DK161808C - Apparat til kontinuerlig aflejring af et fast lag paa overfladen af et substrat, der befinder sig ved hoej temperatur - Google Patents
Apparat til kontinuerlig aflejring af et fast lag paa overfladen af et substrat, der befinder sig ved hoej temperaturInfo
- Publication number
- DK161808C DK161808C DK562382A DK562382A DK161808C DK 161808 C DK161808 C DK 161808C DK 562382 A DK562382 A DK 562382A DK 562382 A DK562382 A DK 562382A DK 161808 C DK161808 C DK 161808C
- Authority
- DK
- Denmark
- Prior art keywords
- substrate
- high temperature
- solid layer
- continuous deposition
- deposition
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Life Sciences & Earth Sciences (AREA)
- Metallurgy (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Carbon Steel Or Casting Steel Manufacturing (AREA)
- Nozzles (AREA)
- Coating With Molten Metal (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Sampling And Sample Adjustment (AREA)
- Aerodynamic Tests, Hydrodynamic Tests, Wind Tunnels, And Water Tanks (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH821181 | 1981-12-22 | ||
CH821181A CH643469A5 (fr) | 1981-12-22 | 1981-12-22 | Installation pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide. |
Publications (3)
Publication Number | Publication Date |
---|---|
DK562382A DK562382A (da) | 1983-06-23 |
DK161808B DK161808B (da) | 1991-08-19 |
DK161808C true DK161808C (da) | 1992-01-20 |
Family
ID=4336860
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK562382A DK161808C (da) | 1981-12-22 | 1982-12-20 | Apparat til kontinuerlig aflejring af et fast lag paa overfladen af et substrat, der befinder sig ved hoej temperatur |
Country Status (23)
Country | Link |
---|---|
US (1) | US4446815A (pt) |
JP (1) | JPS58114726A (pt) |
KR (1) | KR890000873B1 (pt) |
AU (1) | AU551974B2 (pt) |
BE (1) | BE895412A (pt) |
BR (1) | BR8207390A (pt) |
CA (1) | CA1197375A (pt) |
CH (1) | CH643469A5 (pt) |
CS (1) | CS235977B2 (pt) |
DD (1) | DD204907A5 (pt) |
DE (1) | DE3247345A1 (pt) |
DK (1) | DK161808C (pt) |
ES (1) | ES518406A0 (pt) |
FR (1) | FR2518429B1 (pt) |
GB (1) | GB2113120B (pt) |
IT (1) | IT1155007B (pt) |
LU (1) | LU84539A1 (pt) |
MX (1) | MX157630A (pt) |
NL (1) | NL8204898A (pt) |
PL (1) | PL133525B1 (pt) |
SE (1) | SE451112B (pt) |
TR (1) | TR21862A (pt) |
ZA (1) | ZA829305B (pt) |
Families Citing this family (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0173715B1 (en) * | 1984-02-13 | 1992-04-22 | SCHMITT, Jerome J. III | Method and apparatus for the gas jet deposition of conducting and dielectric thin solid films and products produced thereby |
JPS6169961A (ja) * | 1984-09-13 | 1986-04-10 | Agency Of Ind Science & Technol | 霧化薄膜作製装置用ノズル |
AT386762B (de) * | 1985-05-08 | 1988-10-10 | Zimmer Johannes | Verfahren und vorrichtung zum impraegnierenden und/oder beschichtenden auftragen auf eine warenbahn |
US5160543A (en) * | 1985-12-20 | 1992-11-03 | Canon Kabushiki Kaisha | Device for forming a deposited film |
US4928627A (en) * | 1985-12-23 | 1990-05-29 | Atochem North America, Inc. | Apparatus for coating a substrate |
US5391232A (en) * | 1985-12-26 | 1995-02-21 | Canon Kabushiki Kaisha | Device for forming a deposited film |
AT396340B (de) * | 1986-11-17 | 1993-08-25 | Zimmer Johannes | Verfahren und vorrichtung zum impraegnierenden und/oder beschichtenden auftragen fluessiger, gegebenenfalls verschaeumter substanzen |
US4793282A (en) * | 1987-05-18 | 1988-12-27 | Libbey-Owens-Ford Co. | Distributor beam for chemical vapor deposition on glass |
US5313982A (en) * | 1988-07-08 | 1994-05-24 | Tadahiro Ohmi | Gas supply piping device for a process apparatus |
JPH0647073B2 (ja) | 1988-07-08 | 1994-06-22 | 忠弘 大見 | プロセス装置用ガス供給配管装置 |
US5906688A (en) * | 1989-01-11 | 1999-05-25 | Ohmi; Tadahiro | Method of forming a passivation film |
US5591267A (en) * | 1988-01-11 | 1997-01-07 | Ohmi; Tadahiro | Reduced pressure device |
GB8824102D0 (en) * | 1988-10-14 | 1988-11-23 | Pilkington Plc | Apparatus for coating glass |
US5789086A (en) * | 1990-03-05 | 1998-08-04 | Ohmi; Tadahiro | Stainless steel surface having passivation film |
US5136975A (en) * | 1990-06-21 | 1992-08-11 | Watkins-Johnson Company | Injector and method for delivering gaseous chemicals to a surface |
US6379466B1 (en) * | 1992-01-17 | 2002-04-30 | Applied Materials, Inc. | Temperature controlled gas distribution plate |
GB9300400D0 (en) * | 1993-01-11 | 1993-03-03 | Glaverbel | A device and method for forming a coating by pyrolysis |
US5863337A (en) * | 1993-02-16 | 1999-01-26 | Ppg Industries, Inc. | Apparatus for coating a moving glass substrate |
US5356718A (en) * | 1993-02-16 | 1994-10-18 | Ppg Industries, Inc. | Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates |
US5599387A (en) * | 1993-02-16 | 1997-02-04 | Ppg Industries, Inc. | Compounds and compositions for coating glass with silicon oxide |
DE4325011A1 (de) * | 1993-07-28 | 1995-03-02 | Herlitz Michael | Erweiterung von Entspiegelung wie bei Brillengläsern üblich auf Autoglasscheiben sowie weitere Kraftfahrzeuge und Verkehrsmittel, sowie alle anderen Silikat- und Kunststoffscheiben |
US5425810A (en) * | 1994-05-11 | 1995-06-20 | Internation Business Machines Corporation | Removable gas injectors for use in chemical vapor deposition of aluminium oxide |
US6200389B1 (en) | 1994-07-18 | 2001-03-13 | Silicon Valley Group Thermal Systems Llc | Single body injector and deposition chamber |
TW359943B (en) * | 1994-07-18 | 1999-06-01 | Silicon Valley Group Thermal | Single body injector and method for delivering gases to a surface |
US6022414A (en) * | 1994-07-18 | 2000-02-08 | Semiconductor Equipment Group, Llc | Single body injector and method for delivering gases to a surface |
FR2724923B1 (fr) * | 1994-09-27 | 1996-12-20 | Saint Gobain Vitrage | Technique de depot de revetements par pyrolyse de composition de gaz precurseur(s) |
TW356554B (en) * | 1995-10-23 | 1999-04-21 | Watkins Johnson Co | Gas injection system for semiconductor processing |
US5698262A (en) * | 1996-05-06 | 1997-12-16 | Libbey-Owens-Ford Co. | Method for forming tin oxide coating on glass |
US6055927A (en) * | 1997-01-14 | 2000-05-02 | Applied Komatsu Technology, Inc. | Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology |
US5938851A (en) * | 1997-04-14 | 1999-08-17 | Wj Semiconductor Equipment Group, Inc. | Exhaust vent assembly for chemical vapor deposition systems |
US6103015A (en) * | 1998-01-19 | 2000-08-15 | Libbey-Owens-Ford Co. | Symmetrical CVD coater with lower upstream exhaust toe |
US20010040230A1 (en) * | 1999-11-30 | 2001-11-15 | Woo Sik Yoo | Compact gate valve |
US6302965B1 (en) * | 2000-08-15 | 2001-10-16 | Applied Materials, Inc. | Dispersion plate for flowing vaporizes compounds used in chemical vapor deposition of films onto semiconductor surfaces |
US6698718B2 (en) | 2001-08-29 | 2004-03-02 | Wafermasters, Inc. | Rotary valve |
JP4124046B2 (ja) * | 2003-07-10 | 2008-07-23 | 株式会社大阪チタニウムテクノロジーズ | 金属酸化物被膜の成膜方法および蒸着装置 |
DE102006043542B4 (de) * | 2006-09-12 | 2012-05-16 | Innovent E.V. | Verfahren zum Beschichten von Oberflächen |
DE102006043543B4 (de) * | 2006-09-12 | 2012-05-10 | Innovent E.V. | Homogenisator für der Beschichtung von Oberflächen dienende Gasströme |
JP2008169437A (ja) * | 2007-01-11 | 2008-07-24 | Mitsubishi Heavy Ind Ltd | 製膜装置 |
JP5727368B2 (ja) * | 2008-05-19 | 2015-06-03 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーE.I.Du Pont De Nemours And Company | 電子デバイスにおける気相コーティングの装置および方法 |
US20100212591A1 (en) * | 2008-05-30 | 2010-08-26 | Alta Devices, Inc. | Reactor lid assembly for vapor deposition |
CN102308368B (zh) | 2008-12-04 | 2014-02-12 | 威科仪器有限公司 | 用于化学气相沉积的进气口元件及其制造方法 |
US8931431B2 (en) * | 2009-03-25 | 2015-01-13 | The Regents Of The University Of Michigan | Nozzle geometry for organic vapor jet printing |
JP2014520201A (ja) * | 2011-03-23 | 2014-08-21 | ピルキントン グループ リミテッド | 薄膜コーティングを被覆するための装置およびこのような装置を用いた被覆方法 |
CN103649003B (zh) * | 2011-07-12 | 2016-08-24 | 旭硝子株式会社 | 带层叠膜的玻璃基板的制造方法 |
WO2013008895A1 (ja) | 2011-07-12 | 2013-01-17 | 旭硝子株式会社 | 積層膜付きガラス基板の製造方法 |
CN104310796A (zh) * | 2014-09-26 | 2015-01-28 | 蓝思科技(长沙)有限公司 | 一种玻璃材料表面as膜方法及其装置 |
DE102014117492A1 (de) * | 2014-11-28 | 2016-06-02 | Aixtron Se | Vorrichtung zum Abscheiden einer Schicht auf einem Substrat |
US11588140B2 (en) * | 2018-01-12 | 2023-02-21 | Universal Display Corporation | Organic vapor jet print head for depositing thin film features with high thickness uniformity |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH544156A (de) * | 1971-04-16 | 1973-11-15 | Bbc Brown Boveri & Cie | Verfahren zur Herstellung von oxydischen Halbleiterschichten und Vorrichtung zur Durchführung des Verfahrens |
US3888649A (en) * | 1972-12-15 | 1975-06-10 | Ppg Industries Inc | Nozzle for chemical vapor deposition of coatings |
US3850679A (en) * | 1972-12-15 | 1974-11-26 | Ppg Industries Inc | Chemical vapor deposition of coatings |
US4088471A (en) * | 1974-06-14 | 1978-05-09 | Pilkington Brothers Limited | Apparatus for coating glass |
FR2288068A1 (fr) * | 1974-10-15 | 1976-05-14 | Boussois Sa | Procede et dispositif pour deposer par pulverisation d'un liquide une couche mince a la surface d'un materiau en feuille, notamment pour le traitement a chaud d'une feuille de verre |
GB1507996A (en) * | 1975-06-11 | 1978-04-19 | Pilkington Brothers Ltd | Coating glass |
GB1524326A (en) * | 1976-04-13 | 1978-09-13 | Bfg Glassgroup | Coating of glass |
GB1516032A (en) * | 1976-04-13 | 1978-06-28 | Bfg Glassgroup | Coating of glass |
CH628600A5 (fr) * | 1979-02-14 | 1982-03-15 | Siv Soc Italiana Vetro | Procede pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide et installation pour la mise en oeuvre de ce procede. |
MX152941A (es) * | 1979-07-31 | 1986-07-04 | Siv Soc Italiana Vetro | Mejoras en procedimiento para depositar sobre un substrato de vidrio ceramico u otra substancia mineral un revestimiento adherente de oxido de estano |
IT1134153B (it) * | 1979-11-21 | 1986-07-31 | Siv Soc Italiana Vetro | Ugello per depositare in continuo su un substrato uno strato di una materia solida |
GB2068937B (en) * | 1980-01-31 | 1984-02-29 | Bfg Glassgroup | Coating hot glass with metals or metal compounds especially oxides |
-
1981
- 1981-12-22 CH CH821181A patent/CH643469A5/fr not_active IP Right Cessation
-
1982
- 1982-12-11 KR KR8205558A patent/KR890000873B1/ko active
- 1982-12-14 US US06/449,773 patent/US4446815A/en not_active Expired - Fee Related
- 1982-12-14 AU AU91469/82A patent/AU551974B2/en not_active Ceased
- 1982-12-17 ZA ZA829305A patent/ZA829305B/xx unknown
- 1982-12-17 MX MX195702A patent/MX157630A/es unknown
- 1982-12-17 DE DE19823247345 patent/DE3247345A1/de active Granted
- 1982-12-17 IT IT24840/82A patent/IT1155007B/it active
- 1982-12-17 CA CA000417975A patent/CA1197375A/en not_active Expired
- 1982-12-20 LU LU84539A patent/LU84539A1/fr unknown
- 1982-12-20 FR FR8221345A patent/FR2518429B1/fr not_active Expired
- 1982-12-20 DK DK562382A patent/DK161808C/da not_active IP Right Cessation
- 1982-12-20 NL NL8204898A patent/NL8204898A/nl not_active Application Discontinuation
- 1982-12-20 SE SE8207254A patent/SE451112B/sv not_active IP Right Cessation
- 1982-12-20 BR BR8207390A patent/BR8207390A/pt not_active IP Right Cessation
- 1982-12-20 GB GB08236146A patent/GB2113120B/en not_active Expired
- 1982-12-20 BE BE0/209771A patent/BE895412A/fr not_active IP Right Cessation
- 1982-12-20 DD DD82246273A patent/DD204907A5/de not_active IP Right Cessation
- 1982-12-21 PL PL1982239652A patent/PL133525B1/pl unknown
- 1982-12-21 ES ES518406A patent/ES518406A0/es active Granted
- 1982-12-21 TR TR21862A patent/TR21862A/xx unknown
- 1982-12-21 JP JP57223125A patent/JPS58114726A/ja active Granted
- 1982-12-22 CS CS829554A patent/CS235977B2/cs unknown
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PBP | Patent lapsed |