BR9901322A - Solução de revelação aquosa alcalina para revestimento fotossensìvel, e, processo de preparação de um padrão de revestimento fotossensìvel padronizado sobre um substrato. - Google Patents
Solução de revelação aquosa alcalina para revestimento fotossensìvel, e, processo de preparação de um padrão de revestimento fotossensìvel padronizado sobre um substrato.Info
- Publication number
- BR9901322A BR9901322A BR9901322-3A BR9901322A BR9901322A BR 9901322 A BR9901322 A BR 9901322A BR 9901322 A BR9901322 A BR 9901322A BR 9901322 A BR9901322 A BR 9901322A
- Authority
- BR
- Brazil
- Prior art keywords
- photosensitive coating
- substrate
- oxide units
- preparing
- standardized
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Detergent Compositions (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Removal Of Specific Substances (AREA)
- Separation Of Suspended Particles By Flocculating Agents (AREA)
Abstract
"SOLUçãO DE REVELAçãO AQUOSA ALCALINA PARA REVESTIMENTO FOTOSSENSìVEL, E, PROCESSO DE PREPARAçãO DE UM PADRãO DE REVESTIMENTO FOTOSSENSìVEL PADRONIZADO SOBRE UM SUBSTRATO" Uma solução de revelação aquosa alcalina para revelar revestimentos fotossensíveis, ou similares, contém, como um agente antiescuma, um tensoativo etoxilado tendo a fórmula geral: [R-O-(AO)~ n~]~ m~-X (I) onde AO são unidades de óxido de alquileno selecionadas dentre unidades de óxido de etileno (CH~ 2~-CH~ 2~-O) e unidades de óxido de propileno (CH(CH~ 3~)-CH~ 2~-O) ou (CH~ 2~-CH(CH~ 3~)-O), onde R é um grupo hidrofóbico, X é H ou um grupo aniónico, m é de 1 a 3, e n é pelo menos aproximadamente 8, e a proporção molar do toal de unidades de óxido de etileno para o total de unidades de óxido de propileno está entre aproximadamente 1:4 e aproximadamente 4:1, preferencialmente, entre aproximadamente 2:3 e aproximadamente 3:2.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/069,518 US5922522A (en) | 1998-04-29 | 1998-04-29 | Aqueous developing solutions for reduced developer residue |
Publications (1)
Publication Number | Publication Date |
---|---|
BR9901322A true BR9901322A (pt) | 2000-03-14 |
Family
ID=22089531
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR9901322-3A BR9901322A (pt) | 1998-04-29 | 1999-04-29 | Solução de revelação aquosa alcalina para revestimento fotossensìvel, e, processo de preparação de um padrão de revestimento fotossensìvel padronizado sobre um substrato. |
Country Status (10)
Country | Link |
---|---|
US (1) | US5922522A (pt) |
EP (1) | EP0953880B1 (pt) |
KR (1) | KR100326617B1 (pt) |
CN (1) | CN1141622C (pt) |
AT (1) | ATE232994T1 (pt) |
BR (1) | BR9901322A (pt) |
CA (1) | CA2270013A1 (pt) |
DE (1) | DE69905417T2 (pt) |
IL (1) | IL129658A0 (pt) |
SG (1) | SG80021A1 (pt) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6248506B1 (en) * | 1998-12-04 | 2001-06-19 | Nichigo-Morton | Aqueous developing solutions for reduced developer residue |
US6455234B1 (en) | 1999-05-04 | 2002-09-24 | Air Products And Chemicals, Inc. | Acetylenic diol ethylene oxide/propylene oxide adducts and their use in photoresist developers |
US6281170B1 (en) | 1999-10-18 | 2001-08-28 | Air Products And Chemicals, Inc. | Surface tension reduction with N,N,N'-trialkkyl ureas |
JP2001215690A (ja) | 2000-01-04 | 2001-08-10 | Air Prod And Chem Inc | アセチレン列ジオールエチレンオキシド/プロピレンオキシド付加物および現像剤におけるその使用 |
EP1172699B1 (en) | 2000-07-14 | 2013-09-11 | FUJIFILM Corporation | Method for making lithographic printing plates |
US6649324B1 (en) | 2000-08-14 | 2003-11-18 | Kodak Polychrome Graphics Llc | Aqueous developer for lithographic printing plates |
US6503694B1 (en) * | 2001-06-12 | 2003-01-07 | Chi Mei Corporation | Developer solution and edge bead remover composition |
JP2003021901A (ja) * | 2001-07-05 | 2003-01-24 | Fuji Photo Film Co Ltd | 感光性平版印刷版の光重合方法 |
US6756183B2 (en) | 2001-08-24 | 2004-06-29 | Fuji Photo Film Co., Ltd. | Method for preparing lithographic printing plate |
US20030196685A1 (en) * | 2001-12-18 | 2003-10-23 | Shipley Company, L.L.C. | Cleaning composition and method |
EP1335016A1 (en) * | 2002-02-06 | 2003-08-13 | Shipley Company LLC | Cleaning composition |
JP2003302770A (ja) * | 2002-02-08 | 2003-10-24 | Fuji Photo Film Co Ltd | 画像形成方法 |
US6900003B2 (en) * | 2002-04-12 | 2005-05-31 | Shipley Company, L.L.C. | Photoresist processing aid and method |
JP2004252395A (ja) * | 2002-05-07 | 2004-09-09 | Shipley Co Llc | 残渣削減安定濃縮物 |
US6887654B2 (en) * | 2002-05-07 | 2005-05-03 | Shipley Company, L.L.C. | Residue and scum reducing composition and method |
JP2004163904A (ja) * | 2002-09-30 | 2004-06-10 | Rohm & Haas Electronic Materials Llc | 改善された光開始剤 |
KR20050101458A (ko) * | 2004-04-19 | 2005-10-24 | 주식회사 하이닉스반도체 | 포토레지스트 세정액 조성물 및 이를 이용한 패턴 형성방법 |
US20050282093A1 (en) * | 2004-06-16 | 2005-12-22 | Dammel Ralph R | Aqueous edge bead remover |
US7094523B1 (en) | 2005-11-30 | 2006-08-22 | Kesheng Feng | Developer solution and process for use |
CN102540771A (zh) * | 2010-12-24 | 2012-07-04 | 无锡华润上华半导体有限公司 | 正性光刻胶用显影液及光刻工艺中的显影方法 |
CN104597727A (zh) * | 2015-01-14 | 2015-05-06 | 深圳市国华光电科技有限公司 | 一种kmpr光刻胶用koh显影液 |
KR102378341B1 (ko) * | 2015-06-11 | 2022-03-24 | 주식회사 이엔에프테크놀로지 | 포토레지스트 현상액 |
WO2022114208A1 (ja) * | 2020-11-30 | 2022-06-02 | 富士フイルム株式会社 | フレキソ印刷版用水性現像液およびフレキソ印刷版の製造方法 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0279630B1 (en) * | 1987-02-16 | 1993-10-13 | Konica Corporation | Developer for light-sensitive lithographic printing plate capable of processing commonly the negative-type and the positive type and developer composition for light-sensitive material |
US5364736A (en) * | 1987-12-07 | 1994-11-15 | Morton International, Inc. | Photoimageable compositions |
JP2543742B2 (ja) * | 1988-04-07 | 1996-10-16 | 富士写真フイルム株式会社 | ポジ型フオトレジスト用現像液 |
US5122438A (en) * | 1989-11-02 | 1992-06-16 | Konica Corporation | Method for developing a waterless light-sensitive lithographic plate |
JPH04163556A (ja) * | 1990-10-29 | 1992-06-09 | Konica Corp | 感光性平版印刷版の処理方法及び処理装置 |
JP2866951B2 (ja) * | 1990-11-28 | 1999-03-08 | 富士写真フイルム株式会社 | ハロゲン化銀カラー写真感光材料の処理方法 |
JP2748057B2 (ja) * | 1991-07-22 | 1998-05-06 | 富士写真フイルム株式会社 | 画像形成方法及びアルカリ性現像液 |
JPH0572686A (ja) * | 1991-09-11 | 1993-03-26 | Konica Corp | ハロゲン化銀写真感光材料 |
US5532116A (en) * | 1992-01-13 | 1996-07-02 | Fuji Photo Film Co., Ltd. | Aqueous alkaline developing solution |
JP3094716B2 (ja) * | 1992-01-16 | 2000-10-03 | 富士写真フイルム株式会社 | ハロゲン化銀カラー写真感光材料の処理方法 |
US5457011A (en) * | 1993-12-27 | 1995-10-10 | Eastman Kodak Company | Photographic developing composition containing a sludge inhibiting agent and use thereof in the high contrast development of nucleated photographic elements |
US5364737A (en) * | 1994-01-25 | 1994-11-15 | Morton International, Inc. | Waterbone photoresists having associate thickeners |
JP2937801B2 (ja) * | 1994-03-31 | 1999-08-23 | 東京応化工業株式会社 | レジスト用現像原液 |
DE4419166A1 (de) * | 1994-06-01 | 1995-12-07 | Hoechst Ag | Entwickler für Photoresistschichten |
JPH0810600A (ja) * | 1994-06-30 | 1996-01-16 | Toho Chem Ind Co Ltd | 感光性樹脂工業用消泡分散剤 |
US5576145A (en) * | 1995-02-10 | 1996-11-19 | Morton International, Inc. | Esterified styrene/maleic anhydride polymer and polymer-containing photoimageable composition having improved alkaline process resistance |
US5609991A (en) * | 1995-02-10 | 1997-03-11 | Morton International, Inc. | Photoimageable composition having improved alkaline process resistance and tack-free surface for contact imaging |
US5998102A (en) * | 1997-10-06 | 1999-12-07 | Agfa Corporation | Etch inhibitors in developer for lithographic printing plates |
-
1998
- 1998-04-29 US US09/069,518 patent/US5922522A/en not_active Expired - Fee Related
-
1999
- 1999-04-05 SG SG9901631A patent/SG80021A1/en unknown
- 1999-04-23 DE DE69905417T patent/DE69905417T2/de not_active Expired - Fee Related
- 1999-04-23 AT AT99303144T patent/ATE232994T1/de not_active IP Right Cessation
- 1999-04-23 EP EP99303144A patent/EP0953880B1/en not_active Expired - Lifetime
- 1999-04-26 CA CA002270013A patent/CA2270013A1/en not_active Abandoned
- 1999-04-27 KR KR1019990014962A patent/KR100326617B1/ko not_active IP Right Cessation
- 1999-04-28 IL IL12965899A patent/IL129658A0/xx unknown
- 1999-04-29 CN CNB991064232A patent/CN1141622C/zh not_active Expired - Fee Related
- 1999-04-29 BR BR9901322-3A patent/BR9901322A/pt not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
KR100326617B1 (ko) | 2002-03-02 |
EP0953880B1 (en) | 2003-02-19 |
CN1233783A (zh) | 1999-11-03 |
DE69905417D1 (de) | 2003-03-27 |
KR19990083501A (ko) | 1999-11-25 |
IL129658A0 (en) | 2000-02-29 |
EP0953880A3 (en) | 1999-11-17 |
CA2270013A1 (en) | 1999-10-29 |
US5922522A (en) | 1999-07-13 |
SG80021A1 (en) | 2001-04-17 |
DE69905417T2 (de) | 2003-08-28 |
EP0953880A2 (en) | 1999-11-03 |
ATE232994T1 (de) | 2003-03-15 |
CN1141622C (zh) | 2004-03-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FA10 | Dismissal: dismissal - article 33 of industrial property law | ||
B11Y | Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette] |