DE60138157D1 - Beleuchtungssystem und Abtastbelichtungsapparat unter Verwendung desselben - Google Patents

Beleuchtungssystem und Abtastbelichtungsapparat unter Verwendung desselben

Info

Publication number
DE60138157D1
DE60138157D1 DE60138157T DE60138157T DE60138157D1 DE 60138157 D1 DE60138157 D1 DE 60138157D1 DE 60138157 T DE60138157 T DE 60138157T DE 60138157 T DE60138157 T DE 60138157T DE 60138157 D1 DE60138157 D1 DE 60138157D1
Authority
DE
Germany
Prior art keywords
same
exposure apparatus
illumination system
scanning exposure
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60138157T
Other languages
English (en)
Inventor
Akiyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE60138157D1 publication Critical patent/DE60138157D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
DE60138157T 2000-06-15 2001-06-14 Beleuchtungssystem und Abtastbelichtungsapparat unter Verwendung desselben Expired - Fee Related DE60138157D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000180009A JP3413160B2 (ja) 2000-06-15 2000-06-15 照明装置及びそれを用いた走査型露光装置

Publications (1)

Publication Number Publication Date
DE60138157D1 true DE60138157D1 (de) 2009-05-14

Family

ID=18681181

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60138157T Expired - Fee Related DE60138157D1 (de) 2000-06-15 2001-06-14 Beleuchtungssystem und Abtastbelichtungsapparat unter Verwendung desselben

Country Status (4)

Country Link
US (1) US6762823B2 (de)
EP (1) EP1164407B1 (de)
JP (1) JP3413160B2 (de)
DE (1) DE60138157D1 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6927887B2 (en) * 2001-10-16 2005-08-09 Euv Llc Holographic illuminator for synchrotron-based projection lithography systems
US6813003B2 (en) * 2002-06-11 2004-11-02 Mark Oskotsky Advanced illumination system for use in microlithography
JP2005012169A (ja) * 2003-05-22 2005-01-13 Canon Inc 露光装置及びデバイス製造方法
JP5653182B2 (ja) * 2003-05-22 2015-01-14 キヤノン株式会社 露光方法、露光装置及びデバイス製造方法
JP4481698B2 (ja) * 2004-03-29 2010-06-16 キヤノン株式会社 加工装置
US20070216887A1 (en) * 2004-04-23 2007-09-20 Carl Zeiss Smt Ag Illumination System for a Microlithographic Projection Exposure Apparatus
KR100684872B1 (ko) 2004-08-03 2007-02-20 삼성전자주식회사 빛의 편광을 공간적으로 제어하는 광학 시스템 및 이를제작하는 방법
US7145634B2 (en) * 2004-12-01 2006-12-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2006084476A1 (en) * 2005-02-08 2006-08-17 Carl Zeiss Smt Ag Illumination system for a microlithographic projection exposure apparatus
JP2007242775A (ja) * 2006-03-07 2007-09-20 Canon Inc 露光装置及びデバイス製造方法
JP4232801B2 (ja) * 2006-08-17 2009-03-04 セイコーエプソン株式会社 画像読取装置および複合機
US7518705B2 (en) * 2006-09-14 2009-04-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008153401A (ja) * 2006-12-15 2008-07-03 Canon Inc 露光装置及びデバイス製造方法
TWI463272B (zh) * 2010-11-30 2014-12-01 Ushio Electric Inc Light irradiation device
CN102645853B (zh) * 2012-04-26 2013-12-25 中国科学院上海光学精密机械研究所 衍射型环形照明发生器及其制备方法
US9201008B2 (en) * 2012-06-26 2015-12-01 Universite Laval Method and system for obtaining an extended-depth-of-field volumetric image using laser scanning imaging
JP5541375B2 (ja) * 2013-01-18 2014-07-09 セイコーエプソン株式会社 プロジェクター
CN103135369B (zh) * 2013-03-21 2014-11-26 中国科学院上海光学精密机械研究所 光刻照明模式产生装置
CN104200726B (zh) * 2014-09-16 2016-03-30 江南大学 一种平行光管狭缝光线调控器
WO2016046871A1 (ja) * 2014-09-22 2016-03-31 ギガフォトン株式会社 レーザ装置
DE102015209645A1 (de) * 2015-05-27 2016-12-01 Carl Zeiss Smt Gmbh Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage sowie Mikrolithographie-Projektionsbelichtungsanlage mit einem solchen Beleuchtungssystem
JP6771997B2 (ja) * 2016-08-24 2020-10-21 キヤノン株式会社 露光装置、露光方法、および物品製造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2893778B2 (ja) 1990-01-17 1999-05-24 キヤノン株式会社 露光装置
JPH0567558A (ja) * 1991-09-06 1993-03-19 Nikon Corp 露光方法
JP3412704B2 (ja) * 1993-02-26 2003-06-03 株式会社ニコン 投影露光方法及び装置、並びに露光装置
JPH0728313A (ja) 1993-07-07 1995-01-31 Ricoh Co Ltd 画像形成装置
US6285443B1 (en) * 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
DE4436092C1 (de) 1994-10-10 1995-11-30 Braun Ag Arbeitsgerät zum Rühren oder Zerkleinern von Nahrungsmitteln
US5557469A (en) * 1994-10-28 1996-09-17 Ultratech Stepper, Inc. Beamsplitter in single fold optical system and optical variable magnification method and system
US5757838A (en) 1995-06-05 1998-05-26 Canon Kabushiki Kaisha Output control method for excimer laser
JPH09190966A (ja) 1996-01-08 1997-07-22 Canon Inc 走査型露光装置及びそれを用いたデバイスの製造方法
JPH09167735A (ja) 1995-12-15 1997-06-24 Canon Inc 投影露光装置及びそれを用いた半導体デバイスの製造方法
JP3495868B2 (ja) 1996-12-11 2004-02-09 キヤノン株式会社 走査型投影露光装置及びそれを用いたデバイスの製造方法
DE19724903A1 (de) * 1997-06-12 1998-12-17 Zeiss Carl Fa Lichtintensitätsmeßanordnung
JP3392034B2 (ja) 1997-12-10 2003-03-31 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
DE69931690T2 (de) * 1998-04-08 2007-06-14 Asml Netherlands B.V. Lithographischer Apparat
EP0949541B1 (de) * 1998-04-08 2006-06-07 ASML Netherlands B.V. Lithographischer Apparat
DE19855108A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
TW482705B (en) * 1999-05-28 2002-04-11 Electro Scient Ind Inc Beam shaping and projection imaging with solid state UV Gaussian beam to form blind vias
US6392742B1 (en) * 1999-06-01 2002-05-21 Canon Kabushiki Kaisha Illumination system and projection exposure apparatus

Also Published As

Publication number Publication date
EP1164407A3 (de) 2004-01-14
US20020018197A1 (en) 2002-02-14
JP3413160B2 (ja) 2003-06-03
JP2001358057A (ja) 2001-12-26
US6762823B2 (en) 2004-07-13
EP1164407B1 (de) 2009-04-01
EP1164407A2 (de) 2001-12-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee