DE69718113D1 - Strahlungsempfindliche Harzzusammensetzung - Google Patents

Strahlungsempfindliche Harzzusammensetzung

Info

Publication number
DE69718113D1
DE69718113D1 DE69718113T DE69718113T DE69718113D1 DE 69718113 D1 DE69718113 D1 DE 69718113D1 DE 69718113 T DE69718113 T DE 69718113T DE 69718113 T DE69718113 T DE 69718113T DE 69718113 D1 DE69718113 D1 DE 69718113D1
Authority
DE
Germany
Prior art keywords
resin composition
sensitive resin
radiation sensitive
radiation
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69718113T
Other languages
English (en)
Other versions
DE69718113T2 (de
Inventor
Kouichi Hirose
Masahiro Akiyama
Katsumi Inomata
Yoshiji Yumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Application granted granted Critical
Publication of DE69718113D1 publication Critical patent/DE69718113D1/de
Publication of DE69718113T2 publication Critical patent/DE69718113T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/0226Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69718113T 1996-08-28 1997-08-27 Strahlungsempfindliche Harzzusammensetzung Expired - Lifetime DE69718113T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24553596 1996-08-28

Publications (2)

Publication Number Publication Date
DE69718113D1 true DE69718113D1 (de) 2003-02-06
DE69718113T2 DE69718113T2 (de) 2003-10-09

Family

ID=17135147

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69718113T Expired - Lifetime DE69718113T2 (de) 1996-08-28 1997-08-27 Strahlungsempfindliche Harzzusammensetzung

Country Status (4)

Country Link
US (1) US5958645A (de)
EP (1) EP0827024B1 (de)
KR (1) KR100465664B1 (de)
DE (1) DE69718113T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6708065B2 (en) 2001-03-02 2004-03-16 Cardiac Pacemakers, Inc. Antenna for an implantable medical device
KR20040092550A (ko) * 2003-04-24 2004-11-04 클라리언트 인터내셔널 리미티드 레지스트 조성물 및 레지스트 제거용 유기용제
US7720544B2 (en) * 2006-06-09 2010-05-18 Cardiac Pacemakers, Inc. Systems for enabling telemetry in an implantable medical device
US7613522B2 (en) 2006-06-09 2009-11-03 Cardiac Pacemakers, Inc. Multi-antenna for an implantable medical device
US8710272B2 (en) 2007-01-08 2014-04-29 Androscience Corporation Compounds with (1 E, 6E)-1,7-bis-(3,4-dimethoxyphenyl)-4,4-disubstituted-hepta-1,6-diene-3,5-dione structural scaffold, their biological activity, and uses thereof
US9000222B2 (en) 2007-01-08 2015-04-07 Androscience Corporation Compounds with (1E, 6E)-1,7-bis-(3,4-dimethoxyphenyl)-4,4-disubstituted-hepta-1,6-diene-3,5-dione structural scaffold, their biological activity, and uses thereof
WO2008085984A1 (en) * 2007-01-08 2008-07-17 Androscience Corporation Compounds with (substituted phenyl)-propenal moiety, their derivatives, biological activity, and uses thereof
KR20100051808A (ko) 2007-07-31 2010-05-18 앤드로사이언스 코포레이션 안드로겐 수용체 분해 강화제를 포함한 조성물 및 탈모와 피부질환의 예방 또는 치료 방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5334481A (en) * 1985-05-02 1994-08-02 Ciba-Geigy Corporation Positive diazo quinone photoresist compositions containing antihalation compound
US4818658A (en) * 1987-04-17 1989-04-04 Shipley Company Inc. Photoactive esterification product of a diazooxide compound and a curcumin dye and photoresist materials with product
JP2569705B2 (ja) * 1988-03-24 1997-01-08 日本合成ゴム株式会社 ポジ型ホトレジスト
DE3842896C2 (de) * 1988-04-22 1998-07-02 Tokyo Ohka Kogyo Co Ltd Positiv arbeitende lichtempfindliche Zusammensetzung
JP3506295B2 (ja) * 1995-12-22 2004-03-15 富士写真フイルム株式会社 ポジ型感光性平版印刷版

Also Published As

Publication number Publication date
EP0827024A2 (de) 1998-03-04
KR100465664B1 (ko) 2005-01-17
EP0827024B1 (de) 2003-01-02
DE69718113T2 (de) 2003-10-09
KR19980019098A (ko) 1998-06-05
EP0827024A3 (de) 1998-05-13
US5958645A (en) 1999-09-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition