DE69333335T2 - Harzzusammensetzungen die eine Epoxygruppe enthalten - Google Patents
Harzzusammensetzungen die eine Epoxygruppe enthalten Download PDFInfo
- Publication number
- DE69333335T2 DE69333335T2 DE69333335T DE69333335T DE69333335T2 DE 69333335 T2 DE69333335 T2 DE 69333335T2 DE 69333335 T DE69333335 T DE 69333335T DE 69333335 T DE69333335 T DE 69333335T DE 69333335 T2 DE69333335 T2 DE 69333335T2
- Authority
- DE
- Germany
- Prior art keywords
- epoxy group
- compositions containing
- resin compositions
- resin
- epoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
- C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/04—Anhydrides, e.g. cyclic anhydrides
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Graft Or Block Polymers (AREA)
- Paints Or Removers (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19874192A JP3101986B2 (ja) | 1992-07-24 | 1992-07-24 | 耐熱性感放射線性樹脂組成物 |
JP31540692A JP3321858B2 (ja) | 1992-11-25 | 1992-11-25 | 熱硬化性樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69333335D1 DE69333335D1 (de) | 2004-01-15 |
DE69333335T2 true DE69333335T2 (de) | 2004-10-07 |
Family
ID=26511140
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69333335T Expired - Lifetime DE69333335T2 (de) | 1992-07-24 | 1993-07-23 | Harzzusammensetzungen die eine Epoxygruppe enthalten |
DE69325480T Expired - Lifetime DE69325480T2 (de) | 1992-07-24 | 1993-07-23 | Harzzusammensetzungen, die eine Epoxygruppe enthalten |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69325480T Expired - Lifetime DE69325480T2 (de) | 1992-07-24 | 1993-07-23 | Harzzusammensetzungen, die eine Epoxygruppe enthalten |
Country Status (4)
Country | Link |
---|---|
US (2) | US5399604A (de) |
EP (2) | EP0897938B1 (de) |
KR (1) | KR100268697B1 (de) |
DE (2) | DE69333335T2 (de) |
Families Citing this family (51)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW256929B (de) * | 1993-12-29 | 1995-09-11 | Hirama Rika Kenkyusho Kk | |
DE59506534D1 (de) * | 1994-05-25 | 1999-09-09 | Siemens Ag | Trockenentwickelbarer positivresist |
JPH0817288A (ja) * | 1994-07-04 | 1996-01-19 | Matsushita Electric Ind Co Ltd | 透明タッチパネル |
US5538774A (en) * | 1994-07-29 | 1996-07-23 | Minnesota Mining And Manufacturing Company | Internally damped rotatable storage article |
JPH08171209A (ja) * | 1994-12-15 | 1996-07-02 | Japan Synthetic Rubber Co Ltd | 放射線硬化性組成物 |
JP3825506B2 (ja) * | 1996-09-02 | 2006-09-27 | Jsr株式会社 | 液状硬化性樹脂組成物 |
JP3650985B2 (ja) * | 1997-05-22 | 2005-05-25 | Jsr株式会社 | ネガ型感放射線性樹脂組成物およびパターン製造法 |
US6093455A (en) * | 1997-05-23 | 2000-07-25 | Deco Patents, Inc. | Method and compositions for decorating glass |
US6261665B1 (en) * | 1997-09-16 | 2001-07-17 | Tomoegawa Paper Co., Ltd. | Anti-reflection material and method for producing the same |
US6168908B1 (en) * | 1997-10-09 | 2001-01-02 | Jsr Corporation | Process for forming a cured film of a thermoplastic resin |
US6391140B1 (en) | 1998-07-10 | 2002-05-21 | Lexmark International, Inc. | Adhesive material with flexibility modifiers |
US6166100A (en) * | 1998-07-22 | 2000-12-26 | Kansai Paint Co., Ltd. | Cationically polymerizable pigmented composition |
GB9821991D0 (en) * | 1998-10-08 | 1998-12-02 | Thorstone Business Man Ltd | Coatings |
US6599987B1 (en) | 2000-09-26 | 2003-07-29 | The University Of Akron | Water soluble, curable copolymers, methods of preparation and uses thereof |
EP1239015A1 (de) * | 2001-03-08 | 2002-09-11 | Sika AG, vorm. Kaspar Winkler & Co. | Leicht herzustellende Methacrylic-Klebstoffzusammensetzungen |
US6680158B2 (en) * | 2001-07-31 | 2004-01-20 | Chi Mei Corporation | Radiation-sensitive resin composition for spacer |
JP3996802B2 (ja) * | 2002-05-15 | 2007-10-24 | 太陽インキ製造株式会社 | 低放射線性の光硬化性・熱硬化性樹脂組成物及びその硬化被膜 |
JP4093557B2 (ja) * | 2002-11-14 | 2008-06-04 | 東洋合成工業株式会社 | 感光性樹脂組成物および含水ゲルの形成方法並びに含水ゲル |
JP3915789B2 (ja) * | 2003-03-13 | 2007-05-16 | セイコーエプソン株式会社 | カラーフィルタ基板の製造方法 |
JP4662533B2 (ja) * | 2003-08-26 | 2011-03-30 | 日東電工株式会社 | 電池用セパレータのための反応性ポリマー担持多孔質フィルムとそれを用いる電池の製造方法 |
WO2005076060A1 (ja) * | 2004-02-10 | 2005-08-18 | Sekisui Chemical Co., Ltd. | カラムスペーサ、液晶表示素子及びカラムスペーサ用硬化性樹脂組成物 |
JP4315010B2 (ja) * | 2004-02-13 | 2009-08-19 | Jsr株式会社 | 感放射線性樹脂組成物、表示パネル用スペーサーおよび表示パネル |
US7816487B2 (en) * | 2004-09-30 | 2010-10-19 | Intel Corporation | Die-attach films for chip-scale packaging, packages made therewith, and methods of assembling same |
KR100642446B1 (ko) * | 2004-10-15 | 2006-11-02 | 제일모직주식회사 | 열경화성 일액형 컬러필터용 보호막 조성물 및 이를이용한 컬러필터 |
US7265063B2 (en) * | 2004-10-22 | 2007-09-04 | Hewlett-Packard Development Company, L.P. | Method of forming a component having dielectric sub-layers |
KR100845692B1 (ko) * | 2004-12-29 | 2008-07-11 | 제일모직주식회사 | 열경화성 일액형 컬러필터용 보호막 조성물 및 이를이용한 컬러필터 |
TW200710570A (en) * | 2005-05-31 | 2007-03-16 | Taiyo Ink Mfg Co Ltd | Composition for forming adhesive pattern, multilayer structure obtained by using same, and method for producing such multilayer structure |
KR100731325B1 (ko) * | 2005-06-23 | 2007-06-25 | 주식회사 삼양이엠에스 | 음성 레지스트 조성물 |
KR100805688B1 (ko) * | 2005-09-15 | 2008-02-21 | 제일모직주식회사 | 열경화성 일액형 컬러필터용 보호막 조성물 및 이를 이용한컬러필터 |
US7571979B2 (en) * | 2005-09-30 | 2009-08-11 | Lexmark International, Inc. | Thick film layers and methods relating thereto |
KR101321150B1 (ko) * | 2005-11-29 | 2013-10-22 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 레지스트 보호막 재료 및 패턴 형성 방법 |
KR101348757B1 (ko) * | 2006-02-03 | 2014-01-07 | 주식회사 동진쎄미켐 | 유기 절연막용 수지 조성물 및 그 제조 방법, 상기 수지조성물을 포함하는 표시판 |
US7771913B2 (en) * | 2006-04-04 | 2010-08-10 | Shin-Etsu Chemical Co., Ltd. | Resist composition and patterning process using the same |
JP2007311454A (ja) * | 2006-05-17 | 2007-11-29 | Sony Corp | 固体撮像装置 |
KR100793946B1 (ko) * | 2006-11-17 | 2008-01-16 | 제일모직주식회사 | 액정표시소자 칼럼 스페이서용 감광성 수지 조성물, 이를이용한 액정표시소자 칼럼 스페이서의 제조방법,액정표시소자용 칼럼 스페이서 및 이를 포함하는디스플레이 장치 |
KR100839046B1 (ko) * | 2006-12-14 | 2008-06-19 | 제일모직주식회사 | 액정표시소자용 감광성 수지 조성물, 이를 이용하여제조된 칼럼 스페이서 및 그 칼럼 스페이서를 포함하는디스플레이 장치 |
JP5083540B2 (ja) * | 2007-03-20 | 2012-11-28 | Jsr株式会社 | 感放射線性保護膜形成用樹脂組成物およびその組成物から保護膜を形成する方法、ならびに液晶表示素子および固体撮像素子 |
KR101388519B1 (ko) | 2007-07-23 | 2014-04-24 | 주식회사 동진쎄미켐 | 박막 트랜지스터 기판의 제조 방법 및 이에 사용되는감광성 수지 조성물 |
KR100859008B1 (ko) * | 2007-08-21 | 2008-09-18 | 삼성전기주식회사 | 배선기판 제조방법 |
US8409783B2 (en) * | 2007-09-28 | 2013-04-02 | Tokyo Ohka Kogyo Co., Ltd. | Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer |
KR100919715B1 (ko) * | 2007-11-30 | 2009-10-06 | 제일모직주식회사 | 컬러 필터용 감광성 수지 조성물 및 이로부터 제조된 컬러필터 |
US20090258963A1 (en) * | 2008-04-10 | 2009-10-15 | Freudenberg-Nok General Partnership | Liquid acrylic elastomer |
CN102375340A (zh) * | 2010-08-10 | 2012-03-14 | Jsr株式会社 | 放射线敏感性树脂组合物、固化膜、固化膜的形成方法、滤色器以及滤色器的形成方法 |
JP2012049225A (ja) * | 2010-08-25 | 2012-03-08 | Sony Corp | 電子デバイス及びその製造方法、並びに、半導体装置及びその製造方法 |
JP5636839B2 (ja) | 2010-09-16 | 2014-12-10 | Jsr株式会社 | 感放射線性樹脂組成物、層間絶縁膜、層間絶縁膜の形成方法及び表示素子 |
US8785517B2 (en) * | 2011-05-25 | 2014-07-22 | 3M Innovative Properties Company | Pressure-sensitive adhesives with onium-epdxy crosslinking system |
US9518207B2 (en) * | 2012-06-29 | 2016-12-13 | Halliburton Energy Services, Inc. | Methods to prevent formation damage from friction reducers |
CN102786631B (zh) * | 2012-08-16 | 2014-05-14 | 京东方科技集团股份有限公司 | 光敏性碱可溶性树脂、其制备方法及彩色光刻胶 |
EP2970725A1 (de) | 2013-03-13 | 2016-01-20 | 3M Innovative Properties Company | Klebstoffe mit epoxidharzvernetzten gruppen und verfahren |
TWI675907B (zh) | 2015-01-21 | 2019-11-01 | 日商Jsr股份有限公司 | 固體攝像裝置 |
JP6447557B2 (ja) * | 2016-03-24 | 2019-01-09 | 日亜化学工業株式会社 | 発光装置の製造方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2604463A (en) * | 1949-04-28 | 1952-07-22 | Canadian Ind | Cross-linkable and cross-linked vinyl type copolymers |
JPS5294346A (en) * | 1976-02-05 | 1977-08-08 | Toray Silicone Co Ltd | Compositions for resin treatments |
DE2618809C2 (de) * | 1976-04-29 | 1983-06-30 | Hoechst Ag, 6230 Frankfurt | Verfahren zur Herstellung von in organischen Lösungsmitteln löslichen Copolymerisaten und Verwendung derselben in Reaktionslacken |
AU3870478A (en) * | 1977-08-09 | 1980-02-14 | Somar Mfg | High energy radiation cruable resist material |
DE2851615C2 (de) * | 1978-11-29 | 1990-05-31 | Synthopol Chemie Dr. rer. pol. Koch & Co, 2150 Buxtehude | Verfahren zur Herstellung von in organischen Lösungsmitteln löslichen hydroxylgruppentragenden Copolymerisaten und deren Verwendung |
JPS5653171A (en) * | 1979-09-11 | 1981-05-12 | Hitachi Chem Co Ltd | Preparation of adhesive film |
EP0173278B1 (de) * | 1984-08-31 | 1990-11-07 | Dainippon Ink And Chemicals, Inc. | Bei Zimmertemperatur härtbare Harzzusammensetzung |
US4678835A (en) * | 1986-01-30 | 1987-07-07 | Ppg Industries, Inc. | Coating composition containing an ungelled reaction product as a curative |
FR2606775B1 (fr) * | 1986-11-14 | 1989-07-07 | Charbonnages Ste Chimique | Copolymeres (meth)acryliques autoreticulables a basses temperatures |
JPH01263645A (ja) * | 1988-04-15 | 1989-10-20 | Tokyo Ohka Kogyo Co Ltd | 光重合性組成物 |
US5362597A (en) * | 1991-05-30 | 1994-11-08 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive resin composition comprising an epoxy-containing alkali-soluble resin and a naphthoquinone diazide sulfonic acid ester |
JPH05132538A (ja) * | 1991-11-13 | 1993-05-28 | Nippon Paint Co Ltd | 新規常温硬化性樹脂組成物 |
JPH07300876A (ja) * | 1994-05-10 | 1995-11-14 | Kubota Corp | ドーザ付バックホウのドーザ構造 |
-
1993
- 1993-07-21 US US08/094,436 patent/US5399604A/en not_active Expired - Lifetime
- 1993-07-23 DE DE69333335T patent/DE69333335T2/de not_active Expired - Lifetime
- 1993-07-23 EP EP98121347A patent/EP0897938B1/de not_active Expired - Lifetime
- 1993-07-23 KR KR1019930013997A patent/KR100268697B1/ko not_active IP Right Cessation
- 1993-07-23 EP EP93305817A patent/EP0581536B1/de not_active Expired - Lifetime
- 1993-07-23 DE DE69325480T patent/DE69325480T2/de not_active Expired - Lifetime
-
1994
- 1994-12-15 US US08/356,544 patent/US5530036A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0581536B1 (de) | 1999-06-30 |
US5399604A (en) | 1995-03-21 |
EP0581536A1 (de) | 1994-02-02 |
DE69333335D1 (de) | 2004-01-15 |
KR940005718A (ko) | 1994-03-22 |
KR100268697B1 (en) | 2000-10-16 |
EP0897938A2 (de) | 1999-02-24 |
EP0897938A3 (de) | 1999-06-16 |
DE69325480T2 (de) | 2000-03-30 |
US5530036A (en) | 1996-06-25 |
EP0897938B1 (de) | 2003-12-03 |
DE69325480D1 (de) | 1999-08-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |