DE69516942D1 - Entspiegelte Beschichtungszusammensetzung - Google Patents

Entspiegelte Beschichtungszusammensetzung

Info

Publication number
DE69516942D1
DE69516942D1 DE69516942T DE69516942T DE69516942D1 DE 69516942 D1 DE69516942 D1 DE 69516942D1 DE 69516942 T DE69516942 T DE 69516942T DE 69516942 T DE69516942 T DE 69516942T DE 69516942 D1 DE69516942 D1 DE 69516942D1
Authority
DE
Germany
Prior art keywords
coating composition
reflective coating
reflective
composition
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69516942T
Other languages
English (en)
Other versions
DE69516942T2 (de
Inventor
Satoshi Watanabe
Toshinobu Ishihara
Ichiro Kaneko
Katsuyuki Oikawa
Yoshihumi Takeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Application granted granted Critical
Publication of DE69516942D1 publication Critical patent/DE69516942D1/de
Publication of DE69516942T2 publication Critical patent/DE69516942T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1046—Polyimides containing oxygen in the form of ether bonds in the main chain
    • C08G73/105—Polyimides containing oxygen in the form of ether bonds in the main chain with oxygen only in the diamino moiety
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09D179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003—Preparatory processes
    • C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
    • C08G73/101—Preparatory processes from tetracarboxylic acids or derivatives and diamines containing chain terminating or branching agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1039—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/1064—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1075—Partially aromatic polyimides
    • C08G73/1082—Partially aromatic polyimides wholly aromatic in the tetracarboxylic moiety
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
DE69516942T 1994-06-29 1995-06-28 Entspiegelte Beschichtungszusammensetzung Expired - Fee Related DE69516942T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6169971A JP3033443B2 (ja) 1994-06-29 1994-06-29 反射防止膜材料

Publications (2)

Publication Number Publication Date
DE69516942D1 true DE69516942D1 (de) 2000-06-21
DE69516942T2 DE69516942T2 (de) 2001-01-04

Family

ID=15896211

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69516942T Expired - Fee Related DE69516942T2 (de) 1994-06-29 1995-06-28 Entspiegelte Beschichtungszusammensetzung

Country Status (6)

Country Link
US (1) US5772925A (de)
EP (1) EP0690111B1 (de)
JP (1) JP3033443B2 (de)
KR (1) KR100243709B1 (de)
DE (1) DE69516942T2 (de)
TW (1) TW290581B (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5939236A (en) 1997-02-07 1999-08-17 Shipley Company, L.L.C. Antireflective coating compositions comprising photoacid generators
US6492031B1 (en) 1999-03-12 2002-12-10 Dupont-Toray Co. Ltd. Reflector substrate for illumination device and reflector for illumination device
JP4251343B2 (ja) * 1999-09-17 2009-04-08 東レ・デュポン株式会社 照明機器用反射体の製造方法。
US7261997B2 (en) * 2002-01-17 2007-08-28 Brewer Science Inc. Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings
US7160665B2 (en) * 2002-12-30 2007-01-09 International Business Machines Corporation Method for employing vertical acid transport for lithographic imaging applications
WO2005038878A2 (en) * 2003-10-15 2005-04-28 Brewer Science Inc. Developer-soluble materials and methods of using the same in via-first dual damascene applications
JP4769455B2 (ja) * 2003-12-30 2011-09-07 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． コーティング組成物
US20050255410A1 (en) * 2004-04-29 2005-11-17 Guerrero Douglas J Anti-reflective coatings using vinyl ether crosslinkers
US20070207406A1 (en) * 2004-04-29 2007-09-06 Guerrero Douglas J Anti-reflective coatings using vinyl ether crosslinkers
US7427466B2 (en) * 2004-11-29 2008-09-23 Imation Corp. Anti-reflection optical data storage disk master
US7914974B2 (en) 2006-08-18 2011-03-29 Brewer Science Inc. Anti-reflective imaging layer for multiple patterning process
JP4986071B2 (ja) * 2007-03-30 2012-07-25 国立大学法人東京工業大学 樹脂組成物、硬化物及び光学用部材
EP2245512B1 (de) * 2008-01-29 2019-09-11 Brewer Science, Inc. On-track-prozess zur strukturierung einer hardmaske durch mehrere dunkelfeldbelichtungen
JP5326513B2 (ja) * 2008-11-17 2013-10-30 三菱瓦斯化学株式会社 リソグラフィー用下層膜形成組成物
US9640396B2 (en) * 2009-01-07 2017-05-02 Brewer Science Inc. Spin-on spacer materials for double- and triple-patterning lithography
JP2015199916A (ja) * 2014-04-02 2015-11-12 Jsr株式会社 膜形成用組成物及びパターン形成方法
JP2018062443A (ja) * 2016-10-13 2018-04-19 株式会社アルプスエンジニアリング 隔壁パターンを有するマスキング被膜の形成方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3959350A (en) * 1971-05-17 1976-05-25 E. I. Du Pont De Nemours And Company Melt-fusible linear polyimide of 2,2-bis(3,4-dicarboxyphenyl)-hexafluoropropane dianhydride
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
JPH0612452B2 (ja) 1982-09-30 1994-02-16 ブリュ−ワ−・サイエンス・インコ−ポレイテッド 集積回路素子の製造方法
US4910122A (en) * 1982-09-30 1990-03-20 Brewer Science, Inc. Anti-reflective coating
US4595548A (en) * 1984-08-23 1986-06-17 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Process for preparing essentially colorless polyimide film containing phenoxy-linked diamines
US4603061A (en) * 1984-08-23 1986-07-29 The United States Of America As Represented By The National Aeronautics And Space Administration Process for preparing highly optically transparent/colorless aromatic polyimide film
DE3750275T3 (de) 1986-06-13 1998-10-01 Microsi Inc Lackzusammensetzung und -anwendung.
US5310619A (en) 1986-06-13 1994-05-10 Microsi, Inc. Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable
US5234990A (en) 1992-02-12 1993-08-10 Brewer Science, Inc. Polymers with intrinsic light-absorbing properties for anti-reflective coating applications in deep ultraviolet microlithography
US5534201A (en) * 1992-03-31 1996-07-09 E. I. Du Pont De Nemours And Company NLO dye compositions and use thereof in producing NLO elements
JP2891838B2 (ja) 1992-12-10 1999-05-17 株式会社大協精工 医薬品用，医療用ゴム栓およびその製造方法

Also Published As

Publication number Publication date
JPH0812940A (ja) 1996-01-16
US5772925A (en) 1998-06-30
EP0690111A1 (de) 1996-01-03
EP0690111B1 (de) 2000-05-17
JP3033443B2 (ja) 2000-04-17
TW290581B (de) 1996-11-11
DE69516942T2 (de) 2001-01-04
KR960001054A (ko) 1996-01-25
KR100243709B1 (ko) 2000-02-01

Similar Documents

Publication Publication Date Title
DK0802243T3 (da) Overtræksammensætning
FI944515A0 (fi) Päällystyskoostumus
DE69512553T2 (de) Wässrige Beschichtungszusammensetzung
DE69327420D1 (de) Antireflex-Beschichtung
DE69305255D1 (de) Beschichtungszusammensetzungen
DE69501075D1 (de) Überzugszusammensetzung
DE69705466T2 (de) Zusammensetzung für Antireflexionsbeschichtung
FI955588A (fi) Päällystyskoostumus
DE69622367D1 (de) Beschichtungsmittel-Zusammensetzung
DE69528442D1 (de) Hartbare Beschichtungszusammensetzungen
DE69516942T2 (de) Entspiegelte Beschichtungszusammensetzung
DE69313189D1 (de) Beschichtungszusammensetzung
DE69521870T2 (de) Antibewuchs-Beschichtungszusammensetzung
DE69702001D1 (de) Beschichtungszusammensetzungen
DE69727217D1 (de) Verbesserte überzugszusammensetzung
DE69303215D1 (de) Überzugzusammensetzung
DE69715718D1 (de) Beschichtungszusammensetzung
DE69605295D1 (de) Beschichtungszusammensetzungen
DE69500343D1 (de) Flachenbeschichtung
BR9408497A (pt) Composição de revestimento carável
DE19581452T1 (de) Beschichtungszusammensetzung
DE69426271D1 (de) Geruchsbeständige Beschichtungszusammensetzung
DE69525139T2 (de) Härtbare Beschichtungszusammensetzungen
DE69523521T2 (de) Überzugsmittel-Zusammensetzungen
DE69504517D1 (de) Haltbare beschichtungszusammensetzungen

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee