EP0006461A1 - Bain acide pour le dépôt électrolytique de nickel contenant de la sulfobétaine comme agent de brillantage et de nivellement - Google Patents
Bain acide pour le dépôt électrolytique de nickel contenant de la sulfobétaine comme agent de brillantage et de nivellement Download PDFInfo
- Publication number
- EP0006461A1 EP0006461A1 EP79101652A EP79101652A EP0006461A1 EP 0006461 A1 EP0006461 A1 EP 0006461A1 EP 79101652 A EP79101652 A EP 79101652A EP 79101652 A EP79101652 A EP 79101652A EP 0006461 A1 EP0006461 A1 EP 0006461A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- nickel
- agents
- gloss
- compounds
- current density
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 38
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 19
- 239000003795 chemical substances by application Substances 0.000 title claims abstract description 16
- PSBDWGZCVUAZQS-UHFFFAOYSA-N (dimethylsulfonio)acetate Chemical compound C[S+](C)CC([O-])=O PSBDWGZCVUAZQS-UHFFFAOYSA-N 0.000 title description 7
- 229940117986 sulfobetaine Drugs 0.000 title description 6
- 239000002253 acid Substances 0.000 title description 3
- 238000005282 brightening Methods 0.000 title description 2
- 238000004070 electrodeposition Methods 0.000 title 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 20
- -1 arylalkyl halide Chemical class 0.000 claims abstract description 16
- 150000001875 compounds Chemical class 0.000 claims abstract description 14
- 239000000203 mixture Substances 0.000 claims abstract description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 10
- 230000002378 acidificating effect Effects 0.000 claims abstract description 7
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims abstract description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract 2
- 239000001257 hydrogen Substances 0.000 claims abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract 2
- 239000002585 base Substances 0.000 claims description 9
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052794 bromium Inorganic materials 0.000 claims description 3
- 239000000460 chlorine Substances 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims description 2
- 150000001340 alkali metals Chemical group 0.000 claims description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 2
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical class [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims 1
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims 1
- 125000001309 chloro group Chemical group Cl* 0.000 claims 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims 1
- 238000007747 plating Methods 0.000 claims 1
- 229910052723 transition metal Inorganic materials 0.000 claims 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 abstract description 11
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 abstract description 5
- 150000001768 cations Chemical class 0.000 abstract description 3
- 125000001072 heteroaryl group Chemical group 0.000 abstract description 2
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 125000005556 thienylene group Chemical group 0.000 abstract 1
- 239000003792 electrolyte Substances 0.000 description 15
- 238000000034 method Methods 0.000 description 9
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 4
- 238000006277 sulfonation reaction Methods 0.000 description 4
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Chemical compound O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 4
- NDZFNTHGIIQMQI-UHFFFAOYSA-N 1-benzylpyridin-1-ium Chemical compound C=1C=CC=C[N+]=1CC1=CC=CC=C1 NDZFNTHGIIQMQI-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 125000000623 heterocyclic group Chemical group 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- GZODBWVCIKIWKC-UHFFFAOYSA-N 1-benzyl-2-methylpyridin-1-ium Chemical compound CC1=CC=CC=[N+]1CC1=CC=CC=C1 GZODBWVCIKIWKC-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 2
- 229940073608 benzyl chloride Drugs 0.000 description 2
- 229960003237 betaine Drugs 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- XSUMSESCSPMNPN-UHFFFAOYSA-N propane-1-sulfonate;pyridin-1-ium Chemical compound C1=CC=NC=C1.CCCS(O)(=O)=O XSUMSESCSPMNPN-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000000080 wetting agent Substances 0.000 description 2
- KNKRKFALVUDBJE-UHFFFAOYSA-N 1,2-dichloropropane Chemical compound CC(Cl)CCl KNKRKFALVUDBJE-UHFFFAOYSA-N 0.000 description 1
- FSSPGSAQUIYDCN-UHFFFAOYSA-N 1,3-Propane sultone Chemical compound O=S1(=O)CCCO1 FSSPGSAQUIYDCN-UHFFFAOYSA-N 0.000 description 1
- KEQGZUUPPQEDPF-UHFFFAOYSA-N 1,3-dichloro-5,5-dimethylimidazolidine-2,4-dione Chemical compound CC1(C)N(Cl)C(=O)N(Cl)C1=O KEQGZUUPPQEDPF-UHFFFAOYSA-N 0.000 description 1
- UMGOXOSNRRCSNQ-UHFFFAOYSA-N 1-(2-phenylethyl)-4,5-dihydro-1h-imidazol-1-ium;chloride Chemical class [Cl-].C1CN=C[NH+]1CCC1=CC=CC=C1 UMGOXOSNRRCSNQ-UHFFFAOYSA-N 0.000 description 1
- ASHVGNGFCXYXBN-UHFFFAOYSA-M 1-benzyl-2-methylpyridin-1-ium;chloride Chemical compound [Cl-].CC1=CC=CC=[N+]1CC1=CC=CC=C1 ASHVGNGFCXYXBN-UHFFFAOYSA-M 0.000 description 1
- SZAVXDFBYYCZLW-UHFFFAOYSA-N 1-benzyl-4-methylpyridin-1-ium Chemical compound C1=CC(C)=CC=[N+]1CC1=CC=CC=C1 SZAVXDFBYYCZLW-UHFFFAOYSA-N 0.000 description 1
- GNPSDJOWGWWXSS-UHFFFAOYSA-M 1-benzylpyridin-1-ium;chloride Chemical compound [Cl-].C=1C=CC=C[N+]=1CC1=CC=CC=C1 GNPSDJOWGWWXSS-UHFFFAOYSA-M 0.000 description 1
- MNNZINNZIQVULG-UHFFFAOYSA-N 2-chloroethylbenzene Chemical compound ClCCC1=CC=CC=C1 MNNZINNZIQVULG-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- XZBXAYCCBFTQHH-UHFFFAOYSA-N 3-chloropropylbenzene Chemical compound ClCCCC1=CC=CC=C1 XZBXAYCCBFTQHH-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001251 acridines Chemical class 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 125000005526 alkyl sulfate group Chemical group 0.000 description 1
- 230000029936 alkylation Effects 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- IYABWNGZIDDRAK-UHFFFAOYSA-N allene Chemical group C=C=C IYABWNGZIDDRAK-UHFFFAOYSA-N 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 239000003183 carcinogenic agent Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- XTHPWXDJESJLNJ-UHFFFAOYSA-N chlorosulfonic acid Substances OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- PAFZNILMFXTMIY-UHFFFAOYSA-O cyclohexylammonium Chemical compound [NH3+]C1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-O 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 150000008050 dialkyl sulfates Chemical class 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-M ethenesulfonate Chemical compound [O-]S(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-M 0.000 description 1
- VXAWCKIQYKXJMD-UHFFFAOYSA-N ethynamine Chemical class NC#C VXAWCKIQYKXJMD-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000005054 naphthyridines Chemical class 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- ZNCXUFVDFVBRDO-UHFFFAOYSA-N pyridine;sulfuric acid Chemical compound [H+].[O-]S([O-])(=O)=O.C1=CC=[NH+]C=C1 ZNCXUFVDFVBRDO-UHFFFAOYSA-N 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical class N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 230000019635 sulfation Effects 0.000 description 1
- 238000005670 sulfation reaction Methods 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910001428 transition metal ion Inorganic materials 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-O tributylazanium Chemical compound CCCC[NH+](CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-O 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/18—Heterocyclic compounds
Definitions
- the invention relates to a new acidic galvanic nickel bath which, in addition to conventional glossing and wetting agents, contains special heteroaromatic sulfobetaines as glossing and leveling agents.
- reaction products of heterocyclic nitrogen bases of the aromatic type with sultons as brighteners and leveling agents in galvanic nickel baths. According to their chemical structure, they represent internal salts of aminoalkanesulfonic acids (sulfobetaines).
- sulfobetaines aminoalkanesulfonic acids
- DAS 11 91 652 Another group of gloss additives for acidic galvanic nickel baths is described in DAS 11 91 652. These are sulfobetaines of aromatic type heterocyclic nitrogen bases which are obtained, for example, by alkylation of pyridine with dialkyl sulfates. An alkyl sulfate group acts as the anion here.
- This type of brightener also brings satisfactory leveling values only in the high current density range.
- the aim of the invention was. in finding means which do not have these disadvantages and which are particularly effective even at low current densities.
- Nitrogen bases from which the brighteners are made obey Formula II in the R, R 1 and R 2 are defined according to formula I.
- aromatic type e.g. Pyridine, imidazole, thiazole, pyridazine, pyrazine, pyrimidine, quinoline, isoquinoline and others such as 1,2 and 1,3-benzdiazines, naphthiridines, pyridopyridines, triazines and acridines.
- R , R 1 and R 2 are, for example .
- R , R 1 and R 2 are, for example .
- Pyridine, picoline, quinoline, pyrimidine and isoquinoline are preferably chosen as starting bases.
- the nitrogen bases are first arylalkyl halides of the formula III implemented in which R 3 and n are defined according to formula I in the claim and Hal is chlorine or bromine.
- n 1 to 3 and R 3 represents a phenylene or thienylene radical which is unsubstituted or by chlorine, bromine, C 1 - to C 4 -alkyl, such as methyl, ethyl, n- and isopropyl or n and isopropyl groups can be substituted.
- the - (CH 2 ) n group can thus mean the methylene, ethylene or n-propylene group.
- Preferred compounds of the formula III are arylalkyl halides, such as benzyl chloride, phenylethyl chloride or phenylpropyl chloride, ie R 3 in this case means the unsubstituted phenylene radical.
- R 3 in this case means the unsubstituted phenylene radical.
- the sulfonation is conveniently carried out in aliphatic chlorinated hydrocarbons such as ethylene chloride, propylene chloride and others. by.
- Suitable counter cations are alkali metal and the equivalent amount (“half” amount) of alkaline earth metal or divalent transition metal ions, such as iron or nickel.
- Optionally substituted ammonium ions also fulfill this function - NH 4 ⁇ , cyclohexylammonium, tributylammonium and others may be mentioned. Sodium, potassium or cyclohexylammonium cations are particularly preferred.
- the compounds according to the invention have the advantage of being toxicologically harmless in synthesis and use.
- benzylpyridinium chloride has been used for years as a leveling agent in the dyeing of anionically modified polyacrylonitrile fibers.
- the sulfobetaines obtained in this way are more stable in the weakly acidic medium (application conditions) than the acid-sensitive sulfuric acid half-esters.
- Aromatic sulfonic acid groups carry LJ, which may occur due to electrochemical degradation and thus still act as secondary brighteners.
- the baths contain the betaines to be used according to the invention in amounts of 0.05 to 3 g / l, preferably 0.1 to 0.5 g / 1 bath liquid. Otherwise they contain the usual primary and secondary brighteners, such as acetylene alcohols, acetylenamines or oxyalkylated acetylene alcohols or sulfonamides, saccharin, vinyl sulfonate, bisbenzenesulfonamide and others. in amounts of 0.1 to 5 g / l or 0.01 to 3 g / l. They also contain conventional wetting agents in concentrations of 0.1 to 1 g / l.
- the mixture is neutralized with 444 parts of calcium hydroxide, 15 parts of activated carbon are added, gypsum and activated carbon are removed and the solution of the benzylpyridinium sulfobetaine is adjusted to a content of 50% active substance by concentration.
- the benzyl-2-picolinium chloride is prepared and 658.5 parts are introduced into 2600 parts of ethylene chloride.
- the benzylmethylimidazolinium chlorides are prepared and 622.5 parts are introduced into 2600 parts of ethylene chloride.
- benzyl-2-picolinium sulfobetaine instead of benzylpyridinium sulfobetaine in Example 25, benzyl-2-picolinium sulfobetaine according to Example 2 was used as brightener and leveler.
- products according to the prior art were used as leveling agents and brighteners, namely pyridinium propane sulfonate and pyridinium (hydroxyethyl sulfate-2) according to DT-AS 11 91 652.
- benzylpyridinium sulfobetaine instead of benzylpyridinium sulfobetaine according to example 25, benzyl-4-picolinium sulfobetaine (example 5) was used.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Pyridine Compounds (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19782825966 DE2825966A1 (de) | 1978-06-14 | 1978-06-14 | Saures galvanisches nickelbad, das sulfobetaine als glanz- und einebnungsmittel enthaelt |
DE2825966 | 1978-06-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0006461A1 true EP0006461A1 (fr) | 1980-01-09 |
EP0006461B1 EP0006461B1 (fr) | 1981-11-04 |
Family
ID=6041721
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP79101652A Expired EP0006461B1 (fr) | 1978-06-14 | 1979-05-30 | Bain acide pour le dépôt électrolytique de nickel contenant de la sulfobétaine comme agent de brillantage et de nivellement |
Country Status (4)
Country | Link |
---|---|
US (1) | US4212709A (fr) |
EP (1) | EP0006461B1 (fr) |
JP (1) | JPS552799A (fr) |
DE (2) | DE2825966A1 (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT377013B (de) * | 1981-03-06 | 1985-01-25 | Langbein Pfanhauser Werke Ag | Verfahren zur galvanischen herstellung einer ueberzugsschicht aus palladium/-nickel-mischkristallen |
AT377015B (de) * | 1981-03-06 | 1985-01-25 | Langbein Pfanhauser Werke Ag | Verfahren zur galvanischen abscheidung einer ueberzugsschicht aus palladium/nickel-mischkristallen |
AT377014B (de) * | 1981-03-06 | 1985-01-25 | Langbein Pfanhauser Werke Ag | Verfahren zur galvanischen abscheidung einer ueberzugsschicht aus palladium/-nickel-mischkristallen |
EP0341167A1 (fr) * | 1988-05-02 | 1989-11-08 | Piolat Industrie | Procédé de fabrication par électroformage d'un cadre perforé en nickel |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2803493A1 (de) * | 1978-01-27 | 1979-08-02 | Agfa Gevaert Ag | Verfahren zur herstellung von sulfoalkylquartaersalzen |
US4430171A (en) | 1981-08-24 | 1984-02-07 | M&T Chemicals Inc. | Electroplating baths for nickel, iron, cobalt and alloys thereof |
JPS61186878A (ja) * | 1985-02-14 | 1986-08-20 | Furuno Electric Co Ltd | 送受波器 |
JPH03500416A (ja) * | 1988-07-29 | 1991-01-31 | エス・アール・アイ・インターナシヨナル | 置換ピリジニウム化合物に基く協力腐食防止剤 |
SE9002659D0 (sv) * | 1990-08-15 | 1990-08-15 | Astra Ab | New pharmaceutical formulations |
US7300563B2 (en) * | 2003-02-07 | 2007-11-27 | Pavco, Inc. | Use of N-alllyl substituted amines and their salts as brightening agents in nickel plating baths |
US20050230262A1 (en) * | 2004-04-20 | 2005-10-20 | Semitool, Inc. | Electrochemical methods for the formation of protective features on metallized features |
DE102014207778B3 (de) * | 2014-04-25 | 2015-05-21 | Kiesow Dr. Brinkmann GmbH & Co. KG | Verwendung einer Mischung zur Verwendung in einem galvanischen Bad oder eines galvanischen Bades zur Herstellung einer Glanznickelschicht sowie Verfahren zur Herstellung eines Artikels mit einer Glanznickelschicht |
CN112410831B (zh) * | 2020-11-17 | 2021-11-26 | 广州三孚新材料科技股份有限公司 | 一种用于异质结太阳能电池的电镀锡液及其制备方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1092744B (de) * | 1958-12-17 | 1960-11-10 | Dehydag Gmbh | Saures galvanisches Nickelbad |
DE1621157A1 (de) * | 1967-08-16 | 1971-05-19 | Riedel & Co | Saures galvanisches Nickelbad |
US3862019A (en) * | 1974-04-26 | 1975-01-21 | R O Hull & Company Inc | Composition of electroplating bath for the electrodeposition of bright nickel |
US4067785A (en) * | 1976-03-12 | 1978-01-10 | Cilag-Chemie A.G. | Electroplating additives |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1191652B (de) * | 1963-05-15 | 1965-04-22 | Dehydag Gmbh | Saures galvanisches Nickelbad |
-
1978
- 1978-06-14 DE DE19782825966 patent/DE2825966A1/de active Pending
-
1979
- 1979-05-11 US US06/038,171 patent/US4212709A/en not_active Expired - Lifetime
- 1979-05-30 EP EP79101652A patent/EP0006461B1/fr not_active Expired
- 1979-05-30 DE DE7979101652T patent/DE2961219D1/de not_active Expired
- 1979-06-12 JP JP7314779A patent/JPS552799A/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1092744B (de) * | 1958-12-17 | 1960-11-10 | Dehydag Gmbh | Saures galvanisches Nickelbad |
DE1621157A1 (de) * | 1967-08-16 | 1971-05-19 | Riedel & Co | Saures galvanisches Nickelbad |
US3862019A (en) * | 1974-04-26 | 1975-01-21 | R O Hull & Company Inc | Composition of electroplating bath for the electrodeposition of bright nickel |
US4067785A (en) * | 1976-03-12 | 1978-01-10 | Cilag-Chemie A.G. | Electroplating additives |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT377013B (de) * | 1981-03-06 | 1985-01-25 | Langbein Pfanhauser Werke Ag | Verfahren zur galvanischen herstellung einer ueberzugsschicht aus palladium/-nickel-mischkristallen |
AT377015B (de) * | 1981-03-06 | 1985-01-25 | Langbein Pfanhauser Werke Ag | Verfahren zur galvanischen abscheidung einer ueberzugsschicht aus palladium/nickel-mischkristallen |
AT377014B (de) * | 1981-03-06 | 1985-01-25 | Langbein Pfanhauser Werke Ag | Verfahren zur galvanischen abscheidung einer ueberzugsschicht aus palladium/-nickel-mischkristallen |
EP0341167A1 (fr) * | 1988-05-02 | 1989-11-08 | Piolat Industrie | Procédé de fabrication par électroformage d'un cadre perforé en nickel |
Also Published As
Publication number | Publication date |
---|---|
DE2961219D1 (en) | 1982-01-14 |
EP0006461B1 (fr) | 1981-11-04 |
DE2825966A1 (de) | 1980-01-03 |
US4212709A (en) | 1980-07-15 |
JPS552799A (en) | 1980-01-10 |
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