DE69938165D1 - Plasma cvd-verfahren, -vorrichtung und -elektrode - Google Patents

Plasma cvd-verfahren, -vorrichtung und -elektrode

Info

Publication number
DE69938165D1
DE69938165D1 DE69938165T DE69938165T DE69938165D1 DE 69938165 D1 DE69938165 D1 DE 69938165D1 DE 69938165 T DE69938165 T DE 69938165T DE 69938165 T DE69938165 T DE 69938165T DE 69938165 D1 DE69938165 D1 DE 69938165D1
Authority
DE
Germany
Prior art keywords
electrode
plasma cvd
cvd process
plasma
cvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69938165T
Other languages
English (en)
Other versions
DE69938165T2 (de
Inventor
Yasuo Murakami
Takahiro Nakahigashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Electric Co Ltd
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Application granted granted Critical
Publication of DE69938165D1 publication Critical patent/DE69938165D1/de
Publication of DE69938165T2 publication Critical patent/DE69938165T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DE69938165T 1998-03-05 1999-03-02 Plasma cvd-verfahren, -vorrichtung und -elektrode Expired - Fee Related DE69938165T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP5365998 1998-03-05
JP05365998A JP3669138B2 (ja) 1998-03-05 1998-03-05 プラズマｃｖｄ法、プラズマｃｖｄ装置及び電極
PCT/JP1999/000998 WO1999045168A1 (fr) 1998-03-05 1999-03-02 Procede, dispositif, et electrode pour depot chimique de plasma en phase vapeur

Publications (2)

Publication Number Publication Date
DE69938165D1 true DE69938165D1 (de) 2008-04-03
DE69938165T2 DE69938165T2 (de) 2009-02-26

Family

ID=12948994

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69938165T Expired - Fee Related DE69938165T2 (de) 1998-03-05 1999-03-02 Plasma cvd-verfahren, -vorrichtung und -elektrode

Country Status (7)

Country Link
US (1) US6503579B1 (de)
EP (2) EP1867751A1 (de)
JP (1) JP3669138B2 (de)
KR (1) KR100414476B1 (de)
DE (1) DE69938165T2 (de)
TW (1) TW406134B (de)
WO (1) WO1999045168A1 (de)

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JP3669138B2 (ja) 1998-03-05 2005-07-06 日新電機株式会社 プラズマｃｖｄ法、プラズマｃｖｄ装置及び電極
AU768043B2 (en) 1999-05-19 2003-11-27 Kirin Beer Kabushiki Kaisha DLC film, DLC-coated plastic container, and method and apparatus for manufacturing DLC-coated plastic container
JP2001288572A (ja) * 2000-01-31 2001-10-19 Canon Inc 堆積膜形成装置および堆積膜形成方法
US6854309B2 (en) 2001-04-19 2005-02-15 Nissei Asb Machine Co., Ltd. Gas-barrier synthetic resin vessel, device for producing the same, and article-received gas-barrier synthetic resin vessel
DE10119571C1 (de) * 2001-04-21 2002-11-28 Schott Glas Verfahren zum gleichmäßigen Beschichten von Hohlkörpern und deren Verwendung
EP1398274A1 (de) * 2001-06-20 2004-03-17 Mitsubishi Shoji Plastics Corporation Feuchtigkeits- und gassperre aufweisender kunststoffbehälter mit trennplatten und vorrichtung und verfahren zur herstellung des kunststoffbehälters
WO2003000559A1 (fr) * 2001-06-26 2003-01-03 Mitsubishi Shoji Plastics Corporation Dispositif de fabrication d'un recipient en plastique revetu d'un film de carbone sous forme de diamant amorphe, recipient ainsi obtenu et procede de fabrication dudit recipient
WO2003016149A1 (fr) * 2001-08-16 2003-02-27 Mitsubishi Shoji Plastics Corporation Systeme permettant de produire un contenant en plastique recouvert d'un film dlc et son procede de production
ATE521545T1 (de) * 2002-05-28 2011-09-15 Kirin Brewery Mit einem überzug aus diamantähnlichem kohlenstoff beschichteter kunststoffbehälter
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
DK2251454T3 (da) 2009-05-13 2014-10-13 Sio2 Medical Products Inc Coating og inspektion af beholder
US9545360B2 (en) 2009-05-13 2017-01-17 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US20110001103A1 (en) * 2009-07-01 2011-01-06 Chi-Kuang Chen Elevating mechanism for measuring concentrations of medicines
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
RU2456373C1 (ru) * 2011-04-05 2012-07-20 Федеральное государственное образовательное учреждение высшего профессионального образования "Тверская государственная сельскохозяйственная академия" (ФГОУ ВПО "Тверская государственная сельскохозяйственная академия") Устройство для нанесения металлических покрытий на внутренние поверхности подшипников скольжения cvd-методом металлоорганических соединений
CN103930595A (zh) 2011-11-11 2014-07-16 Sio2医药产品公司 用于药物包装的钝化、pH保护性或润滑性涂层、涂布方法以及设备
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
US9664626B2 (en) 2012-11-01 2017-05-30 Sio2 Medical Products, Inc. Coating inspection method
EP2920567B1 (de) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Verfahren und vorrichtung zur erkennung von schnellen sperrbeschichtungsintegritätseigenschaften
WO2014085348A2 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
KR102211788B1 (ko) 2013-03-11 2021-02-04 에스아이오2 메디컬 프로덕츠, 인크. 코팅된 패키징
US9863042B2 (en) 2013-03-15 2018-01-09 Sio2 Medical Products, Inc. PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases
TWI489517B (zh) * 2013-05-07 2015-06-21 Univ Nat Taiwan 表面處理裝置及方法
EP3122917B1 (de) 2014-03-28 2020-05-06 SiO2 Medical Products, Inc. Antistatische beschichtungen für kunststoffbehälter
KR20180048694A (ko) 2015-08-18 2018-05-10 에스아이오2 메디컬 프로덕츠, 인크. 산소 전달률이 낮은, 의약품 및 다른 제품의 포장용기
US20220127721A1 (en) * 2020-10-23 2022-04-28 Applied Materials, Inc. Depositing Low Roughness Diamond Films
CN113405682B (zh) * 2021-06-16 2022-11-01 中国原子能科学研究院 管体内壁温度测量装置
TW202410740A (zh) * 2022-04-18 2024-03-01 美商明亮光源能源公司 紅外電漿光回收熱光伏打氫電力產生器

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EP0300196A1 (de) * 1987-07-22 1989-01-25 Siemens Aktiengesellschaft Messaufnehmer für Längen- oder Abstandsänderungen, insbesondere für berührungslose Messung von Drehmomenten an rotierenden Wellen
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DE69408405T2 (de) * 1993-11-11 1998-08-20 Nissin Electric Co Ltd Plasma-CVD-Verfahren und Vorrichtung
JP3147695B2 (ja) * 1994-02-21 2001-03-19 日新電機株式会社 ダイアモンド状炭素膜形成のためのプラズマｃｖｄ法及び装置
JP2788412B2 (ja) 1994-08-11 1998-08-20 麒麟麦酒株式会社 炭素膜コーティングプラスチック容器の製造装置および製造方法
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JP3119172B2 (ja) * 1995-09-13 2000-12-18 日新電機株式会社 プラズマｃｖｄ法及び装置
JP3669138B2 (ja) 1998-03-05 2005-07-06 日新電機株式会社 プラズマｃｖｄ法、プラズマｃｖｄ装置及び電極

Also Published As

Publication number Publication date
KR20010012230A (ko) 2001-02-15
EP0997554A1 (de) 2000-05-03
DE69938165T2 (de) 2009-02-26
TW406134B (en) 2000-09-21
EP0997554A4 (de) 2006-08-02
US6503579B1 (en) 2003-01-07
JP3669138B2 (ja) 2005-07-06
EP1867751A1 (de) 2007-12-19
KR100414476B1 (ko) 2004-01-13
EP0997554B1 (de) 2008-02-20
WO1999045168A1 (fr) 1999-09-10
JPH11246974A (ja) 1999-09-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee