DE69712311T2 - Verfahren und gerät zur erzeugung optische farbbilder mittels eines gitter-lichtventilarrays - Google Patents
Verfahren und gerät zur erzeugung optische farbbilder mittels eines gitter-lichtventilarraysInfo
- Publication number
- DE69712311T2 DE69712311T2 DE69712311T DE69712311T DE69712311T2 DE 69712311 T2 DE69712311 T2 DE 69712311T2 DE 69712311 T DE69712311 T DE 69712311T DE 69712311 T DE69712311 T DE 69712311T DE 69712311 T2 DE69712311 T2 DE 69712311T2
- Authority
- DE
- Germany
- Prior art keywords
- subpixel
- elements
- light
- components
- pixel unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title claims description 51
- 238000000034 method Methods 0.000 title claims description 34
- 238000004519 manufacturing process Methods 0.000 claims description 16
- 238000004891 communication Methods 0.000 claims description 7
- QNRATNLHPGXHMA-XZHTYLCXSA-N (r)-(6-ethoxyquinolin-4-yl)-[(2s,4s,5r)-5-ethyl-1-azabicyclo[2.2.2]octan-2-yl]methanol;hydrochloride Chemical compound Cl.C([C@H]([C@H](C1)CC)C2)CN1[C@@H]2[C@H](O)C1=CC=NC2=CC=C(OCC)C=C21 QNRATNLHPGXHMA-XZHTYLCXSA-N 0.000 claims 2
- 239000010410 layer Substances 0.000 description 56
- 239000000758 substrate Substances 0.000 description 36
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 26
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 26
- 229910052710 silicon Inorganic materials 0.000 description 26
- 239000010703 silicon Substances 0.000 description 26
- 229910052581 Si3N4 Inorganic materials 0.000 description 21
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 20
- 239000000463 material Substances 0.000 description 15
- 238000005516 engineering process Methods 0.000 description 13
- 239000000377 silicon dioxide Substances 0.000 description 13
- 235000012239 silicon dioxide Nutrition 0.000 description 13
- 230000008901 benefit Effects 0.000 description 10
- 239000000835 fiber Substances 0.000 description 10
- 238000012545 processing Methods 0.000 description 10
- 150000004767 nitrides Chemical class 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 238000013461 design Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 239000003086 colorant Substances 0.000 description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 6
- 229910052721 tungsten Inorganic materials 0.000 description 6
- 239000010937 tungsten Substances 0.000 description 6
- 235000012431 wafers Nutrition 0.000 description 6
- 238000005530 etching Methods 0.000 description 5
- 230000006870 function Effects 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 238000003491 array Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 230000002829 reductive effect Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 210000001747 pupil Anatomy 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- 210000001525 retina Anatomy 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 238000013016 damping Methods 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 239000005262 ferroelectric liquid crystals (FLCs) Substances 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 230000001052 transient effect Effects 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 229910003327 LiNbO3 Inorganic materials 0.000 description 1
- 239000004988 Nematic liquid crystal Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000013528 artificial neural network Methods 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000004108 freeze drying Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000036039 immunity Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 238000003909 pattern recognition Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000005701 quantum confined stark effect Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000012995 silicone-based technology Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0002—Arrangements for avoiding sticking of the flexible or moving parts
- B81B3/001—Structures having a reduced contact area, e.g. with bumps or with a textured surface
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0808—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more diffracting elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1828—Diffraction gratings having means for producing variable diffraction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/11—Treatments for avoiding stiction of elastic or moving parts of MEMS
- B81C2201/115—Roughening a surface
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/591,231 US6219015B1 (en) | 1992-04-28 | 1996-01-18 | Method and apparatus for using an array of grating light valves to produce multicolor optical images |
| PCT/US1997/000854 WO1997026569A2 (en) | 1996-01-18 | 1997-01-17 | Method and apparatus for using an array of grating light valves to produce multicolor optical images |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69712311D1 DE69712311D1 (de) | 2002-06-06 |
| DE69712311T2 true DE69712311T2 (de) | 2002-12-19 |
Family
ID=24365635
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69712311T Expired - Lifetime DE69712311T2 (de) | 1996-01-18 | 1997-01-17 | Verfahren und gerät zur erzeugung optische farbbilder mittels eines gitter-lichtventilarrays |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US6219015B1 (enExample) |
| EP (1) | EP0875010B1 (enExample) |
| JP (1) | JP4053598B2 (enExample) |
| AT (1) | ATE217094T1 (enExample) |
| CA (1) | CA2243347C (enExample) |
| DE (1) | DE69712311T2 (enExample) |
| WO (1) | WO1997026569A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106415346A (zh) * | 2014-06-03 | 2017-02-15 | 华为技术有限公司 | 二维光栅偏振分束器及光相干接收机 |
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1996
- 1996-01-18 US US08/591,231 patent/US6219015B1/en not_active Expired - Lifetime
- 1996-04-26 US US08/638,605 patent/US5808797A/en not_active Expired - Lifetime
-
1997
- 1997-01-17 CA CA002243347A patent/CA2243347C/en not_active Expired - Fee Related
- 1997-01-17 AT AT97904813T patent/ATE217094T1/de not_active IP Right Cessation
- 1997-01-17 WO PCT/US1997/000854 patent/WO1997026569A2/en not_active Ceased
- 1997-01-17 JP JP52625497A patent/JP4053598B2/ja not_active Expired - Fee Related
- 1997-01-17 EP EP97904813A patent/EP0875010B1/en not_active Expired - Lifetime
- 1997-01-17 DE DE69712311T patent/DE69712311T2/de not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106415346A (zh) * | 2014-06-03 | 2017-02-15 | 华为技术有限公司 | 二维光栅偏振分束器及光相干接收机 |
| CN106415346B (zh) * | 2014-06-03 | 2019-05-10 | 华为技术有限公司 | 二维光栅偏振分束器及光相干接收机 |
Also Published As
| Publication number | Publication date |
|---|---|
| CA2243347A1 (en) | 1997-07-24 |
| CA2243347C (en) | 2005-05-10 |
| US6219015B1 (en) | 2001-04-17 |
| US5808797A (en) | 1998-09-15 |
| JP2001518198A (ja) | 2001-10-09 |
| WO1997026569A3 (en) | 1997-10-09 |
| DE69712311D1 (de) | 2002-06-06 |
| EP0875010B1 (en) | 2002-05-02 |
| WO1997026569A2 (en) | 1997-07-24 |
| ATE217094T1 (de) | 2002-05-15 |
| EP0875010A2 (en) | 1998-11-04 |
| JP4053598B2 (ja) | 2008-02-27 |
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