DE69703076D1 - Lithographischer projektionsapparat zur abtastbelichtung - Google Patents

Lithographischer projektionsapparat zur abtastbelichtung

Info

Publication number
DE69703076D1
DE69703076D1 DE69703076T DE69703076T DE69703076D1 DE 69703076 D1 DE69703076 D1 DE 69703076D1 DE 69703076 T DE69703076 T DE 69703076T DE 69703076 T DE69703076 T DE 69703076T DE 69703076 D1 DE69703076 D1 DE 69703076D1
Authority
DE
Germany
Prior art keywords
projection apparatus
lithographic projection
scan exposure
scan
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69703076T
Other languages
English (en)
Other versions
DE69703076T2 (de
Inventor
Alexander Straaijer
Jager Andre De
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE69703076D1 publication Critical patent/DE69703076D1/de
Application granted granted Critical
Publication of DE69703076T2 publication Critical patent/DE69703076T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
DE69703076T 1996-04-01 1997-03-25 Lithographischer projektionsapparat zur abtastbelichtung Expired - Fee Related DE69703076T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP96200883 1996-04-01
PCT/IB1997/000297 WO1997037283A1 (en) 1996-04-01 1997-03-25 Lithographic scanning exposure projection apparatus

Publications (2)

Publication Number Publication Date
DE69703076D1 true DE69703076D1 (de) 2000-10-19
DE69703076T2 DE69703076T2 (de) 2001-05-03

Family

ID=8223838

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69703076T Expired - Fee Related DE69703076T2 (de) 1996-04-01 1997-03-25 Lithographischer projektionsapparat zur abtastbelichtung

Country Status (6)

Country Link
US (1) US5986742A (de)
EP (1) EP0829036B9 (de)
JP (2) JP3813635B2 (de)
KR (1) KR100500770B1 (de)
DE (1) DE69703076T2 (de)
WO (1) WO1997037283A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3296448B2 (ja) 1993-03-15 2002-07-02 株式会社ニコン 露光制御方法、走査露光方法、露光制御装置、及びデバイス製造方法
TW530189B (en) * 1998-07-01 2003-05-01 Asml Netherlands Bv Lithographic projection apparatus for imaging of a mask pattern and method of manufacturing a device using a lithographic projection apparatus
US6537372B1 (en) * 1999-06-29 2003-03-25 American Crystal Technologies, Inc. Heater arrangement for crystal growth furnace
US6602345B1 (en) 1999-06-29 2003-08-05 American Crystal Technologies, Inc., Heater arrangement for crystal growth furnace
US6545829B1 (en) 2000-08-21 2003-04-08 Micron Technology, Inc. Method and device for improved lithographic critical dimension control
KR100376867B1 (ko) * 2000-11-02 2003-03-19 주식회사 하이닉스반도체 스캔 방식 반도체 노광장치 및 노광 균일도 향상 방법
JP4394500B2 (ja) * 2003-04-09 2010-01-06 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、デバイス製造方法、及びコンピュータ・プログラム
US7061591B2 (en) 2003-05-30 2006-06-13 Asml Holding N.V. Maskless lithography systems and methods utilizing spatial light modulator arrays
US7070915B2 (en) * 2003-08-29 2006-07-04 Tokyo Electron Limited Method and system for drying a substrate
US7282666B2 (en) * 2004-05-07 2007-10-16 Micron Technology, Inc. Method and apparatus to increase throughput of processing using pulsed radiation sources
US7463330B2 (en) * 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2006078658A1 (en) * 2005-01-18 2006-07-27 Dow Global Technologies Inc. Structures useful in creating composite left-hand-rule media
US20070139630A1 (en) * 2005-12-19 2007-06-21 Nikon Precision, Inc. Changeable Slit to Control Uniformity of Illumination
GB2442016B (en) * 2006-09-20 2009-02-18 Exitech Ltd Method for thermally curing thin films on moving substrates
GB2442017A (en) * 2006-09-20 2008-03-26 Exitech Ltd Repeating pattern exposure
DE102006060368B3 (de) * 2006-12-16 2008-07-31 Xtreme Technologies Gmbh Verfahren und Anordnung zur Stabilisierung der mittleren abgegebenen Strahlungsleistung einer gepulst betriebenen Strahlungsquelle
DE102007022895B9 (de) * 2007-05-14 2013-11-21 Erich Thallner Vorrichtung zum Übertragen von in einer Maske vorgesehenen Strukturen auf ein Substrat
DE102007025340B4 (de) * 2007-05-31 2019-12-05 Globalfoundries Inc. Immersionslithograpieprozess unter Anwendung einer variablen Abtastgeschwindigkeit und Lithographiesystem
EP3647872A1 (de) 2018-11-01 2020-05-06 ASML Netherlands B.V. Verfahren zum steuern der einstellung des dosisprofils einer lithografischen vorrichtung
EP3942367B1 (de) * 2019-03-21 2022-12-14 ASML Netherlands B.V. Verfahren zur steuerung eines lithographischen systems

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4924257A (en) * 1988-10-05 1990-05-08 Kantilal Jain Scan and repeat high resolution projection lithography system
JP3301153B2 (ja) * 1993-04-06 2002-07-15 株式会社ニコン 投影露光装置、露光方法、及び素子製造方法
JP3316704B2 (ja) * 1993-06-10 2002-08-19 株式会社ニコン 投影露光装置、走査露光方法、及び素子製造方法
JP2862477B2 (ja) * 1993-06-29 1999-03-03 キヤノン株式会社 露光装置及び該露光装置を用いてデバイスを製造する方法
US5777724A (en) * 1994-08-24 1998-07-07 Suzuki; Kazuaki Exposure amount control device
JPH08250402A (ja) * 1995-03-15 1996-09-27 Nikon Corp 走査型露光方法及び装置

Also Published As

Publication number Publication date
US5986742A (en) 1999-11-16
JP2006128732A (ja) 2006-05-18
JPH11507146A (ja) 1999-06-22
KR100500770B1 (ko) 2005-12-28
EP0829036B9 (de) 2001-07-25
EP0829036A1 (de) 1998-03-18
EP0829036B1 (de) 2000-09-13
KR19990022277A (ko) 1999-03-25
JP3813635B2 (ja) 2006-08-23
WO1997037283A1 (en) 1997-10-09
DE69703076T2 (de) 2001-05-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee