DE69710247T2 - Photoleitfähiges Überzugsmittel - Google Patents

Photoleitfähiges Überzugsmittel

Info

Publication number
DE69710247T2
DE69710247T2 DE69710247T DE69710247T DE69710247T2 DE 69710247 T2 DE69710247 T2 DE 69710247T2 DE 69710247 T DE69710247 T DE 69710247T DE 69710247 T DE69710247 T DE 69710247T DE 69710247 T2 DE69710247 T2 DE 69710247T2
Authority
DE
Germany
Prior art keywords
coating agent
photoconductive coating
photoconductive
agent
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69710247T
Other languages
English (en)
Other versions
DE69710247D1 (de
Inventor
Khe Nguyen
Sivapackia Ganapathiappan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HP Inc
Original Assignee
Hewlett Packard Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hewlett Packard Co filed Critical Hewlett Packard Co
Publication of DE69710247D1 publication Critical patent/DE69710247D1/de
Application granted granted Critical
Publication of DE69710247T2 publication Critical patent/DE69710247T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/062—Polyethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F216/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F216/12—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
    • C08F216/14—Monomers containing only one unsaturated aliphatic radical
    • C08F216/1416—Monomers containing oxygen in addition to the ether oxygen, e.g. allyl glycidyl ether
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/14—Inert intermediate or cover layers for charge-receiving layers
    • G03G5/147—Cover layers
    • G03G5/14708—Cover layers comprising organic material
    • G03G5/14713—Macromolecular material
    • G03G5/14717—Macromolecular material obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • G03G5/14726—Halogenated polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/14—Inert intermediate or cover layers for charge-receiving layers
    • G03G5/147—Cover layers
    • G03G5/14708—Cover layers comprising organic material
    • G03G5/14713—Macromolecular material
    • G03G5/14747—Macromolecular material obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • G03G5/1476—Other polycondensates comprising oxygen atoms in the main chain; Phenol resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/14—Inert intermediate or cover layers for charge-receiving layers
    • G03G5/147—Cover layers
    • G03G5/14708—Cover layers comprising organic material
    • G03G5/14713—Macromolecular material
    • G03G5/14786—Macromolecular compounds characterised by specific side-chain substituents or end groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/14—Inert intermediate or cover layers for charge-receiving layers
    • G03G5/147—Cover layers
    • G03G5/14708—Cover layers comprising organic material
    • G03G5/14713—Macromolecular material
    • G03G5/14791—Macromolecular compounds characterised by their structure, e.g. block polymers, reticulated polymers, or by their chemical properties, e.g. by molecular weight or acidity

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
DE69710247T 1996-04-30 1997-03-27 Photoleitfähiges Überzugsmittel Expired - Fee Related DE69710247T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/641,125 US5834564A (en) 1996-04-30 1996-04-30 Photoconductor coating having perfluoro copolymer and composition for making same

Publications (2)

Publication Number Publication Date
DE69710247D1 DE69710247D1 (de) 2002-03-21
DE69710247T2 true DE69710247T2 (de) 2002-07-25

Family

ID=24571032

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69710247T Expired - Fee Related DE69710247T2 (de) 1996-04-30 1997-03-27 Photoleitfähiges Überzugsmittel

Country Status (4)

Country Link
US (1) US5834564A (de)
EP (1) EP0805170B1 (de)
JP (1) JP3741822B2 (de)
DE (1) DE69710247T2 (de)

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JP3632146B2 (ja) * 1997-07-22 2005-03-23 コニカミノルタホールディングス株式会社 電子写真感光体とその製造方法
IT1312344B1 (it) * 1999-06-03 2002-04-15 Ausimont Spa Composizioni per film a basso indice di rifrazione.
TWI250894B (en) * 2002-01-03 2006-03-11 Sipix Imaging Inc Functionalized halogenated polymers for microencapsulation
JP4134753B2 (ja) 2002-06-26 2008-08-20 富士ゼロックス株式会社 電子写真用感光体、電子写真用部材、プロセスカートリッジ、及び画像形成装置
US20040067094A1 (en) * 2002-10-02 2004-04-08 Hong Kong Stationery Manufacturing Co., Ltd. Trigger construction for ring binder mechanism
JP4590849B2 (ja) * 2003-10-03 2010-12-01 Ｔｄｋ株式会社 ハードコート剤組成物及びこれを用いた光情報媒体
JP4779293B2 (ja) * 2003-10-21 2011-09-28 Ｔｄｋ株式会社 ハードコート剤組成物及びこれを用いた光情報媒体
JP4784723B2 (ja) * 2003-12-24 2011-10-05 Ｔｄｋ株式会社 ハードコート剤組成物及びこれを用いた光情報媒体
US20070077478A1 (en) * 2005-10-03 2007-04-05 The Board Of Management Of Saigon Hi-Tech Park Electrolyte membrane for fuel cell utilizing nano composite
US20070237925A1 (en) * 2006-04-07 2007-10-11 Castle Scott R Radiation cured coatings
US8017192B2 (en) * 2007-07-17 2011-09-13 Lexmark International, Inc. Radiation cured coatings for image forming device components
US20100278715A1 (en) * 2009-04-29 2010-11-04 Th Llc Systems, Devices, and/or Methods Regarding Specific Precursors or Tube Control Agent for the Synthesis of Carbon Nanofiber and Nanotube
US8512935B2 (en) 2009-05-08 2013-08-20 Hewlett-Packard Development Company, L.P. Functionalized perfluoropolyether material as a hydrophobic coating
JP5487859B2 (ja) * 2009-09-30 2014-05-14 Ｄｉｃ株式会社 含フッ素硬化性樹脂、活性エネルギー線硬化型塗料組成物及びその硬化物
JP5487860B2 (ja) * 2009-09-30 2014-05-14 Ｄｉｃ株式会社 含フッ素硬化性樹脂、活性エネルギー線硬化型塗料組成物及びその硬化物
JP5610220B2 (ja) * 2010-12-17 2014-10-22 株式会社リコー 電子写真感光体、並びにそれを用いた画像形成装置及びプロセスカートリッジ
US9718961B2 (en) * 2013-06-27 2017-08-01 3M Innovative Properties Company Fluoropolyether-polysiloxane elastomer compositions and shaped articles
JP6354240B2 (ja) * 2014-03-24 2018-07-11 富士ゼロックス株式会社 電子写真感光体、プロセスカートリッジ、および画像形成装置
JP6453622B2 (ja) * 2014-11-21 2019-01-16 デクセリアルズ株式会社 配線基板の製造方法、及び配線基板
JP6601239B2 (ja) * 2016-01-28 2019-11-06 コニカミノルタ株式会社 電子写真像担持体
JP2017194641A (ja) * 2016-04-22 2017-10-26 コニカミノルタ株式会社 電子写真用の像担持体およびその製造方法
JP6776789B2 (ja) * 2016-10-11 2020-10-28 コニカミノルタ株式会社 画像形成方法および画像形成装置
JP2018072372A (ja) * 2016-10-24 2018-05-10 コニカミノルタ株式会社 電子写真感光体、画像形成装置および電子写真感光体の製造方法
JP6780480B2 (ja) * 2016-12-09 2020-11-04 コニカミノルタ株式会社 電子写真感光体およびその製造方法
JP2018097061A (ja) * 2016-12-09 2018-06-21 コニカミノルタ株式会社 像担持体
WO2018139058A1 (ja) 2017-01-26 2018-08-02 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
JP2018132722A (ja) * 2017-02-17 2018-08-23 コニカミノルタ株式会社 電子写真感光体及び画像形成装置
JP2019061003A (ja) * 2017-09-26 2019-04-18 コニカミノルタ株式会社 電子写真感光体及び画像形成装置
US11767483B2 (en) 2018-09-12 2023-09-26 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
CN113544190B (zh) 2019-03-12 2023-08-01 株式会社力森诺科 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
US11879109B2 (en) 2019-09-18 2024-01-23 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
CN114845989A (zh) 2019-12-26 2022-08-02 昭和电工株式会社 含氟醚化合物、磁记录介质用润滑剂及磁记录介质

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US3810874A (en) * 1969-03-10 1974-05-14 Minnesota Mining & Mfg Polymers prepared from poly(perfluoro-alkylene oxide) compounds
US4321404A (en) * 1980-05-20 1982-03-23 Minnesota Mining And Manufacturing Company Compositions for providing abherent coatings
US4567073A (en) * 1982-07-02 1986-01-28 Minnesota Mining And Manufacturing Company Composite low surface energy liner of perfluoropolyether
US4614667A (en) * 1984-05-21 1986-09-30 Minnesota Mining And Manufacturing Company Composite low surface energy liner of perfluoropolyether
US4565714B1 (en) * 1984-06-14 1999-06-29 Minnesota Mining & Mfg Low surface energy material
US5026606A (en) * 1986-08-04 1991-06-25 Minnesota Mining And Manufacturing Company Film for thermal imaging
US4772526A (en) * 1987-10-13 1988-09-20 Eastman Kodak Company Electrophotographic element
IT1223409B (it) * 1987-12-10 1990-09-19 Ausimont Spa Polimeri e copolimeri fluorurati contenenti blocchi perfluoropolieteri
JP2666314B2 (ja) * 1988-01-07 1997-10-22 富士ゼロックス株式会社 電子写真感光体
US5300683A (en) * 1988-09-28 1994-04-05 Exfluor Research Corporation Fluorination of acetals, ketals and orthoesters
US5075106A (en) * 1989-01-11 1991-12-24 Ciba-Geigy Corporation Vinylic macromers containing perfluoropolyalkylether and polyalkylether segments, polymers and ophthalmic devices made therefrom
US4929692A (en) * 1989-01-11 1990-05-29 Ciba-Geigy Corporation Crosslinked copolymers and ophthalmic devices made from vinylic macromers containing perfluoropolyalkyl ether and polyalkyl ether segments and minor amounts of vinylic comonomers
IT1243431B (it) * 1990-10-01 1994-06-10 Ausimont Spa Procedimento per la protezione ed il consolidamento di materiali lapidei
IT1243747B (it) * 1990-10-24 1994-06-21 Sviluppo Settori Impiego Srl Composizioni polimeriche oleo-repellenti e loro impiego nella preparazione di corpi formati aventi superfici ad elevata resistenza ai solventi ed elevata repellenza allo sporco.
US5439980A (en) * 1990-11-29 1995-08-08 Daikin Industries Process for preparing polymer
US5268405A (en) * 1993-03-31 1993-12-07 E. I. Du Pont De Nemours And Company Low temperature perfluoroelastomers
IT1264661B1 (it) * 1993-07-05 1996-10-04 Ausimont Spa Copolimeri termoprocessabilin del tetrafluoroetilene

Also Published As

Publication number Publication date
JPH1171440A (ja) 1999-03-16
DE69710247D1 (de) 2002-03-21
EP0805170A2 (de) 1997-11-05
EP0805170A3 (de) 1998-09-23
JP3741822B2 (ja) 2006-02-01
EP0805170B1 (de) 2002-02-06
US5834564A (en) 1998-11-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee