DE3171490D1 - Photosensitive recording material, and method of half-tone etching - Google Patents

Photosensitive recording material, and method of half-tone etching

Info

Publication number
DE3171490D1
DE3171490D1 DE8181304217T DE3171490T DE3171490D1 DE 3171490 D1 DE3171490 D1 DE 3171490D1 DE 8181304217 T DE8181304217 T DE 8181304217T DE 3171490 T DE3171490 T DE 3171490T DE 3171490 D1 DE3171490 D1 DE 3171490D1
Authority
DE
Germany
Prior art keywords
image
tone
developer
layer
recording material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8181304217T
Other languages
English (en)
Inventor
Robert W Hallman
Eugene L Langlais
Ronald G Bohannon
Dominic B Rubic
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Napp Systems Inc
Napp Systems USA Inc
Original Assignee
Napp Systems Inc
Napp Systems USA Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22689756&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE3171490(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Napp Systems Inc, Napp Systems USA Inc filed Critical Napp Systems Inc
Application granted granted Critical
Publication of DE3171490D1 publication Critical patent/DE3171490D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00—Colour separation; Correction of tonal value
    • G03F3/10—Checking the colour or tonal value of separation negatives or positives
    • G03F3/101—Colour or tonal value checking by non-photographic means or by means other than using non-impact printing methods or duplicating or marking methods covered by B41M5/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Color Printing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
DE8181304217T 1980-09-15 1981-09-15 Photosensitive recording material, and method of half-tone etching Expired DE3171490D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US18762380A 1980-09-15 1980-09-15

Publications (1)

Publication Number Publication Date
DE3171490D1 true DE3171490D1 (en) 1985-08-29

Family

ID=22689756

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8181304217T Expired DE3171490D1 (en) 1980-09-15 1981-09-15 Photosensitive recording material, and method of half-tone etching

Country Status (7)

Country Link
EP (1) EP0048160B1 (de)
JP (1) JPH0145898B2 (de)
AT (1) ATE14483T1 (de)
CA (1) CA1180931A (de)
DE (1) DE3171490D1 (de)
DK (1) DK218882A (de)
WO (1) WO1982001085A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58174946A (ja) * 1982-03-31 1983-10-14 Konishiroku Photo Ind Co Ltd 画像形成材料
DE3328019A1 (de) * 1982-09-21 1984-03-22 Polychrome Corp., 10702 Yonkers, N.Y. Mit wasser entwickelbare druckplatte
WO1995032454A1 (en) * 1994-05-19 1995-11-30 Hoechst Celanese Corporation Single coating transfer color proofing system
US5922509A (en) * 1998-03-18 1999-07-13 Morton International, Inc. Photoimageable compositions having improved stripping properties in aqueous alkaline solutions

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB586003A (en) * 1944-03-25 1947-03-04 Kodak Ltd Method of making diaphragms wholly or partly of metal
BE540225A (de) * 1954-08-20
US2980534A (en) * 1956-12-17 1961-04-18 Monsanto Chemicals Photographic compositions and photographic elements
US2993788A (en) * 1958-06-17 1961-07-25 Gen Aniline & Film Corp Multicolor reproduction using light sensitive diazo oxides
US3130051A (en) * 1958-12-10 1964-04-21 Gen Aniline & Film Corp Process for producing negative working offset diazo printing plates
US3031302A (en) * 1959-11-16 1962-04-24 Bayer Paul Process of producing printing plates
US3164468A (en) * 1960-06-06 1965-01-05 Gen Aniline & Film Corp Photomechanical reversal process and foil and dyes for use therein
US3258337A (en) * 1961-11-06 1966-06-28 Cousins William Walter Method for producing multi-colored art work to be used for proofing
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
JPS49441B1 (de) * 1968-08-14 1974-01-08
US3542551A (en) * 1968-07-01 1970-11-24 Trw Semiconductors Inc Method of etching patterns into solid state devices
JPS5421089B2 (de) * 1973-05-29 1979-07-27
US4124395A (en) * 1973-08-10 1978-11-07 Fuji Photo Film Co., Ltd. Subbing layer on polyester film for light-sensitive material
US3931030A (en) * 1973-10-02 1976-01-06 Kenseido Kagaku Kogyo Kabushiki Kaisha Etching composition for etching nickel screen rolls or plates
US3873319A (en) * 1974-01-31 1975-03-25 Minnesota Mining & Mfg Dry-film negative photoresist having amidized styrene-maleic anhydride binder material
NL7413844A (nl) * 1974-10-23 1976-04-27 Oce Van Der Grinten Nv Lithografische kopieerfilm.
JPS54109423A (en) * 1978-02-16 1979-08-28 Process Shizai Dry imaging material

Also Published As

Publication number Publication date
DK218882A (da) 1982-05-14
EP0048160B1 (de) 1985-07-24
JPH0145898B2 (de) 1989-10-05
WO1982001085A1 (en) 1982-04-01
CA1180931A (en) 1985-01-15
ATE14483T1 (de) 1985-08-15
EP0048160A1 (de) 1982-03-24
JPS57501497A (de) 1982-08-19

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8331 Complete revocation