DE69402820D1 - Verfahren zum Ätzen einer Metallfolie - Google Patents
Verfahren zum Ätzen einer MetallfolieInfo
- Publication number
- DE69402820D1 DE69402820D1 DE69402820T DE69402820T DE69402820D1 DE 69402820 D1 DE69402820 D1 DE 69402820D1 DE 69402820 T DE69402820 T DE 69402820T DE 69402820 T DE69402820 T DE 69402820T DE 69402820 D1 DE69402820 D1 DE 69402820D1
- Authority
- DE
- Germany
- Prior art keywords
- etching
- metal foil
- foil
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/04—Etching of light metals
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12389—All metal or with adjacent metals having variation in thickness
- Y10T428/12396—Discontinuous surface component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12472—Microscopic interfacial wave or roughness
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Physical Vapour Deposition (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/187,085 US5405493A (en) | 1994-01-26 | 1994-01-26 | Method of etching aluminum foil |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69402820D1 true DE69402820D1 (de) | 1997-05-28 |
DE69402820T2 DE69402820T2 (de) | 1997-09-04 |
Family
ID=22687552
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69402820T Expired - Fee Related DE69402820T2 (de) | 1994-01-26 | 1994-12-12 | Verfahren zum Ätzen einer Metallfolie |
Country Status (6)
Country | Link |
---|---|
US (1) | US5405493A (de) |
EP (1) | EP0665310B1 (de) |
JP (1) | JP2723478B2 (de) |
KR (1) | KR100247101B1 (de) |
DE (1) | DE69402820T2 (de) |
TW (1) | TW289118B (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6224738B1 (en) | 1999-11-09 | 2001-05-01 | Pacesetter, Inc. | Method for a patterned etch with electrolytically grown mask |
US7578924B1 (en) | 2004-07-29 | 2009-08-25 | Pacesetter, Inc. | Process for producing high etch gains for electrolytic capacitor manufacturing |
US7531078B1 (en) | 2005-01-13 | 2009-05-12 | Pacesetter, Inc. | Chemical printing of raw aluminum anode foil to induce uniform patterning etching |
AR074508A1 (es) * | 2008-12-08 | 2011-01-19 | Grace Gmbh & Co Kg | Particulas anticorrosivas |
US20130248486A1 (en) * | 2012-03-23 | 2013-09-26 | Apple Inc. | Electron beam polishing of aluminum |
US10384299B2 (en) | 2013-06-26 | 2019-08-20 | Apple Inc. | Electron beam conditioning |
CN104357886B (zh) * | 2014-10-30 | 2017-10-17 | 广西贺州桂海铝业科技有限公司 | 中高压阳极用高纯铝箔表面化学沉积弥散锡、锌晶核的方法 |
US10072349B2 (en) | 2016-01-05 | 2018-09-11 | Pacesetter, Inc. | Etch solutions having bis(perfluoroalkylsulfonyl)imides, and use thereof to form anode foils with increased capacitance |
US10309033B2 (en) | 2016-12-02 | 2019-06-04 | Pacesetter, Inc. | Process additives to reduce etch resist undercutting in the manufacture of anode foils |
US10240249B2 (en) | 2016-12-02 | 2019-03-26 | Pacesetter, Inc. | Use of nonafluorobutanesulfonic acid in a low pH etch solution to increase aluminum foil capacitance |
US10422050B2 (en) | 2016-12-02 | 2019-09-24 | Pacesetter, Inc. | Process for using persulfate in a low pH etch solution to increase aluminum foil capacitance |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL282834A (de) * | 1961-09-15 | |||
JPS5452637A (en) * | 1977-10-05 | 1979-04-25 | Iwatsu Electric Co Ltd | Electrolytic etching method |
DE2758155A1 (de) * | 1977-12-27 | 1979-06-28 | Siemens Ag | Verfahren zur herstellung eines elektrolytkondensators |
US4437955A (en) * | 1983-07-05 | 1984-03-20 | U.S. Philips Corporation | Combined AC and DC etching of aluminum foil |
US4676879A (en) * | 1985-04-12 | 1987-06-30 | Becromal S.P.A. | Method for the production of an aluminum foil for electrolytic _capacitors, and electrolytic capacitors thus produced |
DD247990A1 (de) * | 1986-04-07 | 1987-07-22 | Gera Elektronik Veb | Verfahren zum aetzen von aluminiumfolie fuer elektrolytkondensatoren |
DE3917425A1 (de) * | 1989-05-29 | 1990-12-06 | Siemens Ag | Verfahren zum herstellen von elektrodenfolien fuer insbesondere hochvolt-elektrolytkondensatoren |
JPH061688A (ja) * | 1992-06-22 | 1994-01-11 | Nkk Corp | 粒状ドープ剤供給装置及び方法 |
-
1994
- 1994-01-26 US US08/187,085 patent/US5405493A/en not_active Expired - Fee Related
- 1994-12-12 EP EP94309264A patent/EP0665310B1/de not_active Expired - Lifetime
- 1994-12-12 DE DE69402820T patent/DE69402820T2/de not_active Expired - Fee Related
- 1994-12-13 TW TW083111624A patent/TW289118B/zh not_active IP Right Cessation
-
1995
- 1995-01-23 KR KR1019950001054A patent/KR100247101B1/ko not_active IP Right Cessation
- 1995-01-26 JP JP7010720A patent/JP2723478B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR950027009A (ko) | 1995-10-16 |
DE69402820T2 (de) | 1997-09-04 |
EP0665310A1 (de) | 1995-08-02 |
JPH0841698A (ja) | 1996-02-13 |
KR100247101B1 (ko) | 2000-04-01 |
EP0665310B1 (de) | 1997-04-23 |
US5405493A (en) | 1995-04-11 |
JP2723478B2 (ja) | 1998-03-09 |
TW289118B (de) | 1996-10-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: NIPPON CHEMI-CON CORP., OME, TOKIO/TOKYO, JP |
|
8339 | Ceased/non-payment of the annual fee |