DE69215942T2 - Verfahren und System zur optischen Projetkionsbelichtung - Google Patents
Verfahren und System zur optischen ProjetkionsbelichtungInfo
- Publication number
- DE69215942T2 DE69215942T2 DE69215942T DE69215942T DE69215942T2 DE 69215942 T2 DE69215942 T2 DE 69215942T2 DE 69215942 T DE69215942 T DE 69215942T DE 69215942 T DE69215942 T DE 69215942T DE 69215942 T2 DE69215942 T2 DE 69215942T2
- Authority
- DE
- Germany
- Prior art keywords
- projection exposure
- optical projection
- optical
- exposure
- projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Revoked
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/52—Details
- G03B27/53—Automatic registration or positioning of originals with respect to each other or the photosensitive layer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70125—Use of illumination settings tailored to particular mask patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (14)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9982291 | 1991-04-05 | ||
JP13531791 | 1991-05-13 | ||
JP3142782A JP2657936B2 (ja) | 1991-05-20 | 1991-05-20 | マスク照明光学系及びそれを用いる投影露光装置並びに方法 |
JP3148133A JP2673915B2 (ja) | 1991-05-24 | 1991-05-24 | 微細パタン投影露光装置 |
JP3157401A JP2666161B2 (ja) | 1991-04-05 | 1991-06-03 | 微細パタン投影露光方法 |
JP17781691A JP2694707B2 (ja) | 1991-06-24 | 1991-06-24 | 投影露光方法及び投影露光装置 |
JP19745791A JP2630694B2 (ja) | 1991-07-12 | 1991-07-12 | 投影露光装置用マスク |
JP3218099A JPH0541346A (ja) | 1991-08-05 | 1991-08-05 | 微細パタン投影露光装置 |
JP3218098A JPH0541342A (ja) | 1991-08-05 | 1991-08-05 | 微細パタン投影露光装置 |
JP3218100A JP2613826B2 (ja) | 1991-08-05 | 1991-08-05 | 投影露光装置 |
JP3225335A JP2666162B2 (ja) | 1991-08-12 | 1991-08-12 | 微細パタン投影露光装置 |
JP3235753A JPH0555110A (ja) | 1991-08-23 | 1991-08-23 | 微細パタン投影露光方法および装置 |
JP3254306A JP2807936B2 (ja) | 1991-09-06 | 1991-09-06 | 微細パタン投影露光装置 |
JP3290442A JP3021134B2 (ja) | 1991-10-11 | 1991-10-11 | 微細パタン投影露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69215942D1 DE69215942D1 (de) | 1997-01-30 |
DE69215942T2 true DE69215942T2 (de) | 1997-07-24 |
Family
ID=27584872
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69215942T Revoked DE69215942T2 (de) | 1991-04-05 | 1992-03-24 | Verfahren und System zur optischen Projetkionsbelichtung |
Country Status (4)
Country | Link |
---|---|
US (1) | US5208629A (de) |
EP (1) | EP0507487B1 (de) |
KR (1) | KR970004682B1 (de) |
DE (1) | DE69215942T2 (de) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5638211A (en) | 1990-08-21 | 1997-06-10 | Nikon Corporation | Method and apparatus for increasing the resolution power of projection lithography exposure system |
US7656504B1 (en) | 1990-08-21 | 2010-02-02 | Nikon Corporation | Projection exposure apparatus with luminous flux distribution |
US6885433B2 (en) * | 1990-11-15 | 2005-04-26 | Nikon Corporation | Projection exposure apparatus and method |
US5719704A (en) | 1991-09-11 | 1998-02-17 | Nikon Corporation | Projection exposure apparatus |
US6897942B2 (en) * | 1990-11-15 | 2005-05-24 | Nikon Corporation | Projection exposure apparatus and method |
US6967710B2 (en) | 1990-11-15 | 2005-11-22 | Nikon Corporation | Projection exposure apparatus and method |
US6710855B2 (en) * | 1990-11-15 | 2004-03-23 | Nikon Corporation | Projection exposure apparatus and method |
US6252647B1 (en) | 1990-11-15 | 2001-06-26 | Nikon Corporation | Projection exposure apparatus |
JPH0567558A (ja) * | 1991-09-06 | 1993-03-19 | Nikon Corp | 露光方法 |
US5348837A (en) * | 1991-09-24 | 1994-09-20 | Hitachi, Ltd. | Projection exposure apparatus and pattern forming method for use therewith |
US5530518A (en) * | 1991-12-25 | 1996-06-25 | Nikon Corporation | Projection exposure apparatus |
USRE39662E1 (en) * | 1991-12-25 | 2007-05-29 | Nikon Corporation | Projection exposure apparatus |
US5703675A (en) * | 1992-01-17 | 1997-12-30 | Nikon Corporation | Projection-exposing apparatus with deflecting grating member |
JP3194155B2 (ja) * | 1992-01-31 | 2001-07-30 | キヤノン株式会社 | 半導体デバイスの製造方法及びそれを用いた投影露光装置 |
JP3210123B2 (ja) * | 1992-03-27 | 2001-09-17 | キヤノン株式会社 | 結像方法及び該方法を用いたデバイス製造方法 |
US5274420A (en) * | 1992-04-20 | 1993-12-28 | International Business Machines Corporation | Beamsplitter type lens elements with pupil-plane stops for lithographic systems |
KR970003593B1 (en) * | 1992-09-03 | 1997-03-20 | Samsung Electronics Co Ltd | Projection exposure method and device using mask |
JPH06333803A (ja) * | 1992-09-18 | 1994-12-02 | Sharp Corp | 投影型露光装置用フィルター |
US6017681A (en) * | 1992-11-09 | 2000-01-25 | Fujitsu Limited | Method of coupling optical parts and method of forming a mirror |
JP3064769B2 (ja) * | 1992-11-21 | 2000-07-12 | アルバック成膜株式会社 | 位相シフトマスクおよびその製造方法ならびにその位相シフトマスクを用いた露光方法 |
US5320918A (en) * | 1992-12-31 | 1994-06-14 | At&T Bell Laboratories | Optical lithographical imaging system including optical transmission diffraction devices |
US5486896A (en) * | 1993-02-19 | 1996-01-23 | Nikon Corporation | Exposure apparatus |
WO1994019723A1 (en) * | 1993-02-23 | 1994-09-01 | Interuniversitair Micro-Elektronica | Resolution-enhancing optical phase structure for a projection illumination system |
US5552856A (en) * | 1993-06-14 | 1996-09-03 | Nikon Corporation | Projection exposure apparatus |
KR960011461B1 (ko) * | 1993-06-25 | 1996-08-22 | 현대전자산업 주식회사 | 회절빛 제어 마스크 |
JP3291849B2 (ja) * | 1993-07-15 | 2002-06-17 | 株式会社ニコン | 露光方法、デバイス形成方法、及び露光装置 |
JPH0757993A (ja) * | 1993-08-13 | 1995-03-03 | Nikon Corp | 投影露光装置 |
JP2590700B2 (ja) * | 1993-09-16 | 1997-03-12 | 日本電気株式会社 | 投影露光装置 |
EP0658810B1 (de) * | 1993-12-13 | 1998-11-25 | Carl Zeiss | Beleuchtungseinrichtung für ein optisches System mit einem Reticle-Maskierungssystem |
EP0687956B2 (de) | 1994-06-17 | 2005-11-23 | Carl Zeiss SMT AG | Beleuchtungseinrichtung |
US6426131B1 (en) * | 1998-08-24 | 2002-07-30 | Lsi Logic Corporation | Off-axis pupil aperture and method for making the same |
JP3264368B2 (ja) * | 1998-10-16 | 2002-03-11 | 日本電気株式会社 | 縮小投影型露光装置の調整方法 |
JP3267272B2 (ja) * | 1999-01-26 | 2002-03-18 | 日本電気株式会社 | 投影光学系の収差量の測定方法 |
JP2002231619A (ja) * | 2000-11-29 | 2002-08-16 | Nikon Corp | 照明光学装置および該照明光学装置を備えた露光装置 |
US6563566B2 (en) | 2001-01-29 | 2003-05-13 | International Business Machines Corporation | System and method for printing semiconductor patterns using an optimized illumination and reticle |
JP3615181B2 (ja) * | 2001-11-06 | 2005-01-26 | 株式会社東芝 | 露光装置の検査方法、焦点位置を補正する露光方法、および半導体装置の製造方法 |
US20040161709A1 (en) * | 2003-02-10 | 2004-08-19 | Schroeder Joseph F. | Laser-written optical structures within calcium fluoride and other crystal materials |
JP2005077966A (ja) * | 2003-09-03 | 2005-03-24 | Dainippon Printing Co Ltd | 回折光学素子 |
DE102004058044B4 (de) * | 2004-12-01 | 2014-02-06 | Friedrich-Schiller-Universität Jena | Ortsfrequenzfiltervorrichtung und Verfahren zur Ortsfrequenzfilterung von Laserstrahlen |
ATE400062T1 (de) * | 2005-06-30 | 2008-07-15 | Suisse Electronique Microtech | Farbbildaufnahmesensor |
US20070260720A1 (en) * | 2006-05-03 | 2007-11-08 | Morain Gary E | Mobility domain |
US8054449B2 (en) | 2006-11-22 | 2011-11-08 | Asml Holding N.V. | Enhancing the image contrast of a high resolution exposure tool |
CN107247389A (zh) * | 2017-07-06 | 2017-10-13 | 武汉华星光电技术有限公司 | 曝光方法和聚光透镜以及曝光机 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5942517A (ja) * | 1982-09-02 | 1984-03-09 | Nippon Kogaku Kk <Nikon> | 二重焦点光学系 |
JPH0682598B2 (ja) * | 1984-10-11 | 1994-10-19 | 日本電信電話株式会社 | 投影露光装置 |
JPH0666241B2 (ja) * | 1985-10-14 | 1994-08-24 | 株式会社日立製作所 | 位置検出方法 |
US5026145A (en) * | 1987-09-24 | 1991-06-25 | Asahi Kogaku Kogyo Kabushiki Kaisha | Exposure apparatus |
US5121160A (en) * | 1989-03-09 | 1992-06-09 | Canon Kabushiki Kaisha | Exposure method and apparatus |
US5117255A (en) * | 1990-09-19 | 1992-05-26 | Nikon Corporation | Projection exposure apparatus |
US5144362A (en) * | 1990-11-14 | 1992-09-01 | Mitsubishi Denki Kabushiki Kaisha | Projection aligner |
-
1992
- 1992-03-24 DE DE69215942T patent/DE69215942T2/de not_active Revoked
- 1992-03-24 EP EP92302512A patent/EP0507487B1/de not_active Revoked
- 1992-04-03 US US07/863,454 patent/US5208629A/en not_active Expired - Lifetime
- 1992-04-06 KR KR1019920005715A patent/KR970004682B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0507487A2 (de) | 1992-10-07 |
EP0507487A3 (en) | 1993-10-27 |
US5208629A (en) | 1993-05-04 |
KR970004682B1 (ko) | 1997-04-02 |
KR920020229A (ko) | 1992-11-20 |
DE69215942D1 (de) | 1997-01-30 |
EP0507487B1 (de) | 1996-12-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8363 | Opposition against the patent | ||
8331 | Complete revocation |