DE69719854T2 - Verfahren zur Plasmabehandlung und Apparat dafür - Google Patents

Verfahren zur Plasmabehandlung und Apparat dafür

Info

Publication number
DE69719854T2
DE69719854T2 DE69719854T DE69719854T DE69719854T2 DE 69719854 T2 DE69719854 T2 DE 69719854T2 DE 69719854 T DE69719854 T DE 69719854T DE 69719854 T DE69719854 T DE 69719854T DE 69719854 T2 DE69719854 T2 DE 69719854T2
Authority
DE
Germany
Prior art keywords
treatment method
plasma treatment
apparatus therefor
therefor
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69719854T
Other languages
English (en)
Other versions
DE69719854D1 (de
Inventor
Motokazu Yuasa
Takuya Yara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Publication of DE69719854D1 publication Critical patent/DE69719854D1/de
Application granted granted Critical
Publication of DE69719854T2 publication Critical patent/DE69719854T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H01J37/32027—DC powered
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H01J37/32045—Circuits specially adapted for controlling the glow discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32825—Working under atmospheric pressure or higher

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Chemical Vapour Deposition (AREA)
DE69719854T 1996-05-24 1997-05-23 Verfahren zur Plasmabehandlung und Apparat dafür Expired - Lifetime DE69719854T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP13012496 1996-05-24
JP25514396 1996-09-26

Publications (2)

Publication Number Publication Date
DE69719854D1 DE69719854D1 (de) 2003-04-24
DE69719854T2 true DE69719854T2 (de) 2003-11-20

Family

ID=26465321

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69719854T Expired - Lifetime DE69719854T2 (de) 1996-05-24 1997-05-23 Verfahren zur Plasmabehandlung und Apparat dafür
DE69734324T Expired - Lifetime DE69734324T2 (de) 1996-05-24 1997-05-23 Verfahren zur Plasmabehandlung und Apparat dafür

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69734324T Expired - Lifetime DE69734324T2 (de) 1996-05-24 1997-05-23 Verfahren zur Plasmabehandlung und Apparat dafür

Country Status (6)

Country Link
US (1) US5968377A (de)
EP (2) EP1265268B1 (de)
KR (1) KR100382562B1 (de)
AU (1) AU728494B2 (de)
CA (1) CA2205817C (de)
DE (2) DE69719854T2 (de)

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Also Published As

Publication number Publication date
EP0809275B1 (de) 2003-03-19
DE69734324D1 (de) 2005-11-10
US5968377A (en) 1999-10-19
DE69719854D1 (de) 2003-04-24
KR100382562B1 (ko) 2003-07-10
AU2359997A (en) 1997-11-27
EP1265268A1 (de) 2002-12-11
CA2205817C (en) 2004-04-06
KR970074970A (ko) 1997-12-10
EP1265268B1 (de) 2005-10-05
AU728494B2 (en) 2001-01-11
EP0809275A1 (de) 1997-11-26
CA2205817A1 (en) 1997-11-24
DE69734324T2 (de) 2006-07-06

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