DE69728648D1 - Halbleitervorrichtung mit hochfrequenz-bipolar-transistor auf einem isolierenden substrat - Google Patents

Halbleitervorrichtung mit hochfrequenz-bipolar-transistor auf einem isolierenden substrat

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Publication number
DE69728648D1
DE69728648D1 DE69728648T DE69728648T DE69728648D1 DE 69728648 D1 DE69728648 D1 DE 69728648D1 DE 69728648 T DE69728648 T DE 69728648T DE 69728648 T DE69728648 T DE 69728648T DE 69728648 D1 DE69728648 D1 DE 69728648D1
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DE
Germany
Prior art keywords
transistor
mounting surface
conductive mounting
insulating substrate
bipolar transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69728648T
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English (en)
Other versions
DE69728648T2 (de
Inventor
Atef Akhnoukh
Martinus Moors
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NXP BV
Original Assignee
Koninklijke Philips Electronics NV
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Publication of DE69728648D1 publication Critical patent/DE69728648D1/de
Publication of DE69728648T2 publication Critical patent/DE69728648T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3025Electromagnetic shielding

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Bipolar Transistors (AREA)
DE69728648T 1996-11-05 1997-10-02 Halbleitervorrichtung mit hochfrequenz-bipolar-transistor auf einem isolierenden substrat Expired - Lifetime DE69728648T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP96203079 1996-11-05
EP96203079 1996-11-05
PCT/IB1997/001194 WO1998020553A1 (en) 1996-11-05 1997-10-02 Semiconductor device with a high-frequency bipolar transistor on an insulating substrate

Publications (2)

Publication Number Publication Date
DE69728648D1 true DE69728648D1 (de) 2004-05-19
DE69728648T2 DE69728648T2 (de) 2005-03-31

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US (1) US6087721A (de)
EP (1) EP0878025B1 (de)
JP (1) JP4215133B2 (de)
KR (1) KR100503531B1 (de)
DE (1) DE69728648T2 (de)
WO (1) WO1998020553A1 (de)

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AU705177B1 (en) * 1997-11-26 1999-05-20 Kabushiki Kaisha Toshiba Semiconductor device
US6259157B1 (en) * 1998-03-11 2001-07-10 Sanyo Electric Co., Ltd. Hybrid integrated circuit device, and method of manufacturing thereof
US6529081B1 (en) 2000-06-08 2003-03-04 Zeta, Division Of Sierra Tech Inc. Method of operating a solid state power amplifying device
WO2002005342A1 (en) * 2000-07-06 2002-01-17 Zeta, A Division Of Sierratech, Inc. A solid state power amplifying device
EP1356521B1 (de) * 2001-01-18 2008-12-10 Nxp B.V. Leistungstransistor mit intern kombinierten tiefpass- und bandpass-anpassungsstufen
TWI270968B (en) * 2002-04-11 2007-01-11 Koninkl Philips Electronics Nv Electronic device and method of manufacturing same
JP3896029B2 (ja) * 2002-04-24 2007-03-22 三洋電機株式会社 混成集積回路装置の製造方法
US7173328B2 (en) * 2004-04-06 2007-02-06 Lsi Logic Corporation Integrated circuit package and method having wire-bonded intra-die electrical connections
KR100878708B1 (ko) * 2007-09-04 2009-01-14 알.에프 에이치아이씨 주식회사 고출력 반도체 소자 패키지 및 방법
DE102010001788A1 (de) * 2010-02-10 2011-08-11 Forschungsverbund Berlin e.V., 12489 Skalierbarer Aufbau für laterale Halbleiterbauelemente mit hoher Stromtragfähigkeit
JP2023044582A (ja) * 2021-09-17 2023-03-30 株式会社東芝 半導体装置

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US3784884A (en) * 1972-11-03 1974-01-08 Motorola Inc Low parasitic microwave package
NL8202470A (nl) * 1982-06-18 1984-01-16 Philips Nv Hoogfrequentschakelinrichting en halfgeleiderinrichting voor toepassing in een dergelijke inrichting.
JPH0767055B2 (ja) * 1989-12-05 1995-07-19 三菱電機株式会社 高周波半導体装置
US5198904A (en) * 1991-02-25 1993-03-30 Comark Communications, Inc. Aural carrier correction system and method
JP2728322B2 (ja) * 1991-09-05 1998-03-18 三菱電機株式会社 半導体装置
JPH0595212A (ja) * 1991-10-01 1993-04-16 Mitsubishi Electric Corp 高周波半導体混成集積回路装置
US5151775A (en) * 1991-10-07 1992-09-29 Tektronix, Inc. Integrated circuit device having improved substrate capacitance isolation
EP0590804B1 (de) * 1992-09-03 1997-02-05 STMicroelectronics, Inc. Vertikal isolierter, monolithischer Hochleistungsbipolartransistor mit Topkollektor
JPH06260563A (ja) * 1993-03-03 1994-09-16 Mitsubishi Electric Corp トランジスタ用パッケージ
US5397917A (en) * 1993-04-26 1995-03-14 Motorola, Inc. Semiconductor package capable of spreading heat
DE69524730T2 (de) * 1994-10-31 2002-08-22 Koninkl Philips Electronics Nv Verfahren zur Herstellung einer Halbleitervorrichtung für Mikrowellen
US5986324A (en) * 1997-04-11 1999-11-16 Raytheon Company Heterojunction bipolar transistor

Also Published As

Publication number Publication date
EP0878025A1 (de) 1998-11-18
DE69728648T2 (de) 2005-03-31
JP2000504490A (ja) 2000-04-11
EP0878025B1 (de) 2004-04-14
US6087721A (en) 2000-07-11
WO1998020553A1 (en) 1998-05-14
KR100503531B1 (ko) 2005-09-26
KR19990077001A (ko) 1999-10-25
JP4215133B2 (ja) 2009-01-28

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