-tone dot portion having a rate of area occupied by the half-tone dots of 10% and the solid portion printed on the paper should have the same ink thickness.
- the amount of ink consumed during the offset printing depends on the area occupied by the patterns and correspondingly it is necessary to read the rate of area occupied by the patterns for every key pitch of an ink bottle and to control the switching (or opening and closing) of the ink key depending on the output value of the rate. For this reason, an ink-presetting system is in general used for controlling the switching of the ink key.
- the "ink-presetting system” herein means a system for reading the rate of the area of a lithographic printing plate occupied by patterns for every key pitch by a plate scanner prior to the fitting of the printing plate to a printing press and for automatically controlling the switching of the ink key depending on the rate observed.
- the application of such a system makes it possible to substantially reduce the time required for adjusting the amount or thickness of ink and to improve productivity.
- the reading of the rate of area of a lithographic printing plate occupied by patterns is generally carried out by the following method using a plate scanner.
- the method comprises the steps of irradiating the plate surface with light from a light source arranged perpendicularly to the scanning direction, detecting or determining the quantity of light reflected from the surface of an aluminum plate on the non-image area by photosensors arranged on a linear line parallel to the light source and calculating the area occupied by light-absorbing image area to thus determine the rate of area occupied by the patterns.
- a lithographic printing plate comprising an aluminum plate as a substrate
- the aluminum plate has stripes (rolling marks) on the surface along the rolling direction and hence the light incident upon the surface is scattered within the planes perpendicular to the rolling marks.
- the light which is made incident upon the aluminum plate perpendicularly to the rolling direction thereof is scattered back and forth (parallel direction) relative to the direction of the light propagation. Therefore, the quantity of light detected by a method capable of detecting only the light within a limited angle of reflection is smaller than that observed when any scattering by the rolling marks is not caused.
- the light which is made incident upon the aluminum surface parallel to the rolling direction thereof is scattered and spreads towards the directions perpendicular to the direction of light propagation due to the presence of the rolling marks, but the resulting quantity of light detected is almost the same as that observed for the aluminum plate free of rolling marks if the quantities of light detected by all of the photosensors are integrated, since many light sources are arranged in this direction.
- the rolling marks are masked by, for instance, dispersion of titanium oxide powder in a light-sensitive layer and/or a primer layer for a lithographic printing plate requiring no dampening water, but a large amount of titanium oxide must be dispersed in the layers to mask the rolling marks and this makes the installation for dispersing the same complicated and expensive.
- WO-A-8102547 discloses a method for manufacturing a base material for an offset printing plate wherein an aluminum strip is provided on at least one surface with a defined surface roughness by means of rolls having a defined surface structure and then with an aluminum oxide layer by means of anodization.
- EP-A-0257957 discloses an aluminum alloy support for a lithographic printing plate comprising 0.30 wt% to less than 1.0 wt% of Mg, more than 0.3 wt% up to 1.3 wt% of Si, 0.003 wt% to 0.10 wt% of Cu and a balance of Al and impurities.
- a substrate for lithographic printing plates comprising a rolled aluminum plate whose specular gloss determined by making light incident upon the aluminum plate perpendicularly to the rolling direction of the rolled plate is at least 70% of that determined by making light incident upon the rolled plate parallel to the rolling direction of the rolled plate and whose surface roughness ranges from 0.1 to 0.01 ⁇ m expressed in terms of central line average surface roughness R a .
- the specular gloss of the aluminum plate used in the present invention as a material for making the substrate for lithographic printing plates, determined by making light incident upon the aluminum plate perpendicularly to the rolling direction of the plate is at least 70% of that determined by making light Incident upon the plate parallel to the rolling direction.
- G S ( ⁇ ) represented by the following equation (I) and can be determined by, for instance, Glossmeter VG-1D available from Nippon Denshoku Kogyo K.K.
- G s ( ⁇ )(%) ( ⁇ s / ⁇ os ) ⁇ (gloss of Reference Surface Used)
- the aluminum plate used in the invention as a material for the substrate used for lithographic printing plates is a plate-like material mainly comprising aluminum such as those comprising pure aluminum or those comprising an aluminum alloy containing a small amount of foreign atoms.
- foreign atoms are silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel and titanium.
- the content of these foreign atoms in the aluminum alloys is in the order of up to 10% by weight.
- Aluminum preferably used in the present invention is pure aluminum, but it is very difficult to produce completely pure aluminum from the viewpoint of the refining technique.
- the aluminum alloys having the foreign atom content defined above can be used in the present invention as materials for preparing the substrate without any problem.
- the composition of the aluminum plates usable in the present invention is not restricted to a specific one and hence those obtained from conventionally known or currently used materials can arbitrarily be employed.
- the aluminum plate used in the invention is usually produced by the rolling technique and in general has a thickness ranging from 0.1 to 0.5 mm.
- the specular gloss of the aluminum plate is greatly dependent upon the rolling rolls used in the rolling process and the rolling rolls are thus very important in the present invention.
- the surface roughness of the rolling rolls is most important and preferably those having an averaged central line surface roughness (R a ) of not more than 0.1 ⁇ m, more preferably not more than 0.05 ⁇ m are used.
- the aluminum plate obtained by rolling with rolls having such a surface roughness has a surface roughness (R a ) ranging from 0.1 to 0.01 ⁇ m.
- the specular gloss determined by making light incident upon the aluminum plate perpendicularly to the rolling direction of the plate is less than 70% of that determined by making light incident upon the plate parallel to the rolling direction. Accordingly, if the rate of area occupied by patterns is determined by a plate scanner, the plate scanner outputs a value greater than the true rate and, therefore, the resulting aluminum plate cannot be used in the present invention.
- the aluminum plate thus obtained is degreased and then desired coating layers can directly be applied thereto, but the surface of the plate may further be treated prior to the application of the coating layers.
- a rolling oil is adhered to the surface of the rolled aluminum plate and hence the plate must be degreased.
- the degreasing treatment is performed by the use of an alkali such as caustic soda, caustic potash, sodium carbonate, sodium phosphate and sodium silicate.
- Preferred conditions for degreasing are a temperature ranging from 30 to 100° C, an alkali concentration ranging from 1 to 50% and a treating time ranging from 1 to 100 seconds.
- coating layers such as a light-sensitive layer may directly be applied to the aluminum plate, but the plate may be subjected to other surface treatments such as graining, anodization and/or hydrophilization treatments prior to the application of the coating layers.
- Preferred graining treatments are, for instance, sand blasting or liquid honing methods in which an abrasive is blown on the plate surface, a brush graining method in which the aluminum surface is rubbed with a brush and wet abrasive particles and an electrolytic graining carried out in an electrolyte such as nitric acid or hydrochloric acid, which may, if necessary, be used in combination.
- the grained plate surface is cleaned with an acid or alkali and then anodized.
- the anodization treatment is in general performed in an electrolyte comprising sulfuric acid, but it may also be performed in an electrolyte such as those comprising phosphoric acid or a mixed acid of sulfuric ace and phosphoric acid.
- Preferred conditions for the anodization are not always particularly specified, but are in general an electrolyte concentration ranging from 1 to 30% by weight, a temperature ranging from 20 to 50° C, an anodization time ranging from 5 to 100 seconds and a current density ranging from 5 to 100 A/dm 2 .
- the aluminum plate may be hydrophilized by immersing it into a sodium silicate solution.
- Other hydrophilization treatments may also be used and examples thereof are immersion in a fluorozirconate solution, a polyacrylate solution and a polyvinylphosphonate solution.
- Preferred conditions for the hydrophilization treatment are a concentration ranging from 1 to 20% by weight, a temperature ranging from 20 to 80° C and a treating time ranging from 5 to 30 seconds.
- Various rinds of lithographic printing bates can be prepared by applying a variety of layers onto the surface of the thus treated aluminum substrate of the present invention for use in maring lithographic printing plates.
- PS plates comprise a substrate provided thereon with a light-sensitive layer.
- the light-sensitive layer is imagewise exposed to light directly through an original or through a film by the usual photomechanical method. Thereafter, the imagewise exposed light-sensitive layer is developed with a developer such as an organic solvent or an alkali solution to thus give ink-receptive image portions and hydrophilic non-image portions to hence give a lithographic printing plate.
- the light-sensitive layer maybe obtained from various rinds of light-sensitive composition. Specific examples thereof will be described below.
- Preferred examples of negative-working light-sensitive diazo compounds useful in the invention are a reaction product of a diazonium salt with an organic condensation agent having reactive carbonyl group, e.g., aldol or acetal as a condensation product of diphenylamine-p-diazonium salt and formaldehyde (so-called light-sensitive diazo resins) disclosed in U.S.Patent Nos. 2,063,631 and 2,667,415.
- Examples of other useful condensed diazo compounds are those disclosed in U.S. Patent No. 3,679,419 and U.K. Patent Nos. 1,312,925 and 1,312,926.
- the light-sensitive diazo compounds of this type are in general available in the form of water-soluble inorganic salts and therefore, they can be applied as an aqueous solution.
- substantially water-insoluble light-sensitive diazo resins obtained by reacting these water-soluble diazo compounds with aromatic or aliphatic compounds having either one or both of at least one phenolic hydroxyl group and sulfonic acid group in the manner as disclosed in U.K. Patent No. 1,280,885.
- hydroxybenzophenone examples include 2,4-dihydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2,2'-dihydroxy-4,4'-dimethoxybenzophenone and 2,2',4,4'-tetrahydroxybenzophenone.
- sulfonic acids include aromatic sulfonic adds such as sulfonic acids of benzene, toluene, xylene, naphthalene, phenol, naphthol and benzophenone or soluble salts thereof such as ammonium salts and alkali metal salts.
- aromatic sulfonic adds such as sulfonic acids of benzene, toluene, xylene, naphthalene, phenol, naphthol and benzophenone or soluble salts thereof such as ammonium salts and alkali metal salts.
- the compounds having a sulfonate group may in general be substituted with a lower alkyl group, a nitro group, a halo group, and/or other sulfonate groups.
- Preferred examples thereof are benzenesulfonic acid, toluenesulfonic acid, naphthalenesulfonic acid, 2,5-dimethylbenzenesulfonic acid, sodium benzenesulfonate, naphthalene-2-sulfonic acid, 1-naphthol-2 (or 4)-sulfonic acid, 2,4-dinitro-1-naphthol-7-sulfonic acid, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid, sodium m-(p'-anilinophenylazo)benzenesulfonate, alizarinsulfonic acid, o-toluidine-m-sulfonic acid and ethanesulfonic acid.
- Sulfuric acid esters of alcohols or aromatic hydroxy compounds or salts thereof are also preferably used. These compounds are usually available as anionic surfactants. Specific examples thereof are ammonium salts or alkali metal salts of lauryl sulfate, alkylaryl sulfates, p-nonylphenyl sulfate, 2-phenylethyl sulfate and isooctylphenoxy diethoxyethyl sulfate.
- substantially water-insoluble light-sensitive diazo resins can be isolated as precipitates by mixing an aqueous solution of a water-soluble light-sensitive diazo resin and approximately the same amount of an aqueous solution of the foregoing aromatic or aliphatic compound.
- diazo resins disclosed in U.K. Patent No. 1,312,925.
- the most preferred diazo resin is 2-methoxy-4-hydroxy-5-benzoylbenzenesulfonate of a condensate of p-diazodiphenylamine and formaldehyde.
- the content of the diazo resin in the light-sensitive layer preferably ranges from 5 to 50% by weight. As the content thereof is lowered, the light sensitivity of the resulting light-sensitive layer is correspondingly increased, but in contrast therewith, the stability with time thereof is lowered.
- the optimum content of the diazo resin ranges from about 8 to 20% by weight.
- various polymeric compounds may be used as the binder of the light-sensitive composition, but in the present invention, preferably used are those carrying hydroxyl, amino, carboxyl, amido, sulfonamido, active methylene, thioalcohol and/or epoxy groups.
- the binders include schellac as disclosed in U.K. Patent No. 1,350,521; polymers mainly comprising hydroxyethyl acrylate units or hydroxyethyl methacrylate units as disclosed in U.K. Patent No. 1,460,978 and U.S. Patent No. 4,123,276; polyamide resins as disclosed in U.S. Patent No.
- phenol resins and polyvinyl acetal resins such as polyvinyl formal resins and polyvinyl butyral resins disclosed in U.K. Patent No. 1,074,392; linear polyurethane resins disclosed in U.S. Patent No. 3,660,097; polyvinyl alcohol resins which are converted into phthalates, epoxy resins obtained by the condensation of bisphenol A and epichlorohydrin, polymers having amino groups such as polyaminostyrene and polyalkylamino(meth)acrylate, and cellulose derivatives such as cellulose acetate, cellulose alkyl ether and cellulose acetate phthalate.
- the light-sensitive composition comprising a diazo resin and a binder may further comprise other additives such as a pH indicator as disclosed in U.K. Patent No. 1,041,463; and phosphoric acid and dyes as disclosed in U.S. Patent No. 3,236,646.
- a pH indicator as disclosed in U.K. Patent No. 1,041,463
- phosphoric acid and dyes as disclosed in U.S. Patent No. 3,236,646.
- o-quinonediazide compounds are, for instance, o-naphthoquinonediazide compounds which are disclosed in a variety of publications, for instance, U.S. Patent Nos. 2,766,118; 2,767,092; 2,772,972; 2,859,112; 2,907,665; 3,046,110; 3,046,111; 3,046,115; 3,046,118; 3,046,119; 3,046,120; 3,046,121; 3,046,122; 3,046,123; 3,061,430; 3,102,809; 3,106,465; 3,635,709; and 3,647,443 and which are preferably used in the composition.
- o-naphthoquinonediazidosulfonic acid esters or o-naphthoquinonediazidocarboxylic acid esters of aromatic hydroxy compounds preferred are o-naphthoquinonediazidosulfonic acid esters or o-naphthoquinonediazidocarboxylic acid esters of aromatic hydroxy compounds; o-naphthoquinonediazidosulfonic acid amides or o-naphthoquinonediazidocarboxylic acid amides of aromatic amino compounds and particularly, esterification reaction products of condensates of pyrogallol and acetone with o-nap hthoquinonediazidosulfonic acid disclosed in U.S. Patent No.
- amidation reaction products of copolymers of p-aminostyrene and monomers copolymerizable therewith, with o-naphthoquinonediazidosulfonic acid or o-naphthoquinonediazidocarboxylic acid disclosed in U.K. Patent No. 3,759,711 are very preferable.
- alkali-soluble resins include novolak type phenol resins and specific examples thereof are phenolformaldehyde resins, o-cresol-formaldehyde resins, and m-cresol-formaldehyde resins.
- the composition for forming the light-sensitive layer may comprise these alkali-soluble resins in an amount ranging from about 50 to about 85% by weight, preferably 60 to 80% by weight on the basis of the total weight of the composition.
- the light-sensitive composition comprising o-quinonediazide compounds may, if necessary, comprise other components such as dyes, plasticisers and compounds capable of imparting printing out properties to the resulting light-sensitive layer as disclosed in U.K. Patent Nos. 1,401,463 and 1,039,475 and U.S. Patent No. 3,969,118.
- the lithographic printing plate which comprises a substrate provided with a layer of the composition comprising a polymer having carboxylic acid residues or carboxylic anhydride residues, an addition-polymerizable unsaturated compound and a photopolymerization initiator is excellent in storability, the exposed aluminum plate surface on the non-image area is hardly contaminated with a printing ink, has good hydrophilicity capable of rapidly removing ink stains on the non-image area and the aluminum plate has high adhesion to the light-sensitive layer.
- polymer having carboxylic acid residues or carboxylic anhydride residues preferred are those having the structural units selected from the group consisting of those represented by the following general formulae (A) to (D):
- R 1 and R 4 each represents a hydrogen atom or an alkyl group
- R 3 represents a phenylene group or an alkylene group optionally having a hydroxyl group
- R 5 represents a hydrogen atom or an alkyl group optionally having substituents
- R 6 represents an alkyl, allyl, aryl or cycloalkyl group which may have substituents
- n is an integer of 0 or 1.
- repeating units represented by formula (A) are those derived from acrylic add, methacrylic acid, crotonic acid and vinyl benzoic acid; examples of the repeating units represented by formula (B) those derived from maleic acid, maleic acid monohydroxyalkyl ester and maleic acid monocyclohexyl ester; examples of the repeating units of formula (C) are those derived from males acid monoalkylamide and maleic acid mononydroxyalkylamide; and examples of the repeating units represented by formula (D) are those derived from maleic anhydride and itaconic anhydride.
- the polymers those having an average molecular weight ranging from 1,000 to 100,000 are usually used in the invention.
- the addition polymerizable unsaturated compounds herein mean monomers having ethylenically unsaturated double bonds which can cause addition polymerization between them in the three-dimensional direction when the photopolymerizable light-sensitive composition is irradiated with actinic rays.
- Examples thereof are unsaturated carboxylic acids, esters of unsaturated carboxylic acids and aliphatic polyhydric compounds and esters of unsaturated carboxylic acids and aromatic polyhydric compounds.
- photopolymerization initiators there may be mentioned, for instance, benzoin, benzoin alkyl ether, benzophenone, anthraquinone and Michler's ketones which may be used alone or in combination in an amount ranging from 1 to 3 g/m 2 (weighed after drying).
- J.P. KOKOKU Japanese Examined Patent Publication
- Sho 44-23042 Sho 46-16044, Sho 54-26923 and Sho 61-54222
- J.P. KOKAI Japanese Unexamined Patent Publication
- the silicone rubber layer having a thickness ranging from 0.5 to 5 ⁇ m on the photopolymerizable light-sensitive layer of the foregoing polymer having carboxylic acid residues or carboxylic acid anhydride residues, an addition-polymerizable unsaturated compound and a photopolymerization initiator.
- a PS plate requiring no dampening water which comprises a photoadhesive light-sensitive layer and a silicone rubber layer is exposed to light
- the photoadhesive light-sensitive layer is firmly photolytically adhered to the silicone rubber layer.
- the silicone rubber layer on the non-exposed areas can be selectively peeled off and removed with a developer which does not substantially dissolve the photoadhesive light-sensitive layer (only slightly dissolves the layer) and is capable of swelling the light-sensitive layer and/or the silicone rubber layer.
- the exposed light-sensitive layer thus serves as an ink-receptive portion of the printing plate.
- the silicone rubber layer is preferably applied onto the light-sensitive layer comprising a component substantially insoluble in a developer, an addition-polymerizable unsaturated compound and a photopolymerization initiator in a thickness ranging from 0.5 to 5 ⁇ m.
- the effect of the present invention is particularly conspicuous in this embodiment, i.e., in the PS plate requiring no dampening water, since the surface of the aluminum substrate is not generally subjected to any surface roughening treatment (the rolling marks are reduced or disappeared through the surface roughening treatment).
- the electrophotographic plate making method has been known and is detailed in "DENSHI SHASHIN GIJUTSU NO KISO TO OYO (The Basis and Applications of Electrophotographic Techniques), issued by Society of Electrophotography, published by Corona Publishing Company (1988) of "KIROKU ZAIRYO MANUAL (A Manual of Recording Materials", Trykepus Publishing Company (1981) which may be used in the invention.
- a method which comprises applying, onto an aluminum substrate, a photoconductive layer comprising at least a photoconductive material and an alkali-soluble resin, developing with a toner, fixing the toner and then removing the photoconductive layer on non-image area free of toner with an alkaline solution in the usual manner to give a lithographic printing plate.
- toner images are formed on an organic or inorganic electrophotographic light-sensitive material in the usual manner.
- the resulting toner images are transferred to an aluminum substrate in the usual known transfer method such as a corona transfer, bias-roller transfer or pressure transfer method to give a lithographic printing plate.
- the toner images can, if necessary, be transferred to an aluminum substrate after a plurality of transferring processes through a transferring material such as a rubber roller.
- a lithographic printing plate may also be prepared by previously applying an insulating layer onto an aluminum substrate, then transferring toner images to the insulating layer in the usual manner and removing the non-image area free of toner.
- the lithographic printing plate obtained from the substrate therefor of the present invention can output the rate of area of the printing plate occupied by patterns almost equal to the true area of the patterns formed thereon even if, when determining the rate of the area occupied by patterns using a plate scanner of an ink presetting system, the lithographic printing plate is put on a printing press in such a manner that the rolling direction of the aluminum substrate of the printing plate is perpendicular to the direction of the vector component, parallel to the substrate surface, of the incident light from light sources of the plate scanner.
- the rate of specular gloss of the foregoing rolled aluminum plate was determined by a glossmeter VG-1D available from Nippon Denshoku Kogyo K.K. The results thus obtained are summarized in the following Table 1.
- a light-sensitive layer was formed on the surface of the aluminum substrate thus obtained by applying a light-sensitive solution having the following composition in an amount of 2.0 g/m 2 (weighed after drying) and then drying.
- the PS plate thus prepared was imagewise exposed to light in a vacuum printing frame by making the surface of the plate and an original having a rate of area occupied by half-tone dots of 50% at a density of 133 lines/2.54cm (inch) and then irradiating the assembly with light from a 3 kW metal halide lamp for 50 seconds at a distance of 1 m, then developed with a developer having the following composition and gummed-up with an aqueous solution of gum arabic to give a lithographic printing plate.
- Component Amount (part by weight) sodium sulfite 5 benzyl alcohol 30 sodium carbonate 5 sodium isopropylnaphthalenesulfonate 12 pure water 1000
- the resulting lithographic printing plate was subjected to a test for examining suitability for a plate scanner of an ink presetting system.
- the results obtained are summarized in Table 1.
- suitable for a plate scanner herein means the ability of outputting the rate of area of a lithographic printing plate occupied by patterns almost equal to the true area occupied by the patterns even if the lithographic printing plate is put on a printing press in such a manner that the rolling direction of the aluminum substrate of the printing plate is perpendicular to the direction of the vector component, parallel to the substrate surface, of the incident light from the light source of the plate scanner. Therefore, the smaller the difference between the rates of the area occupied by patterns each observed when the rolling direction is perpendicular to or parallel to the direction of the vector component, parallel to the substrate surface, of the incident light, the higher the suitability for a plate scanner.
- Example 2 To an aluminum substrate prepared in the same procedures as in Example 1, there were applied, in order, a primer layer, a light-sensitive layer and a silicone rubber layer in the following manner to give an original PS plate requiring no dampening water.
- the primer layer was formed by applying a composition for a primer layer having the following composition onto the surface of the resulting aluminum substrate in an amount of 8.0 g/m 2 (weighed after drying) and then heating at 120° C for 3 minutes to dry the same.
- a light-sensitive layer was formed on the resulting primer layer by applying a light-sensitive composition having the following composition in an amount of 3.0 g/m 2 (weighed after drying) and drying at 100° C for one minute.
- a silicone rubber layer was formed on the resulting light-sensitive layer by applying a composition for a silicone rubber layer having the following composition in an amount of 2.0 g/m 2 (weighed after drying) and then drying at 140 ° C for 2 minutes to harden the layer.
- a one-side matted polypropylene film having a thickness of 9 ⁇ m was laminated with the surface of the silicone rubber layer thus produced to give an original PS plate requiring no dampening water.
- the original PS plate requiring no dampening water thus prepared was imagewise exposed to light in a vacuum printing frame by making the surface of the plate come in close contact with an original having a rate of area occupied by half-tone dots of 50% at a density of 133 lines/2.54cm (inch) and then irradiating the assembly with light from a 3 kW metal halve lamp for 50 seconds at a distance of 1 m, then the laminate film was peeled off, the exposed PS plate was developed by immersing, for one minute, in a developer which comprised 12 parts by weight of benzyl alcohol, 5 parts by weight of sodium isopropylnaphthalenesulfonate, one part by weight of triethanolamine and 82 parts by weight of water and then rubbed with a developing pad to remove the light-sensitive layer and the silicone rubber layer on the non-exposed areas to thus give a lithographic printing plate requiring no dampening water.
- a developer which comprised 12 parts by weight of benzyl alcohol, 5 parts by
Claims (8)
- Substrat für lithographische Druckplatten, umfassend eine gewalzte Aluminiumplatte, deren Spiegelglanz, der durch Lichteinfall auf die Aluminiumplatte senkrecht zu der Walzrichtung der gewalzten Platte bestimmt wird, mindestens 70% des Spiegelglanzes beträgt, der durch Lichteinfall auf die gewalzte Platte parallel zu der Walzrichtung der gewalzten Platte bestimmt wird, und deren Oberflächenrauhigkeit, ausgedrückt als durchschnittliche Oberflächenrauhigkeit Ra der Mittellinie, im Bereich von 0,1 bis 0,01 µm liegt.
- Substrat nach Anspruch 1, worin die Aluminiumplatte reines Aluminium oder eine Aluminiumlegierung mit einem Fremdatomgehalt von nicht mehr als 10 Gew.-% umfaßt.
- Substrat nach Anspruch 1, worin die Dicke der Aluminiumplatte im Bereich von 0,1 bis 0,5 mm liegt.
- Substrat nach Anspruch 1, worin die Aluminiumplatte nach dem Walzen mit Alkali unter den Bedingungen einer Konzentration im Bereich von 1 bis 50% einer Temperatur im Bereich von 30 bis 100°C und einer Behandlungsdauer im Bereich von 1 bis 100 Sekunden entfettet wird.
- Substrat nach Anspruch 4, worin die Aluminiumplatte nach der Entfettungsbehandlung gekörnt wird und dann unter den Bedingungen einer Elektrolytkonzentration im Bereich von 1 bis 30 Gew.-%, einer Temperatur im Bereich von 20 bis 50°C, einer Behandlungsdauer im Bereich von 5 bis 100 Sekunden und einer Stromdichte im Bereich von 5 bis 100 A/dm2 anodisiert wird.
- Substrat nach Anspruch 5, worin die Aluminiumplatte weiterhin unter den Bedingungen einer Konzentration einer Behandlungslösung im Bereich von 1 bis 20 Gew.-%, einer Temperatur im Bereich von 20 bis 80°C und einer Behandlungsdauer im Bereich von 5 bis 30 Sekunden hydrophil gemacht wird.
- Substrat nach Anspruch 1, worin die lithographische Druckplatte eine lithographische Druckplatte ist, die kein Befeuchtungswasser erfordert.
- Substrat nach Anspruch 1, worin die lithographische Druckplatte eine lithographische Druckplatte ist, die durch ein elektrophotographisches Plattenherstellungsverfahren hergestellt wird.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP208707/90 | 1990-08-07 | ||
JP2208707A JP2668596B2 (ja) | 1990-08-07 | 1990-08-07 | 平版印刷版用支持体 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0470529A1 EP0470529A1 (de) | 1992-02-12 |
EP0470529B1 EP0470529B1 (de) | 1996-04-10 |
EP0470529B2 true EP0470529B2 (de) | 1999-05-12 |
Family
ID=16560750
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19910113068 Expired - Lifetime EP0470529B2 (de) | 1990-08-07 | 1991-08-02 | Substrat für lithographische Druckplatten |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0470529B2 (de) |
JP (1) | JP2668596B2 (de) |
DE (1) | DE69118614T3 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07199454A (ja) * | 1994-01-10 | 1995-08-04 | Fuji Photo Film Co Ltd | 湿し水不要感光性平版印刷版 |
DE19911821C2 (de) | 1999-03-17 | 2003-03-20 | Roland Man Druckmasch | Druckplatte und Verfahren zu ihrer Herstellung |
ES2430641T3 (es) * | 2010-10-22 | 2013-11-21 | Hydro Aluminium Rolled Products Gmbh | Banda litográfica para desbastado electroquímico y método para su fabricación |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT375880B (de) * | 1980-03-11 | 1984-09-25 | Teich Ag Folienwalzwerk | Verfahren zur herstellung von grundmaterial fuer offsetdruckplatten |
JPS57174494A (en) * | 1980-07-07 | 1982-10-27 | Toyo Kohan Co Ltd | Production of metallic plate for plate material |
JPS5931192A (ja) * | 1982-06-30 | 1984-02-20 | Konishiroku Photo Ind Co Ltd | 平版印刷版用支持体 |
JPS62211196A (ja) * | 1986-03-12 | 1987-09-17 | Toyo Kohan Co Ltd | 版材用金属板の親水処理法 |
JPS6347349A (ja) * | 1986-08-18 | 1988-02-29 | Sky Alum Co Ltd | 平版印刷版用アルミニウム合金支持体 |
-
1990
- 1990-08-07 JP JP2208707A patent/JP2668596B2/ja not_active Expired - Fee Related
-
1991
- 1991-08-02 EP EP19910113068 patent/EP0470529B2/de not_active Expired - Lifetime
- 1991-08-02 DE DE1991618614 patent/DE69118614T3/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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DE69118614T2 (de) | 1996-09-19 |
EP0470529A1 (de) | 1992-02-12 |
JPH0491992A (ja) | 1992-03-25 |
DE69118614D1 (de) | 1996-05-15 |
DE69118614T3 (de) | 1999-09-09 |
EP0470529B1 (de) | 1996-04-10 |
JP2668596B2 (ja) | 1997-10-27 |
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