DE69629111T2 - Verfahren zur herstellung eines synthetischen quarzpulvers und geformtem quarzglas - Google Patents

Verfahren zur herstellung eines synthetischen quarzpulvers und geformtem quarzglas Download PDF

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Publication number
DE69629111T2
DE69629111T2 DE69629111T DE69629111T DE69629111T2 DE 69629111 T2 DE69629111 T2 DE 69629111T2 DE 69629111 T DE69629111 T DE 69629111T DE 69629111 T DE69629111 T DE 69629111T DE 69629111 T2 DE69629111 T2 DE 69629111T2
Authority
DE
Germany
Prior art keywords
powder
silica gel
rotary kiln
synthetic quartz
core tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69629111T
Other languages
German (de)
English (en)
Other versions
DE69629111D1 (de
Inventor
Yoshio Katsuro
Masaru Shimoyama
Hiroshi Maeda
Shoji Oishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP10588895A external-priority patent/JP3735886B2/ja
Priority claimed from JP10588995A external-priority patent/JP3735887B2/ja
Priority claimed from JP25245695A external-priority patent/JP3875735B2/ja
Priority claimed from JP25245895A external-priority patent/JP3806953B2/ja
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Publication of DE69629111D1 publication Critical patent/DE69629111D1/de
Application granted granted Critical
Publication of DE69629111T2 publication Critical patent/DE69629111T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/11—Powder tap density
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Silicon Compounds (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)
DE69629111T 1995-04-28 1996-04-26 Verfahren zur herstellung eines synthetischen quarzpulvers und geformtem quarzglas Expired - Lifetime DE69629111T2 (de)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
JP10588895 1995-04-28
JP10588895A JP3735886B2 (ja) 1995-04-28 1995-04-28 合成石英粉の製造方法及び石英ガラス成形体の製造方法
JP10588995A JP3735887B2 (ja) 1995-04-28 1995-04-28 合成石英粉の製造方法及び石英ガラス成形体の製造方法
JP10588995 1995-04-28
JP25245795 1995-09-29
JP25245795 1995-09-29
JP25245895 1995-09-29
JP25245695A JP3875735B2 (ja) 1995-09-29 1995-09-29 合成石英粉の製造方法
JP25245895A JP3806953B2 (ja) 1995-09-29 1995-09-29 合成石英粉の製造方法
JP25245695 1995-09-29
PCT/JP1996/001176 WO1996033950A1 (fr) 1995-04-28 1996-04-26 Procedes pour produire de la poudre de quartz synthetique et pour produire du verre de quartz forme

Publications (2)

Publication Number Publication Date
DE69629111D1 DE69629111D1 (de) 2003-08-21
DE69629111T2 true DE69629111T2 (de) 2004-04-22

Family

ID=27526249

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69629111T Expired - Lifetime DE69629111T2 (de) 1995-04-28 1996-04-26 Verfahren zur herstellung eines synthetischen quarzpulvers und geformtem quarzglas

Country Status (5)

Country Link
US (1) US6129899A (OSRAM)
EP (1) EP0823403B1 (OSRAM)
KR (1) KR19990008146A (OSRAM)
DE (1) DE69629111T2 (OSRAM)
WO (1) WO1996033950A1 (OSRAM)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1088789A3 (en) * 1999-09-28 2002-03-27 Heraeus Quarzglas GmbH & Co. KG Porous silica granule, its method of production and its use in a method for producing quartz glass
DE60123878T2 (de) * 2000-06-28 2007-05-24 Japan Super Quartz Corp. Synthetisches Quarzpulver, Verfahren zur Herstellung und synthetischer Quarztiegel
US6838068B2 (en) * 2000-06-30 2005-01-04 Mitsubishi Chemical Corporation Silica gel
WO2002026647A1 (en) * 2000-09-28 2002-04-04 Corning Incorporated Optical glass silica soot particles and method of making same
WO2003008332A1 (en) * 2001-07-19 2003-01-30 Mitsubishi Chemical Corporation High purity quartz powder and method for production thereof, and formed glass article from the powder
EP1420035B1 (en) * 2002-11-12 2007-06-06 Nitto Denko Corporation Filled epoxy resin composition for semiconductor encapsulation and semiconductor using same
BRPI0412080A (pt) * 2003-06-30 2006-09-05 Shell Int Research processos para a preparação de um catalisador de epoxidação e para a preparação de óxido de alquileno
US7637126B2 (en) * 2003-12-08 2009-12-29 Heraeus Quarzglas Gmbh & Co. Kg Method for the production of laser-active quartz glass and use thereof
JP2008056533A (ja) * 2006-08-31 2008-03-13 Shinetsu Quartz Prod Co Ltd 石英ガラス及びその製造方法
US9249028B2 (en) 2010-02-08 2016-02-02 Momentive Performance Materials Inc. Method for making high purity metal oxide particles and materials made thereof
US8197782B2 (en) 2010-02-08 2012-06-12 Momentive Performance Materials Method for making high purity metal oxide particles and materials made thereof
PL3218317T3 (pl) 2014-11-13 2019-03-29 Gerresheimer Glas Gmbh Filtr cząstek urządzenia do wytwarzania szkła, jednostka tłoka, głowica dmuchu, wspornik głowicy dmuchu i urządzenie do wytwarzania szkła, przystosowane lub zawierające filtr
TWI813534B (zh) 2015-12-18 2023-09-01 德商何瑞斯廓格拉斯公司 利用露點監測在熔融烘箱中製備石英玻璃體
US10618833B2 (en) 2015-12-18 2020-04-14 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a synthetic quartz glass grain
EP3390293B1 (de) 2015-12-18 2023-04-19 Heraeus Quarzglas GmbH & Co. KG Erhöhen des siliziumgehalts bei der herstellung von quarzglas
JP6940235B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 高融点金属の溶融坩堝内での石英ガラス体の調製
CN108698880B (zh) 2015-12-18 2023-05-02 贺利氏石英玻璃有限两合公司 不透明石英玻璃体的制备
TWI788278B (zh) 2015-12-18 2023-01-01 德商何瑞斯廓格拉斯公司 由均質石英玻璃製得之玻璃纖維及預成型品
TW201731782A (zh) 2015-12-18 2017-09-16 何瑞斯廓格拉斯公司 在多腔式爐中製備石英玻璃體
CN108698883A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 石英玻璃制备中的二氧化硅的喷雾造粒
JP7044454B2 (ja) 2015-12-18 2022-03-30 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 石英ガラス調製時の中間体としての炭素ドープ二酸化ケイ素造粒体の調製
JP6981710B2 (ja) 2015-12-18 2021-12-17 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 二酸化ケイ素造粒体からの石英ガラス体の調製

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58181735A (ja) * 1982-04-19 1983-10-24 Seiko Epson Corp 石英ガラスの製造法
JPS6335411A (ja) * 1986-07-29 1988-02-16 Tonen Sekiyukagaku Kk 高純度合成石英の製造方法
US5030433A (en) * 1988-07-18 1991-07-09 International Minerals & Chemical Corp. Process for producing pure and dense amorphous synthetic silica particles
DE69109026T2 (de) * 1990-09-07 1995-12-07 Mitsubishi Chem Corp Silica-Glas Pulver und Verfahren seiner Herstellung und daraus hergestellter Silica-Glasgegenstand.
EP0486004B1 (en) * 1990-11-16 1996-09-11 Mitsubishi Chemical Corporation Method for producing a high-purity silica glass powder
DE69227521T3 (de) * 1992-07-31 2003-12-24 Shin-Etsu Quartz Products Co., Ltd. Verfahren für die Herstellung einer Quartzglasscheibe mit grosser Abmessung und hoher Sauberkeit
JPH06191824A (ja) * 1992-12-24 1994-07-12 Mitsubishi Kasei Corp 石英粉の廻転加熱方法
JPH072513A (ja) * 1993-06-15 1995-01-06 Kimmon Mfg Co Ltd 合成石英ガラス粉の製造方法
US6110852A (en) * 1994-12-26 2000-08-29 Mitsubishi Chemical Corporation Process for producing synthetic quartz glass powder
DE19729505A1 (de) * 1997-07-10 1999-01-14 Heraeus Quarzglas Verfahren zur Herstellung von Si0¶2¶-Granulat

Also Published As

Publication number Publication date
KR19990008146A (ko) 1999-01-25
DE69629111D1 (de) 2003-08-21
WO1996033950A1 (fr) 1996-10-31
EP0823403B1 (en) 2003-07-16
EP0823403A4 (OSRAM) 1998-02-25
US6129899A (en) 2000-10-10
EP0823403A1 (en) 1998-02-11

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