DE69725391D1 - Herstellungsverfahren einer Schattenmaske - Google Patents

Herstellungsverfahren einer Schattenmaske

Info

Publication number
DE69725391D1
DE69725391D1 DE69725391T DE69725391T DE69725391D1 DE 69725391 D1 DE69725391 D1 DE 69725391D1 DE 69725391 T DE69725391 T DE 69725391T DE 69725391 T DE69725391 T DE 69725391T DE 69725391 D1 DE69725391 D1 DE 69725391D1
Authority
DE
Germany
Prior art keywords
manufacturing process
shadow mask
shadow
mask
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69725391T
Other languages
English (en)
Other versions
DE69725391T2 (de
Inventor
Masaru Nikaido
Sachiko Hirahara
Yukio Okudo
Daizi Hirosawa
Hiroharu Takezawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP8235527A external-priority patent/JPH1083762A/ja
Priority claimed from JP8266444A external-priority patent/JPH1074450A/ja
Application filed by Toshiba Corp filed Critical Toshiba Corp
Publication of DE69725391D1 publication Critical patent/DE69725391D1/de
Application granted granted Critical
Publication of DE69725391T2 publication Critical patent/DE69725391T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/28—Acidic compositions for etching iron group metals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2209/00—Apparatus and processes for manufacture of discharge tubes
    • H01J2209/01—Generalised techniques
    • H01J2209/017—Cleaning

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • ing And Chemical Polishing (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
DE69725391T 1996-07-02 1997-07-01 Herstellungsverfahren einer Schattenmaske Expired - Fee Related DE69725391T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP17228096 1996-07-02
JP17228096 1996-07-02
JP23552796 1996-09-05
JP8235527A JPH1083762A (ja) 1996-09-05 1996-09-05 シャドウマスクの洗浄装置、これを用いたシャドウマスクの製造方法及び製造装置
JP26644496 1996-10-08
JP8266444A JPH1074450A (ja) 1996-07-02 1996-10-08 シャドウマスクの製造方法

Publications (2)

Publication Number Publication Date
DE69725391D1 true DE69725391D1 (de) 2003-11-13
DE69725391T2 DE69725391T2 (de) 2004-07-22

Family

ID=27323601

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69725391T Expired - Fee Related DE69725391T2 (de) 1996-07-02 1997-07-01 Herstellungsverfahren einer Schattenmaske

Country Status (7)

Country Link
US (1) US6193897B1 (de)
EP (1) EP0817231B1 (de)
KR (1) KR100224938B1 (de)
CN (1) CN1123039C (de)
DE (1) DE69725391T2 (de)
MY (1) MY125759A (de)
TW (1) TW373222B (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100358075C (zh) * 2003-04-25 2007-12-26 烟台正海电子网板有限公司 一种荫罩生产过程中的二次涂胶方法及专用设备
JP2005253856A (ja) * 2004-03-15 2005-09-22 Izumi Products Co 往復式電気かみそりの内刃製造方法
US7531470B2 (en) * 2005-09-27 2009-05-12 Advantech Global, Ltd Method and apparatus for electronic device manufacture using shadow masks
KR101281166B1 (ko) * 2006-10-17 2013-07-02 삼성전자주식회사 섀도우 마스크와 그 제조방법 및 섀도우 마스크를 이용한박막 형성방법
KR100804768B1 (ko) * 2007-05-09 2008-02-19 주식회사 씨에이치케이 형광체 인쇄노즐 세정장치

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3325198C2 (de) * 1983-07-13 1998-10-29 Schloemann Siemag Ag Verfahren und Anordnung zum Reinigen von kaltgewalzten Metallbändern
FR2587241B1 (fr) * 1985-05-28 1988-07-29 Outillages Scient Laboratoir Appareil de nettoyage pour composants electroniques et/ou pour pieces mecaniques de precision
US5006432A (en) * 1987-10-28 1991-04-09 Kabushiki Kaisha Toshiba Method for manufacturing a shadow mask
US5188135A (en) * 1990-02-23 1993-02-23 Neumann Industries, Inc. Method and apparatus for processing sheet metal blanks and continuous strip
DE69111002T2 (de) * 1990-09-20 1995-11-02 Dainippon Screen Mfg Verfahren zur Herstellung von kleinen Durchgangslöchern in dünne Metallplatten.
US5118357A (en) * 1991-03-20 1992-06-02 Finishing Equipment, Inc. Treatment fluid application and recovery apparatus and method
JP2513934B2 (ja) 1991-03-30 1996-07-10 株式会社芝浦製作所 基板洗浄装置
US5265629A (en) * 1991-05-10 1993-11-30 Applied Hydro Dynamics, Inc. Universal cleaning system utilizing cavitating fluid
US5348825A (en) * 1991-07-02 1994-09-20 Dai Nippon Printing Co., Ltd. Method for manufacturing shadow mask and shadow mask manufactured by said method
JPH05114358A (ja) * 1991-10-24 1993-05-07 Toshiba Corp シヤドウマスクの製造方法
US5383483A (en) * 1992-10-14 1995-01-24 Shibano; Yoshihide Ultrasonic cleaning and deburring apparatus
JP2504916B2 (ja) 1993-09-20 1996-06-05 株式会社芝浦製作所 基板洗浄装置
US5656097A (en) * 1993-10-20 1997-08-12 Verteq, Inc. Semiconductor wafer cleaning system
US5484074A (en) * 1994-05-03 1996-01-16 Bmc Industries, Inc. Method for manufacturing a shadow mask

Also Published As

Publication number Publication date
KR100224938B1 (ko) 1999-10-15
KR980011578A (ko) 1998-04-30
US6193897B1 (en) 2001-02-27
EP0817231B1 (de) 2003-10-08
EP0817231A2 (de) 1998-01-07
EP0817231A3 (de) 1998-12-16
CN1175074A (zh) 1998-03-04
DE69725391T2 (de) 2004-07-22
CN1123039C (zh) 2003-10-01
TW373222B (en) 1999-11-01
MY125759A (en) 2006-08-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee