DE69512354D1 - Verfahren zur optischen Projektionsbelichtung - Google Patents
Verfahren zur optischen ProjektionsbelichtungInfo
- Publication number
- DE69512354D1 DE69512354D1 DE69512354T DE69512354T DE69512354D1 DE 69512354 D1 DE69512354 D1 DE 69512354D1 DE 69512354 T DE69512354 T DE 69512354T DE 69512354 T DE69512354 T DE 69512354T DE 69512354 D1 DE69512354 D1 DE 69512354D1
- Authority
- DE
- Germany
- Prior art keywords
- exposure method
- projection exposure
- optical projection
- optical
- projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
- G03F7/70333—Focus drilling, i.e. increase in depth of focus for exposure by modulating focus during exposure [FLEX]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6293468A JPH08153661A (ja) | 1994-11-28 | 1994-11-28 | 投影露光方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69512354D1 true DE69512354D1 (de) | 1999-10-28 |
DE69512354T2 DE69512354T2 (de) | 2000-03-23 |
Family
ID=17795144
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69512354T Expired - Fee Related DE69512354T2 (de) | 1994-11-28 | 1995-11-24 | Verfahren zur optischen Projektionsbelichtung |
Country Status (5)
Country | Link |
---|---|
US (1) | US5883700A (de) |
EP (1) | EP0715213B1 (de) |
JP (1) | JPH08153661A (de) |
KR (1) | KR960018770A (de) |
DE (1) | DE69512354T2 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3159163B2 (ja) | 1998-04-06 | 2001-04-23 | 日本電気株式会社 | 走査露光方法及び走査露光装置 |
JP3363787B2 (ja) * | 1998-05-02 | 2003-01-08 | キヤノン株式会社 | 露光方法および露光装置 |
US6586160B2 (en) | 2001-03-26 | 2003-07-01 | Motorola, Inc. | Method for patterning resist |
US6784975B2 (en) * | 2001-08-30 | 2004-08-31 | Micron Technology, Inc. | Method and apparatus for irradiating a microlithographic substrate |
US6794100B2 (en) * | 2001-08-30 | 2004-09-21 | Micron Technology, Inc. | Method for controlling radiation beam intensity directed to microlithographic substrates |
US6894765B2 (en) * | 2003-10-14 | 2005-05-17 | Micron Technology, Inc. | Methods and systems for controlling radiation beam characteristics for microlithographic processing |
EP1524557A1 (de) | 2003-10-15 | 2005-04-20 | ASML Netherlands B.V. | Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung |
US7446855B2 (en) * | 2005-07-25 | 2008-11-04 | Micron Technology, Inc | Methods and apparatuses for configuring radiation in microlithographic processing of workpieces using an adjustment structure |
US20080090396A1 (en) * | 2006-10-06 | 2008-04-17 | Semiconductor Energy Laboratory Co., Ltd. | Light exposure apparatus and method for making semiconductor device formed using the same |
US7838178B2 (en) * | 2007-08-13 | 2010-11-23 | Micron Technology, Inc. | Masks for microlithography and methods of making and using such masks |
DE102008064504B4 (de) * | 2008-12-22 | 2011-04-07 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie |
CN102714707B (zh) * | 2010-01-05 | 2015-06-03 | 皇家飞利浦电子股份有限公司 | 图像投影设备和方法 |
JP2017050816A (ja) * | 2015-09-04 | 2017-03-09 | パナソニックIpマネジメント株式会社 | 照明装置、及び、照明システム |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5817446A (ja) | 1981-07-24 | 1983-02-01 | Hitachi Ltd | 投影露光方法および装置 |
US4688932A (en) * | 1985-02-12 | 1987-08-25 | Canon Kabushiki Kaisha | Exposure apparatus |
US4869999A (en) * | 1986-08-08 | 1989-09-26 | Hitachi, Ltd. | Method of forming pattern and projection aligner for carrying out the same |
JPH0810666B2 (ja) | 1986-09-05 | 1996-01-31 | 株式会社日立製作所 | パターン形成方法 |
US4924257A (en) * | 1988-10-05 | 1990-05-08 | Kantilal Jain | Scan and repeat high resolution projection lithography system |
US5117255A (en) * | 1990-09-19 | 1992-05-26 | Nikon Corporation | Projection exposure apparatus |
JP2830492B2 (ja) * | 1991-03-06 | 1998-12-02 | 株式会社ニコン | 投影露光装置及び投影露光方法 |
JPH07142325A (ja) * | 1993-06-23 | 1995-06-02 | Nikon Corp | 位置合わせ装置 |
US5473409A (en) * | 1993-09-21 | 1995-12-05 | Sony Corporation | Semiconductor light exposure device |
-
1994
- 1994-11-28 JP JP6293468A patent/JPH08153661A/ja not_active Withdrawn
-
1995
- 1995-11-24 DE DE69512354T patent/DE69512354T2/de not_active Expired - Fee Related
- 1995-11-24 EP EP95118575A patent/EP0715213B1/de not_active Expired - Lifetime
- 1995-11-27 KR KR1019950043825A patent/KR960018770A/ko not_active Application Discontinuation
- 1995-11-27 US US08/563,091 patent/US5883700A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0715213B1 (de) | 1999-09-22 |
DE69512354T2 (de) | 2000-03-23 |
US5883700A (en) | 1999-03-16 |
KR960018770A (ko) | 1996-06-17 |
EP0715213A1 (de) | 1996-06-05 |
JPH08153661A (ja) | 1996-06-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |