DE69705975T2 - Haltemechanismus und Belichtungsapparat unter Verwendung des Mechanismus - Google Patents

Haltemechanismus und Belichtungsapparat unter Verwendung des Mechanismus

Info

Publication number
DE69705975T2
DE69705975T2 DE69705975T DE69705975T DE69705975T2 DE 69705975 T2 DE69705975 T2 DE 69705975T2 DE 69705975 T DE69705975 T DE 69705975T DE 69705975 T DE69705975 T DE 69705975T DE 69705975 T2 DE69705975 T2 DE 69705975T2
Authority
DE
Germany
Prior art keywords
exposure apparatus
holding
holding mechanism
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69705975T
Other languages
English (en)
Other versions
DE69705975D1 (de
Inventor
Yuji Chiba
Shinichi Hara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69705975D1 publication Critical patent/DE69705975D1/de
Application granted granted Critical
Publication of DE69705975T2 publication Critical patent/DE69705975T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0456—Supports
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31788—Lithography by projection through mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Holders For Sensitive Materials And Originals (AREA)
  • Projection-Type Copiers In General (AREA)
DE69705975T 1996-02-06 1997-02-05 Haltemechanismus und Belichtungsapparat unter Verwendung des Mechanismus Expired - Fee Related DE69705975T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4424696A JP3243168B2 (ja) 1996-02-06 1996-02-06 原版保持装置およびこれを用いた露光装置

Publications (2)

Publication Number Publication Date
DE69705975D1 DE69705975D1 (de) 2001-09-13
DE69705975T2 true DE69705975T2 (de) 2002-04-04

Family

ID=12686187

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69705975T Expired - Fee Related DE69705975T2 (de) 1996-02-06 1997-02-05 Haltemechanismus und Belichtungsapparat unter Verwendung des Mechanismus

Country Status (4)

Country Link
US (1) US6005910A (de)
EP (1) EP0789280B1 (de)
JP (1) JP3243168B2 (de)
DE (1) DE69705975T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3814359B2 (ja) * 1996-03-12 2006-08-30 キヤノン株式会社 Ｘ線投影露光装置及びデバイス製造方法
DE10030004A1 (de) * 2000-06-17 2001-12-20 Zeiss Carl Vorrichtung zur Lagerung eines optischen Elementes, z.B. einer Linse in einem Objektiv
DE10030005A1 (de) 2000-06-17 2001-12-20 Zeiss Carl Objektiv, insbesondere Projektionsobjektiv in der Halbleiter-Lithographie
US6460414B1 (en) 2000-11-17 2002-10-08 Sonoscan, Inc. Automated acoustic micro imaging system and method
KR100597035B1 (ko) * 2001-03-01 2006-07-04 에이에스엠엘 네델란즈 비.브이. 마스크핸들링방법, 마스크, 그를 위한 그리퍼를 포함하는기구 또는 장치, 디바이스 제조방법 및 그 디바이스
EP1237045B1 (de) * 2001-03-01 2007-05-02 ASML Netherlands B.V. Verfahren zur Übernahme einer lithographischen Maske
JP4605373B2 (ja) * 2005-02-28 2011-01-05 株式会社ニコン 露光装置
KR101350759B1 (ko) * 2006-06-30 2014-01-13 노르디코 테크니컬 서비시즈 리미티드 이온빔 가속 장치
JPWO2008007521A1 (ja) * 2006-07-11 2009-12-10 株式会社ニコン レチクル保持部材、レチクル・ステージ、露光装置、投影露光方法およびデバイス製造方法
WO2008071269A1 (en) * 2006-12-15 2008-06-19 Carl-Zeiss Sms Gmbh Apparatus and method for mask metrology
GB0703044D0 (en) * 2007-02-16 2007-03-28 Nordiko Technical Services Ltd Apparatus
DE102014109046A1 (de) * 2014-06-27 2015-12-31 Von Ardenne Gmbh Transferlithographiemaske und Transferlithographieanlage
US10256132B2 (en) 2016-04-28 2019-04-09 Varian Semiconductor Equipment Associates, Inc. Reticle processing system
TW202134774A (zh) 2019-12-05 2021-09-16 美商應用材料股份有限公司 光標處理系統
TWI726728B (zh) * 2020-05-22 2021-05-01 辛耘企業股份有限公司 晶圓清洗裝置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4539695A (en) * 1984-01-06 1985-09-03 The Perkin-Elmer Corporation X-Ray lithography system
US4534047A (en) * 1984-01-06 1985-08-06 The Perkin-Elmer Corporation Mask ring assembly for X-ray lithography
DE68928460T2 (de) * 1988-09-06 1998-04-02 Canon Kk Maskenkassetten-Ladevorrichtung
US4979195A (en) * 1988-09-22 1990-12-18 Fujitsu Limited Vertical stepper
JP2770960B2 (ja) * 1988-10-06 1998-07-02 キヤノン株式会社 Ｓｏｒ−ｘ線露光装置
JP2731950B2 (ja) * 1989-07-13 1998-03-25 キヤノン株式会社 露光方法
EP0425739B1 (de) * 1989-10-30 1995-02-22 Canon Kabushiki Kaisha Ausrichtevorrichtung und eine damit versehene Synchrotron-Röntgenbelichtungsvorrichtung
US5253012A (en) * 1990-10-05 1993-10-12 Canon Kabushiki Kaisha Substrate holding apparatus for vertically holding a substrate in an exposure apparatus
JPH04162610A (ja) * 1990-10-26 1992-06-08 Canon Inc マスク保持装置
EP0484179B1 (de) * 1990-11-01 1996-03-27 Canon Kabushiki Kaisha Waferhaltebefestigung für Belichtungsgerät
US5684856A (en) * 1991-09-18 1997-11-04 Canon Kabushiki Kaisha Stage device and pattern transfer system using the same
JP3224157B2 (ja) * 1992-03-31 2001-10-29 キヤノン株式会社 Ｘ線マスクとその製造方法、並びに該ｘ線マスクを用いたデバイス製造方法とｘ線露光装置
US5450746A (en) * 1993-10-12 1995-09-19 The University Of North Carolina Constant force stylus profiling apparatus and method
US5608773A (en) * 1993-11-30 1997-03-04 Canon Kabushiki Kaisha Mask holding device, and an exposure apparatus and a device manufacturing method using the device
JP3244894B2 (ja) * 1993-11-30 2002-01-07 キヤノン株式会社 マスク保持方法、マスク及びマスクチャック、ならびにこれを用いた露光装置とデバイス製造方法

Also Published As

Publication number Publication date
JPH09213626A (ja) 1997-08-15
US6005910A (en) 1999-12-21
EP0789280B1 (de) 2001-08-08
DE69705975D1 (de) 2001-09-13
JP3243168B2 (ja) 2002-01-07
EP0789280A3 (de) 1998-03-25
EP0789280A2 (de) 1997-08-13

Similar Documents

Publication Publication Date Title
DE69512132D1 (de) Trägerplattevorrichtung und Belichtungsapparat unter Verwendung derselben
DE69940765D1 (de) Ausrichtverfahren und Belichtungsapparat unter Verwendung desselben
DE69729149D1 (de) Prozesskassette und Bilderzeugungsgerät mit herausnehmbarer Prozesskassette
DE69730903D1 (de) Belichtungsverfahren und -apparat
DE69721448D1 (de) Prozesskassette und elektrophotographisches Bilderzeugungsgerät
DE69721392D1 (de) Prozesskassette und elektrofotografisches Bilderzeugungsgerät
DE69524283D1 (de) Prozesskassette und Bilderzeugungsgerät
DE69518570D1 (de) Prozesskassette und Bilderzeugungsgerät
DE69729623D1 (de) Prozesskassette und elektrofotografisches Bilderzeugungsgerät
DE69526692T2 (de) Prozesskartusche und Bilderzeugungsgerät
DE69734126D1 (de) Druckverfahren und Gerät
DE69837358D1 (de) Beleuchtungssystem und Belichtungsapparat
DE69627584D1 (de) Abtastbelichtungsapparat und Belichtungsverfahren unter Verwendung desselben
DE69717884D1 (de) Prozesskassette und elektrophotographisches Bilderzeugungsgerät
NO954290D0 (no) Festeanordning for protese
DE69711157D1 (de) Belichtungsapparat
DE69623698D1 (de) Druckapparat und diesen verwendenden Faksimileapparat
DE69705975D1 (de) Haltemechanismus und Belichtungsapparat unter Verwendung des Mechanismus
DE60138157D1 (de) Beleuchtungssystem und Abtastbelichtungsapparat unter Verwendung desselben
DE69727016D1 (de) Belichtungsapparat
DE69523418D1 (de) Bilderzeugungsgerät und Prozesskartusche
DE69724333D1 (de) Beleuchtungssystem und Belichtungsapparat
DE69613432T2 (de) Belichtungsapparat und Belichtungsverfahren unter Verwendung desselben
DE69722694D1 (de) Belichtungsapparat
DE69515831T2 (de) Belichtungsapparat

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee