DE69827925D1 - Spiegelprojektionssytem für eine abtastende lithographische projektionsvorrichtung und eine dieses system enthaltende lithographische vorrichtung - Google Patents

Spiegelprojektionssytem für eine abtastende lithographische projektionsvorrichtung und eine dieses system enthaltende lithographische vorrichtung

Info

Publication number
DE69827925D1
DE69827925D1 DE69827925T DE69827925T DE69827925D1 DE 69827925 D1 DE69827925 D1 DE 69827925D1 DE 69827925 T DE69827925 T DE 69827925T DE 69827925 T DE69827925 T DE 69827925T DE 69827925 D1 DE69827925 D1 DE 69827925D1
Authority
DE
Germany
Prior art keywords
lithographic
projection
scanning
mirror
device containing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69827925T
Other languages
English (en)
Inventor
Johannes Braat
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Application granted granted Critical
Publication of DE69827925D1 publication Critical patent/DE69827925D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69827925T 1997-11-13 1998-10-19 Spiegelprojektionssytem für eine abtastende lithographische projektionsvorrichtung und eine dieses system enthaltende lithographische vorrichtung Expired - Lifetime DE69827925D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP97203536 1997-11-13
EP98201055 1998-04-02
PCT/IB1998/001639 WO1999026097A1 (en) 1997-11-13 1998-10-19 Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system

Publications (1)

Publication Number Publication Date
DE69827925D1 true DE69827925D1 (de) 2005-01-05

Family

ID=26147037

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69827925T Expired - Lifetime DE69827925D1 (de) 1997-11-13 1998-10-19 Spiegelprojektionssytem für eine abtastende lithographische projektionsvorrichtung und eine dieses system enthaltende lithographische vorrichtung

Country Status (7)

Country Link
US (3) US6199991B1 (de)
EP (1) EP0951655B1 (de)
JP (1) JP2002503356A (de)
KR (1) KR20000070095A (de)
DE (1) DE69827925D1 (de)
TW (1) TW451069B (de)
WO (1) WO1999026097A1 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6396067B1 (en) * 1998-05-06 2002-05-28 Koninklijke Philips Electronics N.V. Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
US6985210B2 (en) * 1999-02-15 2006-01-10 Carl Zeiss Smt Ag Projection system for EUV lithography
USRE42118E1 (en) * 1999-02-15 2011-02-08 Carl-Zeiss-Smt Ag Projection system for EUV lithography
EP1035445B1 (de) * 1999-02-15 2007-01-31 Carl Zeiss SMT AG Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
US7151592B2 (en) * 1999-02-15 2006-12-19 Carl Zeiss Smt Ag Projection system for EUV lithography
DE19910724A1 (de) * 1999-03-11 2000-09-14 Zeiss Carl Fa Mikrolithographie-Projektionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
JP3770542B2 (ja) 1999-07-22 2006-04-26 コーニング インコーポレイテッド 遠紫外軟ｘ線投影リソグラフィー法およびマスク装置
EP1214718A4 (de) 1999-07-22 2006-08-23 Corning Inc Extrem-ultraviolett weiche-roentchenstrahlungen lithographisches projektionsverfahren- und vorrichtung und lithographische elemente
EP1093021A3 (de) 1999-10-15 2004-06-30 Nikon Corporation Projektionsbelichtungssystem sowie ein solches System benutzendes Gerät und Verfahren
US6867913B2 (en) 2000-02-14 2005-03-15 Carl Zeiss Smt Ag 6-mirror microlithography projection objective
JP2001228401A (ja) * 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
TW573234B (en) 2000-11-07 2004-01-21 Asml Netherlands Bv Lithographic projection apparatus and integrated circuit device manufacturing method
US6624880B2 (en) 2001-01-18 2003-09-23 Micronic Laser Systems Ab Method and apparatus for microlithography
JP2003045782A (ja) * 2001-07-31 2003-02-14 Canon Inc 反射型縮小投影光学系及びそれを用いた露光装置
JP2003233001A (ja) * 2002-02-07 2003-08-22 Canon Inc 反射型投影光学系、露光装置及びデバイス製造方法
JP2003233005A (ja) * 2002-02-07 2003-08-22 Canon Inc 反射型投影光学系、露光装置及びデバイス製造方法
US6829908B2 (en) * 2002-02-27 2004-12-14 Corning Incorporated Fabrication of inclusion free homogeneous glasses
US6832493B2 (en) * 2002-02-27 2004-12-21 Corning Incorporated High purity glass bodies formed by zero shrinkage casting
US20030159466A1 (en) * 2002-02-27 2003-08-28 Bowden Bradley F. Dry pressing of spray dried soot to make EUV components
US8208198B2 (en) * 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
JP2005172988A (ja) * 2003-12-09 2005-06-30 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
JP2006245147A (ja) * 2005-03-01 2006-09-14 Canon Inc 投影光学系、露光装置及びデバイスの製造方法
US20060199111A1 (en) * 2005-03-01 2006-09-07 Taiwan Semiconductor Manufacturing Company, Ltd. Method for manufacturing semiconductor devices using a photo acid generator
EP2192446B1 (de) * 2005-03-08 2011-10-19 Carl Zeiss SMT GmbH Mikrolithographie-Projektionssystem mit einer zugänglichen Aperturblende
WO2007016502A2 (en) * 2005-08-02 2007-02-08 Wisconsin Alumni Research Foundation Synthesis of arrays of oligonucleotides and other chain molecules
DE102008049588B4 (de) * 2008-09-30 2018-04-05 Carl Zeiss Smt Gmbh Optische Abbildungseinrichtung, Mikroskop und Abbildungsverfahren für die Mikroskopie
JP5756121B2 (ja) * 2009-12-14 2015-07-29 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系
US8593729B2 (en) 2010-06-25 2013-11-26 The United States Of America As Represented By The Secretary Of The Army Multi-field of view annular folded optics

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3805365A (en) 1972-12-13 1974-04-23 Ashby H Method and apparatus for constructing house structures to be transported and installed at remote locations
US4711535A (en) * 1985-05-10 1987-12-08 The Perkin-Elmer Corporation Ring field projection system
EP0947882B1 (de) * 1986-07-11 2006-03-29 Canon Kabushiki Kaisha Verkleinerndes Projektionsbelichtungssystem des Reflexionstyps für Röntgenstrahlung
US5003567A (en) * 1989-02-09 1991-03-26 Hawryluk Andrew M Soft x-ray reduction camera for submicron lithography
US5071240A (en) * 1989-09-14 1991-12-10 Nikon Corporation Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image
NL9000503A (nl) 1990-03-05 1991-10-01 Asm Lithography Bv Apparaat en werkwijze voor het afbeelden van een maskerpatroon op een substraat.
NL9100410A (nl) 1991-03-07 1992-10-01 Asm Lithography Bv Afbeeldingsapparaat voorzien van een focusfout- en/of scheefstandsdetectie-inrichting.
US5805365A (en) * 1995-10-12 1998-09-08 Sandia Corporation Ringfield lithographic camera
US5815310A (en) 1995-12-12 1998-09-29 Svg Lithography Systems, Inc. High numerical aperture ring field optical reduction system
DE69709584T2 (de) 1996-03-04 2002-06-13 Asm Lithography B.V., Veldhoven Lithographisches gerät zur step-und-scan übertragung eines maskenmusters
US5686728A (en) * 1996-05-01 1997-11-11 Lucent Technologies Inc Projection lithography system and method using all-reflective optical elements

Also Published As

Publication number Publication date
EP0951655A1 (de) 1999-10-27
US20020018309A1 (en) 2002-02-14
KR20000070095A (ko) 2000-11-25
US6299318B1 (en) 2001-10-09
WO1999026097A1 (en) 1999-05-27
EP0951655B1 (de) 2004-12-01
JP2002503356A (ja) 2002-01-29
TW451069B (en) 2001-08-21
US6199991B1 (en) 2001-03-13
US6386715B2 (en) 2002-05-14

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Legal Events

Date Code Title Description
8320 Willingness to grant licences declared (paragraph 23)
8332 No legal effect for de