EP0243205A1 - Plaque électrophotographique - Google Patents
Plaque électrophotographique Download PDFInfo
- Publication number
- EP0243205A1 EP0243205A1 EP87303655A EP87303655A EP0243205A1 EP 0243205 A1 EP0243205 A1 EP 0243205A1 EP 87303655 A EP87303655 A EP 87303655A EP 87303655 A EP87303655 A EP 87303655A EP 0243205 A1 EP0243205 A1 EP 0243205A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- naphthalocyanine
- compound
- bis
- formula
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 naphthalocyanine compound Chemical class 0.000 claims abstract description 40
- 239000000126 substance Substances 0.000 claims abstract description 27
- LKKPNUDVOYAOBB-UHFFFAOYSA-N naphthalocyanine Chemical compound N1C(N=C2C3=CC4=CC=CC=C4C=C3C(N=C3C4=CC5=CC=CC=C5C=C4C(=N4)N3)=N2)=C(C=C2C(C=CC=C2)=C2)C2=C1N=C1C2=CC3=CC=CC=C3C=C2C4=N1 LKKPNUDVOYAOBB-UHFFFAOYSA-N 0.000 claims description 56
- 150000001875 compounds Chemical class 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- JHKWXZZEBNEOAE-UHFFFAOYSA-N dihydroxysilicon Chemical compound O[Si]O JHKWXZZEBNEOAE-UHFFFAOYSA-N 0.000 claims description 11
- 239000011230 binding agent Substances 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 9
- YCXNBETUNFJYPL-UHFFFAOYSA-N C(C)[Si](O[Si]O[Si](CC)(CC)CC)(CC)CC Chemical compound C(C)[Si](O[Si]O[Si](CC)(CC)CC)(CC)CC YCXNBETUNFJYPL-UHFFFAOYSA-N 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 6
- ZNKCKMJPPQPCDT-UHFFFAOYSA-N CCC[Si](CCC)(CCC)O[Si]O[Si](CCC)(CCC)CCC Chemical compound CCC[Si](CCC)(CCC)O[Si]O[Si](CCC)(CCC)CCC ZNKCKMJPPQPCDT-UHFFFAOYSA-N 0.000 claims description 5
- 229910052736 halogen Chemical group 0.000 claims description 5
- 150000002367 halogens Chemical group 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- VNWTULBIIFEUNE-UHFFFAOYSA-N bis(tributylsilyloxy)silicon Chemical compound CCCC[Si](CCCC)(CCCC)O[Si]O[Si](CCCC)(CCCC)CCCC VNWTULBIIFEUNE-UHFFFAOYSA-N 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- MJVASWARXKAZOC-UHFFFAOYSA-N bis(trihexylsilyloxy)silicon Chemical compound CCCCCC[Si](CCCCCC)(CCCCCC)O[Si]O[Si](CCCCCC)(CCCCCC)CCCCCC MJVASWARXKAZOC-UHFFFAOYSA-N 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 239000003054 catalyst Substances 0.000 claims description 3
- 239000000460 chlorine Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 3
- IPTASNRUEHWRBV-UHFFFAOYSA-N C(C)O[Si](O[Si]O[Si](OCC)(OCC)OCC)(OCC)OCC Chemical compound C(C)O[Si](O[Si]O[Si](OCC)(OCC)OCC)(OCC)OCC IPTASNRUEHWRBV-UHFFFAOYSA-N 0.000 claims description 2
- DWICHAVLZOCQRC-UHFFFAOYSA-N COC(OC)[SiH2]O[Si]O[SiH2]C(OC)OC Chemical compound COC(OC)[SiH2]O[Si]O[SiH2]C(OC)OC DWICHAVLZOCQRC-UHFFFAOYSA-N 0.000 claims description 2
- JOIWARCXUPGXBU-UHFFFAOYSA-N C[Si](O[Si]O[Si](C)(C)CCC)(CCC)C Chemical compound C[Si](O[Si]O[Si](C)(C)CCC)(CCC)C JOIWARCXUPGXBU-UHFFFAOYSA-N 0.000 claims description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 claims description 2
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 125000001309 chloro group Chemical group Cl* 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract description 16
- 239000002184 metal Substances 0.000 abstract description 16
- 230000035945 sensitivity Effects 0.000 abstract description 13
- 229910052710 silicon Inorganic materials 0.000 abstract description 8
- 239000010703 silicon Substances 0.000 abstract description 8
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 55
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 36
- 230000032258 transport Effects 0.000 description 28
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 27
- 230000015572 biosynthetic process Effects 0.000 description 26
- 238000003786 synthesis reaction Methods 0.000 description 25
- 239000000243 solution Substances 0.000 description 21
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 15
- 238000000576 coating method Methods 0.000 description 14
- 239000013078 crystal Substances 0.000 description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 12
- 239000012860 organic pigment Substances 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000010408 film Substances 0.000 description 9
- 239000002244 precipitate Substances 0.000 description 9
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 9
- 238000001816 cooling Methods 0.000 description 8
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 8
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 8
- 238000002211 ultraviolet spectrum Methods 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- WZQSBCHNVPAYOC-UHFFFAOYSA-N chloro(trihexyl)silane Chemical compound CCCCCC[Si](Cl)(CCCCCC)CCCCCC WZQSBCHNVPAYOC-UHFFFAOYSA-N 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 6
- 230000009102 absorption Effects 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 6
- 229920005668 polycarbonate resin Polymers 0.000 description 6
- 239000004431 polycarbonate resin Substances 0.000 description 6
- 239000011541 reaction mixture Substances 0.000 description 6
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 6
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 6
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- GWVMLCQWXVFZCN-UHFFFAOYSA-N isoindoline Chemical compound C1=CC=C2CNCC2=C1 GWVMLCQWXVFZCN-UHFFFAOYSA-N 0.000 description 5
- 239000012046 mixed solvent Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- KNBYJRSSFXTESR-UHFFFAOYSA-N naphthalene-2,3-dicarbonitrile Chemical compound C1=CC=C2C=C(C#N)C(C#N)=CC2=C1 KNBYJRSSFXTESR-UHFFFAOYSA-N 0.000 description 5
- 239000000049 pigment Substances 0.000 description 5
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 5
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 238000001771 vacuum deposition Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- OFJBYLCQNJHFMI-UHFFFAOYSA-N 2,5-dihydro-1,2-oxazole Chemical compound C1ONC=C1 OFJBYLCQNJHFMI-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 4
- 238000000862 absorption spectrum Methods 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- BUMGIEFFCMBQDG-UHFFFAOYSA-N dichlorosilicon Chemical compound Cl[Si]Cl BUMGIEFFCMBQDG-UHFFFAOYSA-N 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 238000001953 recrystallisation Methods 0.000 description 4
- 239000011669 selenium Substances 0.000 description 4
- 150000003384 small molecules Chemical class 0.000 description 4
- 239000000725 suspension Substances 0.000 description 4
- DCFKHNIGBAHNSS-UHFFFAOYSA-N chloro(triethyl)silane Chemical compound CC[Si](Cl)(CC)CC DCFKHNIGBAHNSS-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 3
- KYPOHTVBFVELTG-OWOJBTEDSA-N (e)-but-2-enedinitrile Chemical compound N#C\C=C\C#N KYPOHTVBFVELTG-OWOJBTEDSA-N 0.000 description 2
- DXBHBZVCASKNBY-UHFFFAOYSA-N 1,2-Benz(a)anthracene Chemical compound C1=CC=C2C3=CC4=CC=CC=C4C=C3C=CC2=C1 DXBHBZVCASKNBY-UHFFFAOYSA-N 0.000 description 2
- QNLZIZAQLLYXTC-UHFFFAOYSA-N 1,2-dimethylnaphthalene Chemical compound C1=CC=CC2=C(C)C(C)=CC=C21 QNLZIZAQLLYXTC-UHFFFAOYSA-N 0.000 description 2
- TURIHPLQSRVWHU-UHFFFAOYSA-N 2-phenylnaphthalene Chemical compound C1=CC=CC=C1C1=CC=C(C=CC=C2)C2=C1 TURIHPLQSRVWHU-UHFFFAOYSA-N 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- QUSIXTNHZHDRQZ-UHFFFAOYSA-N bis(trimethylsilyloxy)silicon Chemical compound C[Si](C)(C)O[Si]O[Si](C)(C)C QUSIXTNHZHDRQZ-UHFFFAOYSA-N 0.000 description 2
- ACTAPAGNZPZLEF-UHFFFAOYSA-N chloro(tripropyl)silane Chemical compound CCC[Si](Cl)(CCC)CCC ACTAPAGNZPZLEF-UHFFFAOYSA-N 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- WDECIBYCCFPHNR-UHFFFAOYSA-N chrysene Chemical compound C1=CC=CC2=CC=C3C4=CC=CC=C4C=CC3=C21 WDECIBYCCFPHNR-UHFFFAOYSA-N 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 150000003219 pyrazolines Chemical class 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 235000009518 sodium iodide Nutrition 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- JSQJUDVTRRCSRU-UHFFFAOYSA-N tributyl(chloro)silane Chemical compound CCCC[Si](Cl)(CCCC)CCCC JSQJUDVTRRCSRU-UHFFFAOYSA-N 0.000 description 2
- WVMSIBFANXCZKT-UHFFFAOYSA-N triethyl(hydroxy)silane Chemical compound CC[Si](O)(CC)CC WVMSIBFANXCZKT-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- WVJRAJZMOVQFEC-UHFFFAOYSA-N 1,2,3,4-tetrabromo-5,6-dimethylbenzene Chemical group CC1=C(C)C(Br)=C(Br)C(Br)=C1Br WVJRAJZMOVQFEC-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- VEUMBMHMMCOFAG-UHFFFAOYSA-N 2,3-dihydrooxadiazole Chemical compound N1NC=CO1 VEUMBMHMMCOFAG-UHFFFAOYSA-N 0.000 description 1
- HDVGAFBXTXDYIB-UHFFFAOYSA-N 2,7-dinitrofluoren-9-one Chemical compound C1=C([N+]([O-])=O)C=C2C(=O)C3=CC([N+](=O)[O-])=CC=C3C2=C1 HDVGAFBXTXDYIB-UHFFFAOYSA-N 0.000 description 1
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 1
- KLLLJCACIRKBDT-UHFFFAOYSA-N 2-phenyl-1H-indole Chemical compound N1C2=CC=CC=C2C=C1C1=CC=CC=C1 KLLLJCACIRKBDT-UHFFFAOYSA-N 0.000 description 1
- CCIRWPQIFNLNMJ-UHFFFAOYSA-N 2-phenylpyrene Chemical compound C1=CC=CC=C1C1=CC2=CC=C(C=CC=C3C=C4)C3=C2C4=C1 CCIRWPQIFNLNMJ-UHFFFAOYSA-N 0.000 description 1
- AEFDIOODLJMOML-UHFFFAOYSA-N 3,7-dinitrodibenzothiophene 5-oxide Chemical compound C1=C([N+]([O-])=O)C=C2S(=O)C3=CC([N+](=O)[O-])=CC=C3C2=C1 AEFDIOODLJMOML-UHFFFAOYSA-N 0.000 description 1
- IHXWECHPYNPJRR-UHFFFAOYSA-N 3-hydroxycyclobut-2-en-1-one Chemical class OC1=CC(=O)C1 IHXWECHPYNPJRR-UHFFFAOYSA-N 0.000 description 1
- IAWRFMPNMXEJCK-UHFFFAOYSA-N 3-phenyl-9h-carbazole Chemical compound C1=CC=CC=C1C1=CC=C(NC=2C3=CC=CC=2)C3=C1 IAWRFMPNMXEJCK-UHFFFAOYSA-N 0.000 description 1
- YGBCLRRWZQSURU-UHFFFAOYSA-N 4-[(diphenylhydrazinylidene)methyl]-n,n-diethylaniline Chemical compound C1=CC(N(CC)CC)=CC=C1C=NN(C=1C=CC=CC=1)C1=CC=CC=C1 YGBCLRRWZQSURU-UHFFFAOYSA-N 0.000 description 1
- PLAZXGNBGZYJSA-UHFFFAOYSA-N 9-ethylcarbazole Chemical compound C1=CC=C2N(CC)C3=CC=CC=C3C2=C1 PLAZXGNBGZYJSA-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 206010034960 Photophobia Diseases 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- HUVXQFBFIFIDDU-UHFFFAOYSA-N aluminum phthalocyanine Chemical compound [Al+3].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 HUVXQFBFIFIDDU-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 150000001556 benzimidazoles Chemical class 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- YIGRKKJIRPDASV-UHFFFAOYSA-N chloro(dimethoxymethyl)silane Chemical compound COC(OC)[SiH2]Cl YIGRKKJIRPDASV-UHFFFAOYSA-N 0.000 description 1
- JEZFASCUIZYYEV-UHFFFAOYSA-N chloro(triethoxy)silane Chemical compound CCO[Si](Cl)(OCC)OCC JEZFASCUIZYYEV-UHFFFAOYSA-N 0.000 description 1
- HXVPUKPVLPTVCQ-UHFFFAOYSA-N chloro-dimethyl-propylsilane Chemical compound CCC[Si](C)(C)Cl HXVPUKPVLPTVCQ-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- QPJDMGCKMHUXFD-UHFFFAOYSA-N cyanogen chloride Chemical compound ClC#N QPJDMGCKMHUXFD-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- FBSAITBEAPNWJG-UHFFFAOYSA-N dimethyl phthalate Natural products CC(=O)OC1=CC=CC=C1OC(C)=O FBSAITBEAPNWJG-UHFFFAOYSA-N 0.000 description 1
- 229960001826 dimethylphthalate Drugs 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007786 electrostatic charging Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 description 1
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- 150000007857 hydrazones Chemical class 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 208000013469 light sensitivity Diseases 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- LBAIJNRSTQHDMR-UHFFFAOYSA-N magnesium phthalocyanine Chemical compound [Mg].C12=CC=CC=C2C(N=C2NC(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2N1 LBAIJNRSTQHDMR-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- DIAIBWNEUYXDNL-UHFFFAOYSA-N n,n-dihexylhexan-1-amine Chemical compound CCCCCCN(CCCCCC)CCCCCC DIAIBWNEUYXDNL-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- 150000002979 perylenes Chemical class 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001470 polyketone Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229940079827 sodium hydrogen sulfite Drugs 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 150000003738 xylenes Chemical class 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B47/00—Porphines; Azaporphines
- C09B47/04—Phthalocyanines abbreviation: Pc
- C09B47/045—Special non-pigmentary uses, e.g. catalyst, photosensitisers of phthalocyanine dyes or pigments
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/04—Esters of silicic acids
- C07F7/06—Esters of silicic acids with hydroxyaryl compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B47/00—Porphines; Azaporphines
- C09B47/04—Phthalocyanines abbreviation: Pc
- C09B47/06—Preparation from carboxylic acids or derivatives thereof, e.g. anhydrides, amides, mononitriles, phthalimide, o-cyanobenzamide
- C09B47/073—Preparation from isoindolenines, e.g. pyrrolenines
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0664—Dyes
- G03G5/0696—Phthalocyanines
Definitions
- Fig. l is absorption spectra of a naphthalocyanine having two trihexylsiloxy groups bonded to the central metal silicon synthesized in Synthesis Example l (solid line), and a phthalocyanine similar to it (dotted line).
- Fig. 2 is an absorption spectrum of a vapor deposited film of naphthalocyanine having two trihexylsiloxy groups bonded to the central metal silicon synthesized in Synthesis Example l.
- the naphthalocyanine compound of the formula (I) can be produced by reacting dihydroxy-silicon naphthalocyanine of the formula: with a compound of the formula: R1R2R3SiX (III) wherein R1, R2 and R3 are as defined above; and X is a hydroxyl group or a halogen with heating.
- Dihydroxysilicon naphthalocyanine is a known compound and can be produced, for example, by the method described in J. Am. Chem. Soc. vol. l06, pp7404- (l984) and the route (A) as shown below:
- the dihydroxysilicon naphthalocyanine of the formula (II) is reacted with a compound of the formula (III), for example, a chlorosilane compound of the formula: R1R2R3SiCl (III ⁇ ) wherein R1, R2 and R3 are as defined above, at l40 to l50°C for l.0 to 3.0 hours, e.g. l.5 hours to yield the naphthalocyanine compound of the formula (I) wherein the two siloxy groups of the formula: R1R2R3Si-O- are bonded to the central metal silicon.
- a compound of the formula (III) for example, a chlorosilane compound of the formula: R1R2R3SiCl (III ⁇ ) wherein R1, R2 and R3 are as defined above, at l40 to l50°C for l.0 to 3.0 hours, e.g. l.5 hours to yield the naphthalocyanine compound of the formula (
- Examples of the siloxy group of the formula: R1R2R3Si-O- are a dimethylsiloxy group, a trimethylsiloxy group, a dimethyoxymethylsiloxy group, a dimethylpropylsiloxy group, a t-butyldimethylsiloxy group, a triethylsiloxy group, a triethoxysiloxy group, a tripropylsiloxy group, a dimethyloctylsiloxy group, a tributylsiloxy group, a trihexylsiloxy group, etc.
- the photoconductive layer is a layer containing an organic photoconductive substance, and can be in the form of a film of an organic photoconductive substance, a film containing an organic photoconductive substance and a binder, a complex type film comprising a charge generation layer and a charge transport layer, etc.
- the naphthalocyanine of the formula (I) is used as an essential component. It is possible to co-use one or more conventional photoconductive substances. It is preferable to use the naphthalocyanine of the formula (I) alone or in combination with one or more organic pigments generating charge together with one or more charge transport substances.
- the naphthalocyanine of the formula (I) and the organic pigments generating charge are contained, and in the charge transport layer, the charge transport substances are contained.
- organic pigment which is included in the charge generation layer for charge generation
- organic pigments there can be used azoxybenzenes, disazos, trisazos, benzimidazoles, multi-ring quinones, indigoids, quinacridones, metallic or non-metallic phthalocyanines having various crystal structures, perylenes, methines, etc., these pigments being known for charge generation.
- These pigments can be used alone or as a mixture thereof.
- These pigments are, for example, disclosed in British Patent Nos. l,370,l97, l,337,222, l,337,224 and l,402,967, U.S. Patent Nos.
- the naphthalocyanine compound of the formula (I) with or without an organic pigment which can generates charge is contained in the charge generation layer which may contain the binder in an amount of 500% by weight or less based on the weight of the organic pigment, or contain the additives in an amount of 5% by weight or less based on the weight of the naphthalocyanine compound of the formula (I) or a total amount of the naphthalocyanine compound of the formula (I) and the organic pigment.
- the charge transport substance is contained in the charge transport layer which may contain the binder in an amount of 500% by weight or less based on the weight of the charge transport substance.
- the resins there is no particular limitation to the resins, so long as they can form insulating films under normal conditions or can form films by curing with heat and/or light.
- the electroconductive support for forming an electroconductive layer there can be used paper or plastic films subjected to the electroconductivity treatment, plastic films clad with a metal foil such as aluminum, metal plates, and the like.
- Bis(dimethylpropylsiloxy)silicon naphthalocyanine was synthesized in the same manner as described in Synthesis Example l except for using dimethylpropylsilyl chloride in place of trihexylsilyl chloride in the step (5).
- Bis(tripropylsiloxy)silicon naphthalocyanine was synthesized in the same manner as described in Synthesis Example l except for using tripropylsilyl chloride in place of trihexylsilyl chloride in the step (5).
- the half decay exposure amount (the product of a time required for making the potential retention rate l/2 by the light intensity) was 20 mJ/m2.
- An electrophotographic plate was produced in the same manner as described in Comparative Example l except for using p-diethylaminobenzaldehyde-disphenylhydrazone as a charge transport substance in place of l-phenyl-3-(p-diethylaminostyryl)-5-(p-diethylaminophenyl)pyrazoline.
- the half decay exposure amount of the electrophotographic plate using the monochromatic light of 800 nm in the near infrared region measured in the same manner as described in Example l was 3200 mJ/m2.
- Each solution was prepared by dissolving a phthalocyanine wherein two trihexylsiloxy groups were bonded to the central metal silicon or a naphthalocyanine compound wherein two trihexylsiloxy groups were bonded to the central metal silicon (the naphthalocyanine compound synthesized in Synthesis Example l) in chloroform to measure an absorption spectrum.
- the results are shown in Fig. l.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9533786 | 1986-04-24 | ||
JP95337/86 | 1986-04-24 | ||
JP15012686A JPS635093A (ja) | 1986-06-26 | 1986-06-26 | ビス(トリアルキルシロキシ)シリコンナフタロシアニン及びその製造法 |
JP150126/86 | 1986-06-26 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP89122030.3 Division-Into | 1989-11-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0243205A1 true EP0243205A1 (fr) | 1987-10-28 |
EP0243205B1 EP0243205B1 (fr) | 1991-01-30 |
Family
ID=26436592
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP89122030A Expired - Lifetime EP0375967B1 (fr) | 1986-04-24 | 1987-04-24 | Composés de naphtalo-cyanines et procédé pour leur préparation |
EP87303655A Expired - Lifetime EP0243205B1 (fr) | 1986-04-24 | 1987-04-24 | Plaque électrophotographique |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP89122030A Expired - Lifetime EP0375967B1 (fr) | 1986-04-24 | 1987-04-24 | Composés de naphtalo-cyanines et procédé pour leur préparation |
Country Status (3)
Country | Link |
---|---|
US (3) | US4749637A (fr) |
EP (2) | EP0375967B1 (fr) |
DE (2) | DE3789243T2 (fr) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0357360A2 (fr) * | 1988-08-31 | 1990-03-07 | Hitachi Chemical Co., Ltd. | Dérivés de naphtalocyanine, leur préparation, et milieu d'enregistrement optique les utilisant |
US4927735A (en) * | 1987-01-07 | 1990-05-22 | Hitachi Chemical Company, Ltd. | Novel naphthalocyanine dye, method for preparing the same, and optical information recording medium employing the same |
US5484685A (en) * | 1988-10-25 | 1996-01-16 | Hitachi, Ltd. | Naphthalocyanine derivatives, production thereof, optical recording medium using the same, and production thereof |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4749637A (en) * | 1986-04-24 | 1988-06-07 | Hitachi Chemical Co., Ltd. | Electrophotographic plate with silicon naphthalocyanine |
US4863821A (en) * | 1986-07-07 | 1989-09-05 | Minolta Camera Kabushiki Kaisha | Photosensitive member comprising charge generating layer and charge transporting layer having amorphous carbon |
JPS63186251A (ja) * | 1987-01-29 | 1988-08-01 | Hitachi Chem Co Ltd | 金属ナフタロシアニン誘導体膜及び電子写真感光体 |
US5000831A (en) * | 1987-03-09 | 1991-03-19 | Minolta Camera Kabushiki Kaisha | Method of production of amorphous hydrogenated carbon layer |
EP0288876B1 (fr) * | 1987-04-22 | 1994-07-20 | Hitachi Chemical Co., Ltd. | Plaque électrophotographique |
DE3810956A1 (de) * | 1988-03-31 | 1989-10-12 | Basf Ag | Neue siliciumnaphthalocyanine sowie duenne strahlungsempfindliche beschichtungsfilme, die diese verbindungen enthalten |
US5087390A (en) * | 1989-04-04 | 1992-02-11 | Hoechst Celanese Corp. | Tetraazaporphyrin dye mixtures |
US5606045A (en) * | 1990-05-15 | 1997-02-25 | Diatron Corporation | Nucleic acid probes and methods |
JPH0776837B2 (ja) * | 1990-10-26 | 1995-08-16 | 富士ゼロックス株式会社 | 電子写真感光体 |
JPH07507074A (ja) * | 1991-11-08 | 1995-08-03 | イーストマン ケミカル カンパニー | 近赤外発螢光団を有する熱可塑性材料の標識方法 |
US7083984B2 (en) | 1993-09-24 | 2006-08-01 | Biosite, Inc. | Hybrid phthalocyanine derivatives and their uses |
US5824799A (en) * | 1993-09-24 | 1998-10-20 | Biosite Diagnostics Incorporated | Hybrid phthalocyanine derivatives and their uses |
US7322927B2 (en) | 1993-09-24 | 2008-01-29 | Biosite, Inc. | Hybrid phthalocyanine derivatives and their uses |
TWI329662B (en) * | 2002-05-17 | 2010-09-01 | Sipix Imaging Inc | Novel fluorinated silicon (iv) phthalocyanines and naphthalocyanines for electrophoretic, magnetophoretic or electromagnetophoretic display |
JP5216279B2 (ja) | 2007-08-23 | 2013-06-19 | 富士フイルム株式会社 | 有機半導体材料、該材料を含む膜、有機電子デバイス及び赤外色素組成物 |
JP5499990B2 (ja) | 2010-08-19 | 2014-05-21 | コニカミノルタ株式会社 | 静電荷像現像用シアントナー |
JP2020518107A (ja) | 2017-04-26 | 2020-06-18 | オーティーアイ ルミオニクス インコーポレーテッドOti Lumionics Inc. | 表面上のコーティングをパターン化する方法およびパターン化されたコーティングを含むデバイス |
US12069938B2 (en) | 2019-05-08 | 2024-08-20 | Oti Lumionics Inc. | Materials for forming a nucleation-inhibiting coating and devices incorporating same |
US12113279B2 (en) | 2020-09-22 | 2024-10-08 | Oti Lumionics Inc. | Device incorporating an IR signal transmissive region |
WO2022123431A1 (fr) | 2020-12-07 | 2022-06-16 | Oti Lumionics Inc. | Formation de motifs sur une couche conductrice déposée à l'aide de revêtement inhibiteur de nucléation et revêtement métallique sous-jacent |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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EP0050464A2 (fr) * | 1980-10-16 | 1982-04-28 | Fujitsu Limited | Matériau photosensible pour électrophotographie |
EP0129413A1 (fr) * | 1983-06-15 | 1984-12-27 | Mita Industrial Co. Ltd. | Matériau stratifié photosensible et procédé de sa production |
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US3816118A (en) * | 1964-06-15 | 1974-06-11 | Xerox Corp | Electrophotographic element containing phthalocyanine |
US3926629A (en) * | 1970-03-11 | 1975-12-16 | Xerox Corp | Electrophotographic method and plate employing a phthaldcyanine polymer |
US4214907A (en) * | 1978-01-05 | 1980-07-29 | Mita Industrial Company, Ltd. | Photosensitive material for electrophotography having a polyvinyl carbazole derivative, phthalocyanine, and an electron-acceptor |
US4131609A (en) * | 1978-02-23 | 1978-12-26 | The United States Of America As Represented By The Secretary Of The Navy | Silicon-phthalocyanine-siloxy monomers |
JPS57148745A (en) * | 1981-03-11 | 1982-09-14 | Nippon Telegr & Teleph Corp <Ntt> | Lamination type electrophotographic receptor |
US4557989A (en) * | 1984-09-13 | 1985-12-10 | Xerox Corporation | Photoresponsive imaging members with dihydroxy metal phthalocyanine compositions |
US4725525A (en) * | 1985-02-04 | 1988-02-16 | Hoebbst Celanese Corporation | Recording information media comprising chromophores |
US4749637A (en) * | 1986-04-24 | 1988-06-07 | Hitachi Chemical Co., Ltd. | Electrophotographic plate with silicon naphthalocyanine |
-
1987
- 1987-04-23 US US07/041,409 patent/US4749637A/en not_active Expired - Fee Related
- 1987-04-24 DE DE3789243T patent/DE3789243T2/de not_active Expired - Fee Related
- 1987-04-24 EP EP89122030A patent/EP0375967B1/fr not_active Expired - Lifetime
- 1987-04-24 EP EP87303655A patent/EP0243205B1/fr not_active Expired - Lifetime
- 1987-04-24 DE DE8787303655T patent/DE3767752D1/de not_active Expired - Lifetime
-
1989
- 1989-05-03 US US07/348,128 patent/US5081236A/en not_active Expired - Fee Related
-
1993
- 1993-06-10 US US08/074,975 patent/US5428152A/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0050464A2 (fr) * | 1980-10-16 | 1982-04-28 | Fujitsu Limited | Matériau photosensible pour électrophotographie |
EP0129413A1 (fr) * | 1983-06-15 | 1984-12-27 | Mita Industrial Co. Ltd. | Matériau stratifié photosensible et procédé de sa production |
Non-Patent Citations (1)
Title |
---|
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, vol. 106, November 1984, American Chemical Society B.L.WHEELER et al. "A Silicon Phatalocyanine and a Silicon Naphtalocyanine: Synthesis, Electrochemistry, and Electrogenerated Chemiluminiscence" pages 7404-7410, * Page 7405 ; fig. 1 ; column 2, paragraphs 4-6 * * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4927735A (en) * | 1987-01-07 | 1990-05-22 | Hitachi Chemical Company, Ltd. | Novel naphthalocyanine dye, method for preparing the same, and optical information recording medium employing the same |
EP0357360A2 (fr) * | 1988-08-31 | 1990-03-07 | Hitachi Chemical Co., Ltd. | Dérivés de naphtalocyanine, leur préparation, et milieu d'enregistrement optique les utilisant |
EP0357360A3 (en) * | 1988-08-31 | 1990-07-25 | Hitachi Chemical Co., Ltd. | Naphthalocyanine derivatives, production thereof and optical recording medium using the same |
US5484685A (en) * | 1988-10-25 | 1996-01-16 | Hitachi, Ltd. | Naphthalocyanine derivatives, production thereof, optical recording medium using the same, and production thereof |
Also Published As
Publication number | Publication date |
---|---|
EP0375967B1 (fr) | 1994-03-02 |
US5428152A (en) | 1995-06-27 |
US5081236A (en) | 1992-01-14 |
DE3789243D1 (de) | 1994-04-07 |
US4749637A (en) | 1988-06-07 |
EP0375967A1 (fr) | 1990-07-04 |
DE3767752D1 (en) | 1991-03-07 |
DE3789243T2 (de) | 1994-06-09 |
EP0243205B1 (fr) | 1991-01-30 |
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