DE69840910D1 - Antireflektierende beschichtungen für fotoresistzusammensetzungen und verwendung derselben - Google Patents

Antireflektierende beschichtungen für fotoresistzusammensetzungen und verwendung derselben

Info

Publication number
DE69840910D1
DE69840910D1 DE69840910T DE69840910T DE69840910D1 DE 69840910 D1 DE69840910 D1 DE 69840910D1 DE 69840910 T DE69840910 T DE 69840910T DE 69840910 T DE69840910 T DE 69840910T DE 69840910 D1 DE69840910 D1 DE 69840910D1
Authority
DE
Germany
Prior art keywords
reflective coatings
photoresist compositions
photoresist
compositions
coatings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69840910T
Other languages
English (en)
Inventor
Shuji Ding
Ping-Hung Lu
Dinesh N Khanna
Jianhui Shan
Dana L Durham
Ralph R Dammel
Dalil M Rahman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EMD Performance Materials Corp
Original Assignee
AZ Electronic Materials USA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AZ Electronic Materials USA Corp filed Critical AZ Electronic Materials USA Corp
Application granted granted Critical
Publication of DE69840910D1 publication Critical patent/DE69840910D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • C09B69/106—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing an azo dye
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
    • C08L81/06—Polysulfones; Polyethersulfones
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/006—Anti-reflective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/825—Photosensitive materials characterised by the base or auxiliary layers characterised by antireflection means or visible-light filtering means, e.g. antihalation
    • G03C1/835—Macromolecular substances therefor, e.g. mordants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
DE69840910T 1997-04-30 1998-04-21 Antireflektierende beschichtungen für fotoresistzusammensetzungen und verwendung derselben Expired - Lifetime DE69840910D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/841,750 US5994430A (en) 1997-04-30 1997-04-30 Antireflective coating compositions for photoresist compositions and use thereof
PCT/EP1998/002334 WO1998049603A1 (en) 1997-04-30 1998-04-21 Antireflective coating compositions for photoresist compositions and use thereof

Publications (1)

Publication Number Publication Date
DE69840910D1 true DE69840910D1 (de) 2009-07-30

Family

ID=25285612

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69840910T Expired - Lifetime DE69840910D1 (de) 1997-04-30 1998-04-21 Antireflektierende beschichtungen für fotoresistzusammensetzungen und verwendung derselben

Country Status (8)

Country Link
US (1) US5994430A (de)
EP (1) EP0978016B1 (de)
JP (1) JP3231794B2 (de)
KR (1) KR100567639B1 (de)
CN (1) CN1159627C (de)
DE (1) DE69840910D1 (de)
TW (1) TW530193B (de)
WO (1) WO1998049603A1 (de)

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US6251562B1 (en) * 1998-12-23 2001-06-26 International Business Machines Corporation Antireflective polymer and method of use
US7259880B1 (en) * 1999-04-01 2007-08-21 Oce Printing Systems Gmbh Device and method for processing and printing information
US6187506B1 (en) * 1999-08-05 2001-02-13 Clariant Finance (Bvi) Limited Antireflective coating for photoresist compositions
US6346361B1 (en) * 1999-10-06 2002-02-12 Clariant Finance (Bvi) Limited Method for synthesizing polymeric AZO dyes
US6686124B1 (en) * 2000-03-14 2004-02-03 International Business Machines Corporation Multifunctional polymeric materials and use thereof
JP3445584B2 (ja) * 2001-08-10 2003-09-08 沖電気工業株式会社 反射防止膜のエッチング方法
US20060060096A1 (en) * 2002-10-15 2006-03-23 Agfa-Gevaert Polymer for heat-sensitive lithographic printing plate precursor
TWI258635B (en) * 2002-11-27 2006-07-21 Tokyo Ohka Kogyo Co Ltd Undercoating material for wiring, embedded material, and wiring formation method
US7029821B2 (en) * 2003-02-11 2006-04-18 Rohm And Haas Electronic Materials Llc Photoresist and organic antireflective coating compositions
CN100440431C (zh) * 2003-03-04 2008-12-03 东京応化工业株式会社 液浸曝光工艺用浸渍液及使用该浸渍液的抗蚀剂图案形成方法
EP1619555A4 (de) 2003-04-17 2007-09-12 Nissan Chemical Ind Ltd Poröser unterschichtfilm und unterschichtfilm-bildungszusammensetzung für seine herstellung
TWI442694B (zh) * 2003-05-30 2014-06-21 Asml Netherlands Bv 微影裝置及元件製造方法
US6867844B2 (en) * 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
KR100586541B1 (ko) * 2003-07-16 2006-06-07 주식회사 하이닉스반도체 유기 반사 방지막 조성물 및 이를 이용한 패턴 형성 방법
KR100570206B1 (ko) * 2003-10-15 2006-04-12 주식회사 하이닉스반도체 유기 반사방지막용 광 흡수제 중합체 및 이의 제조 방법과상기 중합체를 포함하는 유기 반사 방지막 조성물
US7534555B2 (en) * 2003-12-10 2009-05-19 Hitachi Global Storage Technologies Netherlands B.V. Plating using copolymer
KR100966197B1 (ko) * 2004-12-03 2010-06-25 제이에스알 가부시끼가이샤 반사 방지막 형성용 조성물, 적층체 및 레지스트 패턴의형성 방법
US20060177772A1 (en) * 2005-02-10 2006-08-10 Abdallah David J Process of imaging a photoresist with multiple antireflective coatings
DE602006005841D1 (de) * 2005-11-11 2009-04-30 Canon Kk Polymer mit sulfonsäuregruppe oder sulfonsäure-ester-gruppe und amidgruppe sowie toner zur entwicklung elektrostatisch latenter bilder mit dem polymer
US7968650B2 (en) * 2006-10-31 2011-06-28 Johnson & Johnson Vision Care, Inc. Polymeric compositions comprising at least one volume excluding polymer
JP6157160B2 (ja) * 2013-03-15 2017-07-05 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ 上層膜形成用組成物およびそれを用いたレジストパターン形成方法
US9541829B2 (en) 2013-07-24 2017-01-10 Orthogonal, Inc. Cross-linkable fluorinated photopolymer
CN106662808A (zh) 2014-02-07 2017-05-10 正交公司 可交联的氟化光聚合物
CN114686057B (zh) * 2020-12-28 2023-06-02 中国科学院微电子研究所 一种图形化用抗反射涂层组合物及图形化方法
US20220406593A1 (en) * 2021-05-27 2022-12-22 Taiwan Semiconductor Manufacturing Company, Ltd. Coating composition for photolithography
CN117820910A (zh) * 2022-06-30 2024-04-05 华为技术有限公司 涂层材料和集成电路及制备方法、电子设备

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Also Published As

Publication number Publication date
JP3231794B2 (ja) 2001-11-26
CN1159627C (zh) 2004-07-28
JP2000512402A (ja) 2000-09-19
US5994430A (en) 1999-11-30
TW530193B (en) 2003-05-01
WO1998049603A1 (en) 1998-11-05
EP0978016B1 (de) 2009-06-17
KR100567639B1 (ko) 2006-04-05
KR20010020358A (ko) 2001-03-15
CN1253639A (zh) 2000-05-17
EP0978016A1 (de) 2000-02-09

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Legal Events

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