DE69911617D1 - Stereolithographische zusammensetzungen für die herstellung polyäthylenähnlicher gegenstände - Google Patents
Stereolithographische zusammensetzungen für die herstellung polyäthylenähnlicher gegenständeInfo
- Publication number
- DE69911617D1 DE69911617D1 DE69911617T DE69911617T DE69911617D1 DE 69911617 D1 DE69911617 D1 DE 69911617D1 DE 69911617 T DE69911617 T DE 69911617T DE 69911617 T DE69911617 T DE 69911617T DE 69911617 D1 DE69911617 D1 DE 69911617D1
- Authority
- DE
- Germany
- Prior art keywords
- polyethylene
- objects
- production
- stereolithographic
- compositions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000203 mixture Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
- B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/113,271 US6287748B1 (en) | 1998-07-10 | 1998-07-10 | Solid imaging compositions for preparing polyethylene-like articles |
US113271 | 1998-07-10 | ||
PCT/US1999/015645 WO2000003300A1 (en) | 1998-07-10 | 1999-07-12 | Stereolithographic composition for preparing polyethylene-like articles |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69911617D1 true DE69911617D1 (de) | 2003-10-30 |
DE69911617T2 DE69911617T2 (de) | 2004-06-24 |
Family
ID=22348506
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69911617T Expired - Lifetime DE69911617T2 (de) | 1998-07-10 | 1999-07-12 | Stereolithographische zusammensetzungen für die herstellung polyäthylenähnlicher gegenstände |
Country Status (9)
Country | Link |
---|---|
US (3) | US6287748B1 (de) |
EP (1) | EP1099138B1 (de) |
JP (1) | JP4796690B2 (de) |
KR (1) | KR100595116B1 (de) |
CN (1) | CN1196028C (de) |
DE (1) | DE69911617T2 (de) |
HK (1) | HK1039985A1 (de) |
TW (1) | TW586051B (de) |
WO (1) | WO2000003300A1 (de) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6287748B1 (en) | 1998-07-10 | 2001-09-11 | Dsm N.V. | Solid imaging compositions for preparing polyethylene-like articles |
US6762002B2 (en) | 1998-07-10 | 2004-07-13 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polypropylene-like articles |
US6379866B2 (en) | 2000-03-31 | 2002-04-30 | Dsm Desotech Inc | Solid imaging compositions for preparing polypropylene-like articles |
US20060154175A9 (en) * | 1998-07-10 | 2006-07-13 | Lawton John A | Solid imaging compositions for preparing polypropylene-like articles |
JP4663893B2 (ja) * | 2001-03-23 | 2011-04-06 | ダイセル化学工業株式会社 | エポキシ化合物の製造方法 |
US20030059618A1 (en) | 2001-03-23 | 2003-03-27 | Hideyuke Takai | Method of producing epoxy compound, epoxy resin composition and its applications, ultraviolet rays-curable can-coating composition and method of producing coated metal can |
US6811937B2 (en) | 2001-06-21 | 2004-11-02 | Dsm Desotech, Inc. | Radiation-curable resin composition and rapid prototyping process using the same |
JP4743736B2 (ja) * | 2001-08-31 | 2011-08-10 | 株式会社Adeka | 光学的立体造形用樹脂組成物およびこれを用いた光学的立体造形方法 |
US20030149124A1 (en) * | 2001-11-27 | 2003-08-07 | Thommes Glen A. | Radiation curable resin composition for making colored three dimensional objects |
US20030198824A1 (en) * | 2002-04-19 | 2003-10-23 | Fong John W. | Photocurable compositions containing reactive polysiloxane particles |
US20040054025A1 (en) * | 2002-06-20 | 2004-03-18 | Lawton John A. | Compositions comprising a benzophenone photoinitiator |
US6989225B2 (en) † | 2002-07-18 | 2006-01-24 | 3D Systems, Inc. | Stereolithographic resins with high temperature and high impact resistance |
US6833231B2 (en) * | 2002-07-31 | 2004-12-21 | 3D Systems, Inc. | Toughened stereolithographic resin compositions |
TWI312800B (en) | 2002-09-05 | 2009-08-01 | Daicel Chem | Process for the preparation of an alicyclic diepoxy compound, a curable epoxy resin composition, an epoxy resin composition for encapsulating electronics parts, a stabilizer for electrically insulating oils, and an epoxy resin composition for casting |
US20040137368A1 (en) * | 2003-01-13 | 2004-07-15 | 3D Systems, Inc. | Stereolithographic resins containing selected oxetane compounds |
US20040170923A1 (en) * | 2003-02-27 | 2004-09-02 | 3D Systems, Inc. | Colored stereolithographic resins |
US6856283B2 (en) * | 2003-02-28 | 2005-02-15 | Raytheon Company | Method and apparatus for a power system for phased-array radar |
KR101109977B1 (ko) * | 2003-07-23 | 2012-03-13 | 디에스엠 아이피 어셋츠 비.브이. | 점도 감소성 방사선 경화 수지 조성물 |
US7232850B2 (en) * | 2003-10-03 | 2007-06-19 | Huntsman Advanced Materials Americas Inc. | Photocurable compositions for articles having stable tensile properties |
WO2005045523A1 (en) * | 2003-11-06 | 2005-05-19 | Huntsman Advanced Materials (Switzerland) Gmbh | Photocurable composition for producing cured articles having high clarity and improved mechanical properties |
US20050165127A1 (en) * | 2003-12-31 | 2005-07-28 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polyethylene-like articles |
US20050158660A1 (en) * | 2004-01-20 | 2005-07-21 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polypropylene-like articles |
WO2006029095A1 (en) * | 2004-09-03 | 2006-03-16 | Henkel Corporation | Photoinitiated cationic epoxy compositions |
US8786613B2 (en) | 2006-04-08 | 2014-07-22 | Alan Millman | Method and system for interactive simulation of materials and models |
EP2005342B1 (de) * | 2006-04-08 | 2019-06-05 | Allan Millman | Verfahren und system zur interaktiven simulation von materialien |
WO2007124911A1 (en) * | 2006-05-01 | 2007-11-08 | Dsm Ip Assets B.V. | Radiation curable resin composition and rapid three dimensional imaging process using the same |
EP3294780A4 (de) * | 2015-06-08 | 2018-11-21 | DSM IP Assets B.V. | Flüssige hybride uv/vis-strahlungshärtbare harzzusammensetzungen zur generativen fertigung |
TWI692502B (zh) | 2017-12-29 | 2020-05-01 | 法商阿科瑪法國公司 | 可固化組成物 |
US12013330B2 (en) | 2018-07-20 | 2024-06-18 | Illumina, Inc. | Resin composition and flow cells incorporating the same |
Family Cites Families (33)
Publication number | Priority date | Publication date | Assignee | Title |
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US3803466A (en) | 1972-02-28 | 1974-04-09 | Rockwell International Corp | Linear motor propulsion system |
CA1312040C (en) * | 1985-12-19 | 1992-12-29 | Joseph Victor Koleske | Conformal coatings cured with actinic radiation |
US4844144A (en) | 1988-08-08 | 1989-07-04 | Desoto, Inc. | Investment casting utilizing patterns produced by stereolithography |
JPH07103218B2 (ja) | 1988-09-13 | 1995-11-08 | 旭電化工業株式会社 | 光学的造形用樹脂組成物 |
EP0376890A3 (de) * | 1988-12-29 | 1991-04-10 | Ciba-Geigy Ag | Silangruppenhaltige Oxazolidine |
US5176188A (en) | 1991-02-14 | 1993-01-05 | E. I. Du Pont De Nemours And Company | Investment casting method and pattern material comprising thermally-collapsible expanded microspheres |
US5136682A (en) * | 1991-04-15 | 1992-08-04 | Raychem Corporation | Curable compositions and methods for use in forming optical waveguide structures |
EP0525578A1 (de) * | 1991-08-02 | 1993-02-03 | E.I. Du Pont De Nemours And Company | Photopolymerzusammensetzung zur Herstellung von dreidimensionalen Objekten |
CA2092458A1 (en) * | 1992-05-29 | 1993-11-30 | Richard P. Eckberg | Fluoro-organo modified uv-curable epoxy silicone and epoxyfluorosilicone compositions |
TW269017B (de) * | 1992-12-21 | 1996-01-21 | Ciba Geigy Ag | |
US5418112A (en) | 1993-11-10 | 1995-05-23 | W. R. Grace & Co.-Conn. | Photosensitive compositions useful in three-dimensional part-building and having improved photospeed |
JP3000189B2 (ja) | 1994-05-31 | 2000-01-17 | 株式会社サクラクレパス | 紫外線硬化型熱変色性インキ組成物 |
JP3532675B2 (ja) * | 1994-10-03 | 2004-05-31 | 日本ペイント株式会社 | 体積ホログラム記録用感光性組成物、及びそれを用いた記録媒体ならびに体積ホログラム形成方法 |
GB9504995D0 (en) | 1995-03-11 | 1995-04-26 | Zeneca Ltd | Compositions |
EP0831127B1 (de) | 1995-05-12 | 2003-09-03 | Asahi Denka Kogyo Kabushiki Kaisha | Stereolithographisches verfahren und kunststoffharz dazu |
US5707780A (en) | 1995-06-07 | 1998-01-13 | E. I. Du Pont De Nemours And Company | Photohardenable epoxy composition |
DE19541075C1 (de) * | 1995-11-03 | 1997-04-24 | Siemens Ag | Photohärtbares Harz mit geringem Schwund und dessen Verwendung in einem Stereolithographieverfahren |
JP3626275B2 (ja) | 1996-04-09 | 2005-03-02 | Jsr株式会社 | 光硬化性樹脂組成物 |
WO1997042549A1 (en) * | 1996-05-09 | 1997-11-13 | Dsm N.V. | Photosensitive resin composition for rapid prototyping and a process for the manufacture of 3-dimensional objects |
EP0822445B2 (de) * | 1996-07-29 | 2005-02-09 | Huntsman Advanced Materials (Switzerland) GmbH | Flüssige, strahlungshärtbare Zusammensetzung, insbesondere für die Stereolithographie |
JP3786480B2 (ja) | 1996-10-14 | 2006-06-14 | Jsr株式会社 | 光硬化性樹脂組成物 |
JP3626302B2 (ja) | 1996-12-10 | 2005-03-09 | Jsr株式会社 | 光硬化性樹脂組成物 |
JP2001506013A (ja) | 1996-12-11 | 2001-05-08 | ラクソチカ リーシング エセ.ペー.アー. | ヒンジなし眼鏡テンプル |
EP0960354A1 (de) * | 1997-02-14 | 1999-12-01 | Alliedsignal Inc. | Hochtemperaturbeständige polymere für stereolithographie |
US6054250A (en) * | 1997-02-18 | 2000-04-25 | Alliedsignal Inc. | High temperature performance polymers for stereolithography |
JP4204113B2 (ja) | 1997-12-04 | 2009-01-07 | 株式会社Adeka | 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法 |
JP3824286B2 (ja) * | 1998-02-18 | 2006-09-20 | Jsr株式会社 | 光硬化性樹脂組成物 |
DE69940916D1 (de) | 1998-02-18 | 2009-07-09 | Dsm Ip Assets Bv | Fotohärtbare flüssige Harzzusammensetzung |
US6136497A (en) | 1998-03-30 | 2000-10-24 | Vantico, Inc. | Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography |
US6100007A (en) * | 1998-04-06 | 2000-08-08 | Ciba Specialty Chemicals Corp. | Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures |
US6187836B1 (en) * | 1998-06-05 | 2001-02-13 | 3M Innovative Properties Company | Compositions featuring cationically active and free radically active functional groups, and methods for polymerizing such compositions |
US6379866B2 (en) | 2000-03-31 | 2002-04-30 | Dsm Desotech Inc | Solid imaging compositions for preparing polypropylene-like articles |
US6287748B1 (en) | 1998-07-10 | 2001-09-11 | Dsm N.V. | Solid imaging compositions for preparing polyethylene-like articles |
-
1998
- 1998-07-10 US US09/113,271 patent/US6287748B1/en not_active Expired - Lifetime
-
1999
- 1999-07-12 EP EP99933877A patent/EP1099138B1/de not_active Expired - Lifetime
- 1999-07-12 JP JP2000559479A patent/JP4796690B2/ja not_active Expired - Lifetime
- 1999-07-12 WO PCT/US1999/015645 patent/WO2000003300A1/en active IP Right Grant
- 1999-07-12 DE DE69911617T patent/DE69911617T2/de not_active Expired - Lifetime
- 1999-07-12 CN CNB998102679A patent/CN1196028C/zh not_active Expired - Fee Related
- 1999-07-12 KR KR1020017000404A patent/KR100595116B1/ko not_active IP Right Cessation
- 1999-10-08 TW TW088111704A patent/TW586051B/zh not_active IP Right Cessation
-
2001
- 2001-08-02 US US09/919,997 patent/US6537729B1/en not_active Expired - Lifetime
-
2002
- 2002-02-28 HK HK02101560.6A patent/HK1039985A1/zh unknown
- 2002-11-22 US US10/301,859 patent/US6727043B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6537729B1 (en) | 2003-03-25 |
HK1039985A1 (zh) | 2002-05-17 |
EP1099138B1 (de) | 2003-09-24 |
KR20010089136A (ko) | 2001-09-29 |
DE69911617T2 (de) | 2004-06-24 |
CN1196028C (zh) | 2005-04-06 |
JP4796690B2 (ja) | 2011-10-19 |
EP1099138A1 (de) | 2001-05-16 |
WO2000003300A1 (en) | 2000-01-20 |
KR100595116B1 (ko) | 2006-07-03 |
US20040023158A1 (en) | 2004-02-05 |
US6287748B1 (en) | 2001-09-11 |
CN1316066A (zh) | 2001-10-03 |
TW586051B (en) | 2004-05-01 |
JP2002520449A (ja) | 2002-07-09 |
US6727043B2 (en) | 2004-04-27 |
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