DE69621173T2 - Benzanthron als Polymerisierungsregler in fotopolymerisierbarer Zusammensetzung - Google Patents
Benzanthron als Polymerisierungsregler in fotopolymerisierbarer ZusammensetzungInfo
- Publication number
- DE69621173T2 DE69621173T2 DE69621173T DE69621173T DE69621173T2 DE 69621173 T2 DE69621173 T2 DE 69621173T2 DE 69621173 T DE69621173 T DE 69621173T DE 69621173 T DE69621173 T DE 69621173T DE 69621173 T2 DE69621173 T2 DE 69621173T2
- Authority
- DE
- Germany
- Prior art keywords
- benzanthrone
- photopolymerizable composition
- polymerization regulator
- regulator
- polymerization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/118—Initiator containing with inhibitor or stabilizer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/118—Initiator containing with inhibitor or stabilizer
- Y10S430/119—Hydroxyl or carbonyl group containing as sole functional groups
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
- Y10S430/123—Sulfur in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/393,969 US5543262A (en) | 1995-02-24 | 1995-02-24 | Benzanthrone polymerization gate in photopolymerizable compositions |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69621173D1 DE69621173D1 (de) | 2002-06-20 |
DE69621173T2 true DE69621173T2 (de) | 2003-01-02 |
Family
ID=23556998
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69621173T Expired - Fee Related DE69621173T2 (de) | 1995-02-24 | 1996-02-07 | Benzanthron als Polymerisierungsregler in fotopolymerisierbarer Zusammensetzung |
Country Status (6)
Country | Link |
---|---|
US (1) | US5543262A (de) |
EP (1) | EP0729069B1 (de) |
JP (1) | JP3650455B2 (de) |
AU (1) | AU696613B2 (de) |
CA (1) | CA2169898A1 (de) |
DE (1) | DE69621173T2 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9522683D0 (en) * | 1995-11-06 | 1996-01-10 | Coates Brothers Plc | Photoinitiator |
KR100265766B1 (ko) * | 1997-09-04 | 2000-09-15 | 윤종용 | 반도체장치 제조용 웨이퍼의 리워크방법 및 반도체장치의 제조방법 |
US5900345A (en) * | 1997-10-06 | 1999-05-04 | Kodak Polychrome Graphics, Llc | Surfactant in precoat for lithographic plates |
DE19816056A1 (de) | 1998-03-23 | 1999-09-30 | Dystar Textilfarben Gmbh & Co | Dispersionsazofarbstoffmischungen |
US6048375A (en) * | 1998-12-16 | 2000-04-11 | Norton Company | Coated abrasive |
US6413699B1 (en) | 1999-10-11 | 2002-07-02 | Macdermid Graphic Arts, Inc. | UV-absorbing support layers and flexographic printing elements comprising same |
US6495239B1 (en) | 1999-12-10 | 2002-12-17 | International Business Corporation | Dielectric structure and method of formation |
DE10051577A1 (de) * | 2000-10-18 | 2002-06-06 | Agfa Gevaert Nv | Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht |
US7597935B2 (en) * | 2002-05-06 | 2009-10-06 | Lacks Enterprises, Inc. | Process for preparing chrome surface for coating |
US7045269B2 (en) * | 2003-03-10 | 2006-05-16 | Eastman Kodak Company | Method for forming images using negative working imageable elements |
US6960419B2 (en) * | 2003-12-12 | 2005-11-01 | Kodak Polychrome Graphics Llc | Antihalation dye for negative-working printing plates |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE759041A (fr) * | 1969-11-18 | 1971-05-17 | Du Pont | Compositions photopolymerisables contenant des aminophenylcetones et des adjuvants |
US4048036A (en) * | 1974-10-24 | 1977-09-13 | Ppg Industries, Inc. | Process for producing films of low gloss by exposure to ultraviolet light |
JPS6049892B2 (ja) * | 1976-04-26 | 1985-11-05 | 富士写真フイルム株式会社 | 光重合性組成物 |
JPS5994B2 (ja) * | 1976-09-14 | 1984-01-05 | 富士写真フイルム株式会社 | 感光性組成物 |
JPS6026122B2 (ja) * | 1977-01-20 | 1985-06-21 | 富士写真フイルム株式会社 | 光重合性組成物 |
JPS54152091A (en) * | 1978-05-22 | 1979-11-29 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
JPS61123602A (ja) * | 1984-11-19 | 1986-06-11 | Mitsubishi Chem Ind Ltd | 光重合性組成物 |
US4565857A (en) * | 1984-11-21 | 1986-01-21 | Minnesota Mining And Manufacturing Company | Radiation-curable cellulose coating |
US4946373A (en) * | 1985-02-28 | 1990-08-07 | Hoechst Celanese Corporation | Radiation-polymerizable composition |
US5080999A (en) * | 1985-06-10 | 1992-01-14 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide |
US5286594A (en) * | 1988-01-29 | 1994-02-15 | International Paper Company | Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles |
-
1995
- 1995-02-24 US US08/393,969 patent/US5543262A/en not_active Expired - Fee Related
-
1996
- 1996-02-07 DE DE69621173T patent/DE69621173T2/de not_active Expired - Fee Related
- 1996-02-07 EP EP96300833A patent/EP0729069B1/de not_active Expired - Lifetime
- 1996-02-13 AU AU45515/96A patent/AU696613B2/en not_active Ceased
- 1996-02-20 CA CA002169898A patent/CA2169898A1/en not_active Abandoned
- 1996-02-22 JP JP03445696A patent/JP3650455B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0729069A1 (de) | 1996-08-28 |
JP3650455B2 (ja) | 2005-05-18 |
JPH08297365A (ja) | 1996-11-12 |
CA2169898A1 (en) | 1996-08-25 |
AU696613B2 (en) | 1998-09-17 |
EP0729069B1 (de) | 2002-05-15 |
AU4551596A (en) | 1996-09-05 |
US5543262A (en) | 1996-08-06 |
DE69621173D1 (de) | 2002-06-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |