DE6939303U - Vorrichtung zur herstellung von druckplatten. - Google Patents

Vorrichtung zur herstellung von druckplatten.

Info

Publication number
DE6939303U
DE6939303U DE19696939303 DE6939303U DE6939303U DE 6939303 U DE6939303 U DE 6939303U DE 19696939303 DE19696939303 DE 19696939303 DE 6939303 U DE6939303 U DE 6939303U DE 6939303 U DE6939303 U DE 6939303U
Authority
DE
Germany
Prior art keywords
layer
actinic radiation
light source
mass
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19696939303
Other languages
German (de)
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WR Grace and Co
Original Assignee
WR Grace and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WR Grace and Co filed Critical WR Grace and Co
Publication of DE6939303U publication Critical patent/DE6939303U/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3014—Imagewise removal using liquid means combined with ultrasonic means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
DE19696939303 1968-10-25 1969-10-09 Vorrichtung zur herstellung von druckplatten. Expired DE6939303U (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US77060368A 1968-10-25 1968-10-25
US77109968A 1968-10-28 1968-10-28

Publications (1)

Publication Number Publication Date
DE6939303U true DE6939303U (de) 1972-04-20

Family

ID=27118335

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19696939303 Expired DE6939303U (de) 1968-10-25 1969-10-09 Vorrichtung zur herstellung von druckplatten.
DE19691950901 Pending DE1950901A1 (de) 1968-10-25 1969-10-09 Verfahren und Vorrichtung zur Herstellung von Druckplatten

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE19691950901 Pending DE1950901A1 (de) 1968-10-25 1969-10-09 Verfahren und Vorrichtung zur Herstellung von Druckplatten

Country Status (4)

Country Link
DE (2) DE6939303U (enrdf_load_stackoverflow)
FR (1) FR2021570A1 (enrdf_load_stackoverflow)
NL (1) NL6914613A (enrdf_load_stackoverflow)
SE (1) SE366845B (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3937418A1 (de) * 1989-11-10 1991-05-16 Nokia Unterhaltungselektronik Verfahren zum herstellen einer feinstrukturierten tiefdruckplatte und anwendung einer solchen platte

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53143669A (en) * 1977-05-23 1978-12-14 Asahi Chem Ind Co Ltd Elimination of surface tuckiness of radically-polymerizable resin cured product
US4246335A (en) * 1979-04-09 1981-01-20 W. R. Grace & Co. Shape dispensing of photopolymer
JPS55135838A (en) * 1979-04-12 1980-10-23 Asahi Chem Ind Co Ltd Surface treating method for photosensitive elastomer printing plate
NL7908327A (nl) * 1979-11-14 1981-06-16 Stork Screens Bv Werkwijze en inrichting voor het vervaardigen van een gedessineerde drukwals.
US4806506A (en) * 1987-09-14 1989-02-21 E. I. Du Pont De Nemours And Company Process for detackifying photopolymer flexographic printing plates
GB9112295D0 (en) * 1991-06-07 1991-07-24 Dantex Graphics Ltd Preparation of photopolymerised elastomeric printing plates

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3937418A1 (de) * 1989-11-10 1991-05-16 Nokia Unterhaltungselektronik Verfahren zum herstellen einer feinstrukturierten tiefdruckplatte und anwendung einer solchen platte

Also Published As

Publication number Publication date
SE366845B (enrdf_load_stackoverflow) 1974-05-06
DE1950901A1 (de) 1970-04-30
NL6914613A (enrdf_load_stackoverflow) 1970-04-28
FR2021570A1 (en) 1970-07-24

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