DE69839189D1 - Vorrichtung zur oberflächenmodifizierung von polymer-, metall- und keramikmaterialien unter verwendung eines ionenstrahls - Google Patents

Vorrichtung zur oberflächenmodifizierung von polymer-, metall- und keramikmaterialien unter verwendung eines ionenstrahls

Info

Publication number
DE69839189D1
DE69839189D1 DE69839189T DE69839189T DE69839189D1 DE 69839189 D1 DE69839189 D1 DE 69839189D1 DE 69839189 T DE69839189 T DE 69839189T DE 69839189 T DE69839189 T DE 69839189T DE 69839189 D1 DE69839189 D1 DE 69839189D1
Authority
DE
Germany
Prior art keywords
ion
chamber
ion beam
surface modification
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69839189T
Other languages
English (en)
Other versions
DE69839189T2 (de
Inventor
Hyung Jin Jung
Won Kook Choi
Jung Cho
Seok Keun Koh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Korea Advanced Institute of Science and Technology KAIST
Korea Institute of Science and Technology KIST
Original Assignee
Korea Advanced Institute of Science and Technology KAIST
Korea Institute of Science and Technology KIST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Korea Advanced Institute of Science and Technology KAIST, Korea Institute of Science and Technology KIST filed Critical Korea Advanced Institute of Science and Technology KAIST
Application granted granted Critical
Publication of DE69839189D1 publication Critical patent/DE69839189D1/de
Publication of DE69839189T2 publication Critical patent/DE69839189T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4417—Methods specially adapted for coating powder
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using ion beam radiation
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06B—TREATING TEXTILE MATERIALS USING LIQUIDS, GASES OR VAPOURS
    • D06B19/00—Treatment of textile materials by liquids, gases or vapours, not provided for in groups D06B1/00 - D06B17/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/338—Changing chemical properties of treated surfaces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Textile Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Chemical Vapour Deposition (AREA)
  • Chemically Coating (AREA)
DE69839189T 1997-12-05 1998-12-04 Vorrichtung zur oberflächenmodifizierung von polymer-, metall- und keramikmaterialien unter verwendung eines ionenstrahls Expired - Fee Related DE69839189T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR9766184 1997-12-05
KR1019970066184A KR19990047679A (ko) 1997-12-05 1997-12-05 이온 빔을 이용한 재료의 표면 처리 장치
PCT/KR1998/000403 WO1999029922A1 (en) 1997-12-05 1998-12-04 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam

Publications (2)

Publication Number Publication Date
DE69839189D1 true DE69839189D1 (de) 2008-04-10
DE69839189T2 DE69839189T2 (de) 2009-03-26

Family

ID=19526515

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69839189T Expired - Fee Related DE69839189T2 (de) 1997-12-05 1998-12-04 Vorrichtung zur oberflächenmodifizierung von polymer-, metall- und keramikmaterialien unter verwendung eines ionenstrahls

Country Status (9)

Country Link
US (2) US6319326B1 (de)
EP (2) EP1296353A3 (de)
JP (1) JP2001526323A (de)
KR (2) KR19990047679A (de)
CN (2) CN100351422C (de)
AT (1) ATE387520T1 (de)
AU (1) AU1509499A (de)
DE (1) DE69839189T2 (de)
WO (1) WO1999029922A1 (de)

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JP6567119B1 (ja) * 2018-03-27 2019-08-28 キヤノントッキ株式会社 基板処理装置及びその制御方法、成膜装置、電子部品の製造方法
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CN113196453A (zh) * 2018-12-17 2021-07-30 应用材料公司 在基板上形成装置的方法
KR20210094116A (ko) 2018-12-17 2021-07-28 어플라이드 머티어리얼스, 인코포레이티드 광학 디바이스 제작을 위한 전자 빔 장치
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CN111421144B (zh) * 2020-03-27 2021-11-19 西安交通大学 一种抗水腐蚀的难熔金属钼表面处理方法
JP7111380B2 (ja) * 2020-04-01 2022-08-02 株式会社シンクロン スパッタ装置及びこれを用いた成膜方法
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Also Published As

Publication number Publication date
EP1036210A1 (de) 2000-09-20
EP1296353A3 (de) 2008-05-07
WO1999029922A8 (en) 1999-09-30
CN1227385C (zh) 2005-11-16
WO1999029922A1 (en) 1999-06-17
EP1036210B1 (de) 2008-02-27
CN1280631A (zh) 2001-01-17
JP2001526323A (ja) 2001-12-18
KR19990047679A (ko) 1999-07-05
DE69839189T2 (de) 2009-03-26
US6841789B2 (en) 2005-01-11
US6319326B1 (en) 2001-11-20
ATE387520T1 (de) 2008-03-15
AU1509499A (en) 1999-06-28
CN100351422C (zh) 2007-11-28
EP1296353A2 (de) 2003-03-26
CN1619008A (zh) 2005-05-25
US20020014597A1 (en) 2002-02-07
KR100329810B1 (ko) 2002-03-25
KR20010032692A (ko) 2001-04-25

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