CN112899665A - 一种深孔化学镀镍工艺 - Google Patents
一种深孔化学镀镍工艺 Download PDFInfo
- Publication number
- CN112899665A CN112899665A CN202110071430.2A CN202110071430A CN112899665A CN 112899665 A CN112899665 A CN 112899665A CN 202110071430 A CN202110071430 A CN 202110071430A CN 112899665 A CN112899665 A CN 112899665A
- Authority
- CN
- China
- Prior art keywords
- deep hole
- plating
- solution
- plated part
- nickel plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 264
- 238000007747 plating Methods 0.000 title claims abstract description 245
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 132
- 238000000034 method Methods 0.000 title claims abstract description 65
- 239000000126 substance Substances 0.000 title claims abstract description 52
- 238000005406 washing Methods 0.000 claims abstract description 28
- 238000002791 soaking Methods 0.000 claims abstract description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000002253 acid Substances 0.000 claims abstract description 10
- 238000001035 drying Methods 0.000 claims abstract description 8
- 238000011010 flushing procedure Methods 0.000 claims abstract description 5
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000000243 solution Substances 0.000 claims description 125
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 28
- 239000008399 tap water Substances 0.000 claims description 23
- 235000020679 tap water Nutrition 0.000 claims description 23
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 18
- 238000005238 degreasing Methods 0.000 claims description 14
- 229910001220 stainless steel Inorganic materials 0.000 claims description 14
- 239000010935 stainless steel Substances 0.000 claims description 14
- 239000011259 mixed solution Substances 0.000 claims description 12
- 239000000843 powder Substances 0.000 claims description 9
- 238000009713 electroplating Methods 0.000 claims description 8
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims description 7
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 7
- 238000005554 pickling Methods 0.000 claims description 6
- 238000005498 polishing Methods 0.000 claims description 6
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 5
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 12
- 239000010410 layer Substances 0.000 description 17
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 10
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 229910001453 nickel ion Inorganic materials 0.000 description 7
- 239000004312 hexamethylene tetramine Substances 0.000 description 5
- 235000010299 hexamethylene tetramine Nutrition 0.000 description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- 238000005485 electric heating Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000005201 scrubbing Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 238000004321 preservation Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000004448 titration Methods 0.000 description 2
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- BVCZEBOGSOYJJT-UHFFFAOYSA-N ammonium carbamate Chemical compound [NH4+].NC([O-])=O BVCZEBOGSOYJJT-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000861 blow drying Methods 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N carbonic acid monoamide Natural products NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- -1 hydroxyl ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 239000006179 pH buffering agent Substances 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1617—Purification and regeneration of coating baths
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1806—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by mechanical pretreatment, e.g. grinding, sanding
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1824—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
- C23C18/1837—Multistep pretreatment
- C23C18/1844—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electrochemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
本申请涉及一种深孔化学镀镍工艺,其包括如下步骤:1)镀件表面处理,2)化学除油,3)酸洗对镀件进行除锈,4)对镀件进行化学镀镍,将镀件放入镀液中浸泡进行镀镍,在镀镍过程中,先将细长管伸入至镀件的深孔内,再将镀液通过泵注入到深孔内,使得深孔内的镀液持续循环流动,每10‑20min使深孔内镀液的流向换向一次,持续镀镍完成后通过冷水冲洗,再通过热水烫洗,最后烘干即可。本申请具有提高深孔内镀镍质量的效果。
Description
技术领域
本申请涉及镀镍技术领域,尤其是涉及一种深孔化学镀镍工艺。
背景技术
通过在金属或某些非金属上沉积一层镍的方法,称为镀镍。镀镍分电镀镍和化学镀镍。电镀镍是在由镍盐、导电盐、pH缓冲剂、润湿剂组成的电解液中,阳极用金属镍,阴极为镀件,通以直流电,在阴极(镀件)上沉积上一层均匀、致密的镍镀层。化学镀镍又称为无电解镀镍,也可以称为自催化电镀镍,是指在一定条件下水溶液中的镍离子被还原剂还原,并且沉淀到固态基体表面上的过程。
通常在镀件表面进行镀镍(镀层厚度一般为27-35μm),在镀件表面形成保护膜,而对于一些镀件上会带有深孔(孔深与孔径比大于5)在工件表面镀镍的过程中,为避免镀件深孔内腔生锈,常常需要对其内腔也进行镀层处理,一般通常采用化学镀对深孔内进行镀镍处理,通常将带有深孔的镀件直接浸泡在镀液中,使镀液直接注入到深孔内,使镀液与深孔的内壁发生反应,生产一层保护膜。
针对上述中的相关技术,发明人认为存在以下缺陷:对带有深孔的镀件进行镀镍时,由于深孔内腔尺寸小,内孔较长,深孔内镀液的量有限,或内存在空腔,随着镀镍过程中对镀液中镍离子的消耗,降低了化学镀的效果,使得深孔内的镀层较薄或漏镀,导致镀镍质量较差。
发明内容
为了提高对深孔内的镀镍质量,本申请提供一种深孔化学镀镍工艺。
本申请提供一种深孔化学镀镍工艺,采用如下的技术方案:
一种深孔化学镀镍工艺,包括如下步骤:
1)镀件处理:对镀件表面以及镀件的深孔内进行打磨,去除氧化皮;
2)化学除油:将镀件浸泡在除油粉溶液中进行除油后,再通过自来水冲洗;
3)酸洗:将镀件在盐酸溶液中浸泡除去铁锈,再通过自来水冲洗,然后在硫酸溶液中浸泡去除氯离子,再通过自来水冲洗;
4)化学镀镍:将镀件放入镀液中浸泡进行镀镍,在镀镍过程中,先将细长管伸入至镀件的深孔内,再将镀液通过泵注入到深孔内,使得深孔内的镀液持续循环流动,每10-20min使深孔内镀液的流向换向一次,持续镀镍完成后通过冷水冲洗,再通过热水烫洗,最后烘干即可。
通过采用上述技术方案,首先通过对镀件表面处理,去除镀件表面的氧化皮,使镀件基材露出,在通过化学除油以及酸洗过程,出去镀件表面的油污以及铁锈,提高镀件镀镍时的结合强度,在对镀件进行化学镀镍时,通过细长管将镀液通过泵送入镀件深孔内,使得镀件深孔内的镀液持续循环流动,在镀镍过程中,保证深孔内镀液的质量,即保证深孔内镀液中镍离子的含量,进而提高镀镍质量,通过对深孔内镀液的流向定时持续换向,提高镀液的均匀性,杜绝空腔漏镀,进一步提高镀镍质量。
进一步优选为,步骤4)中,在将镀液通过细长管注入镀件深孔内时,当镀件深孔的体积为V时,镀液流量为20-30%V/min。
通过采用上述技术方案,通过控制细长管输送镀液的流量,来间接控制深孔内水流的速度,避免镀液流动过快或过慢而影响镀镍效果。
进一步优选为,步骤4)中,将镀液进行加热后保温,镀液温度为85-90℃,pH值为4.7-5.0。
通过采用上述技术方案,通过控制镀液的pH值,提高镀液质量,进而提高镀镍效果,当pH值过高时,溶液呈碱性,镍离子的质量浓度易降低即损失块,而氢氧根离子的质量浓度高,生成的氢氧化物沉淀会附着在镀件的表面而影响镀镍质量。
进一步优选为,当pH值低于4.7时,用氨水溶液将pH调至正常范围,当pH值高于5.0时,用稀硫酸下调至正常范围。
通过采用上述技术方案,通过氨水溶液以及稀硫酸溶液,方便对镀液的pH进行调节,保证镀液的pH值在可取范围内,且在通过调节pH值来控制镍离子的消耗量,避免与游离镍离子结合形成沉淀而影响镀镍效果。
进一步优选为,步骤4)中,镀镍过程中,对镀液进行连续过滤处理,滤孔的孔径为5-6μm。
通过采用上述技术方案,通过对镀液尺度进行过滤,可将镀液中的杂质以及沉淀物进行过滤,避免这些杂质以及产生的沉淀物沉积在镀件表面而影响镀件的质量。
进一步优选为,当镀件为不锈钢材质时,通过步骤3)酸洗完成后,在对镀件进行预镀冲击镍:在130-150ml/L的盐酸与200-220g/L的氯化镍的混合溶液中电镀5±0.5min,电压为7-10V,再采用自来水在室温下冲洗。
通过采用上述技术方案,由于不锈钢材质表面耐氧化性较强,通过采用电镀的形式首先在表面电镀一层镍,提高镀镍时镍层与镀件表面的结合强度,进而提高对镀件的镀镍质量。
进一步优选为,在步骤2)中,除油粉溶液的浓度为50-60g/L,在除油粉溶液温度为65-70℃的条件下,将镀件浸泡120-150min。
通过采用上述技术方案,提高对镀件表面的除油效果,提高镀件表面的除油效率。
进一步优选为,在对镀件进行化学除油、酸洗的过程中,均通过细长管将溶液通过泵注入深孔内,使溶液在镀件深孔内持续循环流动。
通过采用上述技术方案,对镀件进行处理时,使溶液在镀件深孔内持续循环流动提高对镀件深孔内的处理效果,提高对深孔内的除油以及除锈效果,避免深孔内的油污等影响镀镍质量,提高镀件镀层的附着强度。
综上所述,本申请包括以下至少一种有益技术效果:
1.在对镀件进行时,通过细长管将镀液通过泵送入镀件深孔内,使得镀件深孔内的镀液持续循环流动,保证深孔内镀液的质量,即保证深孔内镀液中镍离子的含量,进而提高镀镍质量;
2.当镀件深孔的体积为V时,通过控制镀液流量为20-30%V/min,来间接控制深孔内水流的速度,避免镀液流动过快或过慢而影响镀镍效果;
3.当镀件为不锈钢材质时,将镀件进行酸洗后,先对镀件进行预镀冲击镍,提高镀镍时镍层与镀件表面的结合强度,进而提高对镀件的镀镍质量。
具体实施方式
下面结合实施例,对本申请进行详细描述。
以下实施例和对照例中使用的高磷化学镍WT-878-A、高磷化学镍WT-878-B购自广州美迪斯新材料有限公司;钢件化学除油粉购自广东比格莱科技有限公司的BC-17。
实施例1:一种深孔化学镀镍工艺,包括如下步骤:
1)镀件处理:对镀件表面以及镀件的深孔内通过打磨机进行打磨,去除氧化皮;
2)化学除油:将镀件浸泡在50g/L的钢件化学除油粉溶液中进行除油,温度为65℃,时间为120min,再通过自来水在室温下冲洗2min,最后再通过自来水擦洗3min;
3)酸洗:将镀件在300ml/L的盐酸与3g/L的六次甲基四胺的混合溶液中在室温下浸泡5min,再通过自来水冲洗2min,然后在8%的硫酸中浸泡2min,再通过自来水冲洗2min;
4)预镀冲击镍:在130ml/L的盐酸与200g/L的氯化镍溶液中电镀5±1min,电压为7V,再通过自来水在室温下冲洗2min;
5)化学镀镍:将镀件放入镀液中浸泡进行镀镍,将镀液通过电加热管进行加热后保温,镀液温度为85℃,pH值为4.7-5.0;在镀镍过程中,先将细长管伸入至镀件的深孔内,再将镀液通过泵注入到深孔内,使得深孔内的镀液持续循环流动,当镀件深孔的体积为V时,镀液流量为10%V/min;当为多孔时,通过多根细长管分别对深孔同时进行注液,每10min使深孔内镀液的流向换向一次,持续镀镍3.5h;镀镍过程中,对镀液通过过滤机进行连续过滤处理,滤孔的孔径为5μm,完成后先通过冷水冲洗2min,再通过70℃的热水烫洗1min,最后通过电石英管将烘房升温至200℃下保温,对镀件烘干8h即可。
在化学镀镍时,当镀液的pH值低于4.7时,采用氨水与水的体积比为1:1的溶液调pH值到正常范围,当pH值高于5.0时,采用质量分数为20%的稀硫酸调pH到正常范围。
在化学镀镍的过程中,持续对镀液中镍含量进行调整,包括如下步骤:
a)取10mL镀液加入100mL的去离子水中,得到镀液稀释液;
b)在镀液稀释液中加入10mL浓氨水,摇匀;
c)最后再在镀液稀释液中加入0.02g紫脲酸铵指示剂,继续摇匀得到分析液;
d)用标定后的0.1mol/L的EDTA标准溶液滴定至棕色转为紫色为终点,镍含量(g/L)=5.87MV,式中:M—EDTA溶液的摩尔浓度,V—耗用EDTA的毫升数;最后根据滴定结果对镀液中添加A液(硫酸镍)和C液(次磷酸钠),添加比例如下表1:
表1
本实施例中,镀液包括以下组分组成:高磷化学镍WT-878-A、高磷化学镍WT-878-B以及去离子水,高磷化学镍WT-878-A的浓度为60ml/L、高磷化学镍WT-878-B的浓度为150ml/L;镀件为不锈钢材质。
实施例2:一种深孔化学镀镍工艺,与实施例1的不同之处在于,包括如下步骤:
1)镀件处理:对镀件表面以及镀件的深孔内通过打磨机进行打磨,去除氧化皮;
2)化学除油:将镀件浸泡在55g/L的钢件化学除油粉溶液中进行除油,温度为68℃,时间为130min,再通过自来水在室温下冲洗2.5min,最后再通过自来水擦洗2.5min;
3)酸洗:将镀件在330ml/L的盐酸与4g/L的六次甲基四胺的混合溶液中在室温下浸泡8min,再通过自来水冲洗3min,然后在10%的硫酸中浸泡2.5min,再通过自来水冲洗2.5min;
4)预镀冲击镍:在140ml/L的盐酸与210g/L的氯化镍溶液中电镀5±1min,电压为8V,再通过自来水在室温下冲洗2.5min;
5)化学镀镍:将镀件放入镀液中浸泡进行镀镍,将镀液通过电加热管进行加热后保温,镀液温度为87℃,pH值为4.7-5.0;在镀镍过程中,先将细长管伸入至镀件的深孔内,再将镀液通过泵注入到深孔内,使得深孔内的镀液持续循环流动,当镀件深孔的体积为V时,镀液流量为10%V/min;当为多孔时,通过多根细长管分别对深孔同时进行注液,每10min使深孔内镀液的流向换向一次,持续镀镍3.7h;镀镍过程中,对镀液通过过滤机进行连续过滤处理,滤孔的孔径为5μm,完成后先通过冷水冲洗3min,再通过75℃的热水烫洗2min,最后通过电石英管将烘房升温至200℃下保温,对镀件烘干8.5h即可。
实施例3:一种深孔化学镀镍工艺,与实施例1的不同之处在于,包括如下步骤:
1)镀件处理:对镀件表面以及镀件的深孔内通过打磨机进行打磨,去除氧化皮;
2)化学除油:将镀件浸泡在60g/L的钢件化学除油粉溶液中进行除油,温度为70℃,时间为150min,再通过自来水在室温下冲洗3min,最后再通过自来水擦洗3min;
3)酸洗:将镀件在350ml/L的盐酸与5g/L的六次甲基四胺的混合溶液中在室温下浸泡10min,再通过自来水冲洗3min,然后在9%的硫酸中浸泡3min,再通过自来水冲洗3min;
4)预镀冲击镍:在150ml/L的盐酸与220g/L的氯化镍溶液中电镀5min,电压为10V,再通过自来水在室温下冲洗3min;
5)化学镀镍:将镀件放入镀液中浸泡进行镀镍,将镀液通过电加热管进行加热后保温,镀液温度为90℃,pH值为4.7-5.0;在镀镍过程中,先将细长管伸入至镀件的深孔内,再将镀液通过泵注入到深孔内,使得深孔内的镀液持续循环流动,当镀件深孔的体积为V时,镀液流量为10%V/min;当为多孔时,通过多根细长管分别对深孔同时进行注液,每10min使深孔内镀液的流向换向一次,持续镀镍4h;镀镍过程中,对镀液通过过滤机进行连续过滤处理,滤孔的孔径为5μm,完成后先通过冷水冲洗3min,再通过80℃的热水烫洗2min,最后通过电石英管将烘房升温至200℃下保温,对镀件烘干9h即可。
实施例4:一种深孔化学镀镍工艺,与实施例1的不同之处在于,步骤5)中,每15min使深孔内镀液的流向换向一次。
实施例5:一种深孔化学镀镍工艺,与实施例1的不同之处在于,步骤5)中,每20min使深孔内镀液的流向换向一次。
实施例6:一种深孔化学镀镍工艺,与实施例1的不同之处在于,当镀件深孔的体积为V时,镀液流量为20%V/min。
实施例7:一种深孔化学镀镍工艺,与实施例1的不同之处在于,当镀件深孔的体积为V时,镀液流量为25%V/min。
实施例8:一种深孔化学镀镍工艺,与实施例1的不同之处在于,当镀件深孔的体积为V时,镀液流量为30%V/min。
实施例9:一种深孔化学镀镍工艺,与实施例1的不同之处在于,当镀件深孔的体积为V时,镀液流量为40%V/min。
实施例10:一种深孔化学镀镍工艺,与实施例1的不同之处在于,对镀件不进行步骤4)的预镀冲击镍。
实施例11:一种深孔化学镀镍工艺,与实施例1的不同之处在于,在对镀件进行化学除油过程中,亦通过细长管将盐酸与氯化镍的混合溶液通过泵注入深孔内,使混合溶液在镀件深孔内持续循环流动。
实施例12:一种深孔化学镀镍工艺,与实施例1的不同之处在于,在对镀件进行酸洗过程中,亦通过细长管将盐酸溶液与六次甲基四胺的混合溶液通过泵注入深孔内,使混合溶液在镀件深孔内持续循环流动。
实施例13:一种深孔化学镀镍工艺,与实施例1的不同之处在于,在对镀件进行化学除油过程中,通过细长管将盐酸与氯化镍的混合溶液通过泵注入深孔内,使溶液在镀件深孔内持续循环流动;在对镀件进行酸洗过程中,亦通过细长管将盐酸溶液与六次甲基四胺的混合溶液通过泵注入深孔内,使溶液在镀件深孔内持续循环流动。
实施例14:一种深孔化学镀镍工艺,与实施例1的不同之处在于,镀件的材质为铝,且对镀件不进行步骤4)的预镀冲击镍。
对比例1:一种深孔化学镀镍工艺,与实施例1的不同之处在于,步骤5)中,对深孔内镀液的流向始终不变。
对比例2:一种深孔化学镀镍工艺,与实施例1的不同之处在于,步骤5)为,化学镀镍:将镀件放入镀液中浸泡进行镀镍,持续镀镍3.5h,完成后先通过冷水冲洗2min,再通过70℃的热水烫洗1min,最后通过电石英管将烘房升温至200℃下保温,对镀件烘干8h即可。
性能测试试验
镀件为不锈钢管,不锈钢管的孔径为2cm、长度为15cm,取13根相通规格的不锈钢管,通过实施例1-11及对比例1-2的镀镍工艺分别对不锈钢管进行镀镍处理。
实验方法:
一、镀层厚度测量
将镀镍后的不锈钢管用线切割方法沿轴向切开,对横断面进行细致打磨、抛光,然后在酒精溶液中超声波清洗,吹干后,在VEGA3 TESCAN型电子显微镜下测量不锈钢管内侧的镀层厚度,在不锈钢管端面每相距3cm测量厚度,取其平均值作为该镀件的镀层的厚度。
二、镀层的附着强度
用硬质刚刀在不锈钢管内侧表面划相距2mm的平行线,划出20条线,划线时的压力使划刀一次划破镀层直达基材,用4-8倍放大镜观察划线间的镀层翘起或剥离的个数。
检测结果:测得不同镀件镀层的厚度、镀层翘起以及剥离的个数如表2。
表2实施例1-14、对比例1-2试验检测结果
实验结果分析:
由表2可知,结合实施例1-9进行比较,实施例6-8的镀层厚度明显高于实施例1-5以及实施例9的镀层厚度,说明在对深孔内进行镀镍时,通过细长管注入深孔内镀液的流量过下或过大均会影响镀层的厚度,进而提过对注入深孔内镀液的流量进行控制,可有效提高镀件的深孔内的镀镍质量。
结合实施例1与实施例10进行比较,实施例10的翘起与剥离的数量明显多于实施例1的翘起与剥离数量,说明对不锈钢镀件进行镀镍时,对镀件进行预镀冲击镍,可有效提高镀件镀层的附着强度,进而提高镀件的镀镍效果。对实施例1与实施例14进行比较,当对镀件为铝材质时,不对镀件进行预镀冲击镍亦可保证镀件的镀镍效果。
结合实施例1以及实施例11-13进行比较,对镀件在酸洗以及除油过程中,通过细长管将混合液通过泵注入深孔内,使溶液在镀件深孔内持续循环流动,均可提高镀件镀层的附着强度。
结合实施例1与对比例1进行比较,对镀件镀镍时,对镀件深孔内镀液的流向定时进行换向时,可有效提高镀件镀层的厚度,提高镀镍质量。结合实施例1与对比例2进行比较,当对镀件镀镍时,通过细长管将混合液通过泵注入深孔内,使深孔内的镀液持续循环流动,有效提高深孔内的镀镍质量。
以上均为本申请的较佳实施例,并非依此限制本申请的保护范围,故:凡依本申请的结构、形状、原理所做的等效变化,均应涵盖于本申请的保护范围之内。
Claims (8)
1.一种深孔化学镀镍工艺,其特征在于:包括如下步骤:
1)镀件处理:对镀件表面以及镀件的深孔内进行打磨,去除氧化皮;
2)化学除油:将镀件浸泡在除油粉溶液中进行除油后,再通过自来水冲洗;
3)酸洗:将镀件在盐酸溶液中浸泡除去铁锈,再通过自来水冲洗,然后在硫酸溶液中浸泡去除氯离子,再通过自来水冲洗;
4)化学镀镍:将镀件放入镀液中浸泡进行镀镍,在镀镍过程中,先将细长管伸入至镀件的深孔内,再将镀液通过泵注入到深孔内,使得深孔内的镀液持续循环流动,每10-20min使深孔内镀液的流向换向一次,持续镀镍完成后通过冷水冲洗,再通过热水烫洗,最后烘干即可。
2.根据权利要求1所述的一种深孔化学镀镍工艺,其特征在于:步骤4)中,在将镀液通过细长管注入镀件深孔内时,当镀件深孔的体积为V时,镀液流量为20-30%V/min。
3.根据权利要求1所述的一种深孔化学镀镍工艺,其特征在于:步骤4)中,将镀液进行加热后保温,镀液温度为85-90℃,pH值为4.7-5.0。
4.根据权利要求3所述的一种深孔化学镀镍工艺,其特征在于:当pH值低于4.7时,用氨水溶液将pH调至正常范围,当pH值高于5.0时,用稀硫酸下调至正常范围。
5.根据权利要求1所述的一种深孔化学镀镍工艺,其特征在于:步骤4)中,镀镍过程中,对镀液进行连续过滤处理,滤孔的孔径为5-6μm。
6.根据权利要求1所述的一种深孔化学镀镍工艺,其特征在于:当镀件为不锈钢材质时,通过步骤3)酸洗完成后,在对镀件进行预镀冲击镍:在130-150ml/L的盐酸与200-220g/L的氯化镍的混合溶液中电镀5±0.5min,电压为7-10V,再采用自来水在室温下冲洗。
7.根据权利要求1所述的一种深孔化学镀镍工艺,其特征在于:在步骤2)中,除油粉溶液的浓度为50-60g/L,在除油粉溶液温度为65-70℃的条件下,将镀件浸泡120-150min。
8.根据权利要求1所述的一种深孔化学镀镍工艺,其特征在于:在对镀件进行化学除油、酸洗的过程中,均通过细长管将溶液通过泵注入深孔内,使溶液在镀件深孔内持续循环流动。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110071430.2A CN112899665A (zh) | 2021-01-19 | 2021-01-19 | 一种深孔化学镀镍工艺 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110071430.2A CN112899665A (zh) | 2021-01-19 | 2021-01-19 | 一种深孔化学镀镍工艺 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN112899665A true CN112899665A (zh) | 2021-06-04 |
Family
ID=76116059
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202110071430.2A Pending CN112899665A (zh) | 2021-01-19 | 2021-01-19 | 一种深孔化学镀镍工艺 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN112899665A (zh) |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1064898A (zh) * | 1991-03-09 | 1992-09-30 | 中国石油化工总公司金陵石油化工公司 | 金属长管内表面化学镀的方法 |
CN1102862A (zh) * | 1994-02-04 | 1995-05-24 | 中国石化金陵石油化工公司 | 一种槽外化学镀的方法及设备 |
US6045860A (en) * | 1996-06-05 | 2000-04-04 | Sumitomo Light Metal Industries, Ltd. | Process for manufacturing interior tinned copper tube |
CN1873053A (zh) * | 2005-05-31 | 2006-12-06 | 李樟弟 | 铅黄铜笔尖的酸性镀镍磷工艺 |
CN102002690A (zh) * | 2010-12-15 | 2011-04-06 | 重庆远达催化剂制造有限公司 | 金属表面化学镀镍方法 |
CN106835090A (zh) * | 2017-03-14 | 2017-06-13 | 北京中纺精业机电设备有限公司 | 一种深孔镀膜装置 |
CN106906457A (zh) * | 2015-12-22 | 2017-06-30 | 佳木斯大学 | 用于注塑模具冷却管道防腐层的制备工艺 |
CN109518235A (zh) * | 2019-01-10 | 2019-03-26 | 江西凤凰光学科技有限公司 | 一种光学模仁镀镍工艺 |
-
2021
- 2021-01-19 CN CN202110071430.2A patent/CN112899665A/zh active Pending
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1064898A (zh) * | 1991-03-09 | 1992-09-30 | 中国石油化工总公司金陵石油化工公司 | 金属长管内表面化学镀的方法 |
CN1102862A (zh) * | 1994-02-04 | 1995-05-24 | 中国石化金陵石油化工公司 | 一种槽外化学镀的方法及设备 |
US6045860A (en) * | 1996-06-05 | 2000-04-04 | Sumitomo Light Metal Industries, Ltd. | Process for manufacturing interior tinned copper tube |
CN1873053A (zh) * | 2005-05-31 | 2006-12-06 | 李樟弟 | 铅黄铜笔尖的酸性镀镍磷工艺 |
CN102002690A (zh) * | 2010-12-15 | 2011-04-06 | 重庆远达催化剂制造有限公司 | 金属表面化学镀镍方法 |
CN106906457A (zh) * | 2015-12-22 | 2017-06-30 | 佳木斯大学 | 用于注塑模具冷却管道防腐层的制备工艺 |
CN106835090A (zh) * | 2017-03-14 | 2017-06-13 | 北京中纺精业机电设备有限公司 | 一种深孔镀膜装置 |
CN109518235A (zh) * | 2019-01-10 | 2019-03-26 | 江西凤凰光学科技有限公司 | 一种光学模仁镀镍工艺 |
Non-Patent Citations (1)
Title |
---|
卫英慧等: "《镁合金腐蚀防护的理论与实践》", 冶金工业出版社 * |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6004181B2 (ja) | 陽極酸化皮膜及びその製造方法 | |
CN109256256B (zh) | 一种表面电镀锌镍合金的钕铁硼磁体及其制备工艺 | |
CN111471997A (zh) | 含层状双氢氧化物复合涂镀层的金属材料及其制备方法 | |
CN113512742B (zh) | 一种高温合金表面的预处理方法和一种高温合金表面电沉积的方法 | |
CN112899665A (zh) | 一种深孔化学镀镍工艺 | |
CN109518239B (zh) | 一种烧结钕铁硼材料的电镀方法 | |
EP3059335A2 (en) | Surface modifiers for ionic liquid aluminum electroplating solutions, processes for electroplating aluminum therefrom, and methods for producing an aluminum coating using the same | |
US3841979A (en) | Method of preparing surfaces for electroplating | |
KR102143590B1 (ko) | 열충격에 강한 피막 형성을 위한 아노다이징 표면 처리 공정 | |
CN114016100A (zh) | Mems探针表面超硬耐磨电镀涂层的制备方法 | |
KR102403878B1 (ko) | 옥살산 아노다이징에서 알루미늄 합금의 후처리 방법 및 이 방법으로 제조된 알루미늄 합금 | |
CN113481558A (zh) | 磁体表面处理方法及镀镍方法 | |
Taherkhani et al. | The Effect of Electroplating Time on Microstructural Properties and Hardness of Silver Coating on C10100 Alloy | |
RU2509832C2 (ru) | Способ гальванического нанесения металлических покрытий | |
RU2709913C1 (ru) | Способ нанесения гальванических покрытий на сложнопрофильные детали | |
CN114086229B (zh) | 一种制备吸液芯的槽液和吸液芯的制备方法 | |
KR102599930B1 (ko) | 양극산화 처리된 알루미늄계 소재용 정전기 방지 봉공처리액 및 이를 이용한 봉공처리방법 | |
CN109338421A (zh) | 一种耐高温化学热处理的无氰镀铜工艺 | |
CN108486554A (zh) | 一种在半导体硅器件上化学镀Ni、Au的工艺 | |
WO2017195430A1 (ja) | 無電解パラジウムめっき液、その調製方法、及びそれを用いる無電解パラジウムめっき方法 | |
KR20220117709A (ko) | Ni-NiP 도금층이 형성된 전해도금용 전극의 제조방법 및 이에 의해 제조된 전극 | |
KR102467268B1 (ko) | 옥살산 전해액에서 전류밀도 변화에 따른 아노다이징 처리 방법 | |
US1198703A (en) | Process for obtaining adhesive coatings of copper upon iron and steel. | |
US2934478A (en) | Process of electroplating metals with aluminum | |
SU1520150A1 (ru) | Способ подготовки поверхности стальных деталей дл осаждени гальванических покрытий |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20210604 |
|
RJ01 | Rejection of invention patent application after publication |