DK218882A - Fotofoelsomt optegnelsesmateriale og fremgangsmaade til halvtoneradering - Google Patents

Fotofoelsomt optegnelsesmateriale og fremgangsmaade til halvtoneradering Download PDF

Info

Publication number
DK218882A
DK218882A DK218882A DK218882A DK218882A DK 218882 A DK218882 A DK 218882A DK 218882 A DK218882 A DK 218882A DK 218882 A DK218882 A DK 218882A DK 218882 A DK218882 A DK 218882A
Authority
DK
Denmark
Prior art keywords
image
developer
layer
tone
molecular weight
Prior art date
Application number
DK218882A
Other languages
Danish (da)
English (en)
Inventor
R W Hallman
R E Bohannon
E L Langs
D B Rubic
Original Assignee
Napp Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22689756&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DK218882(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Napp Systems Inc filed Critical Napp Systems Inc
Publication of DK218882A publication Critical patent/DK218882A/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00—Colour separation; Correction of tonal value
    • G03F3/10—Checking the colour or tonal value of separation negatives or positives
    • G03F3/101—Colour or tonal value checking by non-photographic means or by means other than using non-impact printing methods or duplicating or marking methods covered by B41M5/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Color Printing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
DK218882A 1980-09-15 1982-05-14 Fotofoelsomt optegnelsesmateriale og fremgangsmaade til halvtoneradering DK218882A (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US18762380A 1980-09-15 1980-09-15
PCT/US1981/001229 WO1982001085A1 (en) 1980-09-15 1981-09-15 Bilayer photosensitive imaging article

Publications (1)

Publication Number Publication Date
DK218882A true DK218882A (da) 1982-05-14

Family

ID=22689756

Family Applications (1)

Application Number Title Priority Date Filing Date
DK218882A DK218882A (da) 1980-09-15 1982-05-14 Fotofoelsomt optegnelsesmateriale og fremgangsmaade til halvtoneradering

Country Status (7)

Country Link
EP (1) EP0048160B1 (de)
JP (1) JPH0145898B2 (de)
AT (1) ATE14483T1 (de)
CA (1) CA1180931A (de)
DE (1) DE3171490D1 (de)
DK (1) DK218882A (de)
WO (1) WO1982001085A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58174946A (ja) * 1982-03-31 1983-10-14 Konishiroku Photo Ind Co Ltd 画像形成材料
DE3328019A1 (de) * 1982-09-21 1984-03-22 Polychrome Corp., 10702 Yonkers, N.Y. Mit wasser entwickelbare druckplatte
WO1995032454A1 (en) * 1994-05-19 1995-11-30 Hoechst Celanese Corporation Single coating transfer color proofing system
US5922509A (en) * 1998-03-18 1999-07-13 Morton International, Inc. Photoimageable compositions having improved stripping properties in aqueous alkaline solutions

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB586003A (en) * 1944-03-25 1947-03-04 Kodak Ltd Method of making diaphragms wholly or partly of metal
NL199728A (de) * 1954-08-20
US2980534A (en) * 1956-12-17 1961-04-18 Monsanto Chemicals Photographic compositions and photographic elements
US2993788A (en) * 1958-06-17 1961-07-25 Gen Aniline & Film Corp Multicolor reproduction using light sensitive diazo oxides
US3130051A (en) * 1958-12-10 1964-04-21 Gen Aniline & Film Corp Process for producing negative working offset diazo printing plates
US3031302A (en) * 1959-11-16 1962-04-24 Bayer Paul Process of producing printing plates
US3164468A (en) * 1960-06-06 1965-01-05 Gen Aniline & Film Corp Photomechanical reversal process and foil and dyes for use therein
US3258337A (en) * 1961-11-06 1966-06-28 Cousins William Walter Method for producing multi-colored art work to be used for proofing
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
JPS49441B1 (de) * 1968-08-14 1974-01-08
US3542551A (en) * 1968-07-01 1970-11-24 Trw Semiconductors Inc Method of etching patterns into solid state devices
JPS5421089B2 (de) * 1973-05-29 1979-07-27
US4124395A (en) * 1973-08-10 1978-11-07 Fuji Photo Film Co., Ltd. Subbing layer on polyester film for light-sensitive material
US3931030A (en) * 1973-10-02 1976-01-06 Kenseido Kagaku Kogyo Kabushiki Kaisha Etching composition for etching nickel screen rolls or plates
US3873319A (en) * 1974-01-31 1975-03-25 Minnesota Mining & Mfg Dry-film negative photoresist having amidized styrene-maleic anhydride binder material
NL7413844A (nl) * 1974-10-23 1976-04-27 Oce Van Der Grinten Nv Lithografische kopieerfilm.
JPS54109423A (en) * 1978-02-16 1979-08-28 Process Shizai Dry imaging material

Also Published As

Publication number Publication date
WO1982001085A1 (en) 1982-04-01
EP0048160A1 (de) 1982-03-24
CA1180931A (en) 1985-01-15
JPS57501497A (de) 1982-08-19
JPH0145898B2 (de) 1989-10-05
DE3171490D1 (en) 1985-08-29
EP0048160B1 (de) 1985-07-24
ATE14483T1 (de) 1985-08-15

Similar Documents

Publication Publication Date Title
US5480047A (en) Method for forming a fine resist pattern
MY106633A (en) Positive acting photoresists and method of producing same.
EP0361907A3 (de) Photolack-Zusammensetzung mit Bildumkehr für tiefes UV
KR970050298A (ko) 박막 디바이스 프로세싱용의 오목형 포토레지스트 리프트-오브 프로필을 형성하는 방법 및 그에 의해 제조된 박막 디바이스
GB1514109A (en) Method of making resist mask on a substrate
JPS5355115A (en) Thermodevelopment photosensitive material
DK218882A (da) Fotofoelsomt optegnelsesmateriale og fremgangsmaade til halvtoneradering
CA1312843C (en) Fabrication of electronic devices utilizing lithographic techniques
JPH1197328A (ja) レジストパターンの形成方法
FR2232781A1 (en) Prc5printing pla0e prodn. using laser beam - to form image by perforation of metallised plastic sheet, followed by photopolymsn.
JPS56167135A (en) Contact exposing method
US3695875A (en) Contrast in computer generated photoetching masks
JPS55117142A (en) Image duplicating material and image duplicating method
JPH06105678B2 (ja) 半導体装置の製造方法
JPS5680047A (en) Lithographic plate requiring no dampening water
JPH0821532B2 (ja) 半導体装置の製造方法
DK0623853T3 (da) Negativt arbejdende og positivt arbejdende, i et enkelt trin fremkaldelig trykplade og billeddannelsesproces
JPS57109944A (en) Image forming material
GB1522951A (en) Method of duplication of a video frequency signal recording
JPS6424425A (en) Formation of tapered pattern
JPS55134845A (en) Electron beam resist
JPH06112119A (ja) レジストパターン形成方法
JPH0381759A (ja) 感光材料並びにその製造方法
JPS5255381A (en) Photo exposure method
JPH02262155A (ja) レジストパターンの形成方法

Legal Events

Date Code Title Description
AHB Application shelved due to non-payment