DE69614007D1 - Verfahren zur Einstellung einer optischen Projektionsvorrichtung - Google Patents

Verfahren zur Einstellung einer optischen Projektionsvorrichtung

Info

Publication number
DE69614007D1
DE69614007D1 DE69614007T DE69614007T DE69614007D1 DE 69614007 D1 DE69614007 D1 DE 69614007D1 DE 69614007 T DE69614007 T DE 69614007T DE 69614007 T DE69614007 T DE 69614007T DE 69614007 D1 DE69614007 D1 DE 69614007D1
Authority
DE
Germany
Prior art keywords
adjusting
projection device
optical projection
optical
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
DE69614007T
Other languages
English (en)
Other versions
DE69614007T2 (de
Inventor
Hiroshi Chiba
Toshikazu Yoshikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=11727134&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69614007(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of DE69614007D1 publication Critical patent/DE69614007D1/de
Publication of DE69614007T2 publication Critical patent/DE69614007T2/de
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
DE69614007T 1995-01-25 1996-01-24 Verfahren zur Einstellung einer optischen Projektionsvorrichtung Revoked DE69614007T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP00968795A JP3893626B2 (ja) 1995-01-25 1995-01-25 投影光学装置の調整方法、投影光学装置、露光装置及び露光方法

Publications (2)

Publication Number Publication Date
DE69614007D1 true DE69614007D1 (de) 2001-08-30
DE69614007T2 DE69614007T2 (de) 2002-03-21

Family

ID=11727134

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69614007T Revoked DE69614007T2 (de) 1995-01-25 1996-01-24 Verfahren zur Einstellung einer optischen Projektionsvorrichtung

Country Status (5)

Country Link
US (5) US6268903B1 (de)
EP (2) EP0724199B1 (de)
JP (1) JP3893626B2 (de)
KR (1) KR100422330B1 (de)
DE (1) DE69614007T2 (de)

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JP5629050B2 (ja) * 2004-06-10 2014-11-19 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置のための投影対物レンズ
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DE102006003375A1 (de) * 2006-01-24 2007-08-09 Carl Zeiss Smt Ag Gruppenweise korrigiertes Objektiv
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KR101379096B1 (ko) * 2006-06-16 2014-03-28 칼 짜이스 에스엠티 게엠베하 마이크로 리소그라피 투사 노광 장치의 투사 대물렌즈
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CN101548240B (zh) 2006-12-01 2014-09-17 卡尔蔡司Smt有限责任公司 具有用于减小像差的可替换、可操纵的校正布置的光学系统
WO2009018911A1 (en) 2007-08-03 2009-02-12 Carl Zeiss Smt Ag Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate
JP5402391B2 (ja) 2009-01-27 2014-01-29 信越化学工業株式会社 半導体用合成石英ガラス基板の加工方法
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CN102566296B (zh) * 2010-12-31 2014-07-16 上海微电子装备有限公司 一种光刻曝光系统集成装配方法
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Also Published As

Publication number Publication date
KR960029825A (ko) 1996-08-17
KR100422330B1 (ko) 2004-05-17
US20040196444A1 (en) 2004-10-07
DE69614007T2 (de) 2002-03-21
US20030174297A1 (en) 2003-09-18
EP1087264A1 (de) 2001-03-28
EP0724199A1 (de) 1996-07-31
JPH08203805A (ja) 1996-08-09
US6268903B1 (en) 2001-07-31
EP0724199B1 (de) 2001-07-25
US6377333B1 (en) 2002-04-23
US20020113953A1 (en) 2002-08-22
JP3893626B2 (ja) 2007-03-14

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