SE366845B - - Google Patents

Info

Publication number
SE366845B
SE366845B SE1456069A SE1456069A SE366845B SE 366845 B SE366845 B SE 366845B SE 1456069 A SE1456069 A SE 1456069A SE 1456069 A SE1456069 A SE 1456069A SE 366845 B SE366845 B SE 366845B
Authority
SE
Sweden
Application number
SE1456069A
Inventor
D Gush
E Uy
E Caicedo
F Wessells
Original Assignee
Grace W R & Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Grace W R & Co filed Critical Grace W R & Co
Publication of SE366845B publication Critical patent/SE366845B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3014—Imagewise removal using liquid means combined with ultrasonic means
SE1456069A 1968-10-25 1969-10-23 SE366845B (xx)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US77060368A 1968-10-25 1968-10-25
US77109968A 1968-10-28 1968-10-28

Publications (1)

Publication Number Publication Date
SE366845B true SE366845B (xx) 1974-05-06

Family

ID=27118335

Family Applications (1)

Application Number Title Priority Date Filing Date
SE1456069A SE366845B (xx) 1968-10-25 1969-10-23

Country Status (4)

Country Link
DE (2) DE1950901A1 (xx)
FR (1) FR2021570A1 (xx)
NL (1) NL6914613A (xx)
SE (1) SE366845B (xx)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53143669A (en) * 1977-05-23 1978-12-14 Asahi Chem Ind Co Ltd Elimination of surface tuckiness of radically-polymerizable resin cured product
US4246335A (en) * 1979-04-09 1981-01-20 W. R. Grace & Co. Shape dispensing of photopolymer
JPS55135838A (en) * 1979-04-12 1980-10-23 Asahi Chem Ind Co Ltd Surface treating method for photosensitive elastomer printing plate
NL7908327A (nl) * 1979-11-14 1981-06-16 Stork Screens Bv Werkwijze en inrichting voor het vervaardigen van een gedessineerde drukwals.
US4806506A (en) * 1987-09-14 1989-02-21 E. I. Du Pont De Nemours And Company Process for detackifying photopolymer flexographic printing plates
DE3937418A1 (de) * 1989-11-10 1991-05-16 Nokia Unterhaltungselektronik Verfahren zum herstellen einer feinstrukturierten tiefdruckplatte und anwendung einer solchen platte
GB9112295D0 (en) * 1991-06-07 1991-07-24 Dantex Graphics Ltd Preparation of photopolymerised elastomeric printing plates

Also Published As

Publication number Publication date
NL6914613A (xx) 1970-04-28
DE6939303U (de) 1972-04-20
FR2021570A1 (en) 1970-07-24
DE1950901A1 (de) 1970-04-30

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