DE69718113D1 - Strahlungsempfindliche Harzzusammensetzung - Google Patents
Strahlungsempfindliche HarzzusammensetzungInfo
- Publication number
- DE69718113D1 DE69718113D1 DE69718113T DE69718113T DE69718113D1 DE 69718113 D1 DE69718113 D1 DE 69718113D1 DE 69718113 T DE69718113 T DE 69718113T DE 69718113 T DE69718113 T DE 69718113T DE 69718113 D1 DE69718113 D1 DE 69718113D1
- Authority
- DE
- Germany
- Prior art keywords
- resin composition
- sensitive resin
- radiation sensitive
- radiation
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24553596 | 1996-08-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69718113D1 true DE69718113D1 (de) | 2003-02-06 |
DE69718113T2 DE69718113T2 (de) | 2003-10-09 |
Family
ID=17135147
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69718113T Expired - Lifetime DE69718113T2 (de) | 1996-08-28 | 1997-08-27 | Strahlungsempfindliche Harzzusammensetzung |
Country Status (4)
Country | Link |
---|---|
US (1) | US5958645A (de) |
EP (1) | EP0827024B1 (de) |
KR (1) | KR100465664B1 (de) |
DE (1) | DE69718113T2 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6708065B2 (en) | 2001-03-02 | 2004-03-16 | Cardiac Pacemakers, Inc. | Antenna for an implantable medical device |
KR20040092550A (ko) * | 2003-04-24 | 2004-11-04 | 클라리언트 인터내셔널 리미티드 | 레지스트 조성물 및 레지스트 제거용 유기용제 |
US7720544B2 (en) * | 2006-06-09 | 2010-05-18 | Cardiac Pacemakers, Inc. | Systems for enabling telemetry in an implantable medical device |
US7613522B2 (en) | 2006-06-09 | 2009-11-03 | Cardiac Pacemakers, Inc. | Multi-antenna for an implantable medical device |
US8710272B2 (en) | 2007-01-08 | 2014-04-29 | Androscience Corporation | Compounds with (1 E, 6E)-1,7-bis-(3,4-dimethoxyphenyl)-4,4-disubstituted-hepta-1,6-diene-3,5-dione structural scaffold, their biological activity, and uses thereof |
US9000222B2 (en) | 2007-01-08 | 2015-04-07 | Androscience Corporation | Compounds with (1E, 6E)-1,7-bis-(3,4-dimethoxyphenyl)-4,4-disubstituted-hepta-1,6-diene-3,5-dione structural scaffold, their biological activity, and uses thereof |
WO2008085984A1 (en) * | 2007-01-08 | 2008-07-17 | Androscience Corporation | Compounds with (substituted phenyl)-propenal moiety, their derivatives, biological activity, and uses thereof |
KR20100051808A (ko) | 2007-07-31 | 2010-05-18 | 앤드로사이언스 코포레이션 | 안드로겐 수용체 분해 강화제를 포함한 조성물 및 탈모와 피부질환의 예방 또는 치료 방법 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5334481A (en) * | 1985-05-02 | 1994-08-02 | Ciba-Geigy Corporation | Positive diazo quinone photoresist compositions containing antihalation compound |
US4818658A (en) * | 1987-04-17 | 1989-04-04 | Shipley Company Inc. | Photoactive esterification product of a diazooxide compound and a curcumin dye and photoresist materials with product |
JP2569705B2 (ja) * | 1988-03-24 | 1997-01-08 | 日本合成ゴム株式会社 | ポジ型ホトレジスト |
DE3842896C2 (de) * | 1988-04-22 | 1998-07-02 | Tokyo Ohka Kogyo Co Ltd | Positiv arbeitende lichtempfindliche Zusammensetzung |
JP3506295B2 (ja) * | 1995-12-22 | 2004-03-15 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版 |
-
1997
- 1997-08-27 EP EP97114862A patent/EP0827024B1/de not_active Expired - Lifetime
- 1997-08-27 DE DE69718113T patent/DE69718113T2/de not_active Expired - Lifetime
- 1997-08-27 US US08/917,727 patent/US5958645A/en not_active Expired - Lifetime
- 1997-08-28 KR KR1019970041852A patent/KR100465664B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
EP0827024A2 (de) | 1998-03-04 |
KR100465664B1 (ko) | 2005-01-17 |
EP0827024B1 (de) | 2003-01-02 |
DE69718113T2 (de) | 2003-10-09 |
KR19980019098A (ko) | 1998-06-05 |
EP0827024A3 (de) | 1998-05-13 |
US5958645A (en) | 1999-09-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |