DE69905417T2 - Wässrige Entwicklungslösungen für die Verminderung der Entwicklerrückstände - Google Patents
Wässrige Entwicklungslösungen für die Verminderung der EntwicklerrückständeInfo
- Publication number
- DE69905417T2 DE69905417T2 DE69905417T DE69905417T DE69905417T2 DE 69905417 T2 DE69905417 T2 DE 69905417T2 DE 69905417 T DE69905417 T DE 69905417T DE 69905417 T DE69905417 T DE 69905417T DE 69905417 T2 DE69905417 T2 DE 69905417T2
- Authority
- DE
- Germany
- Prior art keywords
- oxide units
- layer
- photoresist
- surfactant
- developing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Separation Of Suspended Particles By Flocculating Agents (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Detergent Compositions (AREA)
- Removal Of Specific Substances (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/069,518 US5922522A (en) | 1998-04-29 | 1998-04-29 | Aqueous developing solutions for reduced developer residue |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69905417D1 DE69905417D1 (de) | 2003-03-27 |
DE69905417T2 true DE69905417T2 (de) | 2003-08-28 |
Family
ID=22089531
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69905417T Expired - Fee Related DE69905417T2 (de) | 1998-04-29 | 1999-04-23 | Wässrige Entwicklungslösungen für die Verminderung der Entwicklerrückstände |
Country Status (10)
Country | Link |
---|---|
US (1) | US5922522A (de) |
EP (1) | EP0953880B1 (de) |
KR (1) | KR100326617B1 (de) |
CN (1) | CN1141622C (de) |
AT (1) | ATE232994T1 (de) |
BR (1) | BR9901322A (de) |
CA (1) | CA2270013A1 (de) |
DE (1) | DE69905417T2 (de) |
IL (1) | IL129658A0 (de) |
SG (1) | SG80021A1 (de) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6248506B1 (en) * | 1998-12-04 | 2001-06-19 | Nichigo-Morton | Aqueous developing solutions for reduced developer residue |
US6455234B1 (en) | 1999-05-04 | 2002-09-24 | Air Products And Chemicals, Inc. | Acetylenic diol ethylene oxide/propylene oxide adducts and their use in photoresist developers |
US6281170B1 (en) | 1999-10-18 | 2001-08-28 | Air Products And Chemicals, Inc. | Surface tension reduction with N,N,N'-trialkkyl ureas |
JP2001215690A (ja) | 2000-01-04 | 2001-08-10 | Air Prod And Chem Inc | アセチレン列ジオールエチレンオキシド/プロピレンオキシド付加物および現像剤におけるその使用 |
US6686126B2 (en) | 2000-07-14 | 2004-02-03 | Fuji Photo Film Co., Ltd. | Developing solution for photosensitive lithographic printing plate, plate-making method of lithographic printing plate, and photosensitive lithographic printing plate |
US6649324B1 (en) * | 2000-08-14 | 2003-11-18 | Kodak Polychrome Graphics Llc | Aqueous developer for lithographic printing plates |
US6503694B1 (en) * | 2001-06-12 | 2003-01-07 | Chi Mei Corporation | Developer solution and edge bead remover composition |
JP2003021901A (ja) * | 2001-07-05 | 2003-01-24 | Fuji Photo Film Co Ltd | 感光性平版印刷版の光重合方法 |
US6756183B2 (en) | 2001-08-24 | 2004-06-29 | Fuji Photo Film Co., Ltd. | Method for preparing lithographic printing plate |
US20030196685A1 (en) * | 2001-12-18 | 2003-10-23 | Shipley Company, L.L.C. | Cleaning composition and method |
EP1335016A1 (de) * | 2002-02-06 | 2003-08-13 | Shipley Company LLC | Reinigungszusammensetzung |
JP2003302770A (ja) * | 2002-02-08 | 2003-10-24 | Fuji Photo Film Co Ltd | 画像形成方法 |
US6900003B2 (en) * | 2002-04-12 | 2005-05-31 | Shipley Company, L.L.C. | Photoresist processing aid and method |
JP2004252395A (ja) * | 2002-05-07 | 2004-09-09 | Shipley Co Llc | 残渣削減安定濃縮物 |
US6887654B2 (en) * | 2002-05-07 | 2005-05-03 | Shipley Company, L.L.C. | Residue and scum reducing composition and method |
JP2004163904A (ja) * | 2002-09-30 | 2004-06-10 | Rohm & Haas Electronic Materials Llc | 改善された光開始剤 |
KR20050101458A (ko) * | 2004-04-19 | 2005-10-24 | 주식회사 하이닉스반도체 | 포토레지스트 세정액 조성물 및 이를 이용한 패턴 형성방법 |
US20050282093A1 (en) * | 2004-06-16 | 2005-12-22 | Dammel Ralph R | Aqueous edge bead remover |
US7094523B1 (en) | 2005-11-30 | 2006-08-22 | Kesheng Feng | Developer solution and process for use |
CN102540771A (zh) * | 2010-12-24 | 2012-07-04 | 无锡华润上华半导体有限公司 | 正性光刻胶用显影液及光刻工艺中的显影方法 |
CN104597727A (zh) * | 2015-01-14 | 2015-05-06 | 深圳市国华光电科技有限公司 | 一种kmpr光刻胶用koh显影液 |
KR102378341B1 (ko) * | 2015-06-11 | 2022-03-24 | 주식회사 이엔에프테크놀로지 | 포토레지스트 현상액 |
WO2022114208A1 (ja) * | 2020-11-30 | 2022-06-02 | 富士フイルム株式会社 | フレキソ印刷版用水性現像液およびフレキソ印刷版の製造方法 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3884825D1 (de) * | 1987-02-16 | 1993-11-18 | Konishiroku Photo Ind | Entwickler für lichtempfindliche lithographische Druckplatte, gemeinschaftlich verarbeitungsfähig für den Negativ-Typ und den Positiv-Typ und Entwicklerzusammensetzung für lichtempfindliches Material. |
US5364736A (en) * | 1987-12-07 | 1994-11-15 | Morton International, Inc. | Photoimageable compositions |
JP2543742B2 (ja) * | 1988-04-07 | 1996-10-16 | 富士写真フイルム株式会社 | ポジ型フオトレジスト用現像液 |
US5122438A (en) * | 1989-11-02 | 1992-06-16 | Konica Corporation | Method for developing a waterless light-sensitive lithographic plate |
JPH04163556A (ja) * | 1990-10-29 | 1992-06-09 | Konica Corp | 感光性平版印刷版の処理方法及び処理装置 |
JP2866951B2 (ja) * | 1990-11-28 | 1999-03-08 | 富士写真フイルム株式会社 | ハロゲン化銀カラー写真感光材料の処理方法 |
JP2748057B2 (ja) * | 1991-07-22 | 1998-05-06 | 富士写真フイルム株式会社 | 画像形成方法及びアルカリ性現像液 |
JPH0572686A (ja) * | 1991-09-11 | 1993-03-26 | Konica Corp | ハロゲン化銀写真感光材料 |
US5532116A (en) * | 1992-01-13 | 1996-07-02 | Fuji Photo Film Co., Ltd. | Aqueous alkaline developing solution |
JP3094716B2 (ja) * | 1992-01-16 | 2000-10-03 | 富士写真フイルム株式会社 | ハロゲン化銀カラー写真感光材料の処理方法 |
US5457011A (en) * | 1993-12-27 | 1995-10-10 | Eastman Kodak Company | Photographic developing composition containing a sludge inhibiting agent and use thereof in the high contrast development of nucleated photographic elements |
US5364737A (en) * | 1994-01-25 | 1994-11-15 | Morton International, Inc. | Waterbone photoresists having associate thickeners |
JP2937801B2 (ja) * | 1994-03-31 | 1999-08-23 | 東京応化工業株式会社 | レジスト用現像原液 |
DE4419166A1 (de) * | 1994-06-01 | 1995-12-07 | Hoechst Ag | Entwickler für Photoresistschichten |
JPH0810600A (ja) * | 1994-06-30 | 1996-01-16 | Toho Chem Ind Co Ltd | 感光性樹脂工業用消泡分散剤 |
US5609991A (en) * | 1995-02-10 | 1997-03-11 | Morton International, Inc. | Photoimageable composition having improved alkaline process resistance and tack-free surface for contact imaging |
US5576145A (en) * | 1995-02-10 | 1996-11-19 | Morton International, Inc. | Esterified styrene/maleic anhydride polymer and polymer-containing photoimageable composition having improved alkaline process resistance |
US5998102A (en) * | 1997-10-06 | 1999-12-07 | Agfa Corporation | Etch inhibitors in developer for lithographic printing plates |
-
1998
- 1998-04-29 US US09/069,518 patent/US5922522A/en not_active Expired - Fee Related
-
1999
- 1999-04-05 SG SG9901631A patent/SG80021A1/en unknown
- 1999-04-23 AT AT99303144T patent/ATE232994T1/de not_active IP Right Cessation
- 1999-04-23 EP EP99303144A patent/EP0953880B1/de not_active Expired - Lifetime
- 1999-04-23 DE DE69905417T patent/DE69905417T2/de not_active Expired - Fee Related
- 1999-04-26 CA CA002270013A patent/CA2270013A1/en not_active Abandoned
- 1999-04-27 KR KR1019990014962A patent/KR100326617B1/ko not_active IP Right Cessation
- 1999-04-28 IL IL12965899A patent/IL129658A0/xx unknown
- 1999-04-29 BR BR9901322-3A patent/BR9901322A/pt not_active Application Discontinuation
- 1999-04-29 CN CNB991064232A patent/CN1141622C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0953880B1 (de) | 2003-02-19 |
CN1141622C (zh) | 2004-03-10 |
CA2270013A1 (en) | 1999-10-29 |
ATE232994T1 (de) | 2003-03-15 |
EP0953880A2 (de) | 1999-11-03 |
DE69905417D1 (de) | 2003-03-27 |
BR9901322A (pt) | 2000-03-14 |
CN1233783A (zh) | 1999-11-03 |
SG80021A1 (en) | 2001-04-17 |
US5922522A (en) | 1999-07-13 |
IL129658A0 (en) | 2000-02-29 |
EP0953880A3 (de) | 1999-11-17 |
KR100326617B1 (ko) | 2002-03-02 |
KR19990083501A (ko) | 1999-11-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8328 | Change in the person/name/address of the agent |
Representative=s name: MUELLER-BORE & PARTNER, PATENTANWAELTE, EUROPEAN PAT |
|
8339 | Ceased/non-payment of the annual fee |