DE69716222D1 - Herstellungsverfahren zum zinnplattieren einer kupferröhre von innen - Google Patents

Herstellungsverfahren zum zinnplattieren einer kupferröhre von innen

Info

Publication number
DE69716222D1
DE69716222D1 DE69716222T DE69716222T DE69716222D1 DE 69716222 D1 DE69716222 D1 DE 69716222D1 DE 69716222 T DE69716222 T DE 69716222T DE 69716222 T DE69716222 T DE 69716222T DE 69716222 D1 DE69716222 D1 DE 69716222D1
Authority
DE
Germany
Prior art keywords
manufacturing
copper tube
tin plating
plating
tin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69716222T
Other languages
English (en)
Other versions
DE69716222T2 (de
Inventor
Junichi Ito
Tetsuro Atsumi
Makoto Yonemitsu
Yoshihiro Nishimoto
Hiroshi Okamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Light Metal Industries Ltd
Original Assignee
Sumitomo Light Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP8165397A external-priority patent/JP3005469B2/ja
Priority claimed from JP18869996A external-priority patent/JP3712245B2/ja
Application filed by Sumitomo Light Metal Industries Ltd filed Critical Sumitomo Light Metal Industries Ltd
Application granted granted Critical
Publication of DE69716222D1 publication Critical patent/DE69716222D1/de
Publication of DE69716222T2 publication Critical patent/DE69716222T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/54—Contact plating, i.e. electroless electrochemical plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1646—Characteristics of the product obtained
    • C23C18/165—Multilayered product
    • C23C18/1651—Two or more layers only obtained by electroless plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1675—Process conditions
    • C23C18/168—Control of temperature, e.g. temperature of bath, substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Chemically Coating (AREA)
DE69716222T 1996-06-05 1997-05-22 Herstellungsverfahren zum zinnplattieren einer kupferröhre von innen Expired - Lifetime DE69716222T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP8165397A JP3005469B2 (ja) 1996-06-05 1996-06-05 内面スズめっき長尺銅管の製造方法
JP16539796 1996-06-05
JP18869996 1996-06-27
JP18869996A JP3712245B2 (ja) 1996-06-27 1996-06-27 内面錫めっき銅管の製造方法
PCT/JP1997/001752 WO1997046732A1 (fr) 1996-06-05 1997-05-22 Procede de fabrication de tuyau de cuivre dont l'interieur est plaque a l'etain

Publications (2)

Publication Number Publication Date
DE69716222D1 true DE69716222D1 (de) 2002-11-14
DE69716222T2 DE69716222T2 (de) 2004-09-16

Family

ID=26490150

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69716222T Expired - Lifetime DE69716222T2 (de) 1996-06-05 1997-05-22 Herstellungsverfahren zum zinnplattieren einer kupferröhre von innen

Country Status (5)

Country Link
US (1) US6045860A (de)
EP (1) EP0848084B1 (de)
AU (1) AU2792697A (de)
DE (1) DE69716222T2 (de)
WO (1) WO1997046732A1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19653765A1 (de) * 1996-12-23 1998-06-25 Km Europa Metal Ag Innen verzinntes Kupferrohr und Verfahren zur Beschichtung eines Kupferrohrs
DE19749382A1 (de) * 1997-11-07 1999-05-27 Atotech Deutschland Gmbh Verzinnung von Kupferrohren
DE10003582A1 (de) * 2000-01-28 2001-08-02 Km Europa Metal Ag Verfahren zur Erzeugung einer Zinnschicht auf der inneren Oberfläche von Hohlbauteilen aus Kupferlegierungen
JP4493251B2 (ja) * 2001-12-04 2010-06-30 Ｔｏｔｏ株式会社 静電チャックモジュールおよび基板処理装置
DE10213185A1 (de) * 2002-03-23 2003-10-02 Km Europa Metal Ag Verfahren zur Verringerung der Kupferlöslichkeit an der inneren Oberfläche eines Kupferrohrs
JP3485561B1 (ja) * 2002-10-07 2004-01-13 東京エレクトロン株式会社 無電解メッキ方法および無電解メッキ装置
JP3602122B1 (ja) * 2003-10-15 2004-12-15 株式会社共立 内燃エンジン用シリンダのめっき方法及びめっき装置
FI120268B (fi) * 2003-12-12 2009-08-31 Cupori Group Oy Menetelmä putken pinnoittamiseksi
DE102006054761A1 (de) * 2006-11-14 2008-05-15 Hansgrohe Ag Bereitstellung von wasserführenden Bauteilen aus Messinglegierungen mit verringerter Metallionenfreisetzung
IT1395929B1 (it) * 2009-09-25 2012-11-02 Gruppo Cimbali Spa Procedimento per la riduzione del quantitativo di piombo, rilasciato da componenti idraulici in bronzo e/o in ottone in liquidi destinati al consumo umano.
ATE551443T1 (de) * 2009-09-25 2012-04-15 Gruppo Cimbali Spa Verfahren zur verringerung der bleimenge, die von wassersystemkomponenten aus bronze und/oder messing in flüssigkeiten abgegeben wird, die für den menschlichen verzehr bestimmt sind
JP5715411B2 (ja) * 2010-12-28 2015-05-07 ローム・アンド・ハース電子材料株式会社 めっき液中から不純物を除去する方法
US20140083322A1 (en) * 2012-09-24 2014-03-27 Rohm And Haas Electronic Materials Llc Method of removing impurities from plating liquid
JP6607106B2 (ja) * 2015-03-26 2019-11-20 三菱マテリアル株式会社 スルホニウム塩を用いためっき液
JP6476227B2 (ja) * 2017-03-31 2019-02-27 Ｊｘ金属株式会社 銅又は銅合金の板条並びにトラバースコイル及びその製造方法
GB2565276B (en) * 2017-07-27 2020-06-03 Oxford Nanosystems Ltd Electroless flow deposition process
US11054199B2 (en) 2019-04-12 2021-07-06 Rheem Manufacturing Company Applying coatings to the interior surfaces of heat exchangers
CN112899665A (zh) * 2021-01-19 2021-06-04 西安德宇机械科技有限公司 一种深孔化学镀镍工艺
CN114561633B (zh) * 2022-02-23 2023-11-14 吉安宏达秋科技有限公司 镀锡液及其制备方法和用于印制线路板的镀锡方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4511403A (en) * 1979-01-22 1985-04-16 Shipley Company Inc. Immersion tin composition and process for using
JPS59211566A (ja) * 1983-05-16 1984-11-30 Tokyo Mekki:Kk 無電解はんだめつき方法
NL8403033A (nl) * 1984-10-05 1986-05-01 Philips Nv Werkwijze voor het autokatalytisch vertinnen van voorwerpen van koper of een koperlegering.
DE3800918A1 (de) * 1988-01-14 1989-07-27 Siemens Ag Bad zur stromlosen zinnabscheidung
JPH03291385A (ja) * 1990-04-10 1991-12-20 Tashiro Denka Kogyo Kk 無電解錫―鉛合金めっき方法
US5266103A (en) * 1991-07-04 1993-11-30 C. Uyemura & Co., Ltd. Bath and method for the electroless plating of tin and tin-lead alloy
JP3071567B2 (ja) * 1992-06-09 2000-07-31 住友軽金属工業株式会社 銅材料の置換錫めっき処理方法
JP2804722B2 (ja) * 1994-10-26 1998-09-30 株式会社神戸製鋼所 銅又は銅合金管内面への錫めっき方法

Also Published As

Publication number Publication date
DE69716222T2 (de) 2004-09-16
EP0848084B1 (de) 2002-10-09
WO1997046732A1 (fr) 1997-12-11
AU2792697A (en) 1998-01-05
EP0848084A4 (de) 1999-01-27
EP0848084A1 (de) 1998-06-17
US6045860A (en) 2000-04-04

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Legal Events

Date Code Title Description
8332 No legal effect for de
8370 Indication related to discontinuation of the patent is to be deleted
8328 Change in the person/name/address of the agent

Representative=s name: MUELLER-WOLFF, T., DIPL.-ING., PAT.-ANW., 53113 BON

8364 No opposition during term of opposition