DE69613432T2 - Belichtungsapparat und Belichtungsverfahren unter Verwendung desselben - Google Patents

Belichtungsapparat und Belichtungsverfahren unter Verwendung desselben

Info

Publication number
DE69613432T2
DE69613432T2 DE69613432T DE69613432T DE69613432T2 DE 69613432 T2 DE69613432 T2 DE 69613432T2 DE 69613432 T DE69613432 T DE 69613432T DE 69613432 T DE69613432 T DE 69613432T DE 69613432 T2 DE69613432 T2 DE 69613432T2
Authority
DE
Germany
Prior art keywords
exposure
same
exposure apparatus
exposure method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69613432T
Other languages
English (en)
Other versions
DE69613432D1 (de
Inventor
Jae-Kwan Song
Jeong-Kon Kim
Kyung-Sung Bae
Kyoung-Shin Park
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of DE69613432D1 publication Critical patent/DE69613432D1/de
Application granted granted Critical
Publication of DE69613432T2 publication Critical patent/DE69613432T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69613432T 1995-06-19 1996-03-26 Belichtungsapparat und Belichtungsverfahren unter Verwendung desselben Expired - Lifetime DE69613432T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950016257A KR0155830B1 (ko) 1995-06-19 1995-06-19 변형노광장치 및 노광방법

Publications (2)

Publication Number Publication Date
DE69613432D1 DE69613432D1 (de) 2001-07-26
DE69613432T2 true DE69613432T2 (de) 2002-05-29

Family

ID=19417482

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69613432T Expired - Lifetime DE69613432T2 (de) 1995-06-19 1996-03-26 Belichtungsapparat und Belichtungsverfahren unter Verwendung desselben

Country Status (5)

Country Link
US (1) US5691803A (de)
EP (1) EP0750231B1 (de)
JP (1) JP3887034B2 (de)
KR (1) KR0155830B1 (de)
DE (1) DE69613432T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000250100A (ja) * 1999-03-01 2000-09-14 Mitsutoyo Corp 光学測定機用照明装置
US6361909B1 (en) 1999-12-06 2002-03-26 Industrial Technology Research Institute Illumination aperture filter design using superposition
US6403285B1 (en) 1999-12-17 2002-06-11 Micron Technology, Inc. Method for exposing semiconductor wafers in a manner that promotes radial processing uniformity
US6261727B1 (en) 1999-12-28 2001-07-17 Taiwan Semiconductor Manufacturing Company DOF for both dense and isolated contact holes
JP2002324743A (ja) * 2001-04-24 2002-11-08 Canon Inc 露光方法及び装置
US7217503B2 (en) * 2001-04-24 2007-05-15 Canon Kabushiki Kaisha Exposure method and apparatus
JP4171647B2 (ja) 2001-11-28 2008-10-22 エーエスエムエル マスクツールズ ビー．ブイ． プロセス・ラチチュードを改善するために利用した補助形態を除去する方法
KR20150036786A (ko) 2003-04-09 2015-04-07 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI569308B (zh) 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI519819B (zh) 2003-11-20 2016-02-01 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TWI412067B (zh) 2004-02-06 2013-10-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
US20050225740A1 (en) * 2004-03-31 2005-10-13 Padlyar Sushil D Light source for photolithography
KR100613461B1 (ko) * 2005-06-29 2006-08-17 주식회사 하이닉스반도체 이중노광기술을 이용한 이중노광방법과 이를 위한포토마스크

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0967524A3 (de) * 1990-11-15 2000-01-05 Nikon Corporation Verfahren und Vorrichtung zur Projektionsbelichtung
US5357311A (en) * 1991-02-25 1994-10-18 Nikon Corporation Projection type light exposure apparatus and light exposure method
US5348837A (en) * 1991-09-24 1994-09-20 Hitachi, Ltd. Projection exposure apparatus and pattern forming method for use therewith
JPH06333803A (ja) * 1992-09-18 1994-12-02 Sharp Corp 投影型露光装置用フィルター
US5552856A (en) * 1993-06-14 1996-09-03 Nikon Corporation Projection exposure apparatus

Also Published As

Publication number Publication date
JPH097937A (ja) 1997-01-10
KR0155830B1 (ko) 1998-11-16
DE69613432D1 (de) 2001-07-26
EP0750231B1 (de) 2001-06-20
EP0750231A1 (de) 1996-12-27
JP3887034B2 (ja) 2007-02-28
KR970002477A (ko) 1997-01-24
US5691803A (en) 1997-11-25

Similar Documents

Publication Publication Date Title
DE69627584D1 (de) Abtastbelichtungsapparat und Belichtungsverfahren unter Verwendung desselben
DE69940765D1 (de) Ausrichtverfahren und Belichtungsapparat unter Verwendung desselben
FI973378A0 (fi) Laite ja menetelmä
DE69730903D1 (de) Belichtungsverfahren und -apparat
DE69623096D1 (de) Belichtungsapparat und -verfahren
DK0740896T3 (da) Fremgangsmåde og apparat til optimering af anvendelsen af landbrugs-maskiner
DE69512132D1 (de) Trägerplattevorrichtung und Belichtungsapparat unter Verwendung derselben
DE69631782D1 (de) Vorrichtung und druckverfahren
FI965093A (fi) Laite ja menetelmä kellon säätämiseksi ja kytkemiseksi
DE69517459T2 (de) Bilderzeugungsgerät und -verfahren
DE69535393D1 (de) Bilderzeugungsverfahren und -gerät
DE69736161D1 (de) Bilderzeugungsverfahren und Bilderzeugungsgerät
DE69630723D1 (de) Bilderzeugungsverfahren und -gerät
DE69615738D1 (de) Bilderzeugungsgerät und Verfahren dafür
DE69515005D1 (de) Bilderzeugungsvorrichtung mit Zwischenübertragung und Bilderzeugungsverfahren unter Verwendung derselben
DE69613432D1 (de) Belichtungsapparat und Belichtungsverfahren unter Verwendung desselben
DE69129509T2 (de) Filmbelichtungsapparat und Belichtungsverfahren unter Verwendung dieses Apparates
DE69705975T2 (de) Haltemechanismus und Belichtungsapparat unter Verwendung des Mechanismus
DE69536034D1 (de) Belichtungsapparat und Belichtungsverfahren
DE69624881D1 (de) Druckersystem und Druckerverfahren
FI954370A0 (fi) Menetelmä ja laite materiaalin ruiskuttamiseksi
DE69624886D1 (de) Bilderzeugungsgerät und Bilderzeugungsverfahren
KR0185798B1 (en) Illumination device and exposure method using the same
DE69604524T2 (de) Abtastbelichtungsapparat und Belichtungsverfahren unter Verwendung desselben
EE9800166A (et) Meetod ja seade lõhnaaine lisamiseks

Legal Events

Date Code Title Description
8364 No opposition during term of opposition