DE69707129D1 - Verfahren und vorrichtung zur anpassung einer veränderlichen lastimpedanz an eine rf-stromgeneratorimpedanz - Google Patents

Verfahren und vorrichtung zur anpassung einer veränderlichen lastimpedanz an eine rf-stromgeneratorimpedanz

Info

Publication number
DE69707129D1
DE69707129D1 DE69707129T DE69707129T DE69707129D1 DE 69707129 D1 DE69707129 D1 DE 69707129D1 DE 69707129 T DE69707129 T DE 69707129T DE 69707129 T DE69707129 T DE 69707129T DE 69707129 D1 DE69707129 D1 DE 69707129D1
Authority
DE
Germany
Prior art keywords
impedance
load
generator
power generator
frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69707129T
Other languages
English (en)
Other versions
DE69707129T2 (de
Inventor
Anton Mavretic
Andrew Ciszek
Joseph Stach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Energy Voorhees Inc
Original Assignee
Advanced Energy Voorhees Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Energy Voorhees Inc filed Critical Advanced Energy Voorhees Inc
Publication of DE69707129D1 publication Critical patent/DE69707129D1/de
Application granted granted Critical
Publication of DE69707129T2 publication Critical patent/DE69707129T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks
    • H03H7/40—Automatic matching of load impedance to source impedance

Landscapes

  • Plasma Technology (AREA)
  • Amplifiers (AREA)
  • Networks Using Active Elements (AREA)
  • Electrotherapy Devices (AREA)
DE69707129T 1996-06-13 1997-06-11 Verfahren und vorrichtung zur anpassung einer veränderlichen lastimpedanz an eine rf-stromgeneratorimpedanz Expired - Lifetime DE69707129T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/662,886 US5654679A (en) 1996-06-13 1996-06-13 Apparatus for matching a variable load impedance with an RF power generator impedance
PCT/US1997/010291 WO1997048183A1 (en) 1996-06-13 1997-06-11 Method and apparatus for matching a variable load impedance with an rf power generator impedance

Publications (2)

Publication Number Publication Date
DE69707129D1 true DE69707129D1 (de) 2001-11-08
DE69707129T2 DE69707129T2 (de) 2002-07-11

Family

ID=24659639

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69707129T Expired - Lifetime DE69707129T2 (de) 1996-06-13 1997-06-11 Verfahren und vorrichtung zur anpassung einer veränderlichen lastimpedanz an eine rf-stromgeneratorimpedanz

Country Status (9)

Country Link
US (1) US5654679A (de)
EP (1) EP0904634B1 (de)
JP (1) JP2000512460A (de)
KR (1) KR100429930B1 (de)
CN (1) CN1122361C (de)
AT (1) ATE206568T1 (de)
AU (1) AU3487297A (de)
DE (1) DE69707129T2 (de)
WO (1) WO1997048183A1 (de)

Families Citing this family (161)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7569790B2 (en) 1997-06-26 2009-08-04 Mks Instruments, Inc. Method and apparatus for processing metal bearing gases
US6815633B1 (en) 1997-06-26 2004-11-09 Applied Science & Technology, Inc. Inductively-coupled toroidal plasma source
US8779322B2 (en) 1997-06-26 2014-07-15 Mks Instruments Inc. Method and apparatus for processing metal bearing gases
US6924455B1 (en) 1997-06-26 2005-08-02 Applied Science & Technology, Inc. Integrated plasma chamber and inductively-coupled toroidal plasma source
JP2929284B2 (ja) * 1997-09-10 1999-08-03 株式会社アドテック 高周波プラズマ処理装置のためのインピーダンス整合及び電力制御システム
US5842154A (en) * 1997-09-15 1998-11-24 Eni Technologies, Inc. Fuzzy logic tuning of RF matching network
DE69836917D1 (de) * 1997-09-17 2007-03-08 Tokyo Electron Ltd System und verfahren zur anpassung von elektrischen impedanzen
DE19757142A1 (de) * 1997-12-20 1999-07-08 Philips Patentverwaltung Mobilfunkgerät
US6045378A (en) * 1998-03-27 2000-04-04 Adc Telecommunications, Inc. Switching coaxial jack with impedance matching
US6313584B1 (en) 1998-09-17 2001-11-06 Tokyo Electron Limited Electrical impedance matching system and method
JP2000101390A (ja) * 1998-09-18 2000-04-07 Toshiba Corp トリミング回路
US6424232B1 (en) 1999-11-30 2002-07-23 Advanced Energy's Voorhees Operations Method and apparatus for matching a variable load impedance with an RF power generator impedance
US6326584B1 (en) 1999-12-31 2001-12-04 Litmas, Inc. Methods and apparatus for RF power delivery
US6392210B1 (en) 1999-12-31 2002-05-21 Russell F. Jewett Methods and apparatus for RF power process operations with automatic input power control
TW492040B (en) 2000-02-14 2002-06-21 Tokyo Electron Ltd Device and method for coupling two circuit components which have different impedances
US6879062B2 (en) * 2000-03-18 2005-04-12 Alstom Electrical substation
US6472822B1 (en) 2000-04-28 2002-10-29 Applied Materials, Inc. Pulsed RF power delivery for plasma processing
US6677828B1 (en) * 2000-08-17 2004-01-13 Eni Technology, Inc. Method of hot switching a plasma tuner
KR100636052B1 (ko) * 2000-08-28 2006-10-18 삼성전자주식회사 플라즈마 챔버의 부하 측정 장치
US6887339B1 (en) * 2000-09-20 2005-05-03 Applied Science And Technology, Inc. RF power supply with integrated matching network
US6657394B2 (en) * 2001-04-06 2003-12-02 Eni Technology, Inc. Reflection coefficient phase detector
US9708707B2 (en) * 2001-09-10 2017-07-18 Asm International N.V. Nanolayer deposition using bias power treatment
US7132996B2 (en) * 2001-10-09 2006-11-07 Plasma Control Systems Llc Plasma production device and method and RF driver circuit
US7100532B2 (en) * 2001-10-09 2006-09-05 Plasma Control Systems, Llc Plasma production device and method and RF driver circuit with adjustable duty cycle
US7084832B2 (en) * 2001-10-09 2006-08-01 Plasma Control Systems, Llc Plasma production device and method and RF driver circuit with adjustable duty cycle
JP3969081B2 (ja) * 2001-12-14 2007-08-29 東京エレクトロン株式会社 プラズマ処理装置
KR100805602B1 (ko) * 2001-12-31 2008-02-20 주식회사 케이티 교환 시스템의 가입자 정합회로 평형회로망의 임피던스자동 설정 장치
US6819052B2 (en) * 2002-05-31 2004-11-16 Nagano Japan Radio Co., Ltd. Coaxial type impedance matching device and impedance detecting method for plasma generation
US6707255B2 (en) * 2002-07-10 2004-03-16 Eni Technology, Inc. Multirate processing for metrology of plasma RF source
US6794951B2 (en) * 2002-08-05 2004-09-21 Veeco Instruments, Inc. Solid state RF power switching network
US7113759B2 (en) * 2002-08-28 2006-09-26 Texas Instruments Incorporated Controller area network transceiver having capacitive balancing circuit for improved receiver common-mode rejection
DE10253927A1 (de) * 2002-11-19 2004-06-17 Universität Karlsruhe (Th) Impedanztransformator, Phasenschieber und Verfahren zum Betreiben eines Phasenschiebers
JP3574651B2 (ja) * 2002-12-05 2004-10-06 東京エレクトロン株式会社 成膜方法および成膜装置
CN1507151B (zh) * 2002-12-12 2010-05-12 华邦电子股份有限公司 应用于集成电路的可变阻抗网络
US9121098B2 (en) 2003-02-04 2015-09-01 Asm International N.V. NanoLayer Deposition process for composite films
US7713592B2 (en) * 2003-02-04 2010-05-11 Tegal Corporation Nanolayer deposition process
US7901952B2 (en) 2003-05-16 2011-03-08 Applied Materials, Inc. Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parameters
US7910013B2 (en) * 2003-05-16 2011-03-22 Applied Materials, Inc. Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
US7795153B2 (en) * 2003-05-16 2010-09-14 Applied Materials, Inc. Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of selected chamber parameters
US7452824B2 (en) * 2003-05-16 2008-11-18 Applied Materials, Inc. Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters
US7247218B2 (en) * 2003-05-16 2007-07-24 Applied Materials, Inc. Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias power
US7470626B2 (en) * 2003-05-16 2008-12-30 Applied Materials, Inc. Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
CN1871373A (zh) * 2003-06-19 2006-11-29 等离子控制系统有限公司 等离子体生成设备和方法以及具有可调工作周期的rf驱动电路
US6791274B1 (en) * 2003-07-15 2004-09-14 Advanced Energy Industries, Inc. RF power control device for RF plasma applications
US7115185B1 (en) 2003-09-16 2006-10-03 Advanced Energy Industries, Inc. Pulsed excitation of inductively coupled plasma sources
US6848948B1 (en) * 2003-11-03 2005-02-01 Adc Telecommunications, Inc. Jack with modular mounting sleeve
US7326872B2 (en) * 2004-04-28 2008-02-05 Applied Materials, Inc. Multi-frequency dynamic dummy load and method for testing plasma reactor multi-frequency impedance match networks
US7570130B2 (en) * 2004-07-12 2009-08-04 Applied Materials, Inc. Apparatus and methods for a fixed impedance transformation network for use in connection with a plasma chamber
US7292045B2 (en) * 2004-09-04 2007-11-06 Applied Materials, Inc. Detection and suppression of electrical arcing
KR20070108229A (ko) * 2005-03-05 2007-11-08 이노베이션 엔지니어링, 엘엘씨 전자적 가변 커패시터 어레이
US7074080B1 (en) 2005-04-21 2006-07-11 Adc Telecommunications, Inc. Modular mounting sleeve for jack
WO2006115813A1 (en) * 2005-04-21 2006-11-02 Adc Telecommunications, Inc. Modular mounting sleeve for jack
CN100411496C (zh) * 2005-09-21 2008-08-13 大连理工大学 一种实现脉冲电源与等离子体负载间匹配的方法
US20080179948A1 (en) * 2005-10-31 2008-07-31 Mks Instruments, Inc. Radio frequency power delivery system
TWI425767B (zh) * 2005-10-31 2014-02-01 Mks Instr Inc 無線電頻率電力傳送系統
US7353771B2 (en) 2005-11-07 2008-04-08 Mks Instruments, Inc. Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator
CN100377624C (zh) * 2005-12-07 2008-03-26 北京北方微电子基地设备工艺研究中心有限责任公司 一种刻蚀设备的射频起辉控制方法
US7591677B2 (en) * 2006-04-21 2009-09-22 Adc Telecommunications, Inc. High density coaxial jack and panel
EP1885058A1 (de) * 2006-08-03 2008-02-06 Alcatel Lucent Verfahren zur Regelung der Verstärkung eines Verstärkers und einer Verstärkerstufe
US20080061901A1 (en) * 2006-09-13 2008-03-13 Jack Arthur Gilmore Apparatus and Method for Switching Between Matching Impedances
US7902991B2 (en) * 2006-09-21 2011-03-08 Applied Materials, Inc. Frequency monitoring to detect plasma process abnormality
US7554334B2 (en) * 2006-09-28 2009-06-30 Applied Marterials, Inc. Matching network characterization using variable impedance analysis
JP4985654B2 (ja) * 2006-11-21 2012-07-25 日本電気株式会社 Ｒｆ回路
US7969096B2 (en) 2006-12-15 2011-06-28 Mks Instruments, Inc. Inductively-coupled plasma source
KR100870121B1 (ko) 2007-04-19 2008-11-25 주식회사 플라즈마트 임피던스 매칭 방법 및 이 방법을 위한 매칭 시스템
US8120259B2 (en) 2007-04-19 2012-02-21 Plasmart Co., Ltd. Impedance matching methods and systems performing the same
KR100895689B1 (ko) * 2007-11-14 2009-04-30 주식회사 플라즈마트 임피던스 매칭 방법 및 이 방법을 위한 전기 장치
US7649363B2 (en) * 2007-06-28 2010-01-19 Lam Research Corporation Method and apparatus for a voltage/current probe test arrangements
CN101437353B (zh) * 2007-11-15 2012-01-11 北京北方微电子基地设备工艺研究中心有限责任公司 一种匹配器及其匹配方法
US8405467B2 (en) * 2007-11-27 2013-03-26 Qualcomm Incorporated Methods and apparatuses for inductor tuning in radio frequency integrated circuits
CN101459476B (zh) * 2007-12-13 2012-09-05 启碁科技股份有限公司 以阻抗负载特性调整无线射频电路的方法及其相关装置
CN101494947B (zh) * 2008-01-23 2011-07-06 北京北方微电子基地设备工艺研究中心有限责任公司 一种射频阻抗自动匹配的方法
US20090267588A1 (en) * 2008-04-23 2009-10-29 Schmitz Michael J Method and apparatus to dynamically control impedance to maximize power supply
CN101626656B (zh) * 2008-07-11 2012-10-31 北京北方微电子基地设备工艺研究中心有限责任公司 射频匹配方法及等离子体处理设备
US8344704B2 (en) * 2008-12-31 2013-01-01 Advanced Energy Industries, Inc. Method and apparatus for adjusting the reference impedance of a power generator
US8040068B2 (en) * 2009-02-05 2011-10-18 Mks Instruments, Inc. Radio frequency power control system
US8692466B2 (en) * 2009-02-27 2014-04-08 Mks Instruments Inc. Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator
DE102009001355B4 (de) * 2009-03-05 2015-01-22 TRUMPF Hüttinger GmbH + Co. KG Impedanzanpassungsschaltung und Verfahren zur Impedanzanpassung
US8674844B2 (en) * 2009-03-19 2014-03-18 Applied Materials, Inc. Detecting plasma chamber malfunction
CN101860375B (zh) * 2009-04-13 2013-03-20 和硕联合科技股份有限公司 无线通信装置
US9143172B2 (en) 2009-06-03 2015-09-22 Qualcomm Incorporated Tunable matching circuits for power amplifiers
US8963611B2 (en) 2009-06-19 2015-02-24 Qualcomm Incorporated Power and impedance measurement circuits for a wireless communication device
US9559639B2 (en) 2009-08-19 2017-01-31 Qualcomm Incorporated Protection circuit for power amplifier
US8072272B2 (en) 2009-08-19 2011-12-06 Qualcomm, Incorporated Digital tunable inter-stage matching circuit
DE102009054449A1 (de) 2009-11-25 2011-05-26 Hüttinger Elektronik Gmbh + Co. Kg Selbstabgleichende RF-Plasmastromversorgung
US8294632B2 (en) * 2010-05-18 2012-10-23 Sony Ericsson Mobile Communications Ab Antenna interface circuits including tunable impedance matching networks, electronic devices incorporating the same, and methods of tuning antenna interface circuits
CN102479657A (zh) * 2010-11-26 2012-05-30 沈阳拓荆科技有限公司 一种多段式匹配器
DK2461026T4 (en) * 2010-12-03 2017-03-13 Siemens Ag Device and method for testing a system for producing electricity
TWI455172B (zh) * 2010-12-30 2014-10-01 Semes Co Ltd 基板處理設備、電漿阻抗匹配裝置及可變電容器
US8416008B2 (en) 2011-01-20 2013-04-09 Advanced Energy Industries, Inc. Impedance-matching network using BJT switches in variable-reactance circuits
DE102011076404B4 (de) 2011-05-24 2014-06-26 TRUMPF Hüttinger GmbH + Co. KG Verfahren zur Impedanzanpassung der Ausgangsimpedanz einer Hochfrequenzleistungsversorgungsanordnung an die Impedanz einer Plasmalast und Hochfrequenzleistungsversorgungsanordnung
JP2013098177A (ja) * 2011-10-31 2013-05-20 Semes Co Ltd 基板処理装置及びインピーダンスマッチング方法
US8576013B2 (en) 2011-12-29 2013-11-05 Mks Instruments, Inc. Power distortion-based servo control systems for frequency tuning RF power sources
CN102711327A (zh) * 2012-05-25 2012-10-03 天津工业大学 基于无线电能传输技术的led室内台灯
US9490353B2 (en) 2012-08-28 2016-11-08 Advanced Energy Industries, Inc. Three terminal PIN diode
JP6084417B2 (ja) * 2012-09-28 2017-02-22 株式会社ダイヘン インピーダンス調整装置
JP6099995B2 (ja) * 2013-01-24 2017-03-22 東京エレクトロン株式会社 試験装置
CN103178802A (zh) * 2013-01-30 2013-06-26 王少夫 一种可调无耗匹配网络实现方法
CN103246216B (zh) * 2013-04-02 2015-11-25 华为技术有限公司 一种射频模块和射频模块的负载模式切换方法
CN104349567A (zh) * 2013-07-29 2015-02-11 北京北方微电子基地设备工艺研究中心有限责任公司 射频电源系统和利用射频电源系统进行阻抗匹配的方法
JP5950051B2 (ja) 2013-09-05 2016-07-13 株式会社村田製作所 インピーダンス変換回路、アンテナ装置および無線通信装置
KR101544975B1 (ko) * 2013-09-30 2015-08-18 주식회사 플라즈마트 임피던스 매칭 방법 및 임피던스 매칭 시스템
CN103619117B (zh) * 2013-11-29 2016-04-06 中国科学院微电子研究所 可实现快速阻抗匹配的射频电源系统
US9496122B1 (en) 2014-01-10 2016-11-15 Reno Technologies, Inc. Electronically variable capacitor and RF matching network incorporating same
US10455729B2 (en) 2014-01-10 2019-10-22 Reno Technologies, Inc. Enclosure cooling system
US9865432B1 (en) 2014-01-10 2018-01-09 Reno Technologies, Inc. RF impedance matching network
US9844127B2 (en) 2014-01-10 2017-12-12 Reno Technologies, Inc. High voltage switching circuit
US10431428B2 (en) 2014-01-10 2019-10-01 Reno Technologies, Inc. System for providing variable capacitance
US9697991B2 (en) 2014-01-10 2017-07-04 Reno Technologies, Inc. RF impedance matching network
US9755641B1 (en) 2014-01-10 2017-09-05 Reno Technologies, Inc. High speed high voltage switching circuit
US9196459B2 (en) 2014-01-10 2015-11-24 Reno Technologies, Inc. RF impedance matching network
CN105097396A (zh) * 2014-05-19 2015-11-25 北京北方微电子基地设备工艺研究中心有限责任公司 一种阻抗匹配装置及半导体加工设备
KR20170096125A (ko) * 2014-12-19 2017-08-23 메사추세츠 인스티튜트 오브 테크놀로지 상-전환 소자를 갖는 튜너블 매칭 네트워크
US11017983B2 (en) * 2015-02-18 2021-05-25 Reno Technologies, Inc. RF power amplifier
US9729122B2 (en) 2015-02-18 2017-08-08 Reno Technologies, Inc. Switching circuit
US9306533B1 (en) 2015-02-20 2016-04-05 Reno Technologies, Inc. RF impedance matching network
US9525412B2 (en) 2015-02-18 2016-12-20 Reno Technologies, Inc. Switching circuit
US10340879B2 (en) 2015-02-18 2019-07-02 Reno Technologies, Inc. Switching circuit
US10679823B2 (en) * 2015-02-18 2020-06-09 Reno Technologies, Inc. Switching circuit
US10692699B2 (en) 2015-06-29 2020-06-23 Reno Technologies, Inc. Impedance matching with restricted capacitor switching
US11081316B2 (en) 2015-06-29 2021-08-03 Reno Technologies, Inc. Impedance matching network and method
US11342160B2 (en) 2015-06-29 2022-05-24 Reno Technologies, Inc. Filter for impedance matching
US11335540B2 (en) 2015-06-29 2022-05-17 Reno Technologies, Inc. Impedance matching network and method
US11150283B2 (en) 2015-06-29 2021-10-19 Reno Technologies, Inc. Amplitude and phase detection circuit
US11342161B2 (en) 2015-06-29 2022-05-24 Reno Technologies, Inc. Switching circuit with voltage bias
US10984986B2 (en) 2015-06-29 2021-04-20 Reno Technologies, Inc. Impedance matching network and method
JP6498092B2 (ja) * 2015-09-30 2019-04-10 株式会社ダイヘン インピーダンス整合装置
KR102070791B1 (ko) * 2015-11-20 2020-01-30 주식회사 원익아이피에스 박막 증착 장치 및 증착 방법
KR102070768B1 (ko) * 2015-11-20 2020-01-30 주식회사 원익아이피에스 박막 증착 장치
JP5946580B1 (ja) 2015-12-25 2016-07-06 株式会社京三製作所 インピーダンス整合装置
US10229816B2 (en) 2016-05-24 2019-03-12 Mks Instruments, Inc. Solid-state impedance matching systems including a hybrid tuning network with a switchable coarse tuning network and a varactor fine tuning network
US11824454B2 (en) * 2016-06-21 2023-11-21 Eagle Harbor Technologies, Inc. Wafer biasing in a plasma chamber
US10763814B2 (en) 2016-08-09 2020-09-01 John Bean Technologies Corporation Radio frequency processing apparatus and method
US20180234086A1 (en) * 2017-02-13 2018-08-16 Macom Technology Solutions Holdings, Inc. High speed pin diode driver circuit
US11393659B2 (en) 2017-07-10 2022-07-19 Reno Technologies, Inc. Impedance matching network and method
US11476091B2 (en) 2017-07-10 2022-10-18 Reno Technologies, Inc. Impedance matching network for diagnosing plasma chamber
US11398370B2 (en) 2017-07-10 2022-07-26 Reno Technologies, Inc. Semiconductor manufacturing using artificial intelligence
US10727029B2 (en) 2017-07-10 2020-07-28 Reno Technologies, Inc Impedance matching using independent capacitance and frequency control
US11289307B2 (en) 2017-07-10 2022-03-29 Reno Technologies, Inc. Impedance matching network and method
US10714314B1 (en) 2017-07-10 2020-07-14 Reno Technologies, Inc. Impedance matching network and method
US11521833B2 (en) 2017-07-10 2022-12-06 Reno Technologies, Inc. Combined RF generator and RF solid-state matching network
US11315758B2 (en) 2017-07-10 2022-04-26 Reno Technologies, Inc. Impedance matching using electronically variable capacitance and frequency considerations
US11114280B2 (en) 2017-07-10 2021-09-07 Reno Technologies, Inc. Impedance matching with multi-level power setpoint
US11101110B2 (en) 2017-07-10 2021-08-24 Reno Technologies, Inc. Impedance matching network and method
US10483090B2 (en) 2017-07-10 2019-11-19 Reno Technologies, Inc. Restricted capacitor switching
CN108152696A (zh) * 2017-12-27 2018-06-12 扬州市神州科技有限公司 匹配器动态测试方法
US10269540B1 (en) * 2018-01-25 2019-04-23 Advanced Energy Industries, Inc. Impedance matching system and method of operating the same
CN108880251B (zh) * 2018-06-29 2021-07-13 上海联影医疗科技股份有限公司 具有输出特性调节电路的电源系统
DE102018116597A1 (de) 2018-07-10 2020-01-16 Rosenberger Hochfrequenztechnik Gmbh & Co. Kg Schaltung zum schalten einer wechselspannung
KR101938574B1 (ko) 2018-08-24 2019-04-10 주식회사 알에프피티 플라즈마 챔버에 고정밀 및 고속의 전력을 공급하기 위한 디지탈 전력전달장치
CN108712813B (zh) * 2018-09-13 2019-01-04 中微半导体设备(上海)有限公司 一种可切换匹配网络及电感耦合等离子处理器
JP7105183B2 (ja) 2018-12-27 2022-07-22 株式会社ダイヘン インピーダンス整合装置及びインピーダンス整合方法
US11521831B2 (en) 2019-05-21 2022-12-06 Reno Technologies, Inc. Impedance matching network and method with reduced memory requirements
DE202020102084U1 (de) * 2020-04-15 2020-05-13 TRUMPF Hüttinger GmbH + Co. KG Impedanzanpassungsschaltung und Plasmaversorgungssystem
US11784028B2 (en) * 2020-12-24 2023-10-10 Applied Materials, Inc. Performing radio frequency matching control using a model-based digital twin
US11626853B2 (en) * 2021-02-05 2023-04-11 Applied Materials, Inc. RF power delivery architecture with switchable match and frequency tuning
DE102023104948A1 (de) 2023-02-28 2024-08-29 TRUMPF Hüttinger GmbH + Co. KG Impedanzanpassungsschaltung, Plasmaprozessversorgungssystem und Plasmaprozesssystem
DE102023104955A1 (de) 2023-02-28 2024-08-29 TRUMPF Hüttinger GmbH + Co. KG Impedanzanpassungsschaltung für ein Plasmaprozesssystem und ein Plasmaprozesssystem mit einer solchen Impedanzanpassungsschaltung
DE102023104958A1 (de) 2023-02-28 2024-08-29 TRUMPF Hüttinger GmbH + Co. KG Impedanzanpassungsbaustein, Impedanzanpassungsschaltung, Plasmaprozessversorgungssystem und Plasmaprozesssystem
DE102023104942A1 (de) 2023-02-28 2024-08-29 TRUMPF Hüttinger GmbH + Co. KG Impedanzanpassungsschaltung, Plasmaprozessversorgungssystem und Plasmaprozesssystem
CN117459011B (zh) * 2023-12-22 2024-04-09 深圳市瀚强科技股份有限公司 射频电路、射频电源设备及电抗补偿方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1207566A (fr) * 1958-06-26 1960-02-17 Trt Telecom Radio Electr Perfectionnements aux dispositifs d'accord automatique sur une charge largement variable
US3794941A (en) * 1972-05-08 1974-02-26 Hughes Aircraft Co Automatic antenna impedance tuner including digital control circuits
US3906405A (en) * 1974-07-01 1975-09-16 Motorola Inc Tunable antenna coupling circuit
JPS61206322A (ja) * 1985-03-11 1986-09-12 Fujitsu Ltd アンテナインピ−ダンス整合回路
JP2523993Y2 (ja) * 1990-01-24 1997-01-29 ティーディーケイ株式会社 ラインフィルタ
JPH0526833Y2 (de) * 1990-04-04 1993-07-07
JPH0653770A (ja) * 1992-07-30 1994-02-25 Kokusai Electric Co Ltd アンテナ整合器
JPH0693437A (ja) * 1992-09-14 1994-04-05 Jeol Ltd 高周波装置
JP3251087B2 (ja) * 1993-02-16 2002-01-28 東京エレクトロン株式会社 プラズマ処理装置
US5424691A (en) * 1994-02-03 1995-06-13 Sadinsky; Samuel Apparatus and method for electronically controlled admittance matching network
FR2722339B1 (fr) * 1994-07-06 1996-10-04 Tech D Applic & De Rech Electr Antenne demi-boucle a accord automatique rapide

Also Published As

Publication number Publication date
EP0904634B1 (de) 2001-10-04
JP2000512460A (ja) 2000-09-19
EP0904634A1 (de) 1999-03-31
KR100429930B1 (ko) 2004-06-16
ATE206568T1 (de) 2001-10-15
CN1122361C (zh) 2003-09-24
CN1227678A (zh) 1999-09-01
WO1997048183A1 (en) 1997-12-18
DE69707129T2 (de) 2002-07-11
KR20000016599A (ko) 2000-03-25
US5654679A (en) 1997-08-05
AU3487297A (en) 1998-01-07

Similar Documents

Publication Publication Date Title
ATE206568T1 (de) Verfahren und vorrichtung zur anpassung einer veränderlichen lastimpedanz an eine rf- stromgeneratorimpedanz
CA2028311A1 (en) Rf phase shifter
CA2444766A1 (en) Method and apparatus for sequential plasma treatment
CA2220921A1 (en) Control apparatus for electrosurgical generator power output
WO2000008898A3 (en) High frequency heating apparatus
AU4750496A (en) Method and apparatus for electronic power control
AU2444192A (en) High speed power analyzer
WO2004114461A3 (en) Plasma production device and method and rf driver circuit with adjustable duty cycle
EP0609964A3 (de) Einstellbare Reaktanzvorrichtung und Verfahren
DE69836917D1 (de) System und verfahren zur anpassung von elektrischen impedanzen
CA2453052A1 (en) High frequency dielectric heating system
CA2217886A1 (en) Energy control device
MY119456A (en) Pulsed width modulation method for power transforming apparatus
CA2239343A1 (en) A matching circuit and a method for matching a transistor circuit
CA2017062A1 (en) Switching power supply apparatus and isolating method thereof
WO2001039569A3 (en) Method for establishing a detachable mechanical and/or electrical connection
WO2002075922A3 (en) Circuit and method for input side impedance matching of a power amplifier in an electronic device
CA2229071A1 (en) Appliance ac power control apparatus
HK1047195A1 (en) Circuit for dividing or bringing together high-frequency performances.
ATE163769T1 (de) Vorrichtung zur anzeige der spannung eines leiters eines hochspannungsenergieversorgungssystems
SE0101595L (sv) Ferroelektriska anordningar och förfarande relaterande därtill
CA2293029A1 (en) Method and device for controlling the polarization of a beam of light
EP0357052A3 (de) Breites Bildschirmgerät mit Entladungslampen und Entladungslampen-Lastkreis für das breite Bildschirmgerät
EP1094592A3 (de) Verfahren zur Ausgangsspannungsbegrenzung für einen spannungs/frequenzgeführten Umrichter mit Zwischenkreis und einen Umrichter
CN201331557Y (zh) 一种新型gdk型供电控制箱

Legal Events

Date Code Title Description
8364 No opposition during term of opposition