EP0104870A2 - Revêtements à faible émissivité sur substrats transparents - Google Patents

Revêtements à faible émissivité sur substrats transparents Download PDF

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Publication number
EP0104870A2
EP0104870A2 EP83305528A EP83305528A EP0104870A2 EP 0104870 A2 EP0104870 A2 EP 0104870A2 EP 83305528 A EP83305528 A EP 83305528A EP 83305528 A EP83305528 A EP 83305528A EP 0104870 A2 EP0104870 A2 EP 0104870A2
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Prior art keywords
layer
silver
oxide
thick
metal
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EP83305528A
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German (de)
English (en)
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EP0104870B1 (fr
EP0104870A3 (en
Inventor
Frederick Harry Hart
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Pilkington Group Ltd
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Pilkington PLC
Pilkington Brothers Ltd
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Priority claimed from GB838320881A external-priority patent/GB8320881D0/en
Application filed by Pilkington PLC, Pilkington Brothers Ltd filed Critical Pilkington PLC
Priority to AT83305528T priority Critical patent/ATE31525T1/de
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3615—Coatings of the type glass/metal/other inorganic layers, at least one layer being non-metallic
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
    • C03C17/366—Low-emissivity or solar control coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3681—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating being used in glazing, e.g. windows or windscreens
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G02B1/116—Multilayers including electrically conducting layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component

Definitions

  • This invention relates to low emissivity coatings on transparent substrates and, in particular, to low anissivity silver coatings comprising a layer of silver and an overlying anti-reflective layer of metal oxide, and to the production of such coatings.
  • low emissivity silver coatings are kncwn and have been described in the prior art, for example in U.K. Patent Specification 1,307,642.
  • This specification describes electrically conductive glass articles conprising a glass substrate and an electroconductive coating and specifies the use of an intermediate layer of not less than 50% silver 200 to 300 A thick to provide an electrical resistivity of not more than 3 ohms/square disposed between a pair of layers of non-absorbing dielectric material as anti-reflection layers, each 70 to 550 angstroms thick, to increase the light transmission of the coated glass.
  • the specification proposes incorporating up to 10% of chromium, nickel, aluminium or titanium, or up to 50% copper, in the silver layer; use of copper is said to provide a transmission colour of grey which, according to the specification, cannot be easily obtained with a film composed substantially of silver. It is said that the deposition of silver or metal oxide may be conducted by cathodic sputtering. To form a silver layer incorporating an additional metal, either a silver alloy is evaporated or the metal elanents are simultaneously evaporated under vacuum.
  • U.S. Patent Specification 4,166,876 describes a coating comprising a layer of metal such as silver, gold, copper, platinum or tin sandwiched between two layers of a titaniun oxide on a plastics substrate.
  • the patent teaches that, if the lower layer of titanium oxide is derived from an organic titaniun compound and contains residual organic moieties, the bond to the resin substrate is markedly improved with an improvement in the transparency of the laminated structure.
  • the silver layer may contain 1 to 30% of copper which reduces the tendency of the coating to degrade, and gradually lose its light reflecting property, on prolonged exposure to light; the copper-containing silver layer may be deposited by vacuum deposition from a silver-copper alloy,
  • European patent specification 0 035 906 describes a coating comprising a layer of silver sandwiched between two layers of metal oxide.
  • the metal oxide layers may be deposited by sputtering, icn plating, vacuum deposition or fran solution.
  • the patent teaches that a thin layer of material selected from the group consisting of titaniun, zirconium, silicon, indiun, carbon, cobalt and nickel should be deposited between the silver and the overlying metal oxide layer to improve the long tern durability of the coating.
  • the material should be deposited under conditions such that, as far as possible, it is not converted to an cxide; and, where an overlying metal oxide layer is deposited by sputtering, the sputtering is carried out using an oxide source under an argon atmosphere thereby avoiding as far as possible oxidation of the material.
  • Silver coatings of the kind described above i.e. consisting of silver layers sandwiched between anti-reflection metal oxide layers not .only have a high conductivity, but also exhibit a low emissivity i.e. they reflect a high proportion of infra-red radiation incident upon then whilst allowing short-wave infra-red radiation and visible radiation to pass through.
  • the use of such coatings on window glass (or plastics used in place of glass) leads to a reduction -in heat loss fran the windows and, with increasing energy costs, is becoming increasingly desirable in order to reduce heating costs.
  • This difficulty may be overcome in accordance with the present invention by sputtering a small proportion of a metal other than silver before the metal cxide layer so that the additional metal lies predominantly over or in the upper part of the silver layer.
  • a process for the production of a low emissivity coating on a transparent substrate of glass or plastics material by cathode sputtering comprising, in sequence,
  • an additional metal in accordance with the invention enables an anti-reflection metal oxide layer or layers to be reactively sputtered over a silver layer under conditions which, in the absence of the additional metal, would lead to substantial loss of the low emissivity and high light transmission properties of the product.
  • the process of the present invention permits the production, in an efficient and econamical manner, of coatings having an enissivity of 0.2 or less and a light transmission of 70% or more.
  • a silver coated glass or plastics product coated in accordance with the present invention and having an emissivity of 0.2 or less and light transmission of at least 70%.
  • the substrate is conveniently window glass, and the preferred products have an emissivity of 0.1 or less and a light transmission of at least 75% and preferably at least 80%.
  • additional metal required to give the desired optimum combination of emissivity and light transmission will vary with the deposition conditions, but should be sufficient to provide a metal layer from 0.5 to 10 nm thick preferably 1 to 5 nm thick, assuming no inter-diffusion of additional metal with the underlying silver layer or overlying oxide layer.
  • the optimum quantity of additional metal to be used can be determined by simple trial following the teaching of this specification.
  • Any additional metal must, of course, be a metal suitable for sputtering; it should have a melting point above 50°C, be stable in air and electrically conducting.
  • the preferred metals are generally transition metals and metals of Groups 3a to 5a of the Periodic Table (as set out on page B-3 of the Handbook of Chemistry and Physics, 50th edition, published by The Chemical Rubber Co., Cleveland, Ohio), although other metals which are stable in air, melt above 50°C and are electrically conducting may be used if desired.
  • metals which are themselves oxidised to form metal oxides preferably colourless metal oxides (i.e. metal oxides that do not absorb light in the visible part of the spectrum), during reactive sputtering of the overlying anti-reflection metal oxide layer, e.g. aluminium, titanium and zirconium.
  • colourless metal oxides i.e. metal oxides that do not absorb light in the visible part of the spectrum
  • metal oxides which become oxidised to colourless metal oxides increasing the amount of the metal used has less effect on the light transmission of the product than when using coloured metals, e.g. copper and gold, which are. not so readily oxidised.
  • the tendency of a metal to form an oxide depends on the free energy of formation of the metal oxide.
  • metals such as titaniun, which became oxidised to colourless metal oxides
  • an amount of metal sufficient to provide a metal layer less than 5 nm thick (assuming no oxidation and no inter-diffusion of the metal with the silver layer and the overlying anti-reflection metal oxide layer) in order to maximise the light transmission of the product.
  • preferred metals include bismuth, indium, lead, manganese, iron, chraniun, nickel, cobalt, molybdenum, tungsten, platinun, gold, vanadiun and tantalun, and alloys of these metals, e.g. stainless steel .(Fe/Cr/Ni) and brass (Cu/Zn).
  • Sufficient silver is deposited to provide a layer fran 5 to 30 m thick.
  • the thicker the silver layer the lower the emissivity but the lower the total light transmission.
  • Thicknesses greater than 20 nm are generally only required for electroconductive applications and, for low emissivity coatings, we generally use a silver layer less than 20 nm thick, preferably from 8 to 15 nn thick.
  • the anti-reflection metal oxide layer over the silver layer is preferably comprised of a metal oxide with low visible light absorption and may be, for example, of tin cxide, titaniun oxide, zinc oxide, indium oxide (optionally doped with tin oxide) bismuth oxide or zirconium oxide.
  • Tin oxide, titanium oxide and indium oxide (optionally doped with tin oxide), bismuth oxide and zirconium oxide are preferred because, in addition to the anti-reflection properties they provide, they also have good durability and serve to provide the silver layer with sane protection from mechanical damage.
  • the thickness of the anti-reflection layer used will depend on the particular metal oxide used and the colour of the product desired, but will usually be in the range 10 to 80 nm, especially 20 to 60 nm. If desired, instead of using a single metal oxide layer, a succession of two or more layers of different metal oxides of similar total thickness, i.e. usually 10 to 80 rm, especially 20 to 60 m, ray be used.
  • an anti-reflection layer may be sputtered onto the glass before the silver layer to increase the light transmission of the product.
  • an anti-reflection layer When an anti-reflection layer is deposited under the silver layer, it may conveniently be a metal oxide layer e.g.. any of the metal oxides described above for use as an anti-reflection layer over the silver layer.
  • This underlayer may serve, not only as an anti-reflection layer, but also as a primer layer to improve the adhesion of the silver layer to the glass. It will usually have a thickness in the range 10 nm to 80 nm, especially 20 m to 60 nm, although, in any particular case, the thickness used will depend on the metal oxide chosen and the colour and other properties desired in the product.
  • a succession of two or more anti-reflection layers of similar total thickness i.e. usually 10 to 80 nm, especially 20 to 60 nn, may he used under the silver layer.
  • the invention resides in a process for the production of a low enissivity coating on a transparent substrate of glass by cathode sputtering comprising
  • the additional metal deposited after the silver serves to prevent degradation of the coating properties; one possibility is that it has the effect of preventing oxidation of the silver on reactive sputtering of an overlying anti-reflection metal oxide layer; alternatively, it may he that, under the oxidising conditions used for deposition of the metal oxide layer, the silver tends to agglomerate so that the silver layer becomes discontinuous and the presence of additional metal at the surface of the silver layer inhibits this tendency.
  • sputtering processes may he magnetically . enhanced, and the process of the present invention is especially useful in processes in which the metal and metal oxide layers are deposited by magnetically enhanced sputtering.
  • magnetically enhanced sputtering conditions are generally more stringent and more likely to lead to deterioration of the silver layer than in non-enhanced sputtering processes.
  • a glass or plastics substrate coated with a low enissivity coating comprising
  • a glass substrate with a low emissivity coating comprises in order,
  • the additional metal or metals are not wholly dispersed in the silver layers but extend over the upper surface of the silver layers.
  • the additional metal or metals are present, at least in part, as metal oxides.
  • the values quoted for light transmission are for transmission of light from a C.I.E. Illuminant C Source.
  • a pane of float glass 4 mm thick was prepared for coating by washing and drying, and loaded onto an in-line D.C. planar magnetron sputtering apparatus.
  • Tin oxide (Sn0 2 ) was reactively sputtered on to the glass surface from a tin cathode in the presence of an oxygen atmosphere at 2.5 x 10 -3 torr to give a tin oxide layer 40 nm thick.
  • a layer of silver 10 nm thick was then sputtered onto the tin cxide from a silver cathode in the presence of an argon atmosphere at 3 x 10- 3 torr.
  • a further layer of tin oxide 40 nm thick was reactively sputtered on to the silver layer from a tin cathode in the presence of cxygen atmosphere at 2.5 x 10- 3 torr.
  • the product was found to have a light transmission of 55% and an emissivity of 0.9.
  • the product incorporating the copper was analysed by Auger electron spectroscopy, and the results are shown in Figure 1.
  • Auger analysis a beam of electrons (the primary beam) is directed onto the surface to be analysed, and the elements present in the surface are characterised and quantified by exanining the energy spectrun of secondary electrons emitted from the surface.
  • the surface atonic layers are then removed by argon ion etching to expose sub-surface atoms which are then characterised 'and quantified as described above.
  • the etching and analysis steps are repeated to build up a profile of the composition of the surface layers to the required depth (in this case the thickness of the coating).
  • the sputtering or ion etch time which is plotted along the x-axis shown in Figure 1, is an approximate measure of the depth from the surface of the coating but, as different materials are removed at different rates, it is not linearly related to coating depth.
  • the concentration of material removed, in atonic per cent, is plotted on the y-axis.
  • the composition of the coating corresponds substantially to Sn0 2 .
  • the maximun concentration of copper of approximately 20 atonic per cent, occurs after a time of 80 seconds and is within the upper half of the silver layer.
  • a small proportion of copper apparently lies over the silver layer i.e. copper is detected after a tine of 55 seconds whilst silver is not detected mtil after a time of 65 seconds.
  • the presence of a small anount of copper over the silver layer is desirable and leads to improved properties.
  • the material removed is predominantly Sn0 2 .
  • sane silicon is detected, presunably derived fran the glass surface.
  • a pane of float glass 4 nm thick was prepared for coating by washing and drying, and loaded onto an in-line D.C. planar magnetron sputtering apparatus.
  • Tin oxide was reactively sputtered on to the glass surface from a tin cathode in the presence of an oxygen atmosphere at 2.5 x 10- 3 torr to give a tin oxide layer 30 nm thick.
  • Zinc oxide was then reactively sputtered onto the tin oxide in the presence of an oxygen atmosphere at 2.5 x 10 -3 torr to give a zinc oxide layer 15 nm thick.
  • a layer of silver 10 nm thick was then sputtered onto the zinc oxide fran a silver cathode in the presence of an argon atmosphere at 3 x 10 -3 torr and copper was sputtered onto the silver from a copper cathode in the presence of argon at 2.5 x 10 -3 torr and in an amount equivalent to a layer of copper 3.2 nm thick.
  • layers of zinc oxide and tin oxide, 15 nm thick and 30 rm thick respectively, were reactively sputtered in that order over the copper from metal cathodes in the presence of oxygen atmospheres at 2.5 x 10- 3 torr.
  • the resulting coated product was found to have an emissivity of 0.08 and a light transmission of 80%.
  • a pane of float glass 4 nm thick was prepared for coating by washing and drying, and loaded onto an in-line D.C. planar magnetron sputtering apparatus.
  • Tin and indiun were reactively sputtered on to the glass surface fran a cathode comprising 90% weight indiun 10% weight tin in the presence of an oxygen atmosphere at 2.5 x 10- 3 torr to give a tin doped indiun oxide layer 30 nm thick.
  • a layer of silver 10 nm thick was then sputtered onto the tin oxide from a silver cathode in the presence of an argon atmosphere at 3 x 10- 3 torr, and copper was sputtered onto the silver from a copper cathode in the presence of argon at 3.0 x 10- 3 torr and in an amount equivalent to a layer of copper 3.2 nm thick.
  • the resulting coated product was found to have an emissivity of 0.1 and a light transnission of 74%.
  • a pane of float glass 4 mm thick was prepared for coating by washing and drying, and loaded onto an in-line D.C. planar magnetron sputtering apparatus.
  • Tin oxide was reactively sputtered on to the glass surface from a tin cathode in the presence of an oxygen atmosphere at 2.5 x 10- 3 torr to give a tin oxide layer 40 m thick. Titanium cxide was then reactively sputtered onto the tin oxide in the presence of an oxygen atmosphere at 2.5 x 10- 3 torr to give a titaniun oxide layer 10 nm thick.
  • a layer of silver 10 nm thick was then sputtered onto the titaniun oxide from a silver cathode in the presence of an argon atmosphere at 3 x 10- 3 torr, and copper was sputtered onto the silver fran a copper cathode in the presence of argon at 3 x 10- 3 torr and in an amount equivalent to a layer of copper 3.2 nm thick.
  • layers of titaniun oxide and tin oxide, 10 nm thick and 40 nm thick respectively were reactively sputtered in that order over the copper from metal cathodes in the presence of oxygen atmospheres at 2.5 x 10 -3 torr.
  • the resulting coated product was found to have an emissivity of 0.15 and a light transmission of 80%.
  • a pane of float glass 4 nm thick was prepared for coating by washing and drying, and loaded onto an in-line D.C. planar magnetron sputtering apparatus.
  • Titaniun oxide was reactively sputtered on to the glass surface from a titaniun cathode in the presence of an oxygen atmosphere at 2.5 x 10 -3 torr to give a titaniun oxide layer 15 nm thick.
  • Tin oxide was then reactively sputtered onto the titaniun oxide in the presence of an oxygen atmosphere at 2.5 x 10- 3 torr to give a tin oxide layer 40 nm thick.
  • a layer of silver 10 nm thick was then sputtered onto the tin oxide from a silver cathode in the presence of an argon atmosphere at 3 x 10- 3 torr, and tin was sputtered onto the silver fran a tin cathode in the presence of argon at 3 x 10 -3 torr and in an anount equivalent to a layer of tin 3.5 nm thick.
  • the resulting coated product was found to have an emissivity of 0.16 and a light transmission of 76%.
  • a pane of float glass 4 nm thick was prepared for coating by washing and drying, and loaded onto an in-line D .C. planar magnetron sputtering apparatus.
  • Tin oxide was reactively sputtered on to the glass surface from a tin cathode in the presence of a 20% argon/80% oxygen atmosphere at a pressure of 6 x 10- 3 torr to give a tin oxide layer 40 nm thick.
  • a layer of silver 10 nm thick was then sputtered on to the tin oxide from a silver cathode in the presence of an argon atmosphere at 6 x 10- 3 torr, and stainless steel in an amount equivalent to a layer 3.5 nm thick was sputtered on to the silver from a cathode of 316 stainless steel (an alloy of chromium, nickel and iron) in an argon atmosphere at 6 x 10- 3 torr.
  • tin oxide was reactively sputtered on to the glass surface fran a tin cathode in the presence of a 20% argon/80% oxygen atmosphere at a pressure of 6 x 10- 3 torr to give a tin oxide layer 40 nm thick.
  • the resulting coated product was found to have an emissivity of 0.15 and a light transmission of 80 % .
  • Figures 2 and 3 show the Auger spectra obtained on analysis of products of Examples 8 and 10 respectively. They were obtained in a similar manner to the spectrun illustrated in Figure 1, but using slower etches to remove the coatings.
  • the composition corresponds substantially to Sn0 2 .
  • the spectrun shows a substantial silver peak in the middle with a much lower peak, representing the titaniun, to the left of the silver peak.
  • titaniun and silver are both detected after the same etch or sputter time of 200 seconds, although the titaniun peak rises more rapidly than the silver peak suggesting a mixture of silver, titaniun and tin. which is initially richer in titaniun than silver but, after an etch time of just over 250 seconds, becomes richer in silver than titaniun.
  • the titaniun is thus dispersed non-uniformly in the silver with the maximum concentration of titaniun in the silver being in the upper part of the silver layer. It will also be noted that the oxygen concentration never falls below about 30%, suggesting that the titaniun is present as titaniun oxide (probably titaniun dioxide). After about 320 seconds, nearly all the titaniun has been removed and the composition of the coating is pre-dominantly tin oxide although a significant proportion (about 20 atomic percent) of silver remains. As etching continues the silver concentration falls to zero at about 380 seconds; the remainder of the coating correspond substantially to Sn0 2 until elements from the glass surface are detected after an etch time of nearly 500 seconds.
  • Figure 3 is similar to Figure 2, but in this case additional metal (aluminium) is detected, at an etch time of 120 seconds, before the silver metal.
  • Silver is first detected after an etch time of 150 seconds, shortly before the peak aluminium concentration is reached. Both silver and aluminium are detected up to an etch tine of 270 seconds although after about 230 seconds the coating consists predominantly of tin oxide.
  • the oxygen concentration shows a small peak corresponding to the peak of aluminium concentration and falls to a minimum of about 15% in the middle of the silver layer; this suggests that the aluminium is present, at least in part, as aluminium oxide.
  • the Auger spectrum obtained on analysis of the product of Example 7 was similar to those described above, in that it showed an oxygen peak corresponding to the peak concentration of additional metal. This indicates that substantial oxidation of the stainless steel had taken place (the peak iron concentration was observed at an etch tine of 170 seconds; at the peak iron concentration, the concentration of the coating was determined as 15 atonic per cent iron, 7 atomic per cent tin, 3 atomic per cent silver, 2 atonic per cent nickel and 73 atomic per cent nickel).
  • Examples 12 to 15 show the effect of increasing the amount of titanium used as the additional metal. It will be noted that, when the amount of titanium used is greater than that equivalent to a titanium layer 5 nm thick, the light transmission of the product falls below 80%. Similarly, the other metals used generally gave the best results when used in amounts equivalent to a metal layer less than 5 nm thick. Lead and gold were exceptions, and appeared most effective when used in amounts equivalent to a metal layer of about 6 to 8 nm thick.
  • the amount of additional metal used is defined in terms of equivalent layer thickness, that is, the thickness of the additional layer that would be formed by sputtering the same amount of the additional metal assuming the additional mstal was not oxidised and there was no inter-diffusion between the additional metal and the adjacent silver and anti-reflection metal oxide layers.
EP83305528A 1982-09-21 1983-09-20 Revêtements à faible émissivité sur substrats transparents Expired EP0104870B1 (fr)

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AT83305528T ATE31525T1 (de) 1982-09-21 1983-09-20 Beschichtungen mit niedriger ausstrahlung auf transparenten substraten.

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GB8226833 1982-09-21
GB8226833 1982-09-21
GB838320881A GB8320881D0 (en) 1983-08-03 1983-08-03 Low emissivity coatings on transparent substrates
GB8320881 1983-08-03

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EP0104870A2 true EP0104870A2 (fr) 1984-04-04
EP0104870A3 EP0104870A3 (en) 1984-12-27
EP0104870B1 EP0104870B1 (fr) 1987-12-23

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EP (1) EP0104870B1 (fr)
AU (1) AU554729B2 (fr)
CA (1) CA1203197A (fr)
DE (2) DE3375010D1 (fr)
DK (1) DK160758C (fr)
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DE3806124A1 (de) * 1988-02-26 1989-09-07 Leybold Ag Verfahren zum herstellen von scheiben aus mineralglas mit hohem transmissionsverhalten im sichtbaren spektralbereich und mit niedriger sonnenenergietransmission sowie durch das verfahren hergestellte scheiben
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US5110662A (en) * 1989-01-05 1992-05-05 Glaverbel Coated glazing material
US5153054A (en) * 1989-01-05 1992-10-06 Glaverbel Coated glazing material
DE3941026C2 (de) * 1989-01-05 2000-01-13 Glaverbel Beschichtetes Verglasungsmaterial und Verfahren zu dessen Beschichtung
GB2229737B (en) * 1989-01-05 1993-02-24 Glaverbel Coated glazing material and process of coating same
DE3906453A1 (de) * 1989-03-01 1990-09-06 Leybold Ag Verfahren zum beschichten von substraten aus durchscheinendem werkstoff, beispielsweise aus floatglas
US5271994A (en) * 1989-12-09 1993-12-21 Saint Gobain Vitrage International Electrically heatable automobile glazing of laminated glass
EP0433136B1 (fr) * 1989-12-09 1996-02-14 Saint-Gobain Vitrage International Vitrage auto feuilleté chauffant électriquement
US5506037A (en) * 1989-12-09 1996-04-09 Saint Gobain Vitrage International Heat-reflecting and/or electrically heatable laminated glass pane
EP0433136A2 (fr) * 1989-12-09 1991-06-19 Saint-Gobain Vitrage International Vitrage auto feuilleté chauffant À©lectriquement
DE4109708C1 (fr) * 1991-03-23 1992-11-12 Vegla Vereinigte Glaswerke Gmbh, 5100 Aachen, De
DE4239355A1 (de) * 1992-11-24 1994-05-26 Leybold Ag Transparentes Substrat mit einem transparenten Schichtsystem und Verfahren zur Herstellung eines solchen Schichtsystems
WO1995029136A1 (fr) * 1994-04-26 1995-11-02 Thomson Tubes Electroniques Procede de depot d'un revetement conducteur sur un substrat de verre
WO1997000335A1 (fr) * 1995-06-19 1997-01-03 The University Of Sydney Revetement de surface selectif solaire
US6020077A (en) * 1996-02-09 2000-02-01 Saint-Gobain Vitrage Transparent substrate provided with a thin-film stack with properties in the infrared
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DE19726966C1 (de) * 1997-06-25 1999-01-28 Flachglas Ag Verfahren zur Herstellung einer transparenten Silberschicht mit hoher spezifischer elektrischer Leitfähigkeit , Glasscheibe mit einem Dünnschichtsystem mit einer solchen Silberschicht und deren Verwendung
US6007901A (en) * 1997-12-04 1999-12-28 Cpfilms, Inc. Heat reflecting fenestration products with color corrective and corrosion protective layers
US6040939A (en) * 1998-06-16 2000-03-21 Turkiye Sise Ve Cam Fabrikalari A.S. Anti-solar and low emissivity functioning multi-layer coatings on transparent substrates
US6190776B1 (en) * 1999-07-07 2001-02-20 Turkiye Sise Cam Heat treatable coated glass
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US10436955B2 (en) 2014-10-27 2019-10-08 Almeco Gmbh Temperature- and corrosion-stable surface reflector
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EP0104870B1 (fr) 1987-12-23
MX172033B (es) 1993-11-29
CA1203197A (fr) 1986-04-15
NO833335L (no) 1984-03-22
US4462883A (en) 1984-07-31
FI77440B (fi) 1988-11-30
EP0104870A3 (en) 1984-12-27
DE3375010D1 (en) 1988-02-04
DK431483A (da) 1984-03-22
DK431483D0 (da) 1983-09-21
DE104870T1 (de) 1984-07-05
GB2129831B (en) 1986-01-22
FI833385A0 (fi) 1983-09-21
FI833385A (fi) 1984-03-22
DK160758C (da) 1991-09-30
GB8325063D0 (en) 1983-10-19
NO157212C (no) 1988-02-10
NO157212B (no) 1987-11-02
GB2129831A (en) 1984-05-23
AU1928583A (en) 1985-12-12
DK160758B (da) 1991-04-15
AU554729B2 (en) 1986-08-28

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